公开(公告)号：US20080240174A1

公开(公告)日：2008-10-02

申请号：US12056454

申请日：2008-03-27

申请人： Steven R.J. Brueck ,  Liang Xue ,  Ron Kaspi

发明人： Steven R.J. Brueck ,  Liang Xue ,  Ron Kaspi

IPC分类号： H01S3/10

CPC分类号： H01S5/12 ,  B82Y20/00 ,  H01S5/041 ,  H01S5/1212 ,  H01S5/3422

摘要： Exemplary embodiments provide tunable laser devices, methods for making the laser devices and methods for tuning the laser devices. The tunable laser devices can include an optically pumped semiconductor laser heterostructure, on which a distributed-feedback (DFB) laser grating having variable grating spacings (or chirps) can be formed. The optically pumped semiconductor laser heterostructure can be an optically pumped type-II quantum well laser structure. The emission wavelength of the tunable laser devices can be tuned by changing positions of the region illuminated by the pump laser and with respect to the chirped DFB grating. The disclosed laser devices and methods can provide tunable laser emission with a combination of narrow linewidth and high output power that can be used for remote sensing applications and/or spectroscopic applications across the entire mid infrared (IR) spectral region.

摘要翻译： 示例性实施例提供可调激光器件，用于制造激光器件的方法和用于调谐激光器件的方法。 可调激光器件可以包括光泵浦的半导体激光异质结构，其上可以形成具有可变光栅间隔（或线性调频脉冲）的分布反馈（DFB）激光光栅。 光泵浦半导体激光异质结构可以是光泵浦型II量子阱激光器结构。 可调谐激光器件的发射波长可以通过改变由泵激光器照射的区域和相对于啁啾DFB光栅的位置来调节。 所公开的激光器件和方法可以提供具有窄线宽和高输出功率的组合的可调谐激光发射，其可用于整个中红外（IR）光谱区域的遥感应用和/或光谱应用。

公开(公告)号：US5759744A

公开(公告)日：1998-06-02

申请号：US407067

申请日：1995-03-16

申请人： Steven R.J. Brueck ,  Xiaolan Chen ,  Saleem Zaidi ,  Daniel J. Devine

发明人： Steven R.J. Brueck ,  Xiaolan Chen ,  Saleem Zaidi ,  Daniel J. Devine

IPC分类号： G03F7/20 ,  G03F7/22

CPC分类号： G03F7/70408 ,  G03F7/70466

摘要： Methods and apparatuses are disclosed for the exposure of sparse hole and/or mesa arrays with line:space ratios of 1:3 or greater and sub-micrometer hole and/or mesa diameters in a layer of photosensitive material atop a layered material. Methods disclosed include: double exposure interferometric lithography pairs in which only those areas near the overlapping maxima of each single-period exposure pair receive a clearing exposure dose; double interferometric lithography exposure pairs with additional processing steps to transfer the array from a first single-period interferometric lithography exposure pair into an intermediate mask layer and a second single-period interferometric lithography exposure to further select a subset of the first array of holes; a double exposure of a single period interferometric lithography exposure pair to define a dense array of sub-micrometer holes and an optical lithography exposure in which only those holes near maxima of both exposures receive a clearing exposure dose; combination of a single-period interferometric exposure pair, processing to transfer resulting dense array of sub-micrometer holes into an intermediate etch mask, and an optical lithography exposure to select a subset of initial array to form a sparse array; combination of an optical exposure, transfer of exposure pattern into an intermediate mask layer, and a single-period interferometric lithography exposure pair; three-beam interferometric exposure pairs to form sparse arrays of sub-micrometer holes; five- and four-beam interferometric exposures to form a sparse array of sub-micrometer holes in a single exposure. Apparatuses disclosed include arrangements for the three-beam, five-beam and four-beam interferometric exposures.

