Method and apparatus for enhancing in-situ gas flow measurement performance
    2.
    发明授权
    Method and apparatus for enhancing in-situ gas flow measurement performance 有权
    用于提高原位气流测量性能的方法和装置

    公开(公告)号:US08271211B2

    公开(公告)日:2012-09-18

    申请号:US12634593

    申请日:2009-12-09

    IPC分类号: G01F1/34

    摘要: An in-situ gas flow measurement controller measures the temperature and rate of pressure drop upstream from a flow control device (FCD). The controller samples the pressure and temperature data and applies the equivalent of a decimating filter to the data to produce filtered data at a slower sampling rate. The controller derives timestamps by counting ticks from the sampling clock of the A/D converter that is sampling the pressure at regular intervals to ensure the timestamps associated with the pressure samples are accurate and do not contain jitter that is associated with software clocks. The controller additionally normalizes the temperature reading to account for power supply fluctuations, filters out noise from the pressure and temperature readings, and excludes data during periods of instability. It calculates the gas flow rate accounting for possible non-linearities in the pressure measurements, and provides the computed gas flow measurement via one of many possible interfaces.

    摘要翻译: 原位气体流量测量控制器测量流量控制装置(FCD)上游的压降的温度和速率。 控制器对压力和温度数据进行采样,并将等效的抽取滤波器应用于数据,以较慢的采样速率产生滤波数据。 控制器通过对A / D转换器的采样时钟进行计数来计算时间戳,A / D转换器采样时间间隔采样压力,以确保与压力样本相关联的时间戳准确,并且不包含与软件时钟相关的抖动。 控制器另外对温度读数进行标准化以考虑电源波动,从压力和温度读数滤除噪声,并在不稳定期间排除数据。 它计算气体流量,考虑压力测量中可能的非线性,并通过许多可能的接口之一提供计算的气体流量测量。

    System and method for vacuum chamber leak detection
    6.
    发明授权
    System and method for vacuum chamber leak detection 有权
    真空室泄漏检测系统及方法

    公开(公告)号:US07590498B1

    公开(公告)日:2009-09-15

    申请号:US11948907

    申请日:2007-11-30

    IPC分类号: G01F17/00

    CPC分类号: G01M3/38

    摘要: Leaks in a processing chamber, including “virtual leaks” resulting from outgassing of material present within the chamber, may be detected utilizing an optical emission spectroscopy (OES) sensor configured to monitor light emitted from plasma of a sample from the chamber. According to certain embodiments, gas introduced into the chamber by the leak may be detected directly on the basis of its optical spectrum. Alternatively, gas introduced by the leak may be detected indirectly, based upon an optical spectrum of a material resulting from reaction of the gas attributable to the leak. According to one embodiment, data from the OES sensor is received by a processor that is configured to compute a leak detection index. The value of the leak detection index is compared against a threshold to determine if a leak is detected. If the value of the index crosses the threshold, a notification of the existence of a leak is sent.

    摘要翻译: 可以利用配置成监测来自腔室的样品的等离子体发射的光的光发射光谱(OES)传感器来检测在处理室中的泄漏,包括由室内存在的物质的放气引起的“虚泄”。 根据某些实施例,可以基于其光谱直接检测通过泄漏引入到腔室中的气体。 或者,可以基于由归因于泄漏的气体的反应产生的材料的光谱,间接地检测由泄漏引入的气体。 根据一个实施例,来自OES传感器的数据被配置为计算泄漏检测指数的处理器接收。 将泄漏检测索引的值与阈值进行比较,以确定是否检测到泄漏。 如果索引的值超过阈值,则发送泄漏存在的通知。

    Compensation for frequency adjustment in mobile communication-positioning device with shared oscillator
    7.
    发明授权
    Compensation for frequency adjustment in mobile communication-positioning device with shared oscillator 有权
    具有共享振荡器的移动通信定位设备的频率调整补偿

    公开(公告)号:US07299024B2

    公开(公告)日:2007-11-20

    申请号:US10718821

    申请日:2003-11-21

    IPC分类号: H04B1/06

    摘要: In a mobile communication device, a method for compensating for a frequency adjustment in an oscillator shared between a communication circuit and a positioning signal receiver is provided. In one embodiment, a method for determining the operating frequency of an oscillator detects a beginning time point of a reference signal received by the mobile communication device and enables a counter to count in step with a clock signal derived from the oscillator. When an ending time point of the reference signal is received by the mobile communication device, the count is stopped, and the frequency of the oscillator is determined based on the count in the counter and an expected time that elapsed between the beginning time point and the ending time point.

