公开(公告)号：US08320833B2

公开(公告)日：2012-11-27

申请号：US12370834

申请日：2009-02-13

Applicant: Sang-soo Lee ,  Jong-tae Lim ,  Hyun-young Jang

Inventor： Sang-soo Lee ,  Jong-tae Lim ,  Hyun-young Jang

IPC: H04B15/00

CPC classification number: H04W72/082

Abstract: A transmission apparatus, a reception apparatus, a transmission system which combines these, and a transmission and reception method thereof are provided. The transmission apparatus includes a first transmission unit which transmits data via a channel in a first band, a second transmission unit which transmits data via a channel in a second band, and a transmission control unit which controls the first transmission unit to stop transmitting the data via the channel in the first band if interference is sensed in the channel in the first band. Accordingly, data can be provided without data interruption in a wireless environment where there is interference.

Abstract translation: 提供一种发送装置，接收装置，组合这些的发送系统及其发送和接收方法。 发送装置具有通过第一频带的信道发送数据的第一发送部，经由第二频带的信道发送数据的第二发送部，以及控制第一发送部停止发送数据的发送控制部 如果在第一频带中的信道中感测到干扰，则经由第一频带中的信道。 因此，可以在存在干扰的无线环境中提供数据而不发生数据中断。

公开(公告)号：US20080298461A1

公开(公告)日：2008-12-04

申请号：US11953493

申请日：2007-12-10

Applicant: Sang-soo Lee ,  Jong-tae Lim

Inventor： Sang-soo Lee ,  Jong-tae Lim

IPC: H04N11/02

CPC classification number: H04N21/43637 ,  H04N21/4122 ,  H04N21/4621

Abstract: A video signal processing apparatus and method and a display apparatus are provided. The video signal processing apparatus includes: an input unit through which a video signal is input; a signal processing unit which processes the video signal input through the input unit, wherein signal processing unit encodes the video signal if a transmission distance from the transmitting unit to the display apparatus is greater than a reference distance; and a transmitting unit which transmits the video signal processed by the signal processing unit to a display apparatus using wireless communication.

Abstract translation: 提供了视频信号处理装置和方法以及显示装置。 视频信号处理装置包括：输入单元，输入视频信号; 处理通过输入单元输入的视频信号的信号处理单元，其中如果从发送单元到显示设备的传输距离大于参考距离，信号处理单元对视频信号进行编码; 以及发送单元，其使用无线通信将由信号处理单元处理的视频信号发送到显示装置。

公开(公告)号：US07799706B2

公开(公告)日：2010-09-21

申请号：US12031498

申请日：2008-02-14

Applicant: Geun-young Yeom ,  Byoung-jae Park ,  Sung-woo Kim ,  Jong-tae Lim

Inventor： Geun-young Yeom ,  Byoung-jae Park ,  Sung-woo Kim ,  Jong-tae Lim

IPC: H01L21/31 ,  H01L21/469

CPC classification number: H01L21/3141 ,  C23C16/44 ,  C23C16/45536 ,  H01J2237/0041 ,  H01J2237/08 ,  H01J2237/3142 ,  H01L21/31604

Abstract: A neutral beam-assisted atomic layer chemical vapor deposition (ALCVD) apparatus is provided for uniformly depositing an oxide layer filling a planarization layer or a trench to increase uniformity and density of the oxide layer using neutral beams generated by a neutral beam generator without a seam or void occurring in an atomic layer deposition (ALD) or ALD-like chemical vapor deposition (CVD) process, thereby solving problems on the void or seam and low density occurring when a high-density planarization layer or a shallow trench having a width of 65 nm or less is formed, and improving a next generation oxide layer isolation process. The neutral beam-assisted ALCVD apparatus includes: an ALCVD apparatus, which deposits an oxide layer in order to form a pattern in a semiconductor substrate; and a neutral beam generator, which converts ion beams to neutral beams in order to remove a seam or void in the oxide layer deposited between the patterns, and applies the neutral beams to the oxide layer deposited to form the pattern.

Abstract translation: 提供了一种中性束辅助原子层化学气相沉积（ALCVD）装置，用于均匀沉积填充平坦化层或沟槽的氧化物层，以增加氧化物层的均匀性和密度，使用由中性射束发生器产生的中性光束而无缝隙 或发生在原子层沉积（ALD）或ALD样化学气相沉积（CVD））工艺中的空穴，从而解决当高密度平坦化层或具有宽度为 形成65nm以下，并且改善下一代氧化物层隔离工艺。 中性束辅助ALCVD装置包括：ALCVD装置，其沉积氧化物层以在半导体衬底中形成图案; 以及中性束发生器，其将离子束转换成中性光束，以便去除沉积在图案之间的氧化物层中的接缝或空隙，并将中性光束施加到沉积以形成图案的氧化物层。

公开(公告)号：US20090203226A1

公开(公告)日：2009-08-13

申请号：US12031498

申请日：2008-02-14

Applicant: Geun-young Yeom ,  Byoung-jae Park ,  Sung-woo Kim ,  Jong-tae Lim

Inventor： Geun-young Yeom ,  Byoung-jae Park ,  Sung-woo Kim ,  Jong-tae Lim

IPC: H01L21/316 ,  C23C16/44

CPC classification number: H01L21/3141 ,  C23C16/44 ,  C23C16/45536 ,  H01J2237/0041 ,  H01J2237/08 ,  H01J2237/3142 ,  H01L21/31604

Abstract: A neutral beam-assisted atomic layer chemical vapor deposition (ALCVD) apparatus is provided for uniformly depositing an oxide layer filling a planarization layer or a trench to increase uniformity and density of the oxide layer using neutral beams generated by a neutral beam generator without a seam or void occurring in an atomic layer deposition (ALD) or ALD-like chemical vapor deposition (CVD) process, thereby solving problems on the void or seam and low density occurring when a high-density planarization layer or a shallow trench having a width of 65 nm or less is formed, and improving a next generation oxide layer isolation process. The neutral beam-assisted ALCVD apparatus includes: an ALCVD apparatus, which deposits an oxide layer in order to form a pattern in a semiconductor substrate; and a neutral beam generator, which converts ion beams to neutral beams in order to remove a seam or void in the oxide layer deposited between the patterns, and applies the neutral beams to the oxide layer deposited to form the pattern.

Abstract translation: 提供了一种中性束辅助原子层化学气相沉积（ALCVD）装置，用于均匀沉积填充平坦化层或沟槽的氧化物层，以增加氧化物层的均匀性和密度，使用由中性射束发生器产生的中性光束而无缝隙 或发生在原子层沉积（ALD）或ALD样化学气相沉积（CVD））工艺中的空穴，从而解决当高密度平坦化层或具有宽度为 形成65nm以下，并且改善下一代氧化物层隔离工艺。 中性束辅助ALCVD装置包括：ALCVD装置，其沉积氧化物层以在半导体衬底中形成图案; 以及中性束发生器，其将离子束转换成中性光束，以便去除沉积在图案之间的氧化物层中的接缝或空隙，并将中性光束施加到沉积以形成图案的氧化物层。