摘要翻译： 公开了用于暴露具有1:3或更大的线：空间比的稀疏孔和/或台面阵列的方法和装置，并且在分层材料的顶层中的感光材料层中的亚微米孔和/或台面直径。 公开的方法包括：双曝光干涉光刻对，其中仅每个单周期曝光对的重叠最大值附近的区域接收清除曝光剂量; 双重干涉光刻曝光对，其具有附加处理步骤，以将阵列从第一单周期干涉光刻曝光对转移到中间掩模层和第二单周期干涉光刻曝光中，以进一步选择第一阵列孔的子集; 单周期干涉光刻曝光对的双重曝光以限定亚微米孔的密集阵列和光学曝光曝光，其中只有两个曝光的最大值附近的那些孔接收清除曝光剂量; 单周期干涉曝光对的组合，将所产生的紧密阵列的亚微米孔转移到中间蚀刻掩模中的处理，以及光学曝光以选择初始阵列的子集以形成稀疏阵列; 光学曝光的组合，曝光图案转印到中间掩模层中，以及单周期干涉光刻曝光对; 三光束干涉曝光对形成亚微米孔的稀疏阵列; 五光束和四光束干涉曝光以在单次曝光中形成稀疏阵列的亚微米孔。 公开的装置包括用于三光束，五光束和四光束干涉曝光的布置。

公开(公告)号：US20130193065A1

公开(公告)日：2013-08-01

申请号：US13831537

申请日：2013-03-14

申请人： Steven R.J. Brueck ,  Deying Xia ,  Yuliya Kuznetsova ,  Alexander Neumann

发明人： Steven R.J. Brueck ,  Deying Xia ,  Yuliya Kuznetsova ,  Alexander Neumann

IPC分类号： B01D69/04 ,  G03F7/20

CPC分类号： B01D69/04 ,  B81C1/00071 ,  B82Y30/00 ,  G03F7/2051 ,  Y10S977/78 ,  Y10S977/84 ,  Y10T137/0324 ,  Y10T137/3006

摘要： In accordance with the invention, there is a method of forming a nanochannel including depositing a photosensitive film stack over a substrate and forming a pattern on the film stack using interferometric lithography. The method can further include depositing a plurality of silica nanoparticles to form a structure over the pattern and removing the pattern while retaining the structure formed by the plurality of silica nanoparticles, wherein the structure comprises an enclosed nanochannel.

摘要翻译： 根据本发明，存在一种形成纳米通道的方法，其包括在衬底上沉积感光膜堆叠并且使用干涉光刻在膜堆上形成图案。 该方法可以进一步包括沉积多个二氧化硅纳米颗粒以在图案上形成结构并除去图案，同时保留由多个二氧化硅纳米颗粒形成的结构，其中该结构包括封闭的纳米通道。

公开(公告)号：US09541374B2

公开(公告)日：2017-01-10

申请号：US14230582

申请日：2014-03-31

申请人： Steven R.J. Brueck ,  Yuliya Kuznetsova ,  Alexander Neumann

发明人： Steven R.J. Brueck ,  Yuliya Kuznetsova ,  Alexander Neumann

IPC分类号： G02B21/06 ,  G02B21/00 ,  G01B9/02 ,  G02B21/36 ,  G06T3/40 ,  G02B21/18 ,  G01B9/04 ,  G01N21/65

CPC分类号： G01B9/02015 ,  G01B9/04 ,  G01N21/65 ,  G01N2021/653 ,  G02B21/0056 ,  G02B21/06 ,  G02B21/18 ,  G02B21/365 ,  G06T3/4061

摘要： In accordance with the aspects of the present disclosure, a method and apparatus is disclosed for three-dimensional imaging interferometric microscopy (IIM), which can use at least two wavelengths to image a three-dimensional object. The apparatus can include a first, a second, and a third optical system. The first optical system is disposed to provide a substantially coherent illumination to the 3D object, wherein the illumination is characterized by a plurality of wavelengths. The second optical system includes an optical image recording device and one or more additional optical components characterized by a numerical aperture NA. The third optical system provides interferometric reintroduction of a portion of the coherent illumination as a reference beam into the second optical system. An image recording device records each sub-image formed as a result of interference between the illumination that is scattered by the 3D object and the reference beam.

摘要翻译： 根据本公开的方面，公开了用于三维成像干涉显微镜（IIM）的方法和装置，其可以使用至少两个波长来成像三维物体。 该装置可以包括第一，第二和第三光学系统。 第一光学系统设置成向3D对象提供基本相干的照明，其中照明由多个波长表征。 第二光学系统包括光学图像记录装置和由数值孔径NA表征的一个或多个附加光学部件。 第三光学系统将相干照明的一部分的干涉重新引入作为参考光束进入第二光学系统。 图像记录装置记录由作为3D对象散射的照明与参照光束之间的干涉而形成的各子图像。

