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1.发明授权公开(公告)号：US07119883B2
公开(公告)日：2006-10-10
申请号：US10962550
申请日：2004-10-13
申请人： Stephen Roux , Erik Loopstra , Michael L. Nelson
发明人： Stephen Roux , Erik Loopstra , Michael L. Nelson
CPC分类号： G03F7/70558 , G03F7/70066
摘要： An apparatus for changing an aggregate intensity of a light within an illumination field of a photolithography system having a blade structure and a first actuator. The blade structure is configured to be positioned along an optical path of the photolithography system between an illumination system and a reticle stage so that, when the illumination system provides the light having the illumination field, the blade structure is substantially at a center of the illumination field and a first portion of the light within the illumination field impinges upon the blade structure. The first actuator is coupled between a first portion of the blade structure and a frame of the photolithography system and is configured to move at least the first portion of the blade structure in a first direction so that a second portion of the light within the illumination field impinges upon the blade structure.
摘要翻译： 一种用于改变具有叶片结构和第一致动器的光刻系统的照明场中的光的聚集强度的装置。 叶片结构被构造成沿着光刻系统的光路在照明系统和标线镜台之间定位，使得当照明系统提供具有照明场的光时，叶片结构基本上处于照明的中心 并且照明场内的光的第一部分撞击在叶片结构上。 第一致动器耦合在叶片结构的第一部分和光刻系统的框架之间，并且被配置成沿着第一方向移动至少第一部分叶片结构，使得第一部分的光在照明区域内 撞击在叶片结构上。
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2.发明授权公开(公告)号：US07633599B2
公开(公告)日：2009-12-15
申请号：US11523695
申请日：2006-09-20
申请人： Stephen Roux , Erik Loopstra , Michael L. Nelson
发明人： Stephen Roux , Erik Loopstra , Michael L. Nelson
CPC分类号： G03F7/70558 , G03F7/70066
摘要： An apparatus for changing an intensity distribution of a light within an illumination field includes a structure configured to be positioned within the illumination field so that a first portion of the light within the illumination field impinges upon the structure, where the structure is translucent or opaque to a wavelength of the light. The apparatus also includes an actuator configured to cause a movement of a first portion of the structure so that a second portion of the light within the illumination field impinges upon the structure. The light within the illumination field is produced by a source configured so that a pupil fill of a beam of the light is uncontrolled, but the beam of the light downstream of the structure is substantially telecentric before and after the movement of the first portion of the structure. Related methods are also presented.
摘要翻译： 用于改变照明场中的光的强度分布的装置包括被配置为定位在照明场内的结构，使得照明场内的光的第一部分照射在结构上，其中结构是半透明的或不透明的 光的波长。 该装置还包括致动器，该致动器被配置为引起结构的第一部分的移动，使得照明场内的光的第二部分撞击该结构。 照明场内的光由源构成，使得光束的光瞳填充不受控制，但是结构的下游光的光束在第一部分的移动之前和之后基本上是远心的 结构体。 还提出了相关方法。
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3.发明授权公开(公告)号：US07474384B2
公开(公告)日：2009-01-06
申请号：US10994201
申请日：2004-11-22
申请人： Arno Jan Bleeker , Dominicus Jacobus Petrus Adrianus Franken , Stephen Roux , Michael L. Nelson
发明人： Arno Jan Bleeker , Dominicus Jacobus Petrus Adrianus Franken , Stephen Roux , Michael L. Nelson
CPC分类号： G03F7/709 , G03F7/70258 , G03F7/70308
摘要： A lithographic apparatus, a device manufacturing method, and a projection element for use in a lithographic apparatus are disclosed. The lithographic apparatus has a radiation system for providing a pulsed beam of radiation, a patterning device for imparting the beam with a pattern to form a patterned radiation beam, and a projection system having a projection element for projecting the patterned beam onto a target portion of a substrate. The apparatus further comprises an actuator for moving the projection element for shifting the patterned beam that is projected onto the substrate during at least one pulse of the radiation system. This can be done to compensate for a positional error between a substrate table holding the substrate and an aerial image of the projection system. The positional error could occur due to mechanical vibrations in the frame system of the lithographic apparatus.
摘要翻译： 公开了一种用于光刻设备的光刻设备，设备制造方法和投影元件。 光刻设备具有用于提供脉冲辐射束的辐射系统，用于将光束赋予图案以形成图案化辐射束的图案形成装置，以及具有用于将图案化光束投影到目标部分的投影元件的投影系统 底物。 该装置还包括用于移动投影元件的致动器，用于移动在辐射系统的至少一个脉冲期间投影到基板上的图案化光束。 这可以进行以补偿保持基板的基板台与投影系统的空中图像之间的位置误差。 位置误差可能由于光刻设备的框架系统中的机械振动而发生。
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公开(公告)号：US20120296993A1
公开(公告)日：2012-11-22
申请号：US13448595
申请日：2012-04-17
申请人： Jerrold M. Heyman , Kenton R. Milligan , Michael L. Nelson , Antonio Pirraglia , Andrew G. Tonkin
发明人： Jerrold M. Heyman , Kenton R. Milligan , Michael L. Nelson , Antonio Pirraglia , Andrew G. Tonkin
IPC分类号： G06F15/16
CPC分类号： G06Q10/06
摘要： Embodiments of the invention relate to a message based scheduling tool employed to function with an electronic calendar. As messages are transmitting between clients, a tool is employed to parse the messages to search for one or more string(s) of characters characteristic of a meeting. Based upon these characteristics and the parsing, the electronic calendars are searched to find an available time slot on both calendars in which a meeting can take place, and, if an available time is found, the meeting is scheduled and the clients are sent notification of the scheduling.
