-
公开(公告)号：US20110221095A1
公开(公告)日：2011-09-15
申请号：US13108614
申请日：2011-05-16
申请人： Sidlgata V. Sreenivasan , Byung J. Choi , Norman E. Schumaker , Ronald D. Voisin , Michael P. C. Watts , Mario J. Meissl
发明人： Sidlgata V. Sreenivasan , Byung J. Choi , Norman E. Schumaker , Ronald D. Voisin , Michael P. C. Watts , Mario J. Meissl
CPC分类号： B81C1/0046 , B82Y10/00 , B82Y30/00 , B82Y40/00 , G03F7/0002
摘要： The present invention is directed to methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. In one embodiment, the imprint process is designed to imprint only a portion of the substrate. The remainder of the substrate is imprinted by moving the template to a different portion of the template and repeating the imprint lithography process.
摘要翻译： 本发明涉及通过压印光刻图案化衬底的方法。 压印光刻是将液体分配到基板上的过程。 使模板与液体接触并且液体被固化。 固化液体包括在模板中形成的任何图案的印记。 在一个实施例中，压印工艺被设计成仅印刷基板的一部分。 通过将模板移动到模板的不同部分并重复压印光刻工艺来印刷衬底的其余部分。
-
公开(公告)号：US07077992B2
公开(公告)日：2006-07-18
申请号：US10194991
申请日：2002-07-11
申请人： Sidlgata V. Sreenivasan , Byung J. Choi , Norman E. Schumaker , Ronald D. Voisin , Michael P. C. Watts , Mario J. Meissl
发明人： Sidlgata V. Sreenivasan , Byung J. Choi , Norman E. Schumaker , Ronald D. Voisin , Michael P. C. Watts , Mario J. Meissl
CPC分类号： B81C1/0046 , B82Y10/00 , B82Y30/00 , B82Y40/00 , G03F7/0002
摘要： The present invention is directed to methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. In one embodiment, the imprint process is designed to imprint only a portion of the substrate. The remainder of the substrate is imprinted by moving the template to a different portion of the template and repeating the imprint lithography process.
摘要翻译： 本发明涉及通过压印光刻图案化衬底的方法。 压印光刻是将液体分配到基板上的过程。 使模板与液体接触并且液体被固化。 固化液体包括在模板中形成的任何图案的印记。 在一个实施例中，压印工艺被设计成仅印刷基板的一部分。 通过将模板移动到模板的不同部分并重复压印光刻工艺来印刷衬底的其余部分。
-
公开(公告)号：US07727453B2
公开(公告)日：2010-06-01
申请号：US11127041
申请日：2005-05-11
申请人： Sidlgata V. Sreenivasan , Byung J. Choi , Norman E. Schumaker , Ronald D. Voisin , Michael P. C. Watts , Mario J. Meissl
发明人： Sidlgata V. Sreenivasan , Byung J. Choi , Norman E. Schumaker , Ronald D. Voisin , Michael P. C. Watts , Mario J. Meissl
CPC分类号： B81C1/0046 , B82Y10/00 , B82Y30/00 , B82Y40/00 , G03F7/0002
摘要： The present invention is directed to a method of forming a layer on a region of a substrate, the method including, inter alia, positioning a liquid on the substrate; and contacting the liquid with the mold, defining a gap between the mold and the substrate, with the gap enabling positioning of the liquid by capillary forces to generate the layer over the region.
摘要翻译： 本发明涉及一种在衬底的区域上形成层的方法，该方法尤其包括将液体定位在衬底上; 并且使液体与模具接触，从而在模具和衬底之间形成间隙，间隙使得能够通过毛细管力定位液体以在该区域上产生层。
-
公开(公告)号：US06982783B2
公开(公告)日：2006-01-03
申请号：US10864591
申请日：2004-06-09
申请人： Byung J. Choi , Ronald D. Voisin , Sidlgata V. Sreenivasan , Michael P. C. Watts , Daniel Babbs , Mario J. Meissl , Hillman Bailey , Norman E. Schumaker
发明人： Byung J. Choi , Ronald D. Voisin , Sidlgata V. Sreenivasan , Michael P. C. Watts , Daniel Babbs , Mario J. Meissl , Hillman Bailey , Norman E. Schumaker
CPC分类号： G03F7/70875 , B29C33/20 , B29C43/003 , B29C43/021 , B29C43/36 , B29C43/58 , B29C2043/025 , B29C2043/3233 , B29C2043/3488 , B29C2043/5841 , B29D11/00365 , G03B27/62 , G03F7/707
摘要： The present invention is directed to a chucking system to modulate substrates so as to properly shape and position the same with respect to a wafer upon which a pattern is to be formed with the substrate.
