公开(公告)号：US20200173898A1

公开(公告)日：2020-06-04

申请号：US16204303

申请日：2018-11-29

申请人： Selemani Seif ,  Kenneth Cadien ,  Thomas Thundat

发明人： Selemani Seif ,  Kenneth Cadien ,  Thomas Thundat

IPC分类号： G01N5/02 ,  G01N29/036 ,  G01G3/13

摘要： A measurement probe system is provided that includes a housing, a Quartz Crystal Microbalance (QCM) mass sensor in the housing, a first cover and a second cover attached to the ends of the housing. A chamber is defined between the housing, the mass sensor, and the second cover. An electrical input in electrical communication with the mass sensor and an electrical output in electrical communication with the second cover are also included. The measurement probe system is used to detect nanoparticle levels in an ionic solution includes inputting an ionic solution sample into the chamber, applying a frequency from a signal generator to the QCM via the electrical input, detecting frequency noises with the second cover and transmitting those frequency noises to a frequency counter via the electrical output, and assessing the level of nanoparticles present in the sample based on the frequency measured by the frequency counter.

公开(公告)号：US07800371B2

公开(公告)日：2010-09-21

申请号：US11851291

申请日：2007-09-06

申请人： Chang-Min Park ,  Shriram Ramanathan ,  Patrick Morrow ,  Kenneth Cadien

发明人： Chang-Min Park ,  Shriram Ramanathan ,  Patrick Morrow ,  Kenneth Cadien

IPC分类号： G01V3/00

CPC分类号： G01N24/08 ,  B82Y30/00 ,  G01R33/302

摘要： An embodiment of the invention relates to a portable or handheld device for performing NMR analysis. The device comprises a console and a strip which can be placed into the console through a slot or other means. The strip comprises a sample holding place and a microcoil for generating an excitation magnetic field across a sample in the sample holding space. A permanent magnet is provided either by the console or the strip and generates a static magnetic field which, together with the excitation magnetic field, creates NMR within the sample. Other embodiments of the invention also encompass method of performing NMR analysis using the portable device and method of making such devices.

摘要翻译： 本发明的实施例涉及用于执行NMR分析的便携式或手持式装置。 该装置包括控制台和条，其可以通过槽或其他方式放置到控制台中。 条带包括用于在样品保持空间中的样品上产生激发磁场的样品保持位置和微线圈。 永久磁铁由控制台或条带提供，并产生一个静磁场，与磁场一起在样品内产生NMR。 本发明的其他实施方案还包括使用便携式装置进行NMR分析的方法和制造这种装置的方法。

公开(公告)号：US20070296413A1

公开(公告)日：2007-12-27

申请号：US11851291

申请日：2007-09-06

申请人： Chang-Min Park ,  Shriram Ramanathan ,  Patrick Morrow ,  Kenneth Cadien

发明人： Chang-Min Park ,  Shriram Ramanathan ,  Patrick Morrow ,  Kenneth Cadien

IPC分类号： G01R33/44

CPC分类号： G01N24/08 ,  B82Y30/00 ,  G01R33/302

摘要： An embodiment of the invention relates to a portable or handheld device for performing NMR analysis. The device comprises a console and a strip which can be placed into the console through a slot or other means. The strip comprises a sample holding place and a microcoil for generating an excitation magnetic field across a sample in the sample holding space. A permanent magnet is provided either by the console or the strip and generates a static magnetic field which, together with the excitation magnetic field, creates NMR within the sample. Other embodiments of the invention also encompass method of performing NMR analysis using the portable device and method of making such devices.

