CORROSION RESISTANT WAFER PROCESSING APPARATUS AND METHOD FOR MAKING THEREOF
    8.
    发明申请
    CORROSION RESISTANT WAFER PROCESSING APPARATUS AND METHOD FOR MAKING THEREOF 审中-公开
    耐腐蚀波浪加工设备及其制造方法

    公开(公告)号:US20080006204A1

    公开(公告)日:2008-01-10

    申请号:US11554590

    申请日:2006-10-31

    IPC分类号: C23C14/00 C23C16/00

    CPC分类号: C23C16/4586 C23C16/4581

    摘要: A wafer processing apparatus characterized by having corrosion resistant connections for its electrical connections, gas feed-through channels, recessed areas, raised areas, MESA, through-holes such as lift-pin holes, threaded bolt holes, blind holes, and the like, with the special configurations employing connectors and fillers having excellent chemical resistant properties and optimized CTEs, i.e., having a coefficient of thermal expansion (CTE) that closely matches the CTE of the base substrate layer, the electrode(s), as well as the CTE of coating layer. In one embodiment, a filler composition comprising a glass-ceramic material is employed.

    摘要翻译: 一种晶片处理装置,其特征在于具有用于其电连接,气体馈通通道,凹陷区域,凸起区域,MESA,诸如提升针孔,螺纹孔,盲孔等通孔的耐腐蚀连接, 具有采用具有优异的耐化学性能和优化的CTE的连接器和填料的特殊构造,即具有与基底衬底层,电极以及CTE的CTE密切匹配的热膨胀系数(CTE) 的涂层。 在一个实施方案中,使用包含玻璃 - 陶瓷材料的填料组合物。