公开(公告)号：US08304173B2

公开(公告)日：2012-11-06

申请号：US12847274

申请日：2010-07-30

申请人： Sang-Yong Yu ,  Sung-Hyuck Kim ,  Gi-Sung Yoon

发明人： Sang-Yong Yu ,  Sung-Hyuck Kim ,  Gi-Sung Yoon

IPC分类号： G03F7/20

CPC分类号： H01L27/11543 ,  G03F1/70 ,  G03F7/70466 ,  H01L21/32139 ,  H01L27/10894 ,  H01L27/11526

摘要： The method of forming a pattern includes forming a first photosensitive layer pattern including a first pattern in a first region of a substrate and a second pattern in a second region of the substrate, by performing a first photolithography process using a photomask having a first mask region and a second mask region. The first pattern is transferred from the first mask region, and the second pattern is transferred from the second mask region. The method further includes forming a second photosensitive layer pattern including a third pattern in the second region of the substrate and a fourth pattern in the first region of the substrate, by performing a second photolithography process using the photomask. The third pattern is transferred from the first mask region, and the fourth pattern is transferred from the second mask region.

摘要翻译： 形成图案的方法包括在基板的第一区域中形成包括第一图案的第一感光层图案和在基板的第二区域中形成第二图案，通过使用具有第一掩模区域的光掩模进行第一光刻工艺 和第二掩模区域。 第一图案从第一掩模区域传送，并且第二图案从第二掩模区域传送。 该方法还包括通过使用光掩模进行第二光刻处理，在衬底的第二区域中形成包括第三图案的第二感光层图案和在衬底的第一区域中的第四图案。 第三图案从第一掩模区域传送，并且第四图案从第二掩模区域传送。

公开(公告)号：US20110053096A1

公开(公告)日：2011-03-03

申请号：US12847274

申请日：2010-07-30

申请人： Sang-Yong Yu ,  Sung-Hyuck Kim ,  Gi-Sung Yoon

发明人： Sang-Yong Yu ,  Sung-Hyuck Kim ,  Gi-Sung Yoon

IPC分类号： G03F7/20

CPC分类号： H01L27/11543 ,  G03F1/70 ,  G03F7/70466 ,  H01L21/32139 ,  H01L27/10894 ,  H01L27/11526

摘要： The method of forming a pattern includes forming a first photosensitive layer pattern including a first pattern in a first region of a substrate and a second pattern in a second region of the substrate, by performing a first photolithography process using a photomask having a first mask region and a second mask region. The first pattern is transferred from the first mask region, and the second pattern is transferred from the second mask region. The method further includes forming a second photosensitive layer pattern including a third pattern in the second region of the substrate and a fourth pattern in the first region of the substrate, by performing a second photolithography process using the photomask. The third pattern is transferred from the first mask region, and the fourth pattern is transferred from the second mask region

摘要翻译： 形成图案的方法包括在基板的第一区域中形成包括第一图案的第一感光层图案和在基板的第二区域中形成第二图案，通过使用具有第一掩模区域的光掩模进行第一光刻工艺 和第二掩模区域。 第一图案从第一掩模区域传送，并且第二图案从第二掩模区域传送。 该方法还包括通过使用光掩模进行第二光刻处理，在衬底的第二区域中形成包括第三图案的第二感光层图案和在衬底的第一区域中的第四图案。 第三图案从第一掩模区域传送，并且第四图案从第二掩模区域传送

