Lateral semiconductor device
    4.
    发明授权
    Lateral semiconductor device 有权
    侧面半导体器件

    公开(公告)号:US09240445B2

    公开(公告)日:2016-01-19

    申请号:US14113419

    申请日:2012-05-10

    摘要: A lateral semiconductor device includes a semiconductor layer, an insulating layer, and a resistive field plate. The semiconductor layer includes a first semiconductor region and a second semiconductor region at a surface portion, and the second semiconductor region makes a circuit around the first semiconductor region. The insulating layer is formed on a surface of the semiconductor layer and is disposed between the first and second semiconductor regions. The resistive field plate is formed on a surface of the insulating layer. Between the first and second semiconductor regions, a first section and a second section are adjacent to each other along a circumferential direction around the first semiconductor region. The resistive field plate includes first and second resistive field plate sections respectively formed in the first and second sections, and the first and second resistive field plate sections are separated from each other.

    摘要翻译: 横向半导体器件包括半导体层,绝缘层和电阻场板。 半导体层包括在表面部分处的第一半导体区域和第二半导体区域,并且第二半导体区域在第一半导体区域周围形成电路。 绝缘层形成在半导体层的表面上并且设置在第一和第二半导体区之间。 电阻场板形成在绝缘层的表面上。 在第一和第二半导体区域之间,第一部分和第二部分沿着围绕第一半导体区域的圆周方向彼此相邻。 电阻场板包括分别形成在第一和第二部分中的第一和第二电阻场板部分,并且第一和第二电阻场板部分彼此分离。

    LATERAL SEMICONDUCTOR DEVICE
    5.
    发明申请
    LATERAL SEMICONDUCTOR DEVICE 有权
    横向半导体器件

    公开(公告)号:US20140048911A1

    公开(公告)日:2014-02-20

    申请号:US14113419

    申请日:2012-05-10

    IPC分类号: H01L29/06

    摘要: A lateral semiconductor device includes a semiconductor layer, an insulating layer, and a resistive field plate. The semiconductor layer includes a first semiconductor region and a second semiconductor region at a surface portion, and the second semiconductor region makes a circuit around the first semiconductor region. The insulating layer is formed on a surface of the semiconductor layer and is disposed between the first and second semiconductor regions. The resistive field plate is formed on a surface of the insulating layer. Between the first and second semiconductor regions, a first section and a second section are adjacent to each other along a circumferential direction around the first semiconductor region. The resistive field plate includes first and second resistive field plate sections respectively formed in the first and second sections, and the first and second resistive field plate sections are separated from each other.

    摘要翻译: 横向半导体器件包括半导体层,绝缘层和电阻场板。 半导体层包括在表面部分处的第一半导体区域和第二半导体区域,并且第二半导体区域在第一半导体区域周围形成电路。 绝缘层形成在半导体层的表面上并且设置在第一和第二半导体区之间。 电阻场板形成在绝缘层的表面上。 在第一和第二半导体区域之间,第一部分和第二部分沿着围绕第一半导体区域的圆周方向彼此相邻。 电阻场板包括分别形成在第一和第二部分中的第一和第二电阻场板部分,并且第一和第二电阻场板部分彼此分离。

    Lateral insulated-gate bipolar transistor
    8.
    发明授权
    Lateral insulated-gate bipolar transistor 有权
    侧面绝缘栅双极晶体管

    公开(公告)号:US08354691B2

    公开(公告)日:2013-01-15

    申请号:US13226636

    申请日:2011-09-07

    IPC分类号: H01L29/739

    摘要: A N-channel lateral insulated-gate bipolar transistor includes a semiconductor substrate, a drift layer, a collector region, a channel layer, an emitter region, a gate insulation film, a gate electrode, a collector electrode, an emitter electrode. The collector region includes a high impurity concentration region having a high impurity concentration and a low impurity concentration region having a lower impurity concentration than the high impurity concentration region. The collector electrode is in ohmic contact with the high impurity concentration region and in schottky contact with the low impurity concentration region.

    摘要翻译: N沟道横向绝缘栅双极晶体管包括半导体衬底,漂移层,集电极区,沟道层,发射极区,栅极绝缘膜,栅电极,集电极,发射极。 集电极区域包括具有高杂质浓度的高杂质浓度区域和杂质浓度低于高杂质浓度区域的低杂质浓度区域。 集电极与高杂质浓度区域欧姆接触,与低杂质浓度区域进行肖特基接触。

    LATERAL INSULATED-GATE BIPOLAR TRANSISTOR
    9.
    发明申请
    LATERAL INSULATED-GATE BIPOLAR TRANSISTOR 有权
    横向绝缘栅双极晶体管

    公开(公告)号:US20120061726A1

    公开(公告)日:2012-03-15

    申请号:US13226636

    申请日:2011-09-07

    IPC分类号: H01L29/739

    摘要: A N-channel lateral insulated-gate bipolar transistor includes a semiconductor substrate, a drift layer, a collector region, a channel layer, an emitter region, a gate insulation film, a gate electrode, a collector electrode, an emitter electrode. The collector region includes a high impurity concentration region having a high impurity concentration and a low impurity concentration region having a lower impurity concentration than the high impurity concentration region. The collector electrode is in ohmic contact with the high impurity concentration region and in schottky contact with the low impurity concentration region.

    摘要翻译: N沟道横向绝缘栅双极晶体管包括半导体衬底,漂移层,集电极区,沟道层,发射极区,栅极绝缘膜,栅电极,集电极,发射极。 集电极区域包括具有高杂质浓度的高杂质浓度区域和杂质浓度低于高杂质浓度区域的低杂质浓度区域。 集电极与高杂质浓度区域欧姆接触,与低杂质浓度区域进行肖特基接触。