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公开(公告)号:US20130205454A1
公开(公告)日:2013-08-08
申请号:US13726764
申请日:2012-12-26
申请人: Shuichi BABA , Masahiro WATANABE , Toshihiko NAKATA , Yukio KEMBO , Toru KURENUMA , Takafumi MORIMOTO , Manabu EDAMURA , Satoshi SEKINO
发明人: Shuichi BABA , Masahiro WATANABE , Toshihiko NAKATA , Yukio KEMBO , Toru KURENUMA , Takafumi MORIMOTO , Manabu EDAMURA , Satoshi SEKINO
IPC分类号: G01Q10/00
摘要: In the case of measuring a pattern having a steep side wall, a probe adheres to the side wall by the van der Waals forces acting between the probe and the side wall when approaching the pattern side wall, and an error occurs in a measured profile of the side wall portion. When a pattern having a groove width almost equal to a probe diameter is measured, the probe adheres to both side walls, the probe cannot reach the groove bottom, and the groove depth cannot be measured. When the probe adheres to a pattern side wall in measurements of a microscopic high-aspect ratio pattern using an elongated probe, the probe is caused to reach the side wall bottom by detecting the adhesion of the probe to the pattern side wall, and temporarily increasing a contact force between the probe and the sample. Also, by obtaining the data of the amount of torsion of a cantilever with the shape data of the pattern, a profile error of the side wall portion by the adhesion is corrected by the obtained data of the amount of torsion.
摘要翻译: 在测量具有陡峭侧壁的图案的情况下,当接近图案侧壁时,探针通过作用在探针和侧壁之间的范德华力附着在侧壁上,并且在测量的轮廓中发生错误 侧壁部分。 当测量具有几乎等于探针直径的槽宽度的图案时,探针粘附到两个侧壁,探针不能到达凹槽底部,并且不能测量凹槽深度。 当使用细长的探针测量微观高纵横比图案时探头粘附到图案侧壁上时,通过检测探针与图案侧壁的粘附力使探针到达侧壁底部,并暂时增加 探针和样品之间的接触力。 此外,通过利用图案的形状数据获得悬臂的扭转量的数据,通过获得的扭转量的数据来校正侧壁部分的粘附的轮廓误差。
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公开(公告)号:US20090223633A1
公开(公告)日:2009-09-10
申请号:US12434877
申请日:2009-05-04
申请人: Go MIYA , Manabu EDAMURA , Ken YOSHIOKA , Ryoji NISHIO
发明人: Go MIYA , Manabu EDAMURA , Ken YOSHIOKA , Ryoji NISHIO
IPC分类号: C23F1/08
CPC分类号: H01J37/32449 , H01J37/3244 , H01L21/67017 , H01L21/67069
摘要: A plasma etching apparatus capable of performing processing with excellent in-plane uniformity on an object to be processed having a large diameter is provided. The present invention provides a plasma etching apparatus including a processing chamber 13 which performs plasma processing on an object to be processed 1, a first processing gas supply source 40, a second processing gas supply source 50, a first gas inlet 65-1 which introduces a processing gas into the processing chamber, second gas inlets 65-2 which introduce the processing gas into the processing chamber, flow rate regulators 42 and 53 which regulate the flow rate of the processing gas and a gas shunt 60 which divides the first processing gas into a plurality of portions, wherein at least two gas pipes branched by the shunt 60 are provided with the first gas inlet 65-1 or second gas inlets 65-2 and merging sections 63-1 and 63-2 are provided between the shunt 60 and the first gas inlet 65-1 and between the shunt 60 and the second gas inlets 65-2 for merging the second processing gas.
