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公开(公告)号：US10180759B2
公开(公告)日：2019-01-15
申请号：US15379078
申请日：2016-12-14
申请人： Seiko Yamamoto , Katsuyuki Omura , Noritada Ohi , Yoshiaki Oshima , Masafumi Nagao , Naoyuki Ishikawa , Masanobu Yamagata
发明人： Seiko Yamamoto , Katsuyuki Omura , Noritada Ohi , Yoshiaki Oshima , Masafumi Nagao , Naoyuki Ishikawa , Masanobu Yamagata
IPC分类号： G06F3/042 , G06F3/0354 , G06F3/041
摘要： A coordinate detecting apparatus includes: a plurality of light-emitting and -receiving units arranged along an outer edge of the coordinate input area, the plurality of light-emitting and -receiving units each including a light-emitting part and a light-receiving part; at least one retroreflective member arranged along the outer edge of the coordinate input area; and a control unit to control the plurality of light-emitting and -receiving units to detect coordinates of a position of input made with a designation input unit in a first detection state or a second detection state.
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公开(公告)号：US06902591B2
公开(公告)日：2005-06-07
申请号：US10625593
申请日：2003-07-24
CPC分类号： C09G1/02 , B24B37/044 , C09K3/1463 , Y10T428/32
摘要： A polishing composition comprising an abrasive, water and an organic acid or a salt thereof, wherein the composition has a specified viscosity of from 1.0 to 2.0 mPa·s at a shearing rate of 1500 s−1 and 25° C.; a roll-off reducing agent comprising a Brönsted acid or a salt thereof, having an action of lowering viscosity so that the amount of viscosity lowered is 0.01 mPa·s or more, wherein the amount of viscosity lowered is expressed by the following equation: (Amount of Viscosity Lowered)=(Viscosity of Standard Polishing Composition)−(Viscosity of Roll-Off Reducing Agent-Containing Polishing Composition), wherein the standard polishing composition is prepared which comprises 20 parts by weight of an abrasive, said abrasive being high-purity alumina having Al2O3 purity of 98.0% by weight or more composed of α-type co-random crystal, 1 part by weight of citric acid, and 79 parts by weight of water; the roll-off reducing agent-containing polishing composition is prepared which comprises 20 parts by weight of an abrasive, said abrasive being high-purity alumina having Al2O3 purity of 98.0% by weight or more composed of α-type co-random crystal, 1 part by weight of citric acid, 78.9 parts by weight of water and 0.1 parts by weight of a roll-off reducing agent; and the viscosity is a viscosity at a shearing rate of 1500 s−1 and 25° C. The polishing composition can be favorably used in polishing the substrate for precision parts.
摘要翻译： 一种抛光组合物，其包含磨料，水和有机酸或其盐，其中所述组合物在剪切速率为1500s -1和25℃时具有1.0至2.0mPa.s的特定粘度 C。; 包含布朗斯台德酸或其盐的滚降还原剂，具有降低粘度的作用，使粘度降低量为0.01mPa.s以上，其中降低粘度的量由下式表示： （在线公式）end =“lead”？>（粘度降低）=（标准抛光组合物的粘度） - （含有折射率的还原剂的抛光组合物的粘度） <？in-line-formula description =“In-line Formulas”end =“tail”？>其中制备的标准抛光组合物包含20重量份的研磨剂，所述磨料是具有Al 2O 3 O 3纯度为98.0重量％或更多，由α型共无规晶体组成，1重量份柠檬酸和79重量份水; 制备含滚降还原剂的抛光组合物，其包含20重量份的研磨剂，所述磨料是具有Al 2 O 3 O 3 3纯度的高纯度氧化铝 98.0重量％以上，由α型协同随机晶体组成，1重量份柠檬酸，78.9重量份水和0.1重量份的滚降还原剂; 粘度为剪切速率为1500秒-1和25℃时的粘度。抛光组合物可有利地用于抛光基板用于精密零件。
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公开(公告)号：US11853636B2
公开(公告)日：2023-12-26
申请号：US17409820
申请日：2021-08-24
申请人： Yoshiaki Oshima
发明人： Yoshiaki Oshima
IPC分类号： G06F3/14 , G06F3/0482 , G06F3/04883 , G06V30/32
CPC分类号： G06F3/1446 , G06F3/0482 , G06F3/04883 , G06F3/1415 , G06V30/36
摘要： A display apparatus that displays handwritten data includes a display, a memory, and a processor configured to execute receiving as input the handwritten data; detecting one or more secondary display apparatuses; displaying, in a case where the one or more secondary display apparatuses are detected by the detecting, on the display of the display apparatus, an operation command related to a function of displaying data by using the display apparatus and the one or more secondary display apparatuses, based on the handwritten data received by the receiving; and predetermined processing related to the function, in response to receiving an operation performed by a user with respect to the operation command.