公开(公告)号：US20080115806A1

公开(公告)日：2008-05-22

申请号：US11766699

申请日：2007-06-21

申请人： Sang-Yong Yu ,  Yong-Hoon Kim ,  Se-Gun Moon ,  Jae-Hyuck Choi

发明人： Sang-Yong Yu ,  Yong-Hoon Kim ,  Se-Gun Moon ,  Jae-Hyuck Choi

IPC分类号： B08B7/04

CPC分类号： B08B3/04 ,  G03F1/82 ,  H01L21/67051

摘要： A photomask cleaning apparatus including a stage supporting a photomask, a cleaning fluid supplying unit configured to supply a cleaning fluid to remove contaminants from the photomask, a cleaning fluid absorbing unit configured to absorb the cleaning fluid supplied from the cleaning fluid supplying unit; and a contaminant removing structure configured to provide a path through which the cleaning fluid flows between the cleaning fluid supplying unit and the cleaning fluid absorbing unit through a surface of the photomask on the stage, and to have an opening aperture through which the cleaning fluid is exposed onto the surface of the photomask so as to remove at least some of the contaminants is provided. Methods of cleaning a photomask are also provided.

摘要翻译： 一种光掩模清洁装置，包括支撑光掩模的台，清洁液供给单元，被配置为提供清洁流体以从所述光掩模中除去污染物;清洗液吸收单元，其构造成吸收从所述清洗液供给单元供给的清洗液; 以及污染物去除结构，其构造成提供清洁流体在清洁流体供应单元和清洁液吸收单元之间通过台架上的光掩模的表面流过的路径，并且具有打开孔，清洁流体通过该开口孔 暴露在光掩模的表面上，以便除去至少一些污染物。 还提供了清洁光掩模的方法。

公开(公告)号：US07369254B2

公开(公告)日：2008-05-06

申请号：US11151742

申请日：2005-06-13

申请人： Dong-Gun Lee ,  Seong-Woon Choi ,  Sang-Yong Yu ,  Seong-Yong Moon ,  Byung-Gook Kim

发明人： Dong-Gun Lee ,  Seong-Woon Choi ,  Sang-Yong Yu ,  Seong-Yong Moon ,  Byung-Gook Kim

IPC分类号： G01N21/00

CPC分类号： G01B11/24 ,  G03F1/84

摘要： A system for measuring dimension of photomasks comprises a light source emitting measuring light having a wavelength, a transmission detector for receiving the measuring light, a stage on which a photomask having circuit patterns is placed, the stage being disposed between the light source and the transmission detector, and a controller having a dimension-deciding algorithm to determine a dimension of the circuit patterns from a spectroscopic characteristic of the received measuring light, the controller being connected to the transmission detector.

摘要翻译： 用于测量光掩模尺寸的系统包括发射具有波长的测量光的光源，用于接收测量光的透射检测器，放置有电路图案的光掩模的级，该级设置在光源和传输器之间 检测器和具有尺寸决定算法的控制器，以根据所接收的测量光的光谱特性来确定电路图案的尺寸，所述控制器连接到所述传输检测器。

公开(公告)号：US20060066878A1

公开(公告)日：2006-03-30

申请号：US11151742

申请日：2005-06-13

申请人： Dong-Gun Lee ,  Seong-Woon Choi ,  Sang-Yong Yu ,  Seong-Yong Moon ,  Byung- Gook Kim

发明人： Dong-Gun Lee ,  Seong-Woon Choi ,  Sang-Yong Yu ,  Seong-Yong Moon ,  Byung- Gook Kim

IPC分类号： G01B11/04

CPC分类号： G01B11/24 ,  G03F1/84

摘要： A system for measuring dimension of photomasks comprises a light source emitting measuring light having a wavelength, a transmission detector for receiving the measuring light, a stage on which a photomask having circuit patterns is placed, the stage being disposed between the light source and the transmission detector, and a controller having a dimension-deciding algorithm to determine a dimension of the circuit patterns from a spectroscopic characteristic of the received measuring light, the controller being connected to the transmission detector.

摘要翻译： 用于测量光掩模尺寸的系统包括发射具有波长的测量光的光源，用于接收测量光的透射检测器，其上放置有电路图案的光掩模的级，该级设置在光源和传输器之间 检测器和具有尺寸决定算法的控制器，以根据所接收的测量光的光谱特性来确定电路图案的尺寸，所述控制器连接到所述传输检测器。