公开(公告)号：US10227695B2

公开(公告)日：2019-03-12

申请号：US12974365

申请日：2010-12-21

Applicant: Dale R. Du Bois ,  Mohamad A. Ayoub ,  Robert Kim ,  Amit Bansal ,  Mark Fodor ,  Binh Nguyen ,  Siu F. Cheng ,  Hang Yu ,  Chiu Chan ,  Ganesh Balasubramanian ,  Deenesh Padhi ,  Juan Carlos Rocha

Inventor： Dale R. Du Bois ,  Mohamad A. Ayoub ,  Robert Kim ,  Amit Bansal ,  Mark Fodor ,  Binh Nguyen ,  Siu F. Cheng ,  Hang Yu ,  Chiu Chan ,  Ganesh Balasubramanian ,  Deenesh Padhi ,  Juan Carlos Rocha

IPC: C23C14/04 ,  C23C16/04 ,  C23C16/44 ,  C23C16/455 ,  C23C16/458 ,  C30B25/12 ,  H01J37/32 ,  H01J37/34 ,  H01L21/687

Abstract: Embodiments of the invention contemplate a shadow ring that provides increased or decreased and more uniform deposition on the edge of a wafer. By removing material from the top and/or bottom surfaces of the shadow ring, increased edge deposition and bevel coverage can be realized. In one embodiment, the material on the bottom surface is reduced by providing a recessed slot on the bottom surface. By increasing the amount of material of the shadow ring, the edge deposition and bevel coverage is reduced. Another approach to adjusting the deposition at the edge of the wafer includes increasing or decreasing the inner diameter of the shadow ring. The material forming the shadow ring may also be varied to change the amount of deposition at the edge of the wafer.

公开(公告)号：US09230356B2

公开(公告)日：2016-01-05

申请号：US13332315

申请日：2011-12-20

Applicant: Wang Chiu Chan ,  Charles J. Migos ,  Keng Fai Lee ,  M. Frank Emanuel

Inventor： Wang Chiu Chan ,  Charles J. Migos ,  Keng Fai Lee ,  M. Frank Emanuel

IPC: G06T13/00 ,  G06T19/00

CPC classification number: G06T13/00 ,  G06T19/00 ,  G06T2219/024

Abstract: Various features and processes related to document collaboration are disclosed. In some implementations, animations are presented when updating a local document display to reflect changes made to the document at a remote device. In some implementations, a user can selectively highlight changes made by collaborators in a document. In some implementations, a user can select an identifier associated with another user to display a portion of a document that includes the other user's cursor location. In some implementations, text in document chat sessions can be automatically converted into hyperlinks which, when selected, cause a document editor to perform an operation.

Abstract translation: 公开了与文档协作相关的各种特征和过程。 在一些实现中，当更新本地文档显示以反映在远程设备处对文档所做的更改时，呈现动画。 在一些实现中，用户可以有选择地突出显示协作者在文档中所做的更改。 在一些实现中，用户可以选择与另一用户相关联的标识符来显示包括其他用户的光标位置的文档的一部分。 在一些实现中，文档聊天会话中的文本可以自动转换成超链接，当被选择时，文本编辑器执行操作。

公开(公告)号：US20130159830A1

公开(公告)日：2013-06-20

申请号：US13332335

申请日：2011-12-20

Applicant: Keng Fai Lee ,  Alan Chu ,  Wang Chiu Chan ,  On Loy Sung ,  Oi Ying Angela Lee

Inventor： Keng Fai Lee ,  Alan Chu ,  Wang Chiu Chan ,  On Loy Sung ,  Oi Ying Angela Lee

IPC: G06F17/20

CPC classification number: G06F17/2241 ,  G06F17/2235 ,  G06F17/30011 ,  G06Q10/06 ,  G06Q10/10 ,  H04L12/1827 ,  H04L51/046 ,  H04L51/066

Abstract: Various features and processes related to document collaboration are disclosed. In some implementations, animations are presented when updating a local document display to reflect changes made to the document at a remote device. In some implementations, a user can selectively highlight changes made by collaborators in a document. In some implementations, a user can select an identifier associated with another user to display a portion of a document that includes the other user's cursor location. In some implementations, text in document chat sessions can be automatically converted into hyperlinks which, when selected, cause a document editor to perform an operation.