    摘要翻译: 在移动通信装置中,提供了用于补偿在通信电路和定位信号接收器之间共享的振荡器中的频率调整的方法。 在一个实施例中,用于确定振荡器的工作频率的方法检测由移动通信设备接收到的参考信号的开始时间点,并使计数器能够与从振荡器导出的时钟信号同步进行计数。 当移动通信装置接收到参考信号的结束时间点时,停止计数,并且基于计数器中的计数和从开始时间点和开始时间之间经过的预期时间来确定振荡器的频率 结束时间点。

    System and method for controlling process end-point utilizing legacy end-point system
    8.
    发明申请
    System and method for controlling process end-point utilizing legacy end-point system 有权
    使用传统端点系统控制过程终点的系统和方法

    公开(公告)号:US20080253377A1

    公开(公告)日:2008-10-16

    申请号:US11787654

    申请日:2007-04-16

    IPC分类号: H04L12/28

    摘要: Embodiments in accordance with the present invention allow a second end-point determination (EPD) system to actively control the end-pointing of a semiconductor process chamber, by leveraging a legacy EPD system that is already integrated with the chamber. In one embodiment, the second EPD system controls a shutter that regulates the amount of light transmitted between a plasma light source and an optical emission spectroscopy (OES) sensor of the legacy OES EPD system. In this embodiment, the legacy OES EPD system is pre-configured to call end-point when an artificial end-point condition occurs, i.e. the intensity of light falls below a pre-set threshold. When the second EPD system determines an actual end-point condition has been reached, it closes the shutter which, causes the light intensity being read by the OES sensor to fall below the pre-set threshold. This in turn triggers an end-point command to the chamber from the legacy OES EPD system.

    摘要翻译: 根据本发明的实施例允许第二端点确定(EPD)系统通过利用已经与腔室集成的传统EPD系统来主动地控制半导体处理室的端点指向。 在一个实施例中,第二EPD系统控制快门,其调节在等离子体光源和传统OES EPD系统的光发射光谱(OES)传感器之间传输的光量。 在本实施例中,传统OES EPD系统预先配置成在出现人造终点条件时即光强度低于预定阈值时调用端点。 当第二EPD系统确定已经达到实际的终点条件时,它关闭快门,这导致由OES传感器读取的光强度低于预设阈值。 这反过来触发了从传统OES EPD系统到终端的命令。

    High-speed SECS message services (HSMS) pass-through including bypass
    9.
    发明授权
    High-speed SECS message services (HSMS) pass-through including bypass 有权
    高速SECS消息服务(HSMS)传递包括旁路

    公开(公告)号:US08102844B1

    公开(公告)日:2012-01-24

    申请号:US11525539

    申请日:2006-09-21

    IPC分类号: H04L12/56

    摘要: A method and system for intercepting and forwarding High-Speed SECS Message Services (HSMS) communication between at least two entities, includes a fail-safe bypass to ensure the communications link between the entities is not severed upon failure of the intercepting/forwarding agent. A “pass-through” agent is placed in between two entities communicating via an HSMS link, such that the pass-through agent is able to intercept messages from one entity and forward it to the other entity, and vice versa. The pass-through agent is able to see all messages between the two entities, and is also able to create HSMS messages and send them to one of the entities as if the message had come from the other entity, thereby conferring the ability to inject additional HSMS messages. Should the pass-through agent fail, a bypass mechanism ensures that the two entities can automatically resume HSMS communication without the pass-through agent.

    摘要翻译: 一种用于截取和转发至少两个实体之间的高速SECS消息服务(HSMS)通信的方法和系统,包括故障安全旁路,以确保在拦截/转发代理失败之后,实体之间的通信链路不会被切断。 “通过”代理被放置在通过HSMS链路通信的两个实体之间,使得传递代理能够拦截来自一个实体的消息并将其转发给另一个实体,反之亦然。 传递代理能够看到两个实体之间的所有消息,并且还能够创建HSMS消息并将它们发送到其中一个实体,就像消息来自另一个实体一样,从而赋予另外一个实体的能力 HSMS消息。 如果传递代理失败,旁路机制确保两个实体可以自动恢复HSMS通信而不使用直通代理。

    System and method for controlling process end-point utilizing legacy end-point system
    10.
    发明授权
    System and method for controlling process end-point utilizing legacy end-point system 有权
    使用传统端点系统控制过程终点的系统和方法

    公开(公告)号:US07873052B2

    公开(公告)日:2011-01-18

    申请号:US11787654

    申请日:2007-04-16

    IPC分类号: H04L12/28

    摘要: Embodiments in accordance with the present invention allow a second end-point determination (EPD) system to actively control the end-pointing of a semiconductor process chamber, by leveraging a legacy EPD system that is already integrated with the chamber. In one embodiment, the second EPD system controls a shutter that regulates the amount of light transmitted between a plasma light source and an optical emission spectroscopy (OES) sensor of the legacy OES EPD system. In this embodiment, the legacy OES EPD system is pre-configured to call end-point when an artificial end-point condition occurs, i.e. the intensity of light falls below a pre-set threshold. When the second EPD system determines an actual end-point condition has been reached, it closes the shutter which, causes the light intensity being read by the OES sensor to fall below the pre-set threshold. This in turn triggers an end-point command to the chamber from the legacy OES EPD system.

    摘要翻译: 根据本发明的实施例允许第二端点确定(EPD)系统通过利用已经与腔室集成的传统EPD系统来主动地控制半导体处理室的端点指向。 在一个实施例中,第二EPD系统控制快门,其调节在等离子体光源和传统OES EPD系统的光发射光谱(OES)传感器之间传输的光量。 在本实施例中,传统OES EPD系统预先配置成在出现人造终点条件时即光强度低于预定阈值时调用端点。 当第二EPD系统确定已经达到实际的终点条件时,它关闭快门,这导致由OES传感器读取的光强度低于预设阈值。 这反过来触发了从传统OES EPD系统到终端的命令。