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公开(公告)号：US07248336B2
公开(公告)日：2007-07-24
申请号：US11408956
申请日：2006-04-24
CPC分类号： G03F9/7019 , D21H23/34 , G03F9/7011 , G03F9/7026 , G03F9/7088 , H04N21/41415
摘要： A focus system that includes a calibration subsystem and a control subsystem. The control subsystem, which includes a control sensor, is in close proximity to the exposing of an image. The calibration subsystem, which includes a calibration sensor and a control sensor, is located remotely from, or off-axis with respect to, the exposing of an image. By separating calibration and control functions, the functional requirements can be separated into two (or more) types of sensors.
摘要翻译： 包括校准子系统和控制子系统的焦点系统。 包括控制传感器的控制子系统非常接近图像的曝光。 包括校准传感器和控制传感器的校准子系统相对于图像的曝光远离或离轴定位。 通过分离校准和控制功能，功能要求可以分为两种（或更多种）传感器。
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6.发明授权Mask and wafer diffraction grating alignment system wherein the diffracted light beams return substantially along an incident angle 失效掩模和晶片衍射光栅对准系统，其中衍射光束基本上沿入射角返回
公开(公告)号：US5559601A
公开(公告)日：1996-09-24
申请号：US375636
申请日：1995-01-20
IPC分类号： G01B11/00 , G03F9/00 , H01L21/027 , G01B9/02
CPC分类号： G03F9/7049
摘要： The present invention provides a grating-grating interferometric wafer alignment system, sensor and method for microlithography. It includes: (1) an electromagnetic radiation source with collimating optics delivering a collimated beam of a coherent single or multiple discrete wavelengths or in some cases broadband electromagnetic radiation; (2) a detector of the intensity of the collimated return electromagnetic radiation; (3) x- and y-oriented independent linear gratings for the mask-mark; (3) a "checkerboard pattern" grating for the wafer-mark; and (4) software including an algorithm for determining alignment from the return electromagnetic radiation intensity measured as a function of the relative position of the wafer and mask grating, and a means such as a Fourier transform determining phase and amplitude of a known frequency component of the intensity. In one embodiment a laser diode is used and the backscatter from the mask and wafer gratings is returned to the laser diode creating a beat signal used to determine alignment of the mask and wafer. Alignment accuracy is increased and made more tolerant of processing variables such as wafer topography and coatings.
摘要翻译： 本发明提供一种光栅光栅干涉测量晶片对准系统，用于微光刻的传感器和方法。 它包括：（1）具有准直光学器件的电磁辐射源，其递送相干单个或多个离散波长的准直光束，或在某些情况下传送宽带电磁辐射; （2）准直返回电磁辐射强度的检测器; （3）用于掩模标记的x和y取向的独立线性光栅; （3）用于晶片标记的“棋盘图案”格栅; 以及（4）软件，其包括用于根据作为晶片和掩模光栅的相对位置的函数测量的返回电磁辐射强度来确定对准的算法，以及诸如傅立叶变换确定相位和幅度的装置，其中已知频率分量 强度。 在一个实施例中，使用激光二极管，并且来自掩模和晶片光栅的反向散射返回到激光二极管，产生用于确定掩模和晶片的对准的拍频信号。 对准精度提高，并且能够更加容忍诸如晶片形貌和涂层的处理变量。
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公开(公告)号：US09639832B2
公开(公告)日：2017-05-02
申请号：US13427980
申请日：2012-03-23
CPC分类号： G06Q20/1235 , G06F21/10
摘要： Techniques for implementing software licensing in a massive parallel processing environment on the basis of the actual use of licensed software instances are disclosed. In one embodiment, rather than using a license server or a node-locked license strategy, each use of a licensed software instance is monitored and correlated with a token. A store of tokens is maintained within the licensing system and a token is consumed after each instance successfully executes. Further, a disclosed embodiment also allows jobs that execute multiple software instances to complete execution, even if an adequate number of tokens does not exist for each remaining software instance. Once the license tokens are repurchased and replenished, any overage consumed from previous job executions may be reconciled. In this way, token-based licensing can be adapted to large scale computing environments that execute jobs of large and unpredictable sizes, while the cancellation of executing jobs may be avoided.