摘要翻译： 本发明涉及一种夹持系统，用于调制基板，以便相对于其上将与基底形成图案的晶片适当地成形和定位基板。
-
公开(公告)号：US07019819B2
公开(公告)日：2006-03-28
申请号：US10293224
申请日：2002-11-13
申请人： Byung J. Choi , Ronald D. Voisin , Sidlgata V. Sreenivasan , Michael P. C. Watts , Daniel Babbs , Mario J. Meissl , Hillman Bailey , Norman E. Schumaker
发明人： Byung J. Choi , Ronald D. Voisin , Sidlgata V. Sreenivasan , Michael P. C. Watts , Daniel Babbs , Mario J. Meissl , Hillman Bailey , Norman E. Schumaker
IPC分类号： G03B27/62 , G03B27/42 , G03B27/60 , H01L21/4763
CPC分类号： G03F7/70875 , B29C33/20 , B29C43/003 , B29C43/021 , B29C43/36 , B29C43/58 , B29C2043/025 , B29C2043/3233 , B29C2043/3488 , B29C2043/5841 , B29D11/00365 , G03B27/62 , G03F7/707
摘要： The present invention is directed to a chucking system to modulate substrates so as to properly shape and position the same with respect to a wafer upon which a pattern is to be formed with the substrate. The chucking system includes a chuck body having first and second opposed sides. A side surface extends therebetween. The first side includes first and second spaced-apart recesses defining first and second spaced-apart support regions. The first support region cinctures the second support region and the first and second recesses. The second support region cinctures the second recess, with a portion of the body in superimposition with the second recess being transparent to radiation having a predetermined wavelength. The second side and the side surface define exterior surfaces. The body includes throughways placing the first and second recesses in fluid communication with one of the exterior surfaces.
摘要翻译： 本发明涉及一种夹持系统，用于调制基板，以便相对于其上将与基底形成图案的晶片适当地成形和定位基板。 夹持系统包括具有第一和第二相对侧的卡盘体。 侧面在其间延伸。 第一侧包括限定第一和第二间隔开的支撑区域的第一和第二间隔开的凹部。 第一支撑区域使第二支撑区域和第一和第二凹槽成像。 第二支撑区域使第二凹部成像，其中身体的与第二凹部重叠的部分对于具有预定波长的辐射是透明的。 第二面和侧面限定外表面。 主体包括使第一和第二凹槽与外表面之一流体连通的通道。
-
公开(公告)号：US06980282B2
公开(公告)日：2005-12-27
申请号：US10316963
申请日：2002-12-11
申请人： Byung J. Choi , Ronald D. Voisin , Sidlgata V. Sreenivasan , Michael P. C. Watts , C. Grant Willson , Norman E. Schumaker , Mario J. Meissl
发明人： Byung J. Choi , Ronald D. Voisin , Sidlgata V. Sreenivasan , Michael P. C. Watts , C. Grant Willson , Norman E. Schumaker , Mario J. Meissl
IPC分类号： G03F7/20 , G03B27/58 , G03B27/60 , G03B27/62 , H01L21/302
CPC分类号： G03F7/707 , G03F7/70875
摘要： The present invention is directed to a method for modulating shapes of a substrate, having first and second opposed surfaces. This is achieved by creating a pressure differential between differing regions of the first opposed surface to attenuate structural distortions in the second opposed surface that results from external forces bearing on the substrate.
摘要翻译： 本发明涉及一种用于调制具有第一和第二相对表面的基底的形状的方法。 这是通过在第一相对表面的不同区域之间产生压差来减少第二相对表面中由轴承在基底上的外力产生的结构变形来实现的。
-
公开(公告)号：US06900881B2
公开(公告)日：2005-05-31
申请号：US10194414
申请日：2002-07-11
申请人： Sidlgata V. Sreenivasan , Michael P. C. Watts , Byung Jin Choi , Mario J. Meissl , Norman E. Schumaker , Ronald D. Voisin
发明人： Sidlgata V. Sreenivasan , Michael P. C. Watts , Byung Jin Choi , Mario J. Meissl , Norman E. Schumaker , Ronald D. Voisin
CPC分类号： B82Y10/00 , B29C35/0888 , B29C59/022 , B29C2035/0827 , B29C2059/023 , B81C1/0046 , B82Y40/00 , G03F7/0002 , H01L21/0271
摘要： Described are systems for patterning a substrate by imprint lithography. Imprint lithography systems include an imprint head configured to hold a template in a spaced relation to a substrate. The imprint lithography system is configured to dispense an activating light curable liquid onto a substrate or template. The system includes a light source that applies activating light to cure the activating light curable liquid.