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公开(公告)号：US07220676B2
公开(公告)日：2007-05-22
申请号：US09842769
申请日：2001-04-27
申请人： Toshiya Hagihara , Shigeo Fujii , Yoshiaki Oshima
发明人： Toshiya Hagihara , Shigeo Fujii , Yoshiaki Oshima
IPC分类号： H01L21/461 , C09K13/00 , C09K13/04
CPC分类号： C09G1/02
摘要： A roll-off reducing agent comprising one or more compounds selected from the group consisting of carboxylic acids having 2 to 20 carbon atoms having either OH group or groups or SH group or groups, monocarboxylic acids having 1 to 20 carbon atoms, and dicarboxylic acids having 2 to 3 carbon atoms, and salts thereof; and a roll-off reducing agent composition comprising a roll off-reducing agent comprising one or more compounds selected from the group consisting of carboxylic acids having 2 to 20 carbon atoms having either OH group or groups or SH group or groups, monocarboxylic acids having 1 to 20 carbon atoms, and dicarboxylic acids having 2 to 3 carbon atoms, and salts thereof; an abrasive; and water.
摘要翻译： 包含一种或多种选自由具有OH基或具有OH基团或基团的基团的碳原子数为2〜20的羧酸的化合物的降低还原剂，或具有1〜20个碳原子的单羧酸，以及具有 2至3个碳原子，及其盐; 以及包含一种或多种选自具有OH基团或基团或SH基团的碳原子数为2〜20的羧酸的一种或多种化合物的脱脂还原剂的滚降还原剂组合物，具有1个 20个碳原子的碳原子数为2〜3的二羧酸及其盐， 研磨剂 和水。
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公开(公告)号：US07014534B2
公开(公告)日：2006-03-21
申请号：US10857841
申请日：2004-06-02
IPC分类号： B24B1/00
CPC分类号： C09K3/1463 , B24B37/044 , C09G1/02
摘要： A method for manufacturing a substrate, a polishing process for a substrate, a method of reducing microwaviness for a substrate, each including the step of polishing a substrate to be polished with a polishing composition containing an abrasive and water with a polishing pad of which surface member has an average pore size of from 1 to 35 μm; and a method of reducing scratches for a substrate, comprising the step of polishing a substrate to be polished with a polishing composition comprising an abrasive, an oxidizing agent, an acid, a salt thereof, or a mixture thereof and water, with a polishing pad of which surface member has an average pore size of from 1 to 35 μm. The method for manufacturing a substrate can be used for finish polishing of a memory hard disk or for polishing of a semiconductor element.
