公开(公告)号：US09054146B2

公开(公告)日：2015-06-09

申请号：US12298972

申请日：2007-05-01

申请人： Soon-Im Wi

发明人： Soon-Im Wi

IPC分类号： H01L21/677 ,  H01L21/687 ,  H01L21/67

CPC分类号： H01L21/67742 ,  H01L21/67196 ,  H01L21/67745 ,  H01L21/68707 ,  Y10S414/139 ,  Y10S414/141 ,  Y10S901/30

摘要： There are provided a substrate transferring apparatus for continuously loading/unloading a plurality of substrates in and from a process chamber to reduce time spent on transferring the substrates and to improve productivity and a substrate processing system using the same. The substrate transfer apparatus is installed in the transfer chamber and transfers substrates between first and second process chambers which is positioned lateral sides of the transfer chamber and a load rock chamber. The substrate transfer apparatus includes a driving unit to supply a rotational force, a spindle connected to the driving unit, first swivel plate arms to load/unload substrate to/from first process chamber, and second swivel plate arms to load/unload substrate to/from second process chamber. Since substrates before and after being processed are rapidly exchanged during the simultaneous or continuous process of plural substrates, processing rate increases and overall productivity can be increased.

摘要翻译： 提供了一种用于在处理室中和从处理室中连续地加载/卸载多个基板的基板转移装置，以减少用于转移基板的时间并提高生产率以及使用该基板处理系统的基板处理系统。 衬底传送装置安装在传送室中，并且在位于传送室的侧面的第一和第二处理室和负载岩石室之间传送衬底。 基板输送装置包括：提供旋转力的驱动单元，与驱动单元连接的主轴;第一旋转板臂，用于对第一处理室进行加载/卸载;第二旋转板臂，将基板装载到/ 从第二处理室。 由于在多个基板的同时或连续的过程中快速更换处理前后的基板，因此加工速度提高，总体生产率提高。

公开(公告)号：US07477022B2

公开(公告)日：2009-01-13

申请号：US11339845

申请日：2006-01-26

申请人： Soon-Im Wi ,  Sang-Don Choi

发明人： Soon-Im Wi ,  Sang-Don Choi

IPC分类号： H05B41/16

CPC分类号： H05B41/2822

摘要： A system for driving a multi-lamp, and more particularly to, a system for driving a multi-lamp for driving a parallel arrangement of a plurality of discharge lamps and a method of driving a plurality of discharge lamps and a method thereof. The multi-discharge lamp driving system comprises: a power transformer for producing a positive voltage and a negative voltage upon receipt of an alternative power source from an alternative power supply source; and a current balance distributor for being supplied with the positive voltage produced from said power transformer to divide the supplied positive voltage into a plurality of predetermined voltages, and for applying the divided predetermined voltages to the corresponding electrodes of a plurality of discharge lamps consisting of a lamp array for the purpose of distributing an amount of a current flow so that the distributed current flow inputted into each of the plurality of discharge lamps may keep to make a mutual balance from each other, wherein the negative voltage is commonly applied to second electrodes of the plurality of discharge lamps.

摘要翻译： 一种用于驱动多灯的系统，更具体地涉及用于驱动多个放电灯的并联布置的多灯的系统和驱动多个放电灯的方法及其方法。 多放电灯驱动系统包括：电源变压器，用于在从替代电源接收到替代电源时产生正电压和负电压; 以及电流平衡分配器，其被提供有从所述电力变压器产生的正电压，以将所提供的正电压分成多个预定电压，并且将划分的预定电压施加到由多个放电灯组成的多个放电灯的对应电极 灯阵列，用于分配电流量，使得输入到多个放电灯中的每一个的分布电流可以保持彼此相互平衡，其中负电压通常施加到第二电极的第二电极 多个放电灯。

