公开(公告)号：US20220080468A1

公开(公告)日：2022-03-17

申请号：US17469876

申请日：2021-09-09

Applicant: SHIBAURA MECHATRONICS CORPORATION

Inventor： Kensuke DEMURA ,  Daisuke MATSUSHIMA ,  Masaya KAMIYA

IPC: B08B3/10 ,  H01L21/687 ,  B08B7/00 ,  B08B3/04 ,  B08B13/00

Abstract: A substrate processing apparatus according to an embodiment of the present disclosure includes a stage having a substantially disc-shaped form and including a hole in a center thereof; a roller that contacts a side surface of the stage and rotates the stage; a first liquid nozzle that supplies a first liquid to a first surface of the substrate; a first driver that moves a position of the first liquid nozzle; a second liquid nozzle that supplies a second liquid from the hole of the stage to a second surface of the substrate; a second driver that moves a position of the second liquid nozzle; a cooling nozzle that supplies a cooling gas from the hole of the stage to the second surface; a third driver that moves a position of the cooling nozzle; and a controller that controls the first driver, the second driver, and the third driver.

公开(公告)号：US20210299713A1

公开(公告)日：2021-09-30

申请号：US17195924

申请日：2021-03-09

Applicant: Shibaura Mechatronics Corporation

Inventor： Kensuke DEMURA ,  Daisuke MATSUSHIMA ,  Masaya KAMIYA

IPC: B08B7/00 ,  B08B3/10

Abstract: According to one embodiment, q substrate treatment device includes a placement stand, a plurality of support portions, a cooling part, a liquid supplier, and at least one protrusion. The placement stand has a plate shape, and is configured to rotate. The support portions are provided on one surface of the placement stand and configured to support a substrate. The cooling part is configured to supply a cooling gas into a space between the placement stand and a back surface of the substrate supported by the support portions. The liquid supplier is configured to supply a liquid onto a surface of the substrate. At least one protrusion is provided on the one surface of the placement stand and extends along a boundary line of a region where the substrate is provided in a plan view.

公开(公告)号：US20210323036A1

公开(公告)日：2021-10-21

申请号：US17230152

申请日：2021-04-14

Applicant: Shibaura Mechatronics Corporation

Inventor： Daisuke MATSUSHIMA ,  Kensuke DEMURA ,  Satoshi NAKAMURA ,  Masaya KAMIYA ,  Minami NAKAMURA

IPC: B08B7/00 ,  B08B3/10 ,  B08B3/08 ,  B08B3/04 ,  F25C1/12

Abstract: According to one embodiment, a substrate treatment device includes a placement stand configured to rotate the substrate, a cooling part configured to supply a cooling gas into a space between the placement stand and the substrate, a first liquid supplier configured to supply a first liquid on a surface of the substrate, a second liquid supplier configured to supply a second liquid on the surface, and a controller controlling rotation of the substrate, supply of the cooling gas, the first and second liquids. The controller performs a preliminary process of supplying the second liquid on the surface, and supplying the cooling gas into the space, a liquid film forming process by supplying the first liquid toward the surface after the preliminary process, a supercooling process of the liquid film on the surface, and a freezing process of at least a part of the liquid film on the surface.

公开(公告)号：US20210265159A1

公开(公告)日：2021-08-26

申请号：US17181264

申请日：2021-02-22

Applicant: Shibaura Mechatronics Corporation

Inventor： Kensuke DEMURA ,  Daisuke MATSUSHIMA ,  Masaya KAMIYA

IPC: H01L21/02 ,  B08B7/00

Abstract: According to one embodiment, a substrate treatment device includes a placement stand configured to rotate a substrate, a cooling part configured to supply a cooling gas into a space between the placement stand and the substrate, a liquid supplier configured to supply a liquid on a surface of the substrate opposite to the placement stand, and a controller controlling a rotation speed of the substrate, a flow rate of the cooling gas, or a supply amount of the liquid. The controller sets the liquid on the surface of the substrate to be in a supercooled state, forms a frozen film by freezing the liquid in the super cooled state, and causes crack to generate in the frozen film by decreasing a temperature of the frozen film.

公开(公告)号：US20180016673A1

公开(公告)日：2018-01-18

申请号：US15715966

申请日：2017-09-26

Applicant: SHIBAURA MECHATRONICS CORPORATION ,  TOSHIBA MEMORY CORPORATION

Inventor： Satoshi NAKAMURA ,  Kensuke DEMURA ,  Daisuke MATSUSHIMA ,  Masayuki HATANO ,  Hiroyuki KASHIWAGI ,  Chen KANG ,  Ganachev Ivan PETROV

IPC: C23C14/04 ,  B29C33/38 ,  G03F7/00 ,  B29C59/02

CPC classification number: C23C14/042 ,  B29C33/3842 ,  B29C59/022 ,  C23C14/246 ,  G03F7/0002

Abstract: According to one embodiment, an imprint template manufacturing apparatus includes a support unit, a vaporization unit, and an adhesion preventing plate. The support unit supports a template that includes a base having a main surface, and a convex portion provided on the main surface and having an end surface. A concavo-convex pattern to be pressed against a liquid material to be transferred is formed on the end surface. The support unit supports the template with the convex portion facing downward. The vaporization unit is located below the template on the support unit and configured to vaporize a liquid-repellent material. The adhesion preventing plate is located below the template on the support unit and configured to allow the liquid-repellent material vaporized to adhere to the side surface of the convex portion of the template and to prevent it from adhering to the concavo-convex pattern.