摘要翻译： 描述的是通过压印光刻来图案化衬底的系统。 压印光刻系统包括压印头，其被配置为将模板保持为与衬底间隔开的关系。 压印光刻系统被配置为将激活光可固化液体分配到基底或模板上。 该系统包括施加激活光以固化活化光可固化液体的光源。
-
8.发明授权Imprint lithography substrate processing tool for modulating shapes of substrates 有权用于调制基板形状的压印光刻基板处理工具公开(公告)号：US07224443B2
公开(公告)日：2007-05-29
申请号：US11389731
申请日：2006-03-27
申请人： Byung-Jin Choi , Ronald D. Voisin , Sidlgata V. Sreenivasan , Michael P. C. Watts , Daniel A. Babbs , Mario J. Meissl , Hillman L. Bailey , Norman E. Schumaker
发明人： Byung-Jin Choi , Ronald D. Voisin , Sidlgata V. Sreenivasan , Michael P. C. Watts , Daniel A. Babbs , Mario J. Meissl , Hillman L. Bailey , Norman E. Schumaker
IPC分类号： G03B27/62 , G03B27/42 , G03B27/60 , H01L21/4763
CPC分类号： G03F7/70875 , B29C33/20 , B29C43/003 , B29C43/021 , B29C43/36 , B29C43/58 , B29C2043/025 , B29C2043/3233 , B29C2043/3488 , B29C2043/5841 , B29D11/00365 , G03B27/62 , G03F7/707
摘要： The present invention is directed to a chucking system to modulate substrates so as to properly shape and position the same with respect to a wafer upon which a pattern is to be formed with the substrate. The chucking system includes a chuck body having first and second opposed sides. A side surface extends therebetween. The first side includes first and second spaced-apart recesses defining first and second spaced-apart support regions. The first support region cinctures the second support region and the first and second recesses. The second support region cinctures the second recess, with a portion of the body in superimposition with the second recess being transparent to radiation having a predetermined wavelength. The second side and the side surface define exterior surfaces. The body includes throughways placing the first and second recesses in fluid communication with one of the exterior surfaces.
摘要翻译： 本发明涉及一种夹持系统，用于调制基板，以便相对于其上将与基底形成图案的晶片适当地成形和定位基板。 夹持系统包括具有第一和第二相对侧的卡盘体。 侧面在其间延伸。 第一侧包括限定第一和第二间隔开的支撑区域的第一和第二间隔开的凹部。 第一支撑区域使第二支撑区域和第一和第二凹槽成像。 第二支撑区域使第二凹部成像，其中身体的与第二凹部重叠的部分对于具有预定波长的辐射是透明的。 第二面和侧面限定外表面。 主体包括使第一和第二凹槽与外表面之一流体连通的通道。
-
公开(公告)号：US07070405B2
公开(公告)日：2006-07-04
申请号：US10210894
申请日：2002-08-01
申请人： Sidlgata V Sreenivasan , Michael P. C. Watts , Byung Jin Choi , Ronald D. Voisin , Norman E. Schumaker
发明人： Sidlgata V Sreenivasan , Michael P. C. Watts , Byung Jin Choi , Ronald D. Voisin , Norman E. Schumaker
IPC分类号： B32B37/02
CPC分类号： G03F7/0002 , B29C35/0888 , B29C59/02 , B29C59/026 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00
摘要： Described are systems for patterning a substrate by imprint lithography. Imprint lithography systems include an imprint head configured to hold a template in a spaced relation to a substrate. The imprint lithography system is configured to dispense an activating light curable liquid onto a substrate or template. The system includes a light source that applies activating light to cure the activating light curable liquid. Multiple optical imaging devices are used to align the template with the substrate.
摘要翻译： 描述的是通过压印光刻来图案化衬底的系统。 压印光刻系统包括压印头，其被配置为将模板保持为与衬底间隔开的关系。 压印光刻系统被配置为将激活光可固化液体分配到基底或模板上。 该系统包括施加激活光以固化活化光可固化液体的光源。 使用多个光学成像装置将模板与衬底对准。
-
公开(公告)号：US08318066B2
公开(公告)日：2012-11-27
申请号：US13108614
申请日：2011-05-16
申请人： Sidlgata V. Sreenivasan , Byung-Jin Choi , Norman E. Schumaker , Ronald D. Voisin , Michael P. C. Watts , Mario Johannes Meissl
发明人： Sidlgata V. Sreenivasan , Byung-Jin Choi , Norman E. Schumaker , Ronald D. Voisin , Michael P. C. Watts , Mario Johannes Meissl
CPC分类号： B81C1/0046 , B82Y10/00 , B82Y30/00 , B82Y40/00 , G03F7/0002
摘要： The present invention is directed to methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. In one embodiment, the imprint process is designed to imprint only a portion of the substrate. The remainder of the substrate is imprinted by moving the template to a different portion of the template and repeating the imprint lithography process.
摘要翻译： 本发明涉及通过压印光刻对衬底图案化的方法。 压印光刻是将液体分配到基板上的过程。 使模板与液体接触并且液体被固化。 固化液体包括在模板中形成的任何图案的印记。 在一个实施例中，压印工艺被设计成仅印刷基板的一部分。 通过将模板移动到模板的不同部分并重复压印光刻工艺来印刷衬底的其余部分。
-
-
-
-
-
-
-
-
-
搜索结果
46 条记录 (耗时 0.038 秒)
