SEMICONDUCTOR DEVICE
    2.
    发明申请

    公开(公告)号:US20240379866A1

    公开(公告)日:2024-11-14

    申请号:US18691097

    申请日:2022-09-08

    Abstract: A semiconductor device that can be miniaturized or highly integrated is provided. The semiconductor device includes a transistor. The transistor includes an oxide, a first conductor and a second conductor that are over the oxide, a first insulator over the first conductor and the second conductor, a second insulator in an opening included in the first insulator, a third insulator over the second insulator, a fourth insulator over the third insulator, and a third conductor over the fourth insulator. The opening includes a region overlapping with the oxide. The third conductor includes a region overlapping with the oxide with the second insulator, the third insulator, and the fourth insulator therebetween. The second insulator is in contact with a top surface of the oxide and a sidewall of the opening. The thickness of the second insulator is smaller than that of the third insulator. The fourth insulator is less permeable to oxygen than the third insulator is. The third conductor has a width greater than or equal to 3 nm and less than or equal to 15 nm in a cross-sectional view of the transistor in the channel length direction.

    MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

    公开(公告)号:US20230262952A1

    公开(公告)日:2023-08-17

    申请号:US18015118

    申请日:2021-08-05

    CPC classification number: H10B12/01

    Abstract: A semiconductor device with a small variation in transistor characteristics can be provided. A step of forming an opening in a structure body including an oxide semiconductor device to reach the oxide semiconductor device, a step of embedding a first conductor in the opening, a step of forming a second conductor in contact with a top surface of the first conductor, a step of forming a first barrier insulating film by a sputtering method to cover the structure body, the first conductor, and the second conductor, and a step of forming a second barrier insulating film over the first barrier insulating film by an ALD method are included. The first barrier insulating film and the second barrier insulating film each have a function of inhibiting hydrogen diffusion.

    SECONDARY BATTERY
    6.
    发明公开
    SECONDARY BATTERY 审中-公开

    公开(公告)号:US20240047691A1

    公开(公告)日:2024-02-08

    申请号:US18360024

    申请日:2023-07-27

    Abstract: A secondary battery with little deterioration is provided. A highly reliable secondary battery is provided. A positive electrode active material included in the secondary battery includes a crystal of lithium cobalt oxide. The positive electrode active material includes a first region including a surface parallel to the (00l) plane of the crystal and a second region including a surface parallel to a plane intersecting with the (00l) plane. The positive electrode active material contains magnesium. The first region includes a portion with a magnesium concentration that is higher than or equal to 0.5 atomic % and lower than or equal to 10 atomic %. The second region includes a portion with a magnesium concentration that is higher than the magnesium concentration in the first region and is higher than or equal to 4 atomic % and lower than or equal to 30 atomic %. Furthermore, the second region includes a portion with a fluorine concentration that is higher than a fluorine concentration in the first region and is higher than or equal to 0.5 atomic % and lower than or equal to 10 atomic %.

    POSITIVE ELECTRODE ACTIVE MATERIAL, SECONDARY BATTERY, AND VEHICLE

    公开(公告)号:US20220359870A1

    公开(公告)日:2022-11-10

    申请号:US17734744

    申请日:2022-05-02

    Abstract: A positive electrode active material in which a discharge capacity decrease due to charge and discharge cycles is suppressed and a secondary battery including the positive electrode active material are provided. A positive electrode active material in which a change in a crystal structure, e.g., a shift in CoO2 layers is small between a discharged state and a high-voltage charged state is provided. For example, a positive electrode active material that has a layered rock-salt crystal structure belonging to the space group R-3m in a discharged state and a crystal structure belonging to the space group P2/m in a charged state where x in LixCoO2 is greater than 0.1 and less than or equal to 0.24 is provided. When the positive electrode active material is analyzed by powder X-ray diffraction, a diffraction pattern has at least diffraction peaks at 2θ of 19.47±0.10° and 2θ of 45.62±0.05°.

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