公开(公告)号：US07285916B2

公开(公告)日：2007-10-23

申请号：US11192414

申请日：2005-07-29

申请人： Soon-Im Wi

发明人： Soon-Im Wi

IPC分类号： H01J7/24

CPC分类号： H01J37/32935 ,  H01J37/32009 ,  H01J37/321 ,  H01J37/32183

摘要： A multi-chamber plasma process system includes a plurality of process chambers, each of which has an inductively coupled plasma generator. The inductively coupled plasma generator is electrically connected to a main power supply through a first impedance matcher. The first impedance matcher has at least one variable inductor. Ignition electrodes of the inductively coupled plasma generators are connected in parallel with an ignition power supply configured as a variable transformer. The variable inductor of the first impedance matcher and the variable transformer of the ignition power supply are controlled by a controller. Each process chamber has a plasma density regulator. Power supply systems, including an ignition power source, a radio frequency (RF) power source, an impedance matcher, etc. can be effectively integrated. As a result, it is possible to decrease the area of facilities and the cost of the system, and to individually control the plasma density of each process chamber. Accordingly, process yield is improved, and productivity of the system is further improved.

摘要翻译： 多室等离子体处理系统包括多个处理室，每个处理室具有电感耦合等离子体发生器。 电感耦合等离子体发生器通过第一阻抗匹配器电连接到主电源。 第一阻抗匹配器具有至少一个可变电感器。 电感耦合等离子体发生器的点火电极与被配置为可变变压器的点火电源并联连接。 第一阻抗匹配器的可变电感器和点火电源的可变变压器由控制器控制。 每个处理室具有等离子体密度调节器。 可以有效地整合包括点火电源，射频（RF）电源，阻抗匹配器等的电源系统。 结果，可以减小设备的面积和系统的成本，并且可以单独地控制每个处理室的等离子体密度。 因此，提高了处理成品率，进一步提高了系统的生产率。

公开(公告)号：US20070012563A1

公开(公告)日：2007-01-18

申请号：US11192414

申请日：2005-07-29

申请人： Soon-Im Wi

发明人： Soon-Im Wi

IPC分类号： C23C14/00

CPC分类号： H01J37/32935 ,  H01J37/32009 ,  H01J37/321 ,  H01J37/32183

摘要： A multi-chamber plasma process system includes a plurality of process chambers, each of which has an inductively coupled plasma generator. The inductively coupled plasma generator is electrically connected to a main power supply through a first impedance matcher. The first impedance matcher has at least one variable inductor. Ignition electrodes of the inductively coupled plasma generators are connected in parallel with an ignition power supply configured as a variable transformer. The variable inductor of the first impedance matcher and the variable transformer of the ignition power supply are controlled by a controller. Each process chamber has a plasma density regulator. Power supply systems, including an ignition power source, a radio frequency (RF) power source, an impedance matcher, etc. can be effectively integrated. As a result, it is possible to decrease the area of facilities and the cost of the system, and to individually control the plasma density of each process chamber. Accordingly, process yield is improved, and productivity of the system is further improved.

公开(公告)号：US08409400B2

公开(公告)日：2013-04-02

申请号：US10833312

申请日：2004-04-28

申请人： Soon-Im Wi

发明人： Soon-Im Wi

IPC分类号： C23F1/00 ,  H01L21/306 ,  C23C16/00 ,  H01J7/24

CPC分类号： H01J37/321 ,  H01J37/32357

摘要： An inductive plasma chamber of the present invention comprises a plurality of discharge tube bridges connected between a discharge tube head and a process chamber. The discharge tube head is disc shaped and a cylindrical gas inlet which a gas is injected is disposed in its center. A susceptor on which a workpiece is placed is disposed inside a process chamber and a flange of upper certain area has an inclined surface which is upward centrally inclined. The discharge tube bridge is provided with at least one ferrite core, and the ferrite core has a winding connected to a power supply source. When a process gas is injected via the gas inlet and a RF power from the power supply source is supplied with a winding, the electromotive force is transmitted inside the discharge tube head, the discharge bridge and the process chamber so that the plasma discharge is occurred in the plasma chamber. The plasma chamber comprises a switching means enabling plasma discharge paths to be alternately formed between the plurality of discharge tube bridges. The switching means switches in a predetermined period to be alternately formed the plasma discharge paths between the plurality of discharge tube bridges. The inductive plasma chamber can obtain high-density plasma while enhancing uniformity as well as enlarging plasma volume.

