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1.发明申请ELIMINATION OF PHOTORESIST MATERIAL COLLAPSE AND POISONING IN 45-NM FEATURE SIZE USING DRY OR IMMERSION LITHOGRAPHY 审中-公开使用干涉或倾斜光刻技术消除45-NM特征尺寸的光电材料收缩和沉淀公开(公告)号：US20090197086A1
公开(公告)日：2009-08-06
申请号：US12025615
申请日：2008-02-04
CPC分类号： G03F7/091 , G03F7/11 , Y10T428/30
摘要： A method and structure for the fabrication of semiconductor devices having feature sizes in the range of 90 nm and smaller is provided. In one embodiment of the invention, a method is provided for processing a substrate including depositing an anti-reflective coating layer on a surface of the substrate, depositing an adhesion promotion layer on the anti-reflective coating layer, and depositing a resist material on the adhesion promotion layer. In another embodiment of the invention, a semiconductor substrate structure is provided including a dielectric substrate, an amorphous carbon layer deposited on the dielectric layer, an anti-reflective coating layer deposited on the amorphous carbon layer, an adhesion promotion layer deposited on the anti-reflective coating layer, and a resist material deposited on the adhesion promotion layer.
摘要翻译： 提供了具有尺寸在90nm以下的特征尺寸的半导体器件的制造方法和结构。 在本发明的一个实施例中，提供了一种处理衬底的方法，包括在衬底的表面上沉积抗反射涂层，在抗反射涂层上沉积粘合促进层，以及在抗反射涂层上沉积抗蚀剂材料 粘附促进层。 在本发明的另一个实施例中，提供了一种半导体衬底结构，其包括电介质衬底，沉积在电介质层上的无定形碳层，沉积在无定形碳层上的抗反射涂层， 反射涂层和沉积在粘附促进层上的抗蚀剂材料。
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2.发明申请PLASMA SURFACE TREATMENT TO PREVENT PATTERN COLLAPSE IN IMMERSION LITHOGRAPHY 审中-公开等离子体表面处理，以防止浸渍图中的图案褶皱公开(公告)号：US20090104541A1
公开(公告)日：2009-04-23
申请号：US11877559
申请日：2007-10-23
申请人： Eui Kyoon Kim , Deenesh Padhi , Huixiong Dai , Mehul Naik , Martin Jay Seamons , Bok Hoen Kim
发明人： Eui Kyoon Kim , Deenesh Padhi , Huixiong Dai , Mehul Naik , Martin Jay Seamons , Bok Hoen Kim
IPC分类号： G03F1/00
摘要： The present invention comprises a method of reducing photoresist mask collapse when the photoresist mask is dried after immersion development. As feature sizes continue to shrink, the capillary force of water used to rinse a photoresist mask approaches the point of being greater than adhesion force of the photoresist to the ARC. When the capillary force exceeds the adhesion force, the features of the mask may collapse because the water pulls adjacent features together as the water dries. By depositing a hermetic oxide layer over the ARC before depositing the photoresist, the adhesion force may exceed the capillary force and the features of the photoresist mask may not collapse.
摘要翻译： 本发明包括当浸渍显影后干燥光致抗蚀剂掩模时减少光致抗蚀剂掩模塌陷的方法。 随着特征尺寸的不断缩小，用于冲洗光致抗蚀剂掩模的水的毛细管力接近光致抗蚀剂对ARC的粘附力。 当毛细管力超过粘附力时，面具的特征可能会因为水干燥而将相邻的特征拉到一起而崩溃。 通过在沉积光致抗蚀剂之前在ARC上沉积气密的氧化物层，粘合力可能会超过毛细管力，并且光致抗蚀剂掩模的特征可能不会崩溃。
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3.发明申请PLASMA SURFACE TREATMENT TO PREVENT PATTERN COLLAPSE IN IMMERSION LITHOGRAPHY 审中-公开等离子体表面处理，以防止浸渍图中的图案褶皱公开(公告)号：US20110111604A1
公开(公告)日：2011-05-12
申请号：US13007963
申请日：2011-01-17
申请人： Eui Kyoon Kim , Deenesh Padhi , Huixiong Dai , Mehul Naik , Martin Jay Seamons , Bok Hoen Kim
发明人： Eui Kyoon Kim , Deenesh Padhi , Huixiong Dai , Mehul Naik , Martin Jay Seamons , Bok Hoen Kim
IPC分类号： H01L21/31
摘要： The present invention comprises a method of reducing photoresist mask collapse when the photoresist mask is dried after immersion development. As feature sizes continue to shrink, the capillary force of water used to rinse a photoresist mask approaches the point of being greater than adhesion force of the photoresist to the ARC. When the capillary force exceeds the adhesion force, the features of the mask may collapse because the water pulls adjacent features together as the water dries. By depositing a hermetic oxide layer over the ARC before depositing the photoresist, the adhesion force may exceed the capillary force and the features of the photoresist mask may not collapse.
