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公开(公告)号：US06921615B2
公开(公告)日：2005-07-26
申请号：US09907512
申请日：2001-07-16
CPC分类号： B29C35/0888 , B29C37/0053 , B29C43/003 , B29C43/021 , B29C2035/0827 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/00 , Y10S101/36 , Y10T428/24802
摘要： A method of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed on both the template and substrate. The alignment may be determined and corrected for before the layer is processed.
摘要翻译： 描述了在压印光刻工艺期间确定和校正对准的方法。 在压印光刻工艺期间，模板可以通过使用设置在模板和衬底上的对准标记与衬底对准。 可以在层被处理之前确定和校正对准。
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2.发明授权Dual wavelength method of determining a relative position of a substrate and a template 失效确定衬底和模板的相对位置的双波长方法公开(公告)号：US06902853B2
公开(公告)日：2005-06-07
申请号：US10843195
申请日：2004-05-11
CPC分类号： B29C35/0888 , B29C37/0053 , B29C43/003 , B29C43/021 , B29C2035/0827 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/00 , Y10S101/36 , Y10T428/24802
摘要： The present invention includes a method of determining a relative position of a substrate and a template spaced-apart therefrom, the substrate having substrate alignment marks disposed thereon and the template having template alignment marks disposed thereon, the method including, impinging first and second fluxes of light upon the substrate and template alignment marks, with the substrate and template alignment marks being responsive to the first flux of light defining a first response, and being responsive to the second flux of light defining a second response differing from the first response; and processing the first and second responses to form a focused image of the substrate and template alignment marks on a common plane, with the focused image indicating the relative position of the substrate and the template.
摘要翻译： 本发明包括一种确定基板与其间隔开的模板的相对位置的方法，该基板具有设置在其上的基板对准标记，该模板具有设置在其上的模板对准标记，该方法包括：将第一和第二通量 照亮基板和模板对准标记，其中基板和模板对准标记响应于限定第一响应的第一光束，并且响应于限定与第一响应不同的第二响应的第二光束响应; 以及处理第一和第二响应以在公共平面上形成基板和模板对准标记的聚焦图像，聚焦图像指示基板和模板的相对位置。
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公开(公告)号：US07060324B2
公开(公告)日：2006-06-13
申请号：US10755918
申请日：2004-01-13
申请人： Todd Bailey , Byung J. Choi , Matthew Colburn , Sidlgata V. Sreenivasan , C. Grant Willson , John Ekerdt
发明人： Todd Bailey , Byung J. Choi , Matthew Colburn , Sidlgata V. Sreenivasan , C. Grant Willson , John Ekerdt
IPC分类号： B05D1/32
CPC分类号： G11B5/855 , B29C35/0888 , B29C37/0053 , B29C43/003 , B29C2035/0827 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/00 , Y10S977/887
摘要： The present invention includes a method of moving a liquid between a substrate extending in a first plane and a template extending in a second plane. More specifically, the method may include forming an oblique angle between the first plane and the second plane, reducing a distance between the substrate and the template such that the template is in contact with a portion of the liquid at a desired location, and creating a dispersion of the liquid away from the desired location.
摘要翻译： 本发明包括一种在第一平面中延伸的基板和在第二平面中延伸的模板之间移动液体的方法。 更具体地，该方法可以包括在第一平面和第二平面之间形成倾斜角度，减小基板和模板之间的距离，使得模板在期望位置与液体的一部分接触，并且产生 液体离开所需位置分散。
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公开(公告)号：US06842229B2
公开(公告)日：2005-01-11
申请号：US10747795
申请日：2003-12-29
CPC分类号： B29C35/0888 , B29C37/0053 , B29C43/003 , B29C43/021 , B29C2035/0827 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/00 , Y10S101/36 , Y10T428/24802
摘要： A system of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed on both the template and substrate. The alignment may be determined and corrected for before the layer is processed.
摘要翻译： 描述了在压印光刻工艺期间确定和校正对准的系统。 在压印光刻工艺期间，模板可以通过使用设置在模板和衬底上的对准标记与衬底对准。 可以在层被处理之前确定和校正对准。
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5.发明授权公开(公告)号：US06986975B2
公开(公告)日：2006-01-17
申请号：US10818099
申请日：2004-04-05
IPC分类号： G03F9/00
CPC分类号： B29C35/0888 , B29C37/0053 , B29C43/003 , B29C43/021 , B29C2035/0827 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/00 , Y10S101/36 , Y10T428/24802
摘要： The present invention includes a method of determining an alignment between a substrate and a template spaced-apart from the substrate and having a distance defined therebetween, the substrate having a first pattern disposed thereon and the template having a second pattern disposed thereon, the method including, sensing the first and the second pattern, with the distance being established such that the first and the second pattern form a desired moiré pattern when the template and the substrate are in a desired spatial relationship.