摘要翻译： 本发明的感应等离子体室包括连接在放电管头和处理室之间的多个放电管桥。 放电管头是盘形的，并且注入气体的圆柱形气体入口设置在其中心。 将工件放置在其上的感受体设置在处理室的内部，上部特定区域的凸缘具有向上中心倾斜的倾斜表面。 放电管桥设置有至少一个铁氧体磁芯，铁氧体磁芯具有连接到电源的绕组。 当通过气体入口喷射处理气体并且向来自电源的RF功率供给绕组时，电动势在放电管头，排放桥和处理室内传递，使得发生等离子体放电 在等离子体室中。 等离子体室包括能够在多个放电管桥之间交替形成等离子体放电路径的开关装置。 切换装置在预定周期内切换以交替地形成多个放电管桥之间的等离子体放电路径。 感应等离子体室可以获得高密度等离子体，同时增加均匀性以及扩大等离子体体积。

公开(公告)号：US07952048B2

公开(公告)日：2011-05-31

申请号：US11438691

申请日：2006-05-23

申请人： Dae-Kyu Choi ,  Soon-Im Wi

发明人： Dae-Kyu Choi ,  Soon-Im Wi

IPC分类号： H05B10/00

CPC分类号： H01J37/321 ,  H01J37/32009

摘要： A plasma source with discharge inducing bridges and a plasma processing system using the same. The plasma source may be constructed with a number of discharge inducing bridges, each discharge inducing bridge containing a magnetic core with a primary winding of a transformer. The discharge inducing bridges are positioned so as to face a susceptor. Each discharge inducing bridge is a hollow tube. When the electrical current of the primary winding of the transformer is driven, magnetic flux is induced to the magnetic core, so that inductive coupled plasma is formed around the discharge inducing bridges, and a plasma discharge is evenly induced horizontally/vertically along the discharge inducing bridges, so that uniform large-area high-density plasma is generated.

摘要翻译： 具有放电感应桥​​的等离子体源和使用其的等离子体处理系统。 等离子体源可以由多个放电感应桥​​构成，每个放电感应桥​​包含具有变压器初级绕组的磁芯。 放电感应桥​​被定位为面对基座。 每个放电感应桥​​是中空管。 当变压器的初级绕组的电流被驱动时，磁通量被感应到磁芯，使得在放电感应桥​​周围形成感应耦合等离子体，并且沿着放电诱导水平/垂直地均匀地引入等离子体放电 桥接，从而产生均匀的大面积高密度等离子体。

公开(公告)号：US20090102385A1

公开(公告)日：2009-04-23

申请号：US12114879

申请日：2008-05-05

申请人： Soon-Im Wi

发明人： Soon-Im Wi

IPC分类号： H05H1/00

CPC分类号： H01J37/32174 ,  H01J37/32091 ,  H01J37/32532

摘要： A capacitively coupled plasma reactor includes a plasma reactor, a capacitive coupling electrode assembly including a plurality of capacitive coupling electrodes to induce plasma discharge inside the plasma reactor, a main power supply source to supply radio-frequency power, and a distribution circuit to receive the radio-frequency power supplied from the main power supply source and to distribute the received radio-frequency power to the plurality of capacitive coupling electrodes.