摘要翻译： 本发明包括当浸渍显影后干燥光致抗蚀剂掩模时减少光致抗蚀剂掩模塌陷的方法。 随着特征尺寸的不断缩小，用于冲洗光致抗蚀剂掩模的水的毛细管力接近光致抗蚀剂对ARC的粘附力。 当毛细管力超过粘附力时，面具的特征可能会因为水干燥而将相邻的特征拉到一起而崩溃。 通过在沉积光致抗蚀剂之前在ARC上沉积气密的氧化物层，粘合力可能会超过毛细管力，并且光致抗蚀剂掩模的特征可能不会崩溃。
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4.发明申请SYSTEMS FOR PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION AND BEVEL EDGE ETCHING 审中-公开等离子体增强化学气相沉积和水平蚀刻系统公开(公告)号：US20120211164A1
公开(公告)日：2012-08-23
申请号：US13456080
申请日：2012-04-25
申请人： Ashish Shah , Dale R. DuBois , Ganesh Balasubramanian , Mark A. Fodor , Eui Kyoon Kim , Chiu Chan , Karthik Janakiraman , Thomas Nowak , Joseph C. Werner , Visweswaren Sivaramakrishnan , Mohamad Ayoub , Amir Al-Bayati , Jianhua Zhou
发明人： Ashish Shah , Dale R. DuBois , Ganesh Balasubramanian , Mark A. Fodor , Eui Kyoon Kim , Chiu Chan , Karthik Janakiraman , Thomas Nowak , Joseph C. Werner , Visweswaren Sivaramakrishnan , Mohamad Ayoub , Amir Al-Bayati , Jianhua Zhou
IPC分类号： H01L21/3065 , C23C16/458 , C23C16/50 , H01L21/306
CPC分类号： H01L21/6719 , H01J37/32366 , H01J2237/3321 , H01L21/67201 , H01L21/67207
摘要： Embodiments described herein relate to a substrate processing system that integrates substrate edge processing capabilities. Illustrated examples of the processing system include, without limitations, a factory interface, a loadlock chamber, a transfer chamber, and one or more twin process chambers having two or more processing regions that are isolatable from each other and share a common gas supply and a common exhaust pump. The processing regions in each twin process chamber include separate gas distribution assemblies and RF power sources to provide plasma at selective regions on a substrate surface in each processing region. Each twin process chamber is thereby configured to allow multiple, isolated processes to be performed concurrently on at least two substrates in the processing regions.
摘要翻译： 本文所述的实施例涉及集成衬底边缘处理能力的衬底处理系统。 处理系统的说明性示例包括但不限于工厂接口，负载锁定室，传送室和具有两个或更多个处理区域的一个或多个双处理室，其可彼此隔离并且共享公共气体供应和 普通排气泵。 每个双处理室中的处理区域包括单独的气体分配组件和RF功率源，以在每个处理区域的衬底表面上的选择性区域提供等离子体。 因此，每个双处理室被配置为允许在处理区域中的至少两个基板上同时执行多个隔离过程。
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公开(公告)号：US08465823B1
公开(公告)日：2013-06-18
申请号：US13334179
申请日：2011-12-22
申请人： Eui Kyoon Kim
发明人： Eui Kyoon Kim
IPC分类号： G11B7/00
CPC分类号： G11B7/252 , Y10T428/21
摘要： An optical media such as an optical tape includes a substrate, a pre-format layer on one side of the substrate, and a back side coating. The back side coating is optically transparent and is electrically conductive. One of the substrate and the pre-format layer is between the back side coating and the other one of the substrate and the pre-format layer.
