公开(公告)号：US06596459B1

公开(公告)日：2003-07-22

申请号：US09716269

申请日：2000-11-21

申请人： Hyun-woo Kim ,  Ki-young Kwon ,  Si-hyeung Lee ,  Dong-won Jung ,  Sook Lee ,  Kwang-sub Yoon ,  Sang-jun Choi ,  Sang-gyun Woo

发明人： Hyun-woo Kim ,  Ki-young Kwon ,  Si-hyeung Lee ,  Dong-won Jung ,  Sook Lee ,  Kwang-sub Yoon ,  Sang-jun Choi ,  Sang-gyun Woo

IPC分类号： G03F7004

CPC分类号： G03F7/0395 ,  G03F7/0397

摘要： There are provided a photosensitive polymer and a photoresist compositing containing the same. The photosensitive polymer is represented by the following formula: wherein R1 is an acid-labile tertiary alkyl ester group, R2 is hydrogen atom, methyl, ethyl, carboxyl, &ggr;-butyrolactone-2-yl ester, &ggr;-butyrolactone-3-yl ester, pantolactone-2-yl ester, mevalonic lactone ester, 3-tetrahydrofuranyl ester, 2,3-propylenecarbonate-1-yl ester, 3-methyl-&ggr;-butyrolactone-3-yl ester or C3 to C20 alicyclic hydrocarbon, a/(a+b+c) is 0.1˜0.7, b/(a+b+c) is 0.1˜0.8, c/(a+b+c) is 0.0˜0.8, and n is an integer in the range of 0 to 2.

摘要翻译： 提供光敏聚合物和含有它的光致抗蚀剂复合物。 光敏聚合物由下式表示：其中R1是酸不稳定的叔烷基酯基，R2是氢原子，甲基，乙基，羧基，γ-丁内酯-2-基酯，γ-丁内酯-3-基酯 ，泛酸内酯-2-基酯，甲羟戊酸内酯，3-四氢呋喃基酯，2,3-亚丙基碳酸酯-1-基酯，3-甲基-γ-丁内酯-3-基酯或C 3至C 20脂环族烃，a /（ a + b + c）为0.1〜0.7，b /（a + b + c）为0.1〜0.8，c /（a + b + c）为0.0〜0.8，n为0〜 2。

公开(公告)号：US06642336B1

公开(公告)日：2003-11-04

申请号：US09644101

申请日：2000-08-23

申请人： Sook Lee ,  Ki-young Kwon ,  Si-hyeung Lee ,  Kwang-sub Yoon ,  Hyun-woo Kim ,  Dong-won Jung ,  Sang-jun Choi ,  Sang-gyun Woo

发明人： Sook Lee ,  Ki-young Kwon ,  Si-hyeung Lee ,  Kwang-sub Yoon ,  Hyun-woo Kim ,  Dong-won Jung ,  Sang-jun Choi ,  Sang-gyun Woo

IPC分类号： C08F1000

CPC分类号： G03F7/039 ,  C08G61/08 ,  G03F7/0045

摘要： A photosensitive polymer which maintains transparency even when exposed to a short-wavelength light source of 193 nm or below, exhibits improved adhesiveness to a substrate, improved contrast and improved resistance to dry etching. The photosensitive polymer includes a first monomer which is alicyclic hydrocarbon carboxylate having an acid-labile C6 to C20 tertiary alicyclic hydrocarbon group as a substituent, and a second monomer which is capable of free radical polymerization.

摘要翻译： 即使暴露于193nm以下的短波长光源也能够保持透明性的光敏性聚合物表现出改善的对基材的粘合性，改善的对比度和改善的耐干蚀刻性。 感光性高分子包括具有酸不稳定性C6〜C20叔脂环族烃基作为取代基的脂环式羧酸酯的第一单体和能够进行自由基聚合的第二单体。

公开(公告)号：US07241552B2

公开(公告)日：2007-07-10

申请号：US10909384

申请日：2004-08-03

申请人： Kwang-sub Yoon ,  Dong-won Jung ,  Si-hyeung Lee ,  Hyun-woo Kim ,  Sook Lee ,  Sang-gyun Woo ,  Sang-jun Choi

发明人： Kwang-sub Yoon ,  Dong-won Jung ,  Si-hyeung Lee ,  Hyun-woo Kim ,  Sook Lee ,  Sang-gyun Woo ,  Sang-jun Choi

IPC分类号： G03F7/004

CPC分类号： G03F7/0395 ,  G03F7/0392 ,  G03F7/0397 ,  Y10S430/106

摘要： A resist composition includes a photoacid generator (PAG) and a photosensitive polymer. The photosensitive polymer is polymerized with (a) at least one of the monomers having the respective formulae: where R1 and R2 are independently a hydrogen atom, alkyl, hydroxyalkyl, alkyloxy, carbonyl or ester, and x and y are independently integers from 1 to 6, and (b) at least one of a (meth)acrylate monomer, a maleic anhydride monomer, and a norbornene monomer.