摘要翻译： 本发明的实施例涉及用于执行NMR分析的便携式或手持式装置。 该装置包括控制台和条，其可以通过槽或其他方式放置到控制台中。 条带包括用于在样品保持空间中的样品上产生激发磁场的样品保持位置和微线圈。 永久磁铁由控制台或条带提供，并产生一个静磁场，与磁场一起在样品内产生NMR。 本发明的其他实施方案还包括使用便携式装置进行NMR分析的方法和制造这种装置的方法。

公开(公告)号：US20060141222A1

公开(公告)日：2006-06-29

申请号：US11026320

申请日：2004-12-29

申请人： Paul Fischer ,  Anne Miller ,  Kenneth Cadien ,  Chris Barns

发明人： Paul Fischer ,  Anne Miller ,  Kenneth Cadien ,  Chris Barns

IPC分类号： B32B3/00

CPC分类号： B82Y10/00 ,  B82Y30/00 ,  H01L51/0012 ,  H01L51/0048 ,  H01L51/0052 ,  Y10S977/72 ,  Y10T428/24562 ,  Y10T428/24612 ,  Y10T428/24744

摘要： Methods of forming a microelectronic structure are described. Embodiments of those methods include providing a substrate comprising at least one opening, and then applying a nanotube slurry comprising at least one nanotube to the substrate, wherein the at least one nanotube is substantially placed within the at least one opening.

摘要翻译： 描述形成微电子结构的方法。 这些方法的实施方案包括提供包含至少一个开口的基底，然后将包含至少一个纳米管的纳米管浆料施加到所述基底，其中所述至少一个纳米管基本上放置在所述至少一个开口内。

公开(公告)号：US06825117B2

公开(公告)日：2004-11-30

申请号：US09461158

申请日：1999-12-14

申请人： Anne E. Miller ,  A. Daniel Feller ,  Kenneth Cadien

发明人： Anne E. Miller ,  A. Daniel Feller ,  Kenneth Cadien

IPC分类号： H01L21302

CPC分类号： H01L21/3212 ,  C09K3/1463 ,  H01L21/7684

摘要： A slurry for copper polishing has a pH between 7.5 and 12. In a particular embodiment of the present invention, a slurry for polishing copper has a pH between 8 and 11.5, and includes a SiO2 abrasive, a (NH4)2S2O8 oxidizer, a benzotriazole corrosion inhibitor, and a K3PO4/K2HPO4 buffer. A copper polish slurry, in accordance with the present invention, operates with a high pH of greater than approximately 7.5. In this range the slurry has a low static etch due to formation of a robust, protective layer. This slurry may additionally have S2O8−2 or Fe(CN)6−3 as an oxidizer and can thus offer a high polish rate on the order of 7,000 to 10,000 angstroms per minute which does not decrease significantly during polishing. Such an inventive slurry offers a wide CMP process window such that the slurry and process parameters can be optimized to yield low recess, erosion, and dishing on patterned wafers.

摘要翻译： 用于铜抛光的浆料的pH为7.5至12.在本发明的一个具体实施方案中，用于抛光铜的浆料的pH为8至11.5，并且包括SiO 2研磨剂，（NH 4）2 S 2 O 8氧化剂，苯并三唑 缓蚀剂和K3PO4 / K2HPO4缓冲液。 根据本发明的铜抛光浆料以大于约7.5的高pH操作。 在该范围内，由于形成坚固的保护层，浆料具有低静态蚀刻。 该浆液可另外具有作为氧化剂的S2O8或Fe（CN）6-3，因此能够提供每分钟7000至10,000埃的高抛光速率，这在抛光过程中不会显着降低。 这种本发明的浆料提供了广泛的CMP工艺窗口，使得浆料和工艺参数可以被优化以在图案化的晶片上产生低的凹陷，侵蚀和凹陷。

公开(公告)号：US07274191B2

公开(公告)日：2007-09-25

申请号：US11319755

申请日：2005-12-29

申请人： Chang-Min Park ,  Shriram Ramanathan ,  Patrick Morrow ,  Kenneth Cadien

发明人： Chang-Min Park ,  Shriram Ramanathan ,  Patrick Morrow ,  Kenneth Cadien

IPC分类号： G01V3/00

CPC分类号： G01R33/302 ,  B82Y30/00 ,  G01N24/08 ,  G01N24/10

摘要： An embodiment if the invention relates to an integrated on-chip NMR or ESR device for performing chemical analysis and medical diagnostics. Specifically, the device contains, on a single substrate, a sample holding space, a magnet for generating a static magnetic field across the sample holding space and a microcoil for generating an excitation magnetic field across sample holding space. The magnetic fields are able to create NMR or ESR within a sample in the sample holding space and collect and/or process the signals from the NMR or ESR. The substrate may comprise an array of microcoils and sample holding spaces for performing multiple NMR or ESR analysis, such as multiple DNA analysis. Other embodiments of the invention relate methods for fabricating such devices and methods for performing NMR or ESR analysis using such devices.