摘要翻译： 诸如光学胶带的光学介质包括基板，在基板的一侧上的预格式化层和背面涂层。 背面涂层是光学透明的并且是导电的。 衬底和预制图层之一位于背面涂层和衬底和预制图层之间的另一个之间。
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公开(公告)号：US20130167166A1
公开(公告)日：2013-06-27
申请号：US13334179
申请日：2011-12-22
申请人： Eui Kyoon Kim
发明人： Eui Kyoon Kim
CPC分类号： G11B7/252 , Y10T428/21
摘要： An optical media such as an optical tape includes a substrate, a pre-format layer on one side of the substrate, and a back side coating. The back side coating is optically transparent and is electrically conductive. One of the substrate and the pre-format layer is between the back side coating and the other one of the substrate and the pre-format layer.
摘要翻译： 诸如光学胶带的光学介质包括基板，在基板的一侧上的预格式化层和背面涂层。 背面涂层是光学透明的并且是导电的。 衬底和预制图层之一位于背面涂层和衬底和预制图层之间的另一个之间。
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公开(公告)号：US20090017635A1
公开(公告)日：2009-01-15
申请号：US12171708
申请日：2008-07-11
申请人： Ashish Shah , Ganesh Balasubramanian , Dale R. Du Bois , Mark A. Fodor , Eui Kyoon Kim , Chiu Chan , Karthik Janakiraman , Thomas Nowak , Joseph C. Werner , Visweswaren Sivaramakrishnan , Mohamad Ayoub , Amir Al-Bayati , Jianhua Zhou
发明人： Ashish Shah , Ganesh Balasubramanian , Dale R. Du Bois , Mark A. Fodor , Eui Kyoon Kim , Chiu Chan , Karthik Janakiraman , Thomas Nowak , Joseph C. Werner , Visweswaren Sivaramakrishnan , Mohamad Ayoub , Amir Al-Bayati , Jianhua Zhou
IPC分类号： H01L21/302 , C23F1/00
CPC分类号： H01L21/68 , Y10S414/136
摘要： The present invention comprises an apparatus and method for etching at a substrate edge region. In one embodiment, the apparatus comprises a chamber having a process volume, a substrate support arranged inside the process volume and having a substrate support surface, a plasma generator coupled to the chamber and configured to supply an etching agent in a plasma phase to a peripheral region of the substrate support surface, and a gas delivery assembly coupled to a gas source for generating a radial gas flow over the substrate support surface from an approximately central region of the substrate support surface toward the peripheral region of the substrate support surface.
摘要翻译： 本发明包括用于在衬底边缘区域刻蚀的设备和方法。 在一个实施例中，该装置包括具有处理体积的腔室，布置在处理体积内的衬底支撑件并且具有衬底支撑表面，等离子体发生器，耦合到腔室并且被配置为将等离子体相中的蚀刻剂供应到外围 基板支撑表面的区域以及耦合到气体源的气体输送组件，用于从衬底支撑表面的大致中心区域朝向衬底支撑表面的周边区域产生在衬底支撑表面上的径向气流。
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8.发明申请公开(公告)号：US20090014127A1
公开(公告)日：2009-01-15
申请号：US12106881
申请日：2008-04-21
申请人： Ashish Shah , Dale R. DuBois , Ganesh Balasubramanian , Mark A. Fodor , Eui Kyoon Kim , Chiu Chan , Karthik Janakiraman , Thomas Nowak , Joseph C. Werner , Visweswaren Sivaramakrishnan , Mohamad Ayoub , Amir Al-Bayati , Jianhua Zhou
发明人： Ashish Shah , Dale R. DuBois , Ganesh Balasubramanian , Mark A. Fodor , Eui Kyoon Kim , Chiu Chan , Karthik Janakiraman , Thomas Nowak , Joseph C. Werner , Visweswaren Sivaramakrishnan , Mohamad Ayoub , Amir Al-Bayati , Jianhua Zhou
IPC分类号： C23F1/02
CPC分类号： H01L21/6719 , H01J37/32366 , H01J2237/3321 , H01L21/67201 , H01L21/67207
摘要： Embodiments described herein relate to a substrate processing system that integrates substrate edge processing capabilities. Illustrated examples of the processing system include, without limitations, a factory interface, a loadlock chamber, a transfer chamber, and one or more twin process chambers having two or more processing regions that are isolatable from each other and share a common gas supply and a common exhaust pump. The processing regions in each twin process chamber include separate gas distribution assemblies and RF power sources to provide plasma at selective regions on a substrate surface in each processing region. Each twin process chamber is thereby configured to allow multiple, isolated processes to be performed concurrently on at least two substrates in the processing regions.