摘要翻译： 一种基板的制造方法，基板的研磨工序，降低基板的微波的方法，其特征在于，具备：研磨用抛光组合物研磨待研磨基板的步骤，所述抛光组合物的表面 成员的平均孔径为1至35μm; 以及减少基材划痕的方法，包括用抛光组合物抛光待抛光基材的步骤，抛光组合物包括研磨剂，氧化剂，酸，其盐或其混合物和水，抛光垫 其表面成员的平均孔径为1〜35μm。 用于制造基板的方法可以用于存储硬盘的精抛光或半导体元件的抛光。
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公开(公告)号：US07955517B2
公开(公告)日：2011-06-07
申请号：US12415548
申请日：2009-03-31
申请人： Shigeo Fujii , Yoshiaki Oshima , Koichi Naito
发明人： Shigeo Fujii , Yoshiaki Oshima , Koichi Naito
IPC分类号： C03C15/00 , B44C1/22 , H01L21/302
CPC分类号： C09G1/02 , B24B37/044
摘要： To provide a polishing composition capable of increasing polishing rate and reducing surface roughness, without causing surface defects on a surface of an object to be polished; and a polishing process for a substrate to be polished. [1] a polishing composition comprising water, an abrasive, an intermediate alumina, and a polycarboxylic acid having 4 or more carbon atoms with no OH groups or a salt thereof, wherein a content of the intermediate alumina is from 1 to 90 parts by weight, based on 100 parts by weight of the abrasive; and [2] a polishing process for a substrate to be polished, comprising polishing a substrate to be polished under conditions that a composition of a polishing liquid during polishing is the composition as defined in item [1] above.
摘要翻译： 提供能够提高抛光速度并降低表面粗糙度的抛光组合物，而不会在被抛光物体的表面上引起表面缺陷; 以及用于待抛光的基底的抛光工艺。 [1]一种抛光组合物，其包含水，研磨剂，中间体氧化铝和具有4个以上没有OH基团的碳原子的多元羧酸或其盐，其中所述中间体氧化铝的含量为1〜90重量份 ，基于100重量份的研磨剂; 以及[2]一种抛光用基材的研磨方法，其特征在于，在抛光中的研磨液的成分为上述[1]所述的组成的条件下，研磨抛光用基板。
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公开(公告)号：US07303601B2
公开(公告)日：2007-12-04
申请号：US10727571
申请日：2003-12-05
CPC分类号： C09G1/02 , C09K3/1409 , C09K3/1463
摘要： A polishing composition for memory hard disk containing water and silica particles, wherein the silica particles have a particle size distribution in which the relationship of a particle size (R) and a cumulative volume frequency (V) in a graph of particle size-cumulative volume frequency obtained by plotting a cumulative volume frequency (%) of the silica particles counted from a small particle size side against a particle size (nm) of the silica particles in the range of particle sizes of from 40 to 100 nm satisfy the following formula (1): V≧0.5×R+40 (1), wherein the particle size is determined by observation with a transmission electron microscope (TEM). The polishing composition of the present invention can be even more suitably used for the manufacture of a substrate for precision parts such as substrates for memory hard disks.
摘要翻译： 一种含有水和二氧化硅颗粒的记忆硬盘的抛光组合物，其中二氧化硅颗粒具有颗粒尺寸分布，其中颗粒尺寸累积体积（R）和累积体积频率（V） 通过绘制从小粒径侧计数的二氧化硅粒子的累积体积频率（％）与粒径为40〜100nm范围内的二氧化硅粒子的粒径（nm）的曲线图所得到的频率满足下式（ 1）：V> = 0.5×R + 40（1），其中通过用透射电子显微镜（TEM）观察确定粒径。 本发明的抛光组合物甚至可以更适合用于制造用于存储硬盘的基板的精密部件用基板。
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公开(公告)号：US20070254563A1
公开(公告)日：2007-11-01
申请号：US11790615
申请日：2007-04-26
CPC分类号： C09G1/02 , C09K3/1409 , C09K3/1463 , G11B5/84
摘要： A polishing composition for a magnetic disk substrate of the present invention includes water, silica particles, and at least one or more selected from an acid, a salt of the acid, and an oxidizing agent. The silica particles are observed with a transmission electron microscope to measure a maximum diameter and a projected area of each particle, and a value obtained by dividing the area of a circle whose diameter is the maximum diameter of a silica particle by the projected area of the silica particle and multiplying the result by 100, is in the range of 100 to 130.
