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公开(公告)号:US20030176067A1
公开(公告)日:2003-09-18
申请号:US10412944
申请日:2003-04-14
Applicant: Semitool, Inc.
Inventor: Paul Z. Wirth , Steven L. Peace , Erik Lund
IPC: H01L021/302 , H01L021/461
CPC classification number: B08B3/04 , H01L21/32134 , H01L21/67017 , H01L21/67051 , H01L21/67057 , H01L21/6708 , H01L21/67086 , H01L21/6715 , Y10S134/902 , Y10S438/906 , Y10S438/913
Abstract: A system for processing a workpiece includes a head attached to a head lifter. A workpiece is supported in the head between an upper rotor and a lower rotor. A base has a bowl for containing a liquid. The head is movable by the head lifter from a first position vertically above the bowl, to a second position where the workpiece is at least partially positioned in the bowl. The bowl has a contour section with a sidewall having a radius of curvature which increases adjacent to a drain outlet in the bowl, to help rapid draining of liquid from the bowl. The head has a load position, where the rotors are spaced apart by a first amount, and a process position, where the rotors are engaged and sealed against each other. For rapid evacuation of fluid, the head also has a fast drain position, where the rotors are moved apart sufficiently to create an annular drain gap. Fluid is rapid evacuated by spinning the rotors with the head rotors slightly apart and unsealed, causing the fluid to flow our quickly under centrifugal force.
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公开(公告)号:US20020083960A1
公开(公告)日:2002-07-04
申请号:US09907484
申请日:2001-07-16
Applicant: Semitool, Inc.
Inventor: Paul Z. Wirth , Steven L. Peace , Erik Lund
IPC: C25F001/00 , C25F003/30 , C25F005/00 , B08B006/00
CPC classification number: H01L21/6715 , B08B3/04 , H01L21/32134 , H01L21/67017 , H01L21/67051 , H01L21/67057 , H01L21/6708 , H01L21/67086 , Y10S134/902 , Y10S438/906 , Y10S438/913
Abstract: A system for processing a workpiece includes a head attached to a head lifter. A workpiece is supported in the head between an upper rotor and a lower rotor. A base has a bowl for containing a liquid. The head is movable by the head lifter from a first position vertically above the bowl, to a second position where the workpiece is at least partially positioned in the bowl. The bowl has a contour section with a sidewall having a radius of curvature which increases adjacent to a drain outlet in the bowl, to help rapid draining of liquid from the bowl. The head has a load position, where the rotors are spaced apart by a first amount, and a process position, where the rotors are engaged and sealed against each other. For rapid evacuation of fluid, the head also has a fast drain position, where the rotors are moved apart sufficiently to create an annular drain gap. Fluid is rapid evacuated by spinning the rotors with the head rotors slightly apart and unsealed, causing the fluid to flow our quickly under centrifugal force.
Abstract translation: 用于处理工件的系统包括附接到头部升降器的头部。 工件在上转子和下转子之间的头部中被支撑。 底座有一个容纳液体的碗。 头部可由头部升降器从垂直于碗的第一位置移动到第二位置,在该位置,工件至少部分地定位在碗中。 碗具有轮廓部分,其侧壁具有与碗中的排水出口相邻增加的曲率半径,以帮助液体从碗中快速排出。 头部具有负载位置,其中转子间隔开第一量,以及处理位置,其中转子彼此接合并密封。 为了快速排出流体,头部还具有快速的排放位置,其中转子被足够地移动以产生环形的排水间隙。 流体通过旋转转子而迅速抽空,头部转子稍微分开并开封,导致流体在离心力下快速流动。
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公开(公告)号:US20020017237A1
公开(公告)日:2002-02-14
申请号:US09907522
申请日:2001-07-16
Applicant: Semitool, Inc.
Inventor: Paul Z. Wirth , Steven L. Peace
IPC: B05C013/00 , B05C013/02 , B05C021/00 , H01L021/31 , H01L021/469 , B25J001/00 , B65G049/07 , B05C003/00 , B05C019/02
CPC classification number: B08B3/04 , H01L21/32134 , H01L21/67017 , H01L21/67051 , H01L21/67057 , H01L21/6708 , H01L21/67086 , H01L21/6715 , Y10S118/90 , Y10S438/906 , Y10S438/913
Abstract: A system for processing a workpiece includes a base having a bowl or recess for holding a liquid. A process reactor or head holds a workpiece between an upper rotor and a lower rotor. A head lifter lowers the head holding the workpiece into contact with the liquid. The head spins the workpiece during or after contact with the liquid. The upper and lower rotors have side openings for loading and unloading a workpiece into the head. The rotors are axially moveable to align the side openings.
Abstract translation: 用于处理工件的系统包括具有用于保持液体的碗或凹部的底座。 工艺反应器或头部将工件保持在上转子和下转子之间。 头部升降器降低了将工件保持与液体接触的头部。 头部在与液体接触期间或之后旋转工件。 上下转子具有用于将工件装载和卸载到头部中的侧开口。 转子可轴向移动以对准侧开口。
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