摘要翻译： 本发明包括一种确定衬底和与衬底间隔开的并具有在其间限定的距离的模板之间的对准的方法，所述衬底具有设置在其上的第一图案，并且所述模板具有设置在其上的第二图案，所述方法包括 感测第一和第二图案，其中建立距离使得当模板和衬底处于期望的空间关系时，第一和第二图案形成期望的莫尔图案。
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6.发明授权Method of varying template dimensions to achieve alignment during imprint lithography 有权在压印光刻期间改变模板尺寸以实现对准的方法公开(公告)号：US06916585B2
公开(公告)日：2005-07-12
申请号：US10446192
申请日：2003-05-27
CPC分类号： B29C35/0888 , B29C37/0053 , B29C43/003 , B29C43/021 , B29C2035/0827 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/00 , Y10S101/36 , Y10T428/24802
摘要： A method of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed on both the template and substrate. The alignment may be determined and corrected for before the layer is processed.
摘要翻译： 描述了在压印光刻工艺期间确定和校正对准的方法。 在压印光刻工艺期间，模板可以通过使用设置在模板和衬底上的对准标记与衬底对准。 可以在层被处理之前确定和校正对准。
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7.发明授权System for determining characteristics of substrates employing fluid geometries 有权用于确定采用流体几何形状的基板特性的系统公开(公告)号：US07036389B2
公开(公告)日：2006-05-02
申请号：US10863800
申请日：2004-06-08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： The present invention provides a system for determining characteristics of substrates, such as the presence of contaminants, shape, as well as the spatial relationships between spaced-apart substrates. The spatial relationships include distance and angular orientation between first and second spaced apart substrates.
摘要翻译： 本发明提供一种用于确定衬底特性的系统，例如污染物的存在，形状以及间隔开的衬底之间的空间关系。 空间关系包括第一和第二间隔开的基底之间的距离和角度取向。
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公开(公告)号：US20110221095A1
公开(公告)日：2011-09-15
申请号：US13108614
申请日：2011-05-16
申请人： Sidlgata V. Sreenivasan , Byung J. Choi , Norman E. Schumaker , Ronald D. Voisin , Michael P. C. Watts , Mario J. Meissl
发明人： Sidlgata V. Sreenivasan , Byung J. Choi , Norman E. Schumaker , Ronald D. Voisin , Michael P. C. Watts , Mario J. Meissl
CPC分类号： B81C1/0046 , B82Y10/00 , B82Y30/00 , B82Y40/00 , G03F7/0002
摘要： The present invention is directed to methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. In one embodiment, the imprint process is designed to imprint only a portion of the substrate. The remainder of the substrate is imprinted by moving the template to a different portion of the template and repeating the imprint lithography process.
摘要翻译： 本发明涉及通过压印光刻图案化衬底的方法。 压印光刻是将液体分配到基板上的过程。 使模板与液体接触并且液体被固化。 固化液体包括在模板中形成的任何图案的印记。 在一个实施例中，压印工艺被设计成仅印刷基板的一部分。 通过将模板移动到模板的不同部分并重复压印光刻工艺来印刷衬底的其余部分。
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公开(公告)号：US08016277B2
公开(公告)日：2011-09-13
申请号：US09934248
申请日：2001-08-21
IPC分类号： B23Q1/25
CPC分类号： B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/707 , G03F7/70716 , G03F7/70758 , H01L21/682
摘要： Described are flexure-based high precision positioning stages. The stages are constrained to motion along each axis by a system of symmetrical flexure linkages. The linkages may be formed of link coupled by flexure joints. Magnetic linear servomotors may provide motive force for the stages. In some embodiments, the stages may have no frictional contact joints.
摘要翻译： 描述了基于挠性的高精度定位阶段。 这些阶段被约束为通过对称挠曲联动系统沿着每个轴的运动。 连杆可以由通过挠性接头联接的连杆形成。 磁性线性伺服电机可能为阶段提供动力。 在一些实施例中，所述台阶可以不具有摩擦接触接头。
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公开(公告)号：US07077992B2
公开(公告)日：2006-07-18
申请号：US10194991
申请日：2002-07-11
申请人： Sidlgata V. Sreenivasan , Byung J. Choi , Norman E. Schumaker , Ronald D. Voisin , Michael P. C. Watts , Mario J. Meissl
发明人： Sidlgata V. Sreenivasan , Byung J. Choi , Norman E. Schumaker , Ronald D. Voisin , Michael P. C. Watts , Mario J. Meissl
CPC分类号： B81C1/0046 , B82Y10/00 , B82Y30/00 , B82Y40/00 , G03F7/0002
摘要： The present invention is directed to methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. In one embodiment, the imprint process is designed to imprint only a portion of the substrate. The remainder of the substrate is imprinted by moving the template to a different portion of the template and repeating the imprint lithography process.
摘要翻译： 本发明涉及通过压印光刻图案化衬底的方法。 压印光刻是将液体分配到基板上的过程。 使模板与液体接触并且液体被固化。 固化液体包括在模板中形成的任何图案的印记。 在一个实施例中，压印工艺被设计成仅印刷基板的一部分。 通过将模板移动到模板的不同部分并重复压印光刻工艺来印刷衬底的其余部分。
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