摘要翻译： 本文所述的实施例涉及集成衬底边缘处理能力的衬底处理系统。 处理系统的说明性示例包括但不限于工厂接口，负载锁定室，传送室和具有两个或更多个处理区域的一个或多个双处理室，其可彼此隔离并且共享公共气体供应和 普通排气泵。 每个双处理室中的处理区域包括单独的气体分配组件和RF功率源，以在每个处理区域的衬底表面上的选择性区域提供等离子体。 因此，每个双处理室被配置为允许在处理区域中的至少两个基板上同时执行多个隔离过程。
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9.发明授权公开(公告)号：US08197636B2
公开(公告)日：2012-06-12
申请号：US12106881
申请日：2008-04-21
申请人： Ashish Shah , Dale R. DuBois , Ganesh Balasubramanian , Mark A. Fodor , Eui Kyoon Kim , Chiu Chan , Karthik Janakiraman , Thomas Nowak , Joseph C. Werner , Visweswaren Sivaramakrishnan , Mohamad Ayoub , Amir Al-Bayati , Jianhua Zhou
发明人： Ashish Shah , Dale R. DuBois , Ganesh Balasubramanian , Mark A. Fodor , Eui Kyoon Kim , Chiu Chan , Karthik Janakiraman , Thomas Nowak , Joseph C. Werner , Visweswaren Sivaramakrishnan , Mohamad Ayoub , Amir Al-Bayati , Jianhua Zhou
IPC分类号： C23F1/00 , C23C16/00 , H01L21/306
CPC分类号： H01L21/6719 , H01J37/32366 , H01J2237/3321 , H01L21/67201 , H01L21/67207
摘要： Embodiments described herein relate to a substrate processing system that integrates substrate edge processing capabilities. Illustrated examples of the processing system include, without limitations, a factory interface, a loadlock chamber, a transfer chamber, and one or more twin process chambers having two or more processing regions that are isolatable from each other and share a common gas supply and a common exhaust pump. The processing regions in each twin process chamber include separate gas distribution assemblies and RF power sources to provide plasma at selective regions on a substrate surface in each processing region. Each twin process chamber is thereby configured to allow multiple, isolated processes to be performed concurrently on at least two substrates in the processing regions.
摘要翻译： 本文所述的实施例涉及集成衬底边缘处理能力的衬底处理系统。 处理系统的说明性示例包括但不限于工厂接口，负载锁定室，传送室和具有两个或更多个处理区域的一个或多个双处理室，其可彼此隔离并且共享公共气体供应和 普通排气泵。 每个双处理室中的处理区域包括单独的气体分配组件和RF功率源，以在每个处理区域的衬底表面上的选择性区域提供等离子体。 因此，每个双处理室被配置为允许在处理区域中的至少两个基板上同时执行多个隔离过程。
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公开(公告)号：US20110318534A1
公开(公告)日：2011-12-29
申请号：US12822592
申请日：2010-06-24
申请人： Eui Kyoon Kim
发明人： Eui Kyoon Kim
CPC分类号： G11B7/252 , G11B7/24009 , G11B7/245 , G11B7/263 , Y10T428/24479
摘要： A method for forming an optical tape for data storage from a substrate film includes a step of patterning a curable liquid composition onto a side of the substrate film. Characteristically, the curable liquid composition includes a free radical photoinitiator and a polymerizable component that includes at least one acrylate. The curable liquid composition is illuminated with actinic radiation to form a patterned imprint layer disposed over the substrate film. A multilayer data recording assembly is placed over the imprint layer. An optical tape made by the method is also provided.
摘要翻译： 从衬底膜形成用于数据存储的光带的方法包括将可固化液体组合物图案化到衬底膜的一侧上的步骤。 特征地，可固化液体组合物包括自由基光引发剂和包含至少一种丙烯酸酯的可聚合组分。 用光化辐射照射可固化液体组合物以形成设置在基底膜上的图案化印记层。 多层数据记录组件放置在压印层上。 还提供了由该方法制成的光带。
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