公开(公告)号：US09011224B1

公开(公告)日：2015-04-21

申请号：US13861097

申请日：2013-04-11

Applicant: Robert W Jeffway, Jr. ,  Steven R Casino ,  Steven T Fink

Inventor： Robert W Jeffway, Jr. ,  Steven R Casino ,  Steven T Fink

IPC: A63F9/24 ,  A63F13/20

CPC classification number: A63F13/26 ,  A63F13/211

Abstract: A hand-held, cubic, transparent game system containing a cubiform array of individual LEDs arranged as a cubic matrix of rows and columns, an inclinometer, sound chip and speaker and a timer. Electronic control circuitry including a game-programmed processor is connected between the inclinometer and the LED array to control visible operating states of individual lamps in response to output signals from the inclinometer, according to rules of a game program. Sequential LEDs in a direction of inclination are momentarily flashed to define a traveling cursor. Turning the housing through 90 degrees transfers cursor between a row and a column.

Abstract translation: 一种手持的，立方体的，透明的游戏系统，其包含排列成行和列的立方矩阵的单独LED的立方体阵列，倾斜仪，声音芯片和扬声器以及定时器。 根据游戏程序的规则，包括游戏编程处理器的电子控制电路连接在倾斜仪和LED阵列之间，以响应于来自倾斜仪的输出信号来控制各个灯的可视操作状态。 沿着倾斜方向的顺序LED瞬间闪烁以定义行进光标。 将外壳转动90度将光标移动到一列和一列之间。

公开(公告)号：US07088046B2

公开(公告)日：2006-08-08

申请号：US10664903

申请日：2003-09-22

Applicant: Steven T Fink

Inventor： Steven T Fink

IPC: H01J1/52

CPC classification number: H01J37/321

Abstract: A plasma reactor sub-assembly includes both an electrostatic shield and a process tube. Optionally, the electrostatic shield and the process tube are connected. Alternatively, they are configured to fit together without being physically connected. The sub-assembly may be manufactured using a process tube nested within the circumference of an electrostatic shield, an electrostatic shield patterned directly on a process tube using, for example, thin film deposition, or a process tube bonded or not bonded to an electrostatic shield made of a flexible, electrical film material.

Abstract translation: 等离子体反应器子组件包括静电屏蔽和处理管。 可选地，静电屏蔽和处理管被连接。 或者，它们被配置成在没有物理连接的情况下装配在一起。 子组件可以使用嵌套在静电屏蔽体的圆周内的工艺管，使用例如薄膜沉积直接在处理管上图案化的静电屏蔽来制造，或者是将结合或未结合到静电屏蔽的工艺管 由柔性电膜材料制成。

公开(公告)号：US07001482B2

公开(公告)日：2006-02-21

申请号：US10705221

申请日：2003-11-12

Applicant: Michael Landis ,  Steven T Fink

Inventor： Michael Landis ,  Steven T Fink

IPC: C23F1/02 ,  C25D3/38 ,  C23C16/00

CPC classification number: H01J37/32642

Abstract: A focus ring assembly, configured to be coupled to a substrate holder in a plasma processing system, comprises a focus ring having one or more wear indicators for determining the lifetime of the focus ring, wherein the coupling of the focus ring to the substrate holder facilitates auto-centering of the focus ring in the plasma processing system. For example, a centering ring mounted on the substrate holder can comprise a centering feature configured to couple with a mating feature on the focus ring.

Abstract translation: 配置成耦合到等离子体处理系统中的衬底保持器的聚焦环组件包括具有用于确定聚焦环的寿命的一个或多个磨损指示器的聚焦环，其中聚焦环与衬底保持器的耦合有利于 聚焦环在等离子体处理系统中自动对中。 例如，安装在基板保持器上的定心环可以包括配置成与聚焦环上的配合特征耦合的定心特征。

公开(公告)号：US07604701B2

公开(公告)日：2009-10-20

申请号：US10872569

申请日：2004-06-22

Applicant: Steven T Fink

Inventor： Steven T Fink

IPC: C23C16/00 ,  H01L21/306

CPC classification number: H01J37/32458 ,  C23C14/52 ,  H01J37/16

Abstract: An access assembly for a process chamber, including a wall segment constructed and arranged to access the process chamber, a mounting assembly constructed and arranged to couple the wall segment to the process chamber, and a sealing plate mounted to the process chamber. The sealing plate is constructed and arranged to isolate the wall segment from a volume inside the process chamber.

Abstract translation: 一种用于处理室的进入组件，包括构造和布置成进入处理室的壁段，构造和布置成将壁段耦合到处理室的安装组件和安装到处理室的密封板。 密封板被构造和布置成将壁段与处理室内的体积隔离。

公开(公告)号：US07461614B2

公开(公告)日：2008-12-09

申请号：US10705224

申请日：2003-11-12

Applicant: Steven T Fink ,  Eric J Strang ,  Arthur H Laflamme, Jr. ,  Jay Wallace ,  Sandra Hyland

Inventor： Steven T Fink ,  Eric J Strang ,  Arthur H Laflamme, Jr. ,  Jay Wallace ,  Sandra Hyland

IPC: C23C4/10 ,  H01L21/205

CPC classification number: H01J37/32633 ,  H01J37/32834 ,  H01L21/67069

Abstract: A baffle plate assembly, configured to be coupled to a substrate holder in a plasma processing system, comprises a baffle plate having one or more openings to permit the passage of gas there through, wherein the coupling of the baffle plate to the substrate holder facilitates auto-centering of the baffle plate in the plasma processing system. For example, a centering ring mounted in the substrate holder can comprise a centering feature configured to couple with a mating feature on the baffle plate. After initial assembly of the plasma processing system, the baffle plate can be replaced and centered within the plasma processing system without disassembly and re-assembly of the substrate holder.

Abstract translation: 构造成在等离子体处理系统中耦合到衬底保持器的挡板组件包括具有一个或多个开口以允许气体在其中通过的挡板，其中挡板与衬底保持器的联接有利于自动 - 等离子体处理系统中的挡板的重心。 例如，安装在基板保持器中的定心环可以包括配置成与挡板上的配合特征联接的定心特征。 在初始组装等离子体处理系统之后，挡板可以在等离子体处理系统内更换并居中，而不会拆卸和重新组装衬底支架。

公开(公告)号：US07186313B2

公开(公告)日：2007-03-06

申请号：US10765445

申请日：2004-01-28

Applicant: Andrej S Mitrovic ,  Maolin Long ,  Paul Moroz ,  Steven T Fink ,  William D Jones

Inventor： Andrej S Mitrovic ,  Maolin Long ,  Paul Moroz ,  Steven T Fink ,  William D Jones

IPC: H01L21/306

CPC classification number: H01L21/67248 ,  G05D23/1934 ,  H01J37/32522 ,  H01L21/67069 ,  H01L21/67109

Abstract: A device and method for controlling the temperature of a plasma chamber inside wall or other surfaces exposed to the plasma by a plurality of temperature control systems. A plasma process within the plasma chamber can be controlled by independently controlling the temperature of segments of the wall or other surfaces.