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公开(公告)号：US20110226735A1
公开(公告)日：2011-09-22
申请号：US13051441
申请日：2011-03-18
申请人： Sander Frederik Wuister , Vadim Yevgenyevich Banine , Arie Jeffrey Den Boef , Yvonne Wendela Kruijt-Stegeman , Tatyana Viktorovna Rakhimova , Dmitriy Viktorovich Lopaev , Denis Alexandrovich Glushkov , Andrei Mikhailovich Yakunin , Roelof Koole
发明人： Sander Frederik Wuister , Vadim Yevgenyevich Banine , Arie Jeffrey Den Boef , Yvonne Wendela Kruijt-Stegeman , Tatyana Viktorovna Rakhimova , Dmitriy Viktorovich Lopaev , Denis Alexandrovich Glushkov , Andrei Mikhailovich Yakunin , Roelof Koole
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprint lithography method is disclosed that includes, after imprinting an imprint lithography template into a layer of imprintable medium to form a pattern in that imprintable medium and fixing that pattern to form a patterned layer of imprintable medium, adding etch resistant material (i.e. a hard mask) to a part of the patterned layer of imprintable medium to reduce a difference between an intended topography and an actual topography of that part of the patterned layer of imprintable medium.
摘要翻译： 公开了一种压印光刻方法，其包括在将压印光刻模板压印到可压印介质层中以在该可压印介质中形成图案并固定该图案以形成可压印介质的图案化层之后，添加耐蚀刻材料（即，硬 掩模）到可压印介质的图案化层的一部分，以减少所期望的形貌与可压印介质的图案化层的该部分的实际形貌之间的差异。
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公开(公告)号：US08454849B2
公开(公告)日：2013-06-04
申请号：US13051441
申请日：2011-03-18
申请人： Sander Frederik Wuister , Vadim Yevgenyevich Banine , Arie Jeffrey Den Boef , Yvonne Wendela Kruijt-Stegeman , Tatyana Viktorovna Rakhimova , Dmitriy Viktorovich Lopaev , Denis Alexandrovich Glushkov , Andrei Mikhailovich Yakunin , Roelof Koole
发明人： Sander Frederik Wuister , Vadim Yevgenyevich Banine , Arie Jeffrey Den Boef , Yvonne Wendela Kruijt-Stegeman , Tatyana Viktorovna Rakhimova , Dmitriy Viktorovich Lopaev , Denis Alexandrovich Glushkov , Andrei Mikhailovich Yakunin , Roelof Koole
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprint lithography method is disclosed that includes, after imprinting an imprint lithography template into a layer of imprintable medium to form a pattern in that imprintable medium and fixing that pattern to form a patterned layer of imprintable medium, adding etch resistant material (i.e. a hard mask) to a part of the patterned layer of imprintable medium to reduce a difference between an intended topography and an actual topography of that part of the patterned layer of imprintable medium.
摘要翻译： 公开了一种压印光刻方法，其包括在将压印光刻模板压印到可压印介质层中以在该可压印介质中形成图案并固定该图案以形成可压印介质的图案化层之后，添加耐蚀刻材料（即，硬 掩模）到可压印介质的图案化层的一部分，以减少所期望的形貌与可压印介质的图案化层的该部分的实际形貌之间的差异。
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公开(公告)号：US08961801B2
公开(公告)日：2015-02-24
申请号：US12869381
申请日：2010-08-26
申请人： Sander Frederik Wuister , Vadim Yevgenyevich Banine , Johan Frederik Dijksman , Yvonne Wendela Kruijt-Stegeman , Jeroen Herman Lammers , Roelof Koole
发明人： Sander Frederik Wuister , Vadim Yevgenyevich Banine , Johan Frederik Dijksman , Yvonne Wendela Kruijt-Stegeman , Jeroen Herman Lammers , Roelof Koole
CPC分类号： B29C43/34 , B29C43/021 , B29C43/58 , B29C2043/025 , B29K2101/12 , B44C1/20 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： In an embodiment, there is provided an imprint lithography method that includes providing a first amount of imprintable medium on a first area of a substrate, the first amount of imprintable medium, when fixed, having a first etch rate; and providing a second amount of imprintable medium on a second, different area of the substrate, the second amount of imprintable medium, when fixed, having a second, different etch rate.
摘要翻译： 在一个实施例中，提供了压印光刻方法，其包括在衬底的第一区域上提供第一量的可压印介质，当固定时，第一量的可压印介质具有第一蚀刻速率; 以及在所述基板的第二不同区域上提供第二量的可压印介质，所述第二量的可压印介质在固定时具有第二不同的蚀刻速率。
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公开(公告)号：US20110049097A1
公开(公告)日：2011-03-03
申请号：US12869381
申请日：2010-08-26
申请人： Sander Frederik WUISTER , Vadim Yevgenyevich Banine , Johan Frederik Dijksman , Yvonne Wendela Kruijt-Stegeman , Jeroen Herman Lammers , Roelof Koole
发明人： Sander Frederik WUISTER , Vadim Yevgenyevich Banine , Johan Frederik Dijksman , Yvonne Wendela Kruijt-Stegeman , Jeroen Herman Lammers , Roelof Koole
IPC分类号： B44C1/22
CPC分类号： B29C43/34 , B29C43/021 , B29C43/58 , B29C2043/025 , B29K2101/12 , B44C1/20 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： In an embodiment, there is provided an imprint lithography method that includes providing a first amount of imprintable medium on a first area of a substrate, the first amount of imprintable medium, when fixed, having a first etch rate; and providing a second amount of imprintable medium on a second, different area of the substrate, the second amount of imprintable medium, when fixed, having a second, different etch rate.
