Image exposure device
    1.
    发明授权
    Image exposure device 失效
    图像曝光装置

    公开(公告)号:US07259830B2

    公开(公告)日:2007-08-21

    申请号:US11090856

    申请日:2005-03-28

    IPC分类号: G03B27/54 G03B27/42

    摘要: An image exposure device includes an exposure head for forming a desired pattern on a photosensitive material. The exposure head is equipped with a light source for emitting a great number of light beams, a spatial light modulator in which a great number of pixel portions are arranged for independently modulating the light beams emitted from the light source, a micro lens array in which a great number of micro lenses are arranged for individually converging the great number of light beams modulated by the pixel portions, and a total of two or more aperture arrays arranged in the stage before the micro lens array and/or the stage after the micro lens array. Each of the aperture arrays has a great number of apertures for individually restricting the light beams.

    摘要翻译: 图像曝光装置包括用于在感光材料上形成所需图案的曝光头。 曝光头配备有用于发射大量光束的光源,空间光调制器,其中布置有大量像素部分,用于独立地调制从光源发射的光束;微透镜阵列,其中 多个微透镜被布置用于单独地会聚由像素部分调制的大量光束,并且总共有两个或更多个孔径阵列布置在微透镜阵列之前的阶段和/或微透镜之后的阶段 数组。 每个孔径阵列具有大量的用于单独限制光束的孔。

    Image exposure device
    2.
    发明申请
    Image exposure device 失效
    图像曝光装置

    公开(公告)号:US20050213068A1

    公开(公告)日:2005-09-29

    申请号:US11090856

    申请日:2005-03-28

    摘要: An image exposure device includes an exposure head for forming a desired pattern on a photosensitive material. The exposure head is equipped with a light source for emitting a great number of light beams, a spatial light modulator in which a great number of pixel portions are arranged for independently modulating the light beams emitted from the light source, a micro lens array in which a great number of micro lenses are arranged for individually converging the great number of light beams modulated by the pixel portions, and a total of two or more aperture arrays arranged in the stage before the micro lens array and/or the stage after the micro lens array. Each of the aperture arrays has a great number of apertures for individually restricting the light beams.

    摘要翻译: 图像曝光装置包括用于在感光材料上形成所需图案的曝光头。 曝光头配备有用于发射大量光束的光源,空间光调制器,其中布置有大量像素部分,用于独立地调制从光源发射的光束;微透镜阵列,其中 多个微透镜被布置用于单独地会聚由像素部分调制的大量光束,并且总共有两个或更多个孔径阵列布置在微透镜阵列之前的阶段和/或微透镜之后的阶段 数组。 每个孔径阵列具有大量的用于单独限制光束的孔。

    Exposure apparatus and exposure method
    3.
    发明申请
    Exposure apparatus and exposure method 审中-公开
    曝光装置和曝光方法

    公开(公告)号:US20090251676A1

    公开(公告)日:2009-10-08

    申请号:US11921406

    申请日:2006-05-30

    IPC分类号: G03B27/72

    CPC分类号: G03F7/70291 G03F7/70275

    摘要: An exposure image is accurately projected. An exposure apparatus includes a light source for emitting exposure light, a DMD, which includes a plurality of two-dimensionally-arranged pixel portions, and a telecentric optical system for collimating principal rays of the exposure light. The telecentric optical system is positioned in an optical path of the exposure light that enters the DMD. The DMD performs, based on an image signal, spatial light modulation on exposure light, which has been emitted from the light source, and that has entered the plurality of pixel portions, for each of the plurality of pixel portions.

    摘要翻译: 准确投影曝光图像。 曝光装置包括用于发射曝光光的光源,包括多个二维排列的像素部分的DMD和用于准直曝光光的主光线的远心光学系统。 远心光学系统位于进入DMD的曝光光的光路中。 DMD基于图像信号,对于多个像素部分中的每个像素部分,对从光源发射的并且已进入多个像素部分的曝光光进行空间光调制。

    EXPOSURE APPARATUS AND EXPOSURE METHOD
    4.
    发明申请
    EXPOSURE APPARATUS AND EXPOSURE METHOD 审中-公开
    曝光装置和曝光方法

    公开(公告)号:US20090046262A1

    公开(公告)日:2009-02-19

    申请号:US11817466

    申请日:2006-03-09

    IPC分类号: G03B27/38

    摘要: An exposure apparatus includes a light source for emitting exposure light, a spatial light modulation means for performing spatial light modulation, based on an image signal, on the exposure light, an imaging means for forming an image on a photosensitive material with the exposure light on which spatial light modulation has been performed, and a focus adjustment means for adjusting focus by changing the optical path length of the modulated exposure light when an image is formed on the photosensitive material with the spatially modulated exposure light. The imaging means forms an image with the spatially modulated exposure light only by a substantially rectangular region of the imaging means including the central portion of the imaging means.