摘要翻译： 抗蚀剂组合物包括光致酸产生剂（PAG）和光敏聚合物。 光敏聚合物与（a）至少一种具有以下各式的单体聚合：其中R 1和R 2独立地为氢原子，烷基，羟基烷基，烷氧基，羰基或酯，x和y独立地为1至 6，和（b）至少一种（甲基）丙烯酸酯单体，马来酸酐单体和降冰片烯单体。

公开(公告)号：US20050008975A1

公开(公告)日：2005-01-13

申请号：US10909384

申请日：2004-08-03

申请人： Kwang-sub Yoon ,  Dong-won Jung ,  Si-hyeung Lee ,  Hyun-woo Kim ,  Sook Lee ,  Sang-gyun Woo ,  Sang-jun Choi

发明人： Kwang-sub Yoon ,  Dong-won Jung ,  Si-hyeung Lee ,  Hyun-woo Kim ,  Sook Lee ,  Sang-gyun Woo ,  Sang-jun Choi

IPC分类号： C08F220/18 ,  C08F222/06 ,  C08F232/04 ,  C08F234/02 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027 ,  G03C1/76

CPC分类号： G03F7/0395 ,  G03F7/0392 ,  G03F7/0397 ,  Y10S430/106

摘要： A resist composition includes a photoacid generator (PAG) and a photosensitive polymer. The photosensitive polymer is polymerized with (a) at least one of the monomers having the respective formulae: where R1 and R2 are independently a hydrogen atom, alkyl, hydroxyalkyl, alkyloxy, carbonyl or ester, and x and y are independently integers from 1 to 6, and (b) at least one of a (meth)acrylate monomer, a maleic anhydride monomer, and a norbornene monomer.

摘要翻译： 抗蚀剂组合物包括光致酸产生剂（PAG）和光敏聚合物。 光敏聚合物与（a）至少一种具有以下各式的单体聚合：其中R 1和R 2独立地为氢原子，烷基，羟基烷基，烷氧基，羰基或酯，x和y独立地为1至 6，和（b）至少一种（甲基）丙烯酸酯单体，马来酸酐单体和降冰片烯单体。

公开(公告)号：US07045267B2

公开(公告)日：2006-05-16

申请号：US10349917

申请日：2003-01-24

申请人： Kwang-sub Yoon ,  Dong-won Jung ,  Si-hyeung Lee ,  Hyun-woo Kim ,  Sook Lee ,  Sang-gyun Woo ,  Sang-jun Choi

发明人： Kwang-sub Yoon ,  Dong-won Jung ,  Si-hyeung Lee ,  Hyun-woo Kim ,  Sook Lee ,  Sang-gyun Woo ,  Sang-jun Choi

IPC分类号： G03F7/038 ,  C07D307/00

CPC分类号： G03F7/0395 ,  G03F7/0392 ,  G03F7/0397 ,  Y10S430/106

摘要： This invention is directed to a coating composition used for original equipment manufacturing or refinishing uses in the automotive industry, which coating composition utilizes an acrylic polymer which contains substituted or unsubstituted exomethylene lactones or lactams as a comonomer.

摘要翻译： 本发明涉及用于汽车工业的原始设备制造或修补用途的涂料组合物，该涂料组合物使用含有取代或未取代的异亚丙基内酯或内酰胺作为共聚单体的丙烯酸类聚合物。

公开(公告)号：US06537727B2

公开(公告)日：2003-03-25

申请号：US09901569

申请日：2001-07-11

申请人： Kwang-sub Yoon ,  Dong-won Jung ,  Si-hyeung Lee ,  Hyun-woo Kim ,  Sook Lee ,  Sang-gyun Woo ,  Sang-jun Choi

发明人： Kwang-sub Yoon ,  Dong-won Jung ,  Si-hyeung Lee ,  Hyun-woo Kim ,  Sook Lee ,  Sang-gyun Woo ,  Sang-jun Choi

IPC分类号： G03F7038

CPC分类号： G03F7/0395 ,  G03F7/0392 ,  G03F7/0397 ,  Y10S430/106

摘要： A resist composition includes a photosensitive polymer having a lactone in its backbone. The photosensitive polymer of the resist composition includes at least one of the monomers having the formulae: where R1 and R2 are independently a hydrogen atom, alkyl, hydroxyalkyl, alkyloxy, carbonyl or ester, and x, y, v and w are independently integers from 1 to 6.