摘要翻译： 在一个实施例中，提供了压印光刻方法，其包括在衬底的第一区域上提供第一量的可压印介质，当固定时，第一量的可压印介质具有第一蚀刻速率; 以及在所述基板的第二不同区域上提供第二量的可压印介质，所述第二量的可压印介质在固定时具有第二不同的蚀刻速率。
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公开(公告)号：US09547235B2
公开(公告)日：2017-01-17
申请号：US12898084
申请日：2010-10-05
申请人： Jeroen Herman Lammers , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Roelof Koole
发明人： Jeroen Herman Lammers , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Roelof Koole
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprint lithography method is disclosed for forming a patterned layer from an imprintable liquid medium on a substrate by means of an imprint template having a patterned surface. The method involves contacting the patterned surface and imprintable liquid medium together for a filling period. Light emergent (e.g., scattered or reflected) from an interface between the medium and the patterned surface is collected and measured during the filling period to obtain data concerning one or more voids at the interface, and an estimated end time for the filling period is derived from a relationship between the data and time. The method may allow subsequent process steps to be undertaken more rapidly, with reduced risk of defects arising from remnants of unfilled voids. An imprint lithography apparatus and component for putting the method into effect are also disclosed.
摘要翻译： 公开了一种压印光刻方法，用于通过具有图案化表面的压印模板从衬底上的可压印液体介质形成图案化层。 该方法包括将图案化表面和可压印液体介质接合在一起，以达到填充时间。 在填充期间收集和测量从介质和图案化表面之间的界面出现的轻微的（例如，散射或反射）以获得关于界面处的一个或多个空隙的数据，并且导出填充时间的估计结束时间 从数据和时间之间的关系。 该方法可以允许更快速地进行随后的工艺步骤，同时减少由未填充的空隙残余物引起的缺陷的风险。 还公开了一种用于使该方法生效的压印光刻设备和组件。
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公开(公告)号：US20110079939A1
公开(公告)日：2011-04-07
申请号：US12898084
申请日：2010-10-05
申请人： Jeroen Herman LAMMERS , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Roelof Koole
发明人： Jeroen Herman LAMMERS , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Roelof Koole
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprint lithography method is disclosed for forming a patterned layer from an imprintable liquid medium on a substrate by means of an imprint template having a patterned surface. The method involves contacting the patterned surface and imprintable liquid medium together for a filling period. Light emergent (e.g., scattered or reflected) from an interface between the medium and the patterned surface is collected and measured during the filling period to obtain data concerning one or more voids at the interface, and an estimated end time for the filling period is derived from a relationship between the data and time. The method may allow subsequent process steps to be undertaken more rapidly, with reduced risk of defects arising from remnants of unfilled voids. An imprint lithography apparatus and component for putting the method into effect are also disclosed.
摘要翻译： 公开了一种压印光刻方法，用于通过具有图案化表面的压印模板从衬底上的可压印液体介质形成图案化层。 该方法包括将图案化表面和可压印液体介质接合在一起，以达到填充时间。 在填充期间收集和测量从介质和图案化表面之间的界面出现的轻微的（例如，散射或反射）以获得关于界面处的一个或多个空隙的数据，并且导出填充时间的估计结束时间 从数据和时间之间的关系。 该方法可以允许更快速地进行随后的工艺步骤，同时减少由未填充的空隙残余物引起的缺陷的风险。 还公开了一种用于使该方法生效的压印光刻设备和组件。
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公开(公告)号：US09372399B2
公开(公告)日：2016-06-21
申请号：US13812459
申请日：2011-07-21
申请人： Martinus Bernardus Van Der Mark , Vadim Yevgenyevich Banine , Andre Bernardus Jeunink , Johan Frederik Dijksman , Sander Frederik Wuister , Emiel Andreas Godefridus Peeters , Johan Hendrik Klootwijk , Roelof Koole , Christianus Martinus Van Heesch , Ruediger Guenter Mauczok , Jacobus Bernardus Giesbers
发明人： Martinus Bernardus Van Der Mark , Vadim Yevgenyevich Banine , Andre Bernardus Jeunink , Johan Frederik Dijksman , Sander Frederik Wuister , Emiel Andreas Godefridus Peeters , Johan Hendrik Klootwijk , Roelof Koole , Christianus Martinus Van Heesch , Ruediger Guenter Mauczok , Jacobus Bernardus Giesbers
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprint lithography method is disclosed for reducing a difference between an intended topography and an actual topography arising from a part of a patterned layer of fixed imprintable medium. The method involves imprinting an imprint lithography template into a layer of flowable imprintable medium to form a patterned layer in the imprintable medium, and fixing the imprintable medium to form a patterned layer of fixed imprintable medium. Local excitation is applied to the part of the patterned layer to adjust a chemical reaction in the part of the patterned layer to reduce the difference between the intended topography and the actual topography arising from the part of the fixed patterned layer of imprintable medium when this is subsequently used as a resist for patterning the substrate. An imprint medium suitable for imprint lithography with the method is also disclosed.
