Heating for buffer layer deposition
    7.
    发明授权
    Heating for buffer layer deposition 有权
    加热缓冲层沉积

    公开(公告)号:US08277869B2

    公开(公告)日:2012-10-02

    申请号:US12397873

    申请日:2009-03-04

    IPC分类号: C23C16/52 B05D5/12

    摘要: Improved methods and apparatus for forming thin film buffer layers of chalcogenide on a substrate web through the chemical combination of a metal and chalcogen in solution form. The web and/or the solutions may be heated by one or a plurality of heating elements that may be disposed out of physical contact with the web, allowing enhanced control over the reaction speed through fine temperature control. One or more properties of the chalcogenide layer may be measured, and the temperature of the system may be adjusted in response.

    摘要翻译: 通过溶液形式的金属和硫属元素的化学组合,改进了在衬底网上形成硫族化物薄膜缓冲层的方法和装置。 纸幅和/或溶液可以被一个或多个加热元件加热,这些加热元件可被布置成与纸幅物理接触,从而通过精细的温度控制来增强对反应速度的控制。 可以测量硫族化物层的一个或多个性质,并且可以响应地调节系统的温度。

    HEATING FOR BUFFER LAYER DEPOSITION
    9.
    发明申请
    HEATING FOR BUFFER LAYER DEPOSITION 有权
    加热缓冲层沉积

    公开(公告)号:US20100086673A1

    公开(公告)日:2010-04-08

    申请号:US12397873

    申请日:2009-03-04

    IPC分类号: B05D3/06 B05D3/02 B05C11/00

    摘要: Improved methods and apparatus for forming thin film buffer layers of chalcogenide on a substrate web through the chemical combination of a metal and chalcogen in solution form. The web and/or the solutions may be heated by one or a plurality of heating elements that may be disposed out of physical contact with the web, allowing enhanced control over the reaction speed through fine temperature control. One or more properties of the chalcogenide layer may be measured, and the temperature of the system may be adjusted in response.

    摘要翻译: 通过溶液形式的金属和硫属元素的化学组合,改进了在衬底网上形成硫族化物薄膜缓冲层的方法和装置。 纸幅和/或溶液可以被一个或多个加热元件加热,这些加热元件可被布置成与纸幅物理接触,从而通过精细的温度控制来增强对反应速度的控制。 可以测量硫族化物层的一个或多个性质,并且可以响应地调节系统的温度。