公开(公告)号：US20220068671A1

公开(公告)日：2022-03-03

申请号：US17460566

申请日：2021-08-30

Applicant: SHIBAURA MECHATRONICS CORPORATION

Inventor： Kensuke DEMURA ,  Daisuke MATSUSHIMA ,  Masaya KAMIYA

IPC: H01L21/67 ,  H01L21/687

Abstract: A substrate processing apparatus according to an embodiment of the present disclosure includes: a stage; a plurality of holders configured to hold a substrate; a liquid supply configured to supply a liquid to a surface of the substrate opposite to the stage; a cooler configured to supply a cooling gas to a space between the stage and the substrate; a mover configured to change a distance between the stage and the substrate; and a controller configured to control the cooler and the mover. The controller performs a cooling process that at least includes a supercooling process and a freezing process (solid-liquid phase), and a thawing process after the cooling process. In the cooling process, the controller controls the mover to set the distance to a first distance, and in the thawing process, the controller controls the mover to set the distance to a second distance longer than the first distance.

公开(公告)号：US20210276055A1

公开(公告)日：2021-09-09

申请号：US17181227

申请日：2021-02-22

Applicant: Shibaura Mechatronics Corporation

Inventor： Minami NAKAMURA ,  Daisuke MATSUSHIMA ,  Kensuke DEMURA

IPC: B08B7/00 ,  G03F7/20 ,  B08B7/04 ,  B08B3/10 ,  H01L21/67 ,  H01L21/687

Abstract: According to one embodiment, a substrate treatment device includes a placement stand configured to rotate a substrate, a cooling part configured to supply a cooling gas into a space between the placement stand and the substrate, a liquid supplier configured to supply a liquid on a surface of the substrate opposite to the placement stand side, a detector configured to detect a state of the liquid on the surface of the substrate, and a controller controlling at least one of a rotation speed of the substrate, a flow rate of the cooling gas, or a supply amount of the liquid. The controller sets the liquid on the surface of the substrate to be in a supercooled state, obtains a temperature of the liquid in the supercooled state at a start of freezing, and is configured to calculate a removal ratio of a contamination.

公开(公告)号：US20180117796A1

公开(公告)日：2018-05-03

申请号：US15860075

申请日：2018-01-02

Applicant: SHIBAURA MECHATRONICS CORPORATION ,  TOSHIBA MEMORY CORPORATION

Inventor： Kensuke DEMURA ,  Satoshi NAKAMURA ,  Daisuke MATSUSHIMA ,  Masayuki HATANO ,  Hiroyuki KASHIWAGI

IPC: B29C33/38 ,  B29C59/02 ,  G03F7/00 ,  B29C59/00

CPC classification number: B29C33/3842 ,  B29C33/38 ,  B29C33/42 ,  B29C59/002 ,  B29C59/02 ,  B29C2033/426 ,  B29L2031/757 ,  G03F7/0002

Abstract: According to one embodiment, an imprint template manufacturing apparatus includes: a stage that support a template having a convex portion where a concavo-convex pattern is formed; a supply head that supplies a liquid-repellent material in liquid form to the template on the stage; a moving mechanism that moves the stage and the supply head relatively in a direction along the stage; and a controller that controls the supply head and the moving mechanism such that the supply head applies the liquid-repellent material to at least a side surface of the convex portion so as to avoid the concavo-convex pattern. The liquid-repellent material contains a liquid-repellent component and a non-liquid-repellent component that react with the surface of the template, a volatile solvent that dissolves the liquid-repellent component, and a fluorine-based volatile solvent that dissolves the non-liquid-repellent component.

公开(公告)号：US20180022016A1

公开(公告)日：2018-01-25

申请号：US15720898

申请日：2017-09-29

Applicant: SHIBAURA MECHATRONICS CORPORATION ,  TOSHIBA MEMORY CORPORATION

Inventor： Satoshi NAKAMURA ,  Kensuke DEMURA ,  Daisuke MATSUSHIMA ,  Masayuki HATANO ,  Hiroyuki KASHIWAGI

IPC: B29C59/02

CPC classification number: B29C59/02 ,  B29C35/0888 ,  B29C43/021 ,  B29C2035/0827 ,  G03F7/0002 ,  H01L21/027

Abstract: According to one embodiment, a template for imprint includes a base, a convex portion, and a liquid-repellent layer. The base has a main surface. The convex portion is provided on the main surface. The convex portion has an end surface on a side opposite to the main surface, and a concavo-convex pattern to be pressed against a liquid material to be transferred is formed on the end surface. The liquid-repellent layer is formed on at least the side surface of the convex portion so as to avoid the concavo-convex pattern. The liquid-repellent layer repels the liquid material to be transferred.