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公开(公告)号：US08776058B2
公开(公告)日：2014-07-08
申请号：US13316524
申请日：2011-12-11
申请人： Jerrold M. Heyman , Michael L. Nelson , Andrew G. Tonkin , Kent R. Milligan , Antonio N. Pirraglia
发明人： Jerrold M. Heyman , Michael L. Nelson , Andrew G. Tonkin , Kent R. Milligan , Antonio N. Pirraglia
IPC分类号： G06F9/455
CPC分类号： G06F9/45558 , G06F2009/45562
摘要： Responsive to a request to invoke a given virtual machine (VM) instance, a base VM instance corresponding to a number of VM instances, including the given VM instance, is retrieved. A VM change file particular to just the given VM instance is also retrieved. The VM change file indicates how the given VM instance varies from the base VM instance. The VM change file is applied to the base VM instance to dynamically generate the given VM instance, and the given VM instance is then invoked. Responsive to a request to subsequently shutdown the given VM instance, the VM change file is updated to reflect how the given VM instance varies from the base VM instance. The given VM instance is then shutdown and deleted.
摘要翻译： 响应于调用给定虚拟机（VM）实例的请求，检索与包括给定VM实例的VM数量相对应的基本VM实例。 还会检索到特定于VM给定VM实例的虚拟机更改文件。 VM更改文件指示给定的VM实例与基本VM实例的不同之处。 将VM更改文件应用于基本VM实例以动态生成给定的VM实例，然后调用给定的VM实例。 响应于随后关闭给定VM实例的请求，VM更改文件将被更新，以反映给定VM实例与基本VM实例的不同之处。 然后关闭并删除给定的VM实例。
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9.发明申请公开(公告)号：US20110296402A1
公开(公告)日：2011-12-01
申请号：US12788926
申请日：2010-05-27
CPC分类号： G06Q20/1235 , G06F21/10
摘要： Techniques for implementing software licensing in a massive parallel processing environment on the basis of the actual use of licensed software instances are disclosed. In one embodiment, rather than using a license server or a node-locked license strategy, each use of a licensed software instance is monitored and correlated with a token. A store of tokens is maintained within the licensing system and a token is consumed after each instance successfully executes. Further, a disclosed embodiment also allows jobs that execute multiple software instances to complete execution, even if an adequate number of tokens does not exist for each remaining software instance. Once the license tokens are repurchased and replenished, any overage consumed from previous job executions may be reconciled. In this way, token-based licensing can be adapted to large scale computing environments that execute jobs of large and unpredictable sizes, while the cancellation of executing jobs may be avoided.
摘要翻译： 公开了在大量并行处理环境中基于许可软件实例的实际使用来实现软件许可的技术。 在一个实施例中，不是使用许可证服务器或节点锁定许可策略，每个使用许可的软件实例被监视并与令牌相关联。 一个令牌存储在许可证系统内，令牌在每个实例成功执行后被消耗。 此外，所公开的实施例还允许执行多个软件实例的作业完成执行，即使每个剩余软件实例不存在足够数量的令牌。 一旦许可证令牌被回购和补充，从以前的工作执行中消耗的任何高估可能会被调和。 以这种方式，基于令牌的许可可以适应于执行大型和不可预测尺寸的作业的大规模计算环境，同时可以避免执行作业的取消。
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公开(公告)号：US20110116068A1
公开(公告)日：2011-05-19
申请号：US13054008
申请日：2009-07-29
CPC分类号： G03F1/24 , B82Y10/00 , B82Y40/00 , G03F7/70891
摘要： A reflective reticle substantially reduces or eliminates pattern distortion that results from the absorption of EUV radiation while maintaining a reticle thickness consistent with industry standards. The reflective reticle includes a layer of ultra-low expansion (ULE) glass and a substrate of Cordierite having a thermal conductivity substantially larger than that of ULE glass. An aluminum layer is disposed onto a first surface of the ULE glass and a second surface of the ULE glass is polished to be substantially flat and defect-free. The Cordierite substrate can be directly bonded to the aluminum layer using anodic bonding to form the reflective reticle. Alternatively, a first surface of an intermediate Zerodur layer can be bonded to the aluminum layer, and a second aluminum layer can be used to anodically bond the Cordierite substrate to a second surface of the Zerodur layer, thereby forming the reflective reticle.
摘要翻译： 反射型掩模版基本上减少或消除由于EUV辐射的吸收而导致的图案变形，同时保持与行业标准一致的光罩厚度。 反射型掩模版包括一层超低膨胀（ULE）玻璃和堇青石的基底，其导热率基本上大于ULE玻璃的热导率。 将铝层设置在ULE玻璃的第一表面上，并将ULE玻璃的第二表面抛光成基本平坦且无缺陷。 堇青石基材可以使用阳极结合直接结合到铝层上以形成反射型掩模版。 或者，中间Zerodur层的第一表面可以结合到铝层，并且可以使用第二铝层将堇青石基板阳极结合到Zerodur层的第二表面，从而形成反射掩模版。
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