    摘要翻译: 曝光装置包括:用于发射曝光的光源;空间光调制装置,用于在曝光光上基于图像信号进行空间光调制;成像装置,用于在曝光光在感光材料上形成图像; 已经执行了空间光调制的焦点调节装置,以及用于通过改变当利用空间调制的曝光光在感光材料上形成图像时调制的曝光光的光路长度来调整焦点的焦点调节装置。 成像装置仅通过包括成像装置的中心部分的成像装置的基本上矩形的区域形成具有空间调制曝光的图像。

    Exposure head
    5.
    发明授权
    Exposure head 失效
    曝光头

    公开(公告)号:US07061517B2

    公开(公告)日:2006-06-13

    申请号:US11124058

    申请日:2005-05-09

    IPC分类号: B41J2/47 G02F1/295

    摘要: In the present invention provides, in order to obtain a desired focal depth t in a range α of an acceptable increased amount of beam diameter, an exposure head is designed so that the ratio D/W of an output beam width D to a beam width W at the position where a DMD is placed satisfies the following relational formula. D W ≤ α × M 2 × t - K × λ a θ In the above formula, parameters are defined as follows. λ: the wavelength of laser light θ: the angle of beam outputted from an illumination light source that is derived by a numerical aperture (NA) of optical fiber according to the following formula θ=sin−1(NA) D: the width of beam outputted from the illumination light source W: the beam width at the position where the DMD is placed (at the irradiated surface) a: the size of one pixel on the DMD K: a coefficient determined by beam characteristics, K=1 M: the magnification of imaging optical system t: required focal depth α: acceptable increased amount of beam diameter

    摘要翻译: 在本发明中,为了获得可接受的增加光束直径的α的范围内的所需焦点深度t,曝光头被设计成使得输出光束宽度D的比D / W与光束宽度 放置DMD的位置的W满足以下关系式。 D W 2 - /> > 在上述公式中,参数定义如下。 λ:激光的波长θ:根据以下公式由光纤的数值孔径(NA)导出的照明光源输出的光束的角度<?in-line-formula description =“In-line 公式“end =”lead“?> theta = sin (NA)<?in-line-formula description =”In-line Formulas“end =”tail“?> D: 从照明光源W输出的光束:DMD放置位置处的光束宽度(照射面)a:DMD上的一个像素的大小K:由光束特性确定的系数,K = 1M :成像光学系统的放大倍数t:所需的焦深α:可接受的增加光束直径的数量

      Exposure head
      8.
      发明授权
      Exposure head 失效
      曝光头

      公开(公告)号:US06928198B2

      公开(公告)日:2005-08-09

      申请号:US10443995

      申请日:2003-05-23

      IPC分类号: G02B26/08 G03F7/20 G02F1/295

      摘要: The present invention provides, in order to obtain a desired focal depth t in a range α of an acceptable increased amount of beam diameter, an exposure head is designed so that the ratio D/W of an output beam width D to a beam width W at the position where a digital micromirror device (DMD) is placed satisfies the following formula: D W ≤ α × M 2 × t - K × λ a θ .

      摘要翻译: 本发明为了获得可接受的增加光束直径的α的范围内的期望的焦点深度t,设计了曝光头,使得输出光束宽度D的比D / W与光束宽度W 在数位微镜装置(DMD)的位置满足下列公式: MI> D <= MROW> - K > θ

        Laser-diode-pumped solid state laser and radiation image read-out system
        10.
        发明授权
        Laser-diode-pumped solid state laser and radiation image read-out system 失效
        激光二极管泵浦固态激光器和放射线图像读出系统

        公开(公告)号:US6058126A

        公开(公告)日:2000-05-02

        申请号:US109053

        申请日:1998-07-02

        CPC分类号: H01S3/109 H01S3/1312

        摘要: In a laser-diode-pumped solid state laser, a solid laser crystal is pumped by a pumping laser beam emitted from a laser diode and a harmonic of light emitted from the pumped solid laser crystal is caused to make laser oscillation by a resonator structure containing therein a nonlinear optical crystal. The electric current to be poured into the laser diode is controlled so that the pumping laser beam emitted from the laser diode is kept at an output level at which the pumping laser beam cannot cause the harmonic of light emitted from the solid laser crystal to make laser oscillation though pumping the solid laser crystal.

        摘要翻译: 在激光二极管泵浦的固态激光器中,通过从激光二极管发射的激光激光束泵浦固体激光晶体,并且通过包含以下方式的谐振器结构使得从泵浦固体激光晶体发射的光的谐波使激光振荡: 其中非线性光学晶体。 控制注入激光二极管的电流,使得从激光二极管发射的激光激光束保持在激光束不能引起从固体激光晶体发出的光的谐波产生激光的输出水平 振荡虽然泵浦固体激光晶体。