公开(公告)号：US20080057445A1

公开(公告)日：2008-03-06

申请号：US11849126

申请日：2007-08-31

申请人： Steven R.J. Brueck ,  Andrew Frauenglass ,  Alexander K. Raub ,  Dong Li

发明人： Steven R.J. Brueck ,  Andrew Frauenglass ,  Alexander K. Raub ,  Dong Li

IPC分类号： G03C5/00

CPC分类号： H01L21/3086 ,  H01L21/0337 ,  H01L21/0338 ,  H01L21/3088 ,  H01L21/31144

摘要： In accordance with the invention, there are methods for self-aligned spatial frequency doubling in one dimension and also in two dimension. The method for self-aligned spatial frequency doubling in one dimension can include forming a film stack over a substrate, wherein the film stack comprises a photoresist layer and forming a one-dimensional periodic first pattern having a first pitch p on the photoresist layer using an optical exposure, wherein the first pitch p is at least smaller than twice the bandpass limit for optical exposures. The method can also include forming a second pattern using the first pattern by nonlinear processing steps, wherein the second pattern has a second pitch p2=p/2.

摘要翻译： 根据本发明，在一维和二维中存在自对准空间倍频的方法。 在一个维度中自对准空间倍频的方法可以包括在衬底上形成膜堆叠，其中膜堆叠包括光致抗蚀剂层并且在光刻胶层上形成具有第一间距p的一维周期性第一图案，使用 光学曝光，其中第一间距p至少小于光学曝光的带通极限的两倍。 该方法还可以包括通过非线性处理步骤使用第一图案形成第二图案，其中第二图案具有第二间距p 2/2 = p / 2。

公开(公告)号：US20130094077A1

公开(公告)日：2013-04-18

申请号：US13629598

申请日：2012-09-27

申请人： Steven R.J. Brueck ,  Alexander Neumann ,  Yuliya Kuznetsova

发明人： Steven R.J. Brueck ,  Alexander Neumann ,  Yuliya Kuznetsova

IPC分类号： G02B21/06

CPC分类号： G02B21/06 ,  G01N2021/653 ,  G02B21/0056 ,  G02B21/365 ,  G06T3/4061

摘要： In accordance with the aspects of the present disclosure, a method and apparatus is disclosed for imaging interferometric microscopy (IIM), which can use an immersion medium to enhance resolution up to a resolution of linear systems resolution limit of λ/4n, where λ is the wavelength in free space and n is the index of refraction of a transmission medium.

摘要翻译： 根据本公开的方面，公开了用于成像干涉显微镜（IIM）的方法和装置，其可以使用浸没介质来增强分辨率，直到λ/ 4n的线性系统分辨率极限的分辨率，其中λ是 自由空间中的波长和n是传输介质的折射率。

公开(公告)号：US20110127235A1

公开(公告)日：2011-06-02

申请号：US13022740

申请日：2011-02-08

申请人： Steven R.J. Brueck ,  Andrew Frauenglass ,  Alexander K. Raub ,  Dong Li

发明人： Steven R.J. Brueck ,  Andrew Frauenglass ,  Alexander K. Raub ,  Dong Li

IPC分类号： B32B38/06

CPC分类号： H01L21/3086 ,  H01L21/0337 ,  H01L21/0338 ,  H01L21/3088 ,  H01L21/31144

摘要： In accordance with the invention, there are methods for self-aligned spatial frequency doubling in one dimension and also in two dimension. The method for self-aligned spatial frequency doubling in one dimension can include forming a film stack over a substrate, wherein the film stack comprises a photoresist layer and forming a one-dimensional periodic first pattern having a first pitch p on the photoresist layer using an optical exposure, wherein the first pitch p is at least smaller than twice the bandpass limit for optical exposures. The method can also include forming a second pattern using the first pattern by nonlinear processing steps, wherein the second pattern has a second pitch p2=p/2.

摘要翻译： 根据本发明，在一维和二维中存在自对准空间倍频的方法。 在一个维度中自对准空间倍频的方法可以包括在衬底上形成膜堆叠，其中膜堆叠包括光致抗蚀剂层并且在光刻胶层上形成具有第一间距p的一维周期性第一图案，使用 光学曝光，其中第一间距p至少小于光学曝光的带通极限的两倍。 该方法还可以包括通过非线性处理步骤使用第一图案形成第二图案，其中第二图案具有第二间距p2 = p / 2。