摘要翻译： 抗蚀剂组合物包括在其主链中具有内酯的光敏聚合物。 抗蚀剂组合物的光敏聚合物包含至少一种具有下式的单体：其中R 1和R 2独立地为氢原子，烷基，羟烷基，烷氧基，羰基或酯，x，y，v和w独立地为 1〜6。

公开(公告)号：US06893793B2

公开(公告)日：2005-05-17

申请号：US10383770

申请日：2003-03-10

申请人： Dong-won Jung ,  Sang-jun Choi ,  Si-hyeung Lee ,  Sook Lee

发明人： Dong-won Jung ,  Sang-jun Choi ,  Si-hyeung Lee ,  Sook Lee

IPC分类号： C08F220/18 ,  C08F222/06 ,  C08F232/04 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027

CPC分类号： G03F7/0395 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/115 ,  Y10S430/122

摘要： The photosensitive polymer includes a first monomer which is norbornene ester having C1 to C12 aliphatic alcohol as a substituent, and a second monomer which is maleic anhydride. A chemically amplified photoresist composition, containing the photosensitive polymer, has an improved etching resistance and adhesion to underlying layer materials, and exhibits wettability to developing solutions.

摘要翻译： 感光性高分子包含作为取代基具有C 1〜C 12脂肪族醇的降冰片烯的第一单体和作为马来酸酐的第二单体。 含有光敏聚合物的化学放大光致抗蚀剂组合物具有改进的抗蚀刻性和对下层材料的粘附性，并且显示出对显影液的润湿性。

公开(公告)号：US06593441B2

公开(公告)日：2003-07-15

申请号：US10218637

申请日：2002-08-15

申请人： Dong-won Jung ,  Sang-jun Choi ,  Si-hyeung Lee ,  Sook Lee

发明人： Dong-won Jung ,  Sang-jun Choi ,  Si-hyeung Lee ,  Sook Lee

IPC分类号： C08F3600

CPC分类号： G03F7/0395 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/115 ,  Y10S430/122

摘要： The photosensitive polymer includes a first monomer which is norbornene ester having C1 to C12 aliphatic alcohol as a substituent, and a second monomer which is maleic anhydride. A chemically amplified photoresist composition, containing the photosensitive polymer, has an improved etching resistance and adhesion to underlying layer materials, and exhibits wettability to developing solutions.

公开(公告)号：US07084227B2

公开(公告)日：2006-08-01

申请号：US10925983

申请日：2004-08-26

申请人： Dong-won Jung ,  Sang-jun Choi ,  Si-hyeung Lee ,  Sook Lee

发明人： Dong-won Jung ,  Sang-jun Choi ,  Si-hyeung Lee ,  Sook Lee

IPC分类号： C08F10/00

CPC分类号： G03F7/0395

摘要： The photosensitive polymer includes a first monomer which is norbornene ester having C1 to C12 aliphatic alcohol as a substituent, and a second monomer which is maleic anhydride. A chemically amplified photoresist composition, containing the photosensitive polymer, has an improved etching resistance and adhesion to underlying layer materials, and exhibits wettability to developing solutions.

摘要翻译： 感光性高分子包含作为取代基具有C 1〜C 12脂肪族醇的降冰片烯的第一单体和作为马来酸酐的第二单体。 含有光敏聚合物的化学放大光致抗蚀剂组合物具有改善的抗蚀刻性和对下层材料的粘附性，并且显示出对显影溶液的润湿性。

公开(公告)号：US20050019693A1

公开(公告)日：2005-01-27

申请号：US10925983

申请日：2004-08-26

申请人： Dong-won Jung ,  Sang-jun Choi ,  Si-hyeung Lee ,  Sook Lee

发明人： Dong-won Jung ,  Sang-jun Choi ,  Si-hyeung Lee ,  Sook Lee

IPC分类号： G03F7/039 ,  G03C1/76

CPC分类号： G03F7/0395

摘要： The photosensitive polymer includes a first monomer which is norbornene ester having C1 to C12 aliphatic alcohol as a substituent, and a second monomer which is maleic anhydride. A chemically amplified photoresist composition, containing the photosensitive polymer, has an improved etching resistance and adhesion to underlying layer materials, and exhibits wettability to developing solutions.

摘要翻译： 感光性高分子包含作为取代基具有C1〜C12脂肪族醇的降冰片酯的第一单体和作为马来酸酐的第二单体。 含有光敏聚合物的化学放大光致抗蚀剂组合物具有改进的抗蚀刻性和对下层材料的粘附性，并且显示出对显影液的润湿性。