摘要翻译: 提供了能够对具有大直径的待处理物体进行具有优异的面内均匀性的处理的等离子体蚀刻装置。 本发明提供一种等离子体蚀刻装置,其包括对被处理物1进行等离子体处理的处理室13,第一处理气体供给源40,第二处理气体供给源50,第一气体供给源 进入处理室的处理气体,将处理气体引入处理室的第二气体入口65-2,调节处理气体的流量的流量调节器42和53以及将第一处理气体 其中由分流器60分支的至少两个气体管道设置有第一气体入口65-1或第二气体入口65-2以及合流部分63-1和63-2,分流器60 和第一气体入口65-1以及分流器60和第二气体入口65-2之间,用于合并第二处理气体。
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公开(公告)号:US20100294432A1
公开(公告)日:2010-11-25
申请号:US12850664
申请日:2010-08-05
申请人: Manabu EDAMURA , Ken YOSHIOKA , Takeshi SHIMADA
发明人: Manabu EDAMURA , Ken YOSHIOKA , Takeshi SHIMADA
IPC分类号: H01L21/44
CPC分类号: H01L21/67069 , H01J37/32091 , H01J37/321
摘要: A plasma processing apparatus, a processing chamber having one surface formed by a flat-plate-like insulating-material manufactured window, a sample mounting electrode having a sample mounting plane formed on a surface opposed to the insulating-material manufactured window, a gas-inlet for a flat-plate-structured capacitively coupled antenna formed on an outer surface of the insulating-material manufactured window with slits provided in a radial pattern, an inductively coupled antenna formed outside OF the insulating-material manufactured window and performing an inductive coupling with a plasma via the window, the plasma being formed within the processing chamber, a radio-frequency power supply, and an LC circuit. The inductively coupled antenna is configured by a coil which is wound a plurality of times with a direction defined as a longitudinal direction, the direction extending perpendicular to the sample mounting plane.
摘要翻译: 一种等离子体处理装置,具有由平板状绝缘材料制造的窗口形成的一个表面的处理室,具有形成在与绝缘材料制造窗口相对的表面上的样品安装面的样品安装电极, 用于形成在绝缘材料制造窗口的外表面上的平板结构的电容耦合天线的入口,其具有以径向图案设置的狭缝,在绝缘材料制造的窗口外部形成的电感耦合天线,并且执行与 通过窗口的等离子体,等离子体形成在处理室内,射频电源和LC电路。 电感耦合天线由线圈构成,该线圈被定义为纵向的方向多次缠绕,该方向垂直于样品安装平面延伸。
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公开(公告)号:US20120240581A1
公开(公告)日:2012-09-27
申请号:US13427471
申请日:2012-03-22
申请人: Takatoshi OOKI , Yusuke KAJITA , Hidetoshi SATAKE , Seiji ISHIDA , Shiho IZUMI , Kouji ISHIKAWA , Shinya OKUMURA , Manabu EDAMURA
发明人: Takatoshi OOKI , Yusuke KAJITA , Hidetoshi SATAKE , Seiji ISHIDA , Shiho IZUMI , Kouji ISHIKAWA , Shinya OKUMURA , Manabu EDAMURA
CPC分类号: E02F9/123 , E02F9/2095 , E02F9/2217 , E02F9/2296
摘要: A hybrid construction machine drives the upper swing structure using a hydraulic motor and an electric motor together and is capable of regenerating the energy of the upper swing structure in deceleration or stopping into electric power and using the regenerated electric power for assisting the hydraulic motor for driving the upper swing structure. The opening area characteristics of a meter-out restrictor and a bleed-off restrictor of a swing directional control valve are set to become larger than for construction machines driving the upper swing structure with the hydraulic motor alone. Torque of the electric motor is controlled so that the total sum of the actual torque occurring in the hydraulic and electric motors in deceleration or acceleration of the hydraulic motor equals the torque occurring when the opening area of the meter-out restrictor or the bleed-off restrictor is set at the prescribed opening area.
摘要翻译: 混合动力施工机械使用液压马达和电动机一起驱动上部摆动结构,能够以减速或停止电力再生上部摆动结构的能量,并且使用再生电力来辅助液压马达驱动 上摆动结构。 摆动方向控制阀的出口限流器和泄放限制器的开口面积特性被设定为大于仅用液压马达驱动上部摆动结构的建筑机械的开口面积特性。 控制电动机的扭矩,使得在液压马达的减速或加速中发生在液压马达和电动马达中的实际扭矩的总和等于当出口限流器的开口面积或泄放 限流器设置在规定的开口区域。
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