摘要翻译： 电容耦合等离子体反应器包括等离子体反应器，电容耦合电极组件，其包括多个电容耦合电极以在等离子体反应器内部引发等离子体放电，提供射频电力的主电源以及分配电路， 从主电源提供的射频功率，并将接收的射频功率分配给多个电容耦合电极。

公开(公告)号：US20060289409A1

公开(公告)日：2006-12-28

申请号：US11438691

申请日：2006-05-23

申请人： Dae-Kyu Choi ,  Soon-Im Wi

发明人： Dae-Kyu Choi ,  Soon-Im Wi

IPC分类号： B23K9/00 ,  B23K9/02

CPC分类号： H01J37/321 ,  H01J37/32009

摘要： A plasma source with discharge inducing bridges and a plasma processing system using the same. The plasma source may be constructed with a number of discharge inducing bridges, each discharge inducing bridge containing a magnetic core with a primary winding of a transformer. The discharge inducing bridges are positioned so as to face a susceptor. Each discharge inducing bridge is a hollow tube. When the electrical current of the primary winding of the transformer is driven, magnetic flux is induced to the magnetic core, so that inductive coupled plasma is formed around the discharge inducing bridges, and a plasma discharge is evenly induced horizontally/vertically along the discharge inducing bridges, so that uniform large-area high-density plasma is generated.

摘要翻译： 具有放电感应桥​​的等离子体源和使用其的等离子体处理系统。 等离子体源可以由多个放电感应桥​​构成，每个放电感应桥​​包含具有变压器初级绕组的磁芯。 放电感应桥​​被定位成面对基座。 每个放电感应桥​​是中空管。 当变压器的初级绕组的电流被驱动时，磁通量被感应到磁芯，使得在放电感应桥​​周围形成感应耦合等离子体，并且沿着放电诱导水平/垂直地均匀地引入等离子体放电 桥接，从而产生均匀的大面积高密度等离子体。

公开(公告)号：US20110318141A1

公开(公告)日：2011-12-29

申请号：US12298972

申请日：2007-05-01

申请人： Soon-Im Wi

发明人： Soon-Im Wi

IPC分类号： H01L21/677

CPC分类号： H01L21/67742 ,  H01L21/67196 ,  H01L21/67745 ,  H01L21/68707 ,  Y10S414/139 ,  Y10S414/141 ,  Y10S901/30

摘要： Disclosed is an organic/inorganic composite porous film comprising: (a) a porous substrate having pores; and (b) an active layer formed by coating a surface of the substrate or a part of the pores in the substrate with a mixture of inorganic particles and a binder polymer, wherein the inorganic particles in the active layer are interconnected among themselves and are fixed by the binder polymer, and interstitial volumes among the inorganic particles form a pore structure. A method for manufacturing the same film and an electrochemical device including the same film are also disclosed. An electrochemical device comprising the organic/inorganic composite porous film shows improved safety and quality, simultaneously.

摘要翻译： 公开了一种有机/无机复合多孔膜，其包含：（a）具有孔的多孔基材; 和（b）通过用无机颗粒和粘合剂聚合物的混合物涂覆基底的表面或基底中的一部分孔而形成的活性层，其中活性层中的无机颗粒在它们之间相互连接并固定 通过粘合剂聚合物，并且无机颗粒之间的间隙体积形成孔结构。 还公开了制造相同膜的方法和包括该膜的电化学装置。 包含有机/无机复合多孔膜的电化学装置同时显示出改进的安全性和质量。

公开(公告)号：US08018163B2

公开(公告)日：2011-09-13

申请号：US12114879

申请日：2008-05-05

申请人： Soon-Im Wi

发明人： Soon-Im Wi

IPC分类号： H01J7/24

CPC分类号： H01J37/32174 ,  H01J37/32091 ,  H01J37/32532

摘要： A capacitively coupled plasma reactor includes a plasma reactor, a capacitive coupling electrode assembly including a plurality of capacitive coupling electrodes to induce plasma discharge inside the plasma reactor, a main power supply source to supply radio-frequency power, and a distribution circuit to receive the radio-frequency power supplied from the main power supply source and to distribute the received radio-frequency power to the plurality of capacitive coupling electrodes.

摘要翻译： 电容耦合等离子体反应器包括等离子体反应器，电容耦合电极组件，其包括多个电容耦合电极以在等离子体反应器内部引发等离子体放电，提供射频电力的主电源以及分配电路， 从主电源提供的射频功率，并将接收的射频功率分配给多个电容耦合电极。