摘要翻译： 本发明的实施例涉及用于进行化学分析和医学诊断的集成的片上NMR或ESR装置。 具体地，该装置在单个基板上包含样品保持空间，用于在样品保持空间上产生静态磁场的磁体和用于在样品保持空间上产生激励磁场的微线圈。 磁场能够在样品保持空间中的样品内产生NMR或ESR，并收集和/或处理来自NMR或ESR的信号。 底物可以包括用于进行多个NMR或ESR分析的微量线圈和样品保持空间的阵列，例如多重DNA分析。 本发明的其它实施例涉及制造这种装置的方法和使用这种装置进行NMR或ESR分析的方法。

公开(公告)号：US20060202342A1

公开(公告)日：2006-09-14

申请号：US11407550

申请日：2006-04-19

申请人： Tatyana Andreyushchenko ,  Kenneth Cadien ,  Paul Fischer ,  Valery Dubin

发明人： Tatyana Andreyushchenko ,  Kenneth Cadien ,  Paul Fischer ,  Valery Dubin

IPC分类号： H01L23/52

CPC分类号： H01L21/76843 ,  H01L21/288 ,  H01L21/2885 ,  H01L21/76844 ,  H01L21/76849 ,  H01L21/76856 ,  H01L21/76873 ,  H01L21/76877 ,  H01L21/76888

摘要： A method includes forming a barrier layer on a substrate surface including at least one contact opening; forming an interconnect in the contact opening; and reducing the electrical conductivity of the barrier layer. A method including forming a barrier layer on a substrate surface including a dielectric layer and a contact opening, depositing a conductive material in the contact opening, removing the conductive material sufficient to expose the barrier layer on the substrate surface, and reducing the electrical conductivity of the barrier layer. An apparatus including a circuit substrate including at least one active layer including at least one contact point, a dielectric layer on the at least one active layer, a barrier layer on a surface of the dielectric layer, a portion of the barrier layer having been transformed from a first electrical conductivity to a second different and reduced electrical conductivity, and an interconnect coupled to the at least one contact point.

公开(公告)号：US06909193B2

公开(公告)日：2005-06-21

申请号：US10917729

申请日：2004-08-12

申请人： Anne E. Miller ,  A. Daniel Feller ,  Kenneth Cadien

发明人： Anne E. Miller ,  A. Daniel Feller ,  Kenneth Cadien

IPC分类号： C09G1/02 ,  C09K3/14 ,  H01L21/321 ,  H01L21/768 ,  H01L23/48

CPC分类号： H01L21/3212 ,  C09K3/1463 ,  H01L21/7684

摘要： A slurry for copper polishing has a pH between 7.5 and 12. In a particular embodiment of the present invention, a slurry for polishing copper has a pH between 8 and 11.5, and includes a siO2 abrasive, a (NH4)2S2O8 oxidizer, a benzotriazole corrosion inhibitor, and a K3PO4/K2HPO4 buffer. A copper polish slurry, in accordance with the present invention, operates with a high pH of greater than approximately 7.5. In this range the slurry has a low static etch due to formation of a robust, protective layer. This slurry may additionally have S2O8−2 or Fe(CN)6 −3 as an oxidizer and can thus offer a high polish rate on the order of 7,000 to 10,000 angstroms per minute which does not decrease significantly during polishing. Such an inventive slurry offers a wide CMP process window such that the slurry and process parameters can be optimized to yield low recess, erosion, and dishing on patterned wafers.

