Nonvolatile memory device, layer deposition apparatus and method of fabricating a nonvolatile memory device using the same
    1.
    发明申请
    Nonvolatile memory device, layer deposition apparatus and method of fabricating a nonvolatile memory device using the same 审中-公开
    非挥发性存储器件,层淀积设备和使用其的非易失性存储器件的制造方法

    公开(公告)号:US20070196984A1

    公开(公告)日:2007-08-23

    申请号:US11655191

    申请日:2007-01-19

    IPC分类号: H01L21/336

    摘要: Provided are a nonvolatile memory device, a layer deposition apparatus and a method of fabricating a nonvolatile memory device using the same. The apparatus may include a chamber capable of holding a substrate, a particle-discharging target discharging particles toward the substrate, and a first ion beam gun accelerating a first plurality of ions and irradiating the accelerated ions toward the substrate. The method of fabricating a nonvolatile memory device may include discharging particles from a target toward a substrate, accelerating and irradiating a first plurality of ions toward the substrate, forming a reaction product by reacting the discharged particles and the accelerated and irradiated first plurality of ions, and forming a data storage layer having a deposited layer on the substrate. The nonvolatile memory device may include a data storage layer including a transition metal oxide layer formed by reacting discharged transition metal particles and accelerated and irradiated oxygen ions.

    摘要翻译: 提供一种非易失性存储器件,层淀积设备和使用其的非易失性存储器件的制造方法。 该装置可以包括能够保持基板的室,向基板排出颗粒的颗粒排放目标,以及加速第一多个离子并将加速离子朝向基板照射的第一离子束枪。 制造非易失性存储器件的方法可以包括将靶从靶向衬底排放,加速和照射第一多个离子朝向衬底,通过使排出的微粒和加速和照射的第一多个离子反应形成反应产物, 以及在所述基板上形成具有沉积层的数据存储层。 非易失性存储装置可以包括数据存储层,该数据存储层包括通过使放电的过渡金属颗粒和加速和照射的氧离子反应而形成的过渡金属氧化物层。