摘要翻译： 本发明的磁盘基板用抛光组合物包括水，二氧化硅颗粒和选自酸，酸的盐和氧化剂中的至少一种或多种。 用透射电子显微镜观察二氧化硅颗粒，以测量每个颗粒的最大直径和投影面积，并且通过将直径为二氧化硅颗粒的最大直径的圆的面积除以 二氧化硅颗粒并将结果乘以100，在100至130的范围内。
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公开(公告)号：US07147682B2
公开(公告)日：2006-12-12
申请号：US10726581
申请日：2003-12-04
CPC分类号： C09K3/1463 , C09G1/02
摘要： A polishing composition for a substrate for memory hard disk comprising water and silica particles, wherein the silica particles have a particle size distribution in which the relationship of a particle size (R) and a cumulative volume frequency (V) in a graph of particle size-cumulative volume frequency obtained by plotting a cumulative volume frequency (%) of the silica particles counted from a small particle size side against a particle size (nm) of the silica particles satisfies the above formula (1) and the above formula (2), and wherein a particle size at 90% of a cumulative volume frequency (D90) is within the range of 65 nm or more and less than 105 nm. By using the polishing composition of the present invention, there can be efficiently manufactured an Ni—P plated substrate for a disk polished to have an excellent surface smoothness, in which the micropits are effectively reduced.
摘要翻译： 一种包含水和二氧化硅颗粒的用于存储硬盘的基底的抛光组合物，其中二氧化硅颗粒具有粒度分布，其中颗粒尺寸（R）和颗粒尺寸图中的累积体积频率（V）的关系 通过绘制从小粒径方向计数的二氧化硅粒子的累积体积频率（％）与二氧化硅粒子的粒径（nm）相对应的累积体积频率满足上述式（1）和上述式（2） ，其中累积体积频率（D90）的90％处的粒径在65nm以上且小于105nm的范围内。 通过使用本发明的抛光组合物，可以有效地制造用于盘抛光的Ni-P镀覆基板，以具有优异的表面平滑度，其中微型点被有效地减小。
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公开(公告)号：US06818031B2
公开(公告)日：2004-11-16
申请号：US10128365
申请日：2002-04-24
申请人： Yoshiaki Oshima
发明人： Yoshiaki Oshima
IPC分类号： C09G102
CPC分类号： C09G1/02 , C09K3/1463
摘要： A polishing composition comprising an abrasive, an oxidizing agent, a polishing accelerator, and water, wherein the polishing accelerator comprises an organic phosphonic acid; a method for manufacturing a substrate, comprising polishing a substrate to be polished with the above polishing composition; a method for polishing a substrate comprising polishing a substrate to be polished with the above polishing composition; a process for reducing fine scratches of a substrate, comprising polishing a substrate to be polished with the above polishing composition; and a process for accelerating polishing of a magnetic disk substrate, comprising applying the above polishing composition to a magnetic disk substrate to be polished. The polishing composition is highly suitable for polishing a magnetic disk substrate requiring high surface quality to be used in memory hard disk drives.
摘要翻译： 一种抛光组合物，其包括研磨剂，氧化剂，抛光促进剂和水，其中所述抛光促进剂包含有机膦酸; 一种基板的制造方法，其特征在于，使用上述研磨用组合物研磨抛光用基板。 一种用于抛光衬底的方法，包括用上述抛光组合物抛光待抛光的衬底; 用于减少基材的细小划痕的方法，包括用上述抛光组合物抛光待抛光的基材; 以及用于加速磁盘基板的抛光的方法，包括将上述抛光组合物涂覆到待抛光的磁盘基板上。 抛光组合物非常适合于在存储硬盘驱动器中使用需要高表面质量的磁盘基片。
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