摘要翻译： 用于铜抛光的浆料具有7.5至12的pH。在本发明的一个具体实施方案中，用于抛光铜的浆料的pH值在8和11.5之间，并且包括SiO 2研磨剂， （NH 4）2 S 2 O 2氧化剂，苯并三唑缓蚀剂和K 3 CO 3， 3 PO 4 / 2H 2 HPO 4缓冲液。 根据本发明的铜抛光浆料以大于约7.5的高pH操作。 在该范围内，由于形成坚固的保护层，浆料具有低静态蚀刻。 该浆料可以另外具有S 2 O 8 O 2以上或Fe（CN）6 - 3 作为氧化剂，因此可以提供每分钟7000至10,000埃的高抛光速率，其在抛光期间不显着降低。 这种本发明的浆料提供了广泛的CMP工艺窗口，使得浆料和工艺参数可以被优化以在图案化的晶片上产生低的凹陷，侵蚀和凹陷。

公开(公告)号：US20050017367A1

公开(公告)日：2005-01-27

申请号：US10917729

申请日：2004-08-12

申请人： Anne Miller ,  A. Feller ,  Kenneth Cadien

发明人： Anne Miller ,  A. Feller ,  Kenneth Cadien

IPC分类号： C09G1/02 ,  C09K3/14 ,  H01L21/321 ,  H01L21/768 ,  H01L21/4763

CPC分类号： H01L21/3212 ,  C09K3/1463 ,  H01L21/7684

摘要： A slurry for copper polishing has a pH between 7.5 and 12. In a particular embodiment of the present invention, a slurry for polishing copper has a pH between 8 and 11.5, and includes a SiO2 abrasive, a (NH4)2S2O8 oxidizer, a benzotriazole corrosion inhibitor, and a K3PO4/K2HPO4 buffer. A copper polish slurry, in accordance with the present invention, operates with a high pH of greater than approximately 7.5. In this range the slurry has a low static etch due to formation of a robust, protective layer. This slurry may additionally have S2O8−2 or Fe(CN)6−3 as an oxidizer and can thus offer a high polish rate on the order of 7,000 to 10,000 angstroms per minute which does not decrease significantly during polishing. Such an inventive slurry offers a wide CMP process window such that the slurry and process parameters can be optimized to yield low recess, erosion, and dishing on patterned wafers.

摘要翻译： 用于铜抛光的浆料的pH为7.5至12.在本发明的一个具体实施方案中，用于抛光铜的浆料的pH为8至11.5，并且包括SiO 2研磨剂，（NH 4）2 S 2 O 8氧化剂，苯并三唑 缓蚀剂和K3PO4 / K2HPO4缓冲液。 根据本发明的铜抛光浆料以大于约7.5的高pH操作。 在该范围内，由于形成坚固的保护层，浆料具有低静态蚀刻。 该浆液可另外具有作为氧化剂的S2O8或Fe（CN）6-3，因此能够提供每分钟7000至10,000埃的高抛光速率，这在抛光过程中不会显着降低。 这种本发明的浆料提供了广泛的CMP工艺窗口，使得浆料和工艺参数可以被优化以在图案化的晶片上产生低的凹陷，侵蚀和凹陷。

公开(公告)号：US07087517B2

公开(公告)日：2006-08-08

申请号：US10748106

申请日：2003-12-24

申请人： Tatyana N. Andreyushchenko ,  Kenneth Cadien ,  Paul Fischer ,  Valery M. Dubin

发明人： Tatyana N. Andreyushchenko ,  Kenneth Cadien ,  Paul Fischer ,  Valery M. Dubin

IPC分类号： H01L21/4763

CPC分类号： H01L21/76843 ,  H01L21/288 ,  H01L21/2885 ,  H01L21/76844 ,  H01L21/76849 ,  H01L21/76856 ,  H01L21/76873 ,  H01L21/76877 ,  H01L21/76888

摘要： A method includes forming a barrier layer on a substrate surface including at least one contact opening; forming an interconnect in the contact opening; and reducing the electrical conductivity of the barrier layer. A method including forming a barrier layer on a substrate surface including a dielectric layer and a contact opening, depositing a conductive material in the contact opening, removing the conductive material sufficient to expose the barrier layer on the substrate surface, and reducing the electrical conductivity of the barrier layer. An apparatus including a circuit substrate including at least one active layer including at least one contact point, a dielectric layer on the at least one active layer, a barrier layer on a surface of the dielectric layer, a portion of the barrier layer having been transformed from a first electrical conductivity to a second different and reduced electrical conductivity, and an interconnect coupled to the at least one contact point.