摘要翻译： 公开了一种压印光刻方法，用于减少由固定的可打印介质的图案层的一部分产生的预期形貌和实际形貌之间的差异。 该方法包括将压印光刻模板压印到可流动的可压印介质层中以在可压印介质中形成图案化层，并固定可压印介质以形成固定可压印介质的图案化层。 局部激发被施加到图案化层的部分以调整图案化层的部分中的化学反应，以减少所期望的形貌与由可压印介质的固定图案化层的部分产生的实际形貌之间的差异，当这是 随后用作图案化基板的抗蚀剂。 还公开了适用于该方法的压印光刻的压印介质。
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8.发明授权Method and apparatus for treatment of self-assemblable polymer layers for use in lithography 有权用于光刻的自组装聚合物层的处理方法和装置公开(公告)号：US09011978B2
公开(公告)日：2015-04-21
申请号：US13580356
申请日：2011-01-06
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： Treatment of a layer comprising self-assemblable polymer at a surface of a substrate is disclosed. In an embodiment, the treatment includes arranging a zone of temperature change to sweep across the layer, wherein a temperature of the layer within the zone differs from an initial temperature of the layer prior to passage of the zone.
摘要翻译： 公开了在衬底表面处理包含可自组装聚合物的层。 在一个实施方案中，处理包括布置温度变化区域以扫过层，其中该区域内的层的温度与该区域通过之前该层的初始温度不同。
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公开(公告)号：US20130120725A1
公开(公告)日：2013-05-16
申请号：US13812459
申请日：2011-07-21
申请人： Martinus Bernardus Van Der Mark , Vadim Yevgenyevich Banine , Andre Bernardus Jeunink , Johan Frederik Dijksman , Sander Frederik Wuister , Emiel Andreas Godefridus Peeters , Johan Hendrik Klootwijk , Roelof Koole , Christianus Martinus Van Heesch , Ruediger Guenter Mauczok , JAcobus Bernardus Giesbers
发明人： Martinus Bernardus Van Der Mark , Vadim Yevgenyevich Banine , Andre Bernardus Jeunink , Johan Frederik Dijksman , Sander Frederik Wuister , Emiel Andreas Godefridus Peeters , Johan Hendrik Klootwijk , Roelof Koole , Christianus Martinus Van Heesch , Ruediger Guenter Mauczok , JAcobus Bernardus Giesbers
IPC分类号： G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprint lithography method is disclosed for reducing a difference between an intended topography and an actual topography arising from a part of a patterned layer of fixed imprintable medium. The method involves imprinting an imprint lithography template into a layer of flowable imprintable medium to form a patterned layer in the imprintable medium, and fixing the imprintable medium to form a patterned layer of fixed imprintable medium. Local excitation is applied to the part of the patterned layer to adjust a chemical reaction in the part of the patterned layer to reduce the difference between the intended topography and the actual topography arising from the part of the fixed patterned layer of imprintable medium when this is subsequently used as a resist for patterning the substrate. An imprint medium suitable for imprint lithography with the method is also disclosed.
摘要翻译： 公开了一种压印光刻方法，用于减少由固定的可打印介质的图案层的一部分产生的预期形貌和实际形貌之间的差异。 该方法包括将压印光刻模板压印到可流动的可压印介质层中以在可压印介质中形成图案化层，并固定可压印介质以形成固定可压印介质的图案化层。 局部激发被施加到图案化层的部分以调整图案化层的部分中的化学反应，以减少所期望的形貌与由可压印介质的固定图案化层的部分产生的实际形貌之间的差异，当这是 随后用作图案化基板的抗蚀剂。 还公开了适用于该方法的压印光刻的压印介质。
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10.发明申请METHOD AND APPARATUS FOR TREATMENT OF SELF-ASSEMBLABLE POLYMER LAYERS FOR USE IN LITHOGRAPHY 有权用于处理自组装聚合物层的方法和装置，用于在LITHOGRAPHY中使用公开(公告)号：US20120312501A1
公开(公告)日：2012-12-13
申请号：US13580356
申请日：2011-01-06
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： Treatment of a layer comprising self-assemblable polymer at a surface of a substrate is disclosed. In an embodiment, the treatment includes arranging a zone of temperature change to sweep across the layer, wherein a temperature of the layer within the zone differs from an initial temperature of the layer prior to passage of the zone.
摘要翻译： 公开了在衬底表面处理包含可自组装聚合物的层。 在一个实施方案中，处理包括布置温度变化区域以扫过层，其中该区域内的层的温度与该区域通过之前该层的初始温度不同。
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