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    Sputtering Apparatus and Method, and Sputtering Control Program
    5.
    发明申请
    Sputtering Apparatus and Method, and Sputtering Control Program 失效
    溅射设备和方法以及溅射控制程序

    公开(公告)号：US20080023318A1

    公开(公告)日：2008-01-31

    申请号：US11628138

    申请日：2005-06-13

    申请人： Shunji Kuroiwa

    发明人： Shunji Kuroiwa

    IPC分类号： C23C14/35

    CPC分类号： C23C14/35 ,  C23C14/358 ,  C23C14/54 ,  C23C14/542

    摘要： To provide a sputtering apparatus and method, and a sputtering control program which are configured simply and can secure the uniformity of the film thickness from the beginning to the end of the use of a target. There are provided: a target 15 disposed so as to face an object to be treated 19; a permanent magnet unit M which generates a high-density plasma by means of a magnetic field and deposits a material of the target 15 on the object to be treated, in the form of a film; a rotational mechanism 9 which rotates the permanent magnet unit M; and a rotation number control apparatus 7 which gradually changes the number of rotations of the permanent magnet unit M rotated by the rotational mechanism 9. The rotation number control apparatus 7 has a rotation number setting section 702b for setting the number of rotations to be switched, a switching time setting section 702a for setting the time for switching, a detection section 703 for detecting the switching time, a selecting section 704 for selecting the number of rotations at the switching time, and a switching section 705 for outputting an instruction of switching to the selected number of rotations.

    摘要翻译： 为了提供一种溅射装置和方法，以及溅射控制程序，它们被简单地配置并且可以确保从使用目标的开始到结束的膜厚度的均匀性。 提供：设置为面对待处理物体19的目标15; 永磁体单元M，其通过磁场产生高密度等离子体，并将靶15的材料以膜的形式沉积在待处理物体上; 使永久磁铁单元M旋转的旋转机构9; 以及旋转数控制装置7，其逐渐改变由旋转机构9旋转的永磁体单元M的转数。 旋转数控制装置7具有用于设定要切换的转数的转速设定部702b，切换时刻的切换时刻设定部702a，切换时刻检测部703的选择 用于选择切换时间的转数的部分704，以及用于输出切换到所选择的转数的指令的切换部分705。

    SOLAR CELL AND METHOD FOR MANUFACTURING THE SAME
    7.
    发明申请
    SOLAR CELL AND METHOD FOR MANUFACTURING THE SAME 审中-公开
    太阳能电池及其制造方法

    公开(公告)号：US20110120553A1

    公开(公告)日：2011-05-26

    申请号：US13001755

    申请日：2009-07-03

    申请人： Miwa Watai ,  Kazuya Saito ,  Takashi Komatsu ,  Susumu Sakio ,  Masafumi Wakai ,  Shunji Kuroiwa

    发明人： Miwa Watai ,  Kazuya Saito ,  Takashi Komatsu ,  Susumu Sakio ,  Masafumi Wakai ,  Shunji Kuroiwa

    IPC分类号： H01L31/0224 ,  H01L31/18

    CPC分类号： H01L31/075 ,  H01L31/03762 ,  H01L31/046 ,  H01L31/0463 ,  H01L31/0465 ,  Y02E10/548

    摘要： A method for manufacturing a solar cell, includes a scribing step in which grooves electrically-separating a photoelectric converter into a plurality of compartment sections are formed after the photoelectric converter is formed on a substrate by stacking a first-electrode layer, a photoelectric conversion layer, and a second-electrode layer in this order; a first groove, a second groove, a third groove, and a fourth groove are formed in the scribing step; the method including an insulating-layer forming step in which an insulating layer is formed after the scribing step and a wiring layer forming step in which a wiring layer is formed; the wiring layer passes from the first-electrode layer that is exposed at a bottom face of the second groove, through the inside of the second groove and a surface of the insulating layer, to a surface of the second-electrode layer that is disposed so as to be lateral to the fourth groove opposite to the second groove; and the wiring layer electrically connects the plurality of compartment sections to each other.

    摘要翻译： 一种太阳能电池的制造方法，其特征在于，在将所述光电转换器形成在基板上之后，通过层叠第一电极层，光电转换层 ，和第二电极层。 在划线步骤中形成第一槽，第二槽，第三槽和第四槽; 该方法包括在划线步骤之后形成绝缘层的绝缘层形成步骤和其中形成布线层的布线层形成步骤; 布线层从第二沟槽的底面露出的第一电极层通过第二沟槽的内部和绝缘层的表面通过到设置在第二沟槽的第二电极层的表面上 作为与第二凹槽相对的第四凹槽的横向; 并且所述布线层将所述多个隔室部彼此电连接。

    Sputtering apparatus and method, and sputtering control program
    8.
    发明授权
    Sputtering apparatus and method, and sputtering control program 失效
    溅射装置和方法以及溅射控制程序

    公开(公告)号：US07935232B2

    公开(公告)日：2011-05-03

    申请号：US11628138

    申请日：2005-06-13

    申请人： Shunji Kuroiwa

    发明人： Shunji Kuroiwa

    IPC分类号： C23C14/35

    CPC分类号： C23C14/35 ,  C23C14/358 ,  C23C14/54 ,  C23C14/542

    摘要： To provide a sputtering apparatus and method, and a sputtering control program which are configured simply and can secure the uniformity of the film thickness from the beginning to the end of the use of a target.There are provided: a target 15 disposed so as to face an object to be treated 19; a permanent magnet unit M which generates a high-density plasma by means of a magnetic field and deposits a material of the target 15 on the object to be treated, in the form of a film; a rotational mechanism 9 which rotates the permanent magnet unit M; and a rotation number control apparatus 7 which gradually changes the number of rotations of the permanent magnet unit M rotated by the rotational mechanism 9. The rotation number control apparatus 7 has a rotation number setting section 702b for setting the number of rotations to be switched, a switching time setting section 702a for setting the time for switching, a detection section 703 for detecting the switching time, a selecting section 704 for selecting the number of rotations at the switching time, and a switching section 705 for outputting an instruction of switching to the selected number of rotations.

    摘要翻译： 为了提供一种溅射装置和方法，以及溅射控制程序，它们被简单地配置并且可以确保从使用目标的开始到结束的膜厚度的均匀性。 提供：设置为面对待处理物体19的目标15; 永磁体单元M，其通过磁场产生高密度等离子体，并将靶15的材料以膜的形式沉积在待处理物体上; 使永久磁铁单元M旋转的旋转机构9; 以及旋转数控制装置7，其逐渐改变由旋转机构9旋转的永磁体单元M的转数。转数控制装置7具有用于设定要切换的转数的旋转数设定部702b， 用于设置切换时间的切换时间设定部分702a，用于检测切换时间的检测部分703，用于选择切换时间的旋转数的选择部分704以及用于输出切换指令的切换部分705 所选择的转数。