Semiconductor memory cell and method of forming same
    6.
    发明申请
    Semiconductor memory cell and method of forming same 审中-公开
    半导体存储单元及其形成方法

    公开(公告)号:US20080121860A1

    公开(公告)日:2008-05-29

    申请号:US12007851

    申请日:2008-01-16

    IPC分类号: H01L29/66 G11C11/00

    摘要: A semiconductor memory cell and forming method thereof utilizes a vertical select transistor to eliminate the problem of a large cell surface area in memory cells of the related art utilizing phase changes. A memory cell with a smaller surface area than the DRAM device of the related art is achieved by the present invention. Besides low power consumption during read operation, the invention also provides phase change memory having low power consumption even during write operation. Phase change memory also has stable read-out operation.

    摘要翻译: 半导体存储单元及其形成方法利用垂直选择晶体管来消除利用相位变化的现有技术的存储单元中的大的单元表面积的问题。 通过本发明实现了具有比现有技术的DRAM器件更小的表面积的存储单元。 除了读取操作中的低功耗之外,本发明还提供即使在写入操作期间具有低功耗的相变存储器。 相变存储器也具有稳定的读出操作。