Abstract translation: 公开了与文档协作相关的各种特征和过程。 在一些实现中，当更新本地文档显示以反映在远程设备处对文档所做的更改时，呈现动画。 在一些实现中，用户可以有选择地突出显示协作者在文档中所做的更改。 在一些实现中，用户可以选择与另一用户相关联的标识符来显示包括其他用户的光标位置的文档的一部分。 在一些实现中，文档聊天会话中的文本可以自动转换成超链接，当被选择时，文本编辑器执行操作。

公开(公告)号：US20120080779A1

公开(公告)日：2012-04-05

申请号：US13249794

申请日：2011-09-30

Applicant: Martin Jay SEAMONS ,  Sudha RATHI ,  Kwangduk Douglas LEE ,  Deenesh PADHI ,  Bok Hoen KIM ,  Chiu CHAN

Inventor： Martin Jay SEAMONS ,  Sudha RATHI ,  Kwangduk Douglas LEE ,  Deenesh PADHI ,  Bok Hoen KIM ,  Chiu CHAN

IPC: H01L29/02 ,  C09D1/00 ,  H01L21/31

CPC classification number: H01L21/64 ,  C23C16/0272 ,  C23C16/26 ,  H01L21/02115 ,  H01L21/02274 ,  H01L21/31144

Abstract: Embodiments of the present invention generally relate to the fabrication of integrated circuits and particularly to the deposition of a boron containing amorphous carbon layer on a semiconductor substrate. In one embodiment, a method of processing a substrate in a processing chamber is provided. The method comprises providing a substrate in a processing volume, flowing a hydrocarbon containing gas mixture into the processing volume, generating a plasma of the hydrocarbon containing gas mixture by applying power from an RF source, flowing a boron containing gas mixture into the processing volume, and depositing a boron containing amorphous carbon film on the substrate in the presence of the plasma, wherein the boron containing amorphous carbon film contains from about 30 to about 60 atomic percentage of boron.

Abstract translation: 本发明的实施例一般涉及集成电路的制造，特别涉及在半导体衬底上沉积含硼无定形碳层。 在一个实施例中，提供了一种在处理室中处理衬底的方法。 该方法包括在处理体积中提供衬底，使含烃气体混合物流入处理体积，通过从含有硼的气体混合物流入处理体积的RF源施加功率产生含烃气体混合物的等离子体， 以及在所述等离子体存在下在所述衬底上沉积含硼无定形碳膜，其中所述含硼无定形碳膜含有约30至约60原子百分比的硼。

公开(公告)号：US20110291243A1

公开(公告)日：2011-12-01

申请号：US12790203

申请日：2010-05-28

Applicant: Martin Jay Seamons ,  Kwangduk Douglas Lee ,  Chiu Chan ,  Patrick Reilly ,  Sudha Rathi

Inventor： Martin Jay Seamons ,  Kwangduk Douglas Lee ,  Chiu Chan ,  Patrick Reilly ,  Sudha Rathi

IPC: H01L21/302 ,  H01L23/52 ,  G03F7/20 ,  H01L21/30

CPC classification number: H01L21/02115 ,  H01L21/02274 ,  H01L21/0332 ,  H01L21/0337

Abstract: Methods for manufacturing a semiconductor device in a processing chamber are provided. In one embodiment, a method includes depositing over a substrate a first base material having a first set of interconnect features, filling an upper portion of the first set of interconnect features with an ashable material to an extent capable of protecting the first set of interconnect features from subsequent processes while being easily removable when desired, planarizing an upper surface of the first base material such that an upper surface of the ashable material filled in the first set of interconnect features is at the same level with the upper surface of the first base material, providing a substantial planar outer surface of the first base material, depositing a first film stack comprising a second base material on the substantial planar outer surface of the first base material, forming a second set of interconnect features in the second base material, wherein the second set of interconnect features are aligned with the first set of interconnect features, and removing the ashable material from the first base material, thereby extending a feature depth of the semiconductor device by connecting the second set of interconnect features to the first set of interconnect features. In another embodiment, a method includes providing a base material having a first film stack deposited thereon, wherein the base material is formed over the substrate and having a first set of interconnect features filled with an amorphous carbon material, the first film stack comprising a first amorphous carbon layer deposited on a surface of the base material, a first anti-reflective coating layer deposited on the first amorphous carbon layer, and a first photoresist layer deposited on the first anti-reflective coating layer, and patterning a portion of the first photoresist layer by shifting laterally a projection of a mask on the first photoresist layer relative to the substrate a desired distance, thereby introducing into the first photoresist layer a first feature pattern to be transferred to the underlying base material, wherein the first feature pattern is not aligned with the first set of interconnect features.

公开(公告)号：US20110287633A1

公开(公告)日：2011-11-24

申请号：US12784341

申请日：2010-05-20

Applicant: Kwangduk Douglas Lee ,  Martin Jay Seamons ,  Sudha Rathi ,  Chiu Chan ,  Michael H. Lin

Inventor： Kwangduk Douglas Lee ,  Martin Jay Seamons ,  Sudha Rathi ,  Chiu Chan ,  Michael H. Lin

IPC: H01L21/3105 ,  H01L21/312

CPC classification number: H01L21/02115 ,  C23C16/26 ,  H01L21/02274 ,  H01L21/31144

Abstract: A method of forming an amorphous carbon layer on a substrate in a substrate processing chamber, includes introducing a hydrocarbon source into the processing chamber, introducing argon, alone or in combination with helium, hydrogen, nitrogen, and combinations thereof, into the processing chamber, wherein the argon has a volumetric flow rate to hydrocarbon source volumetric flow rate ratio of about 10:1 to about 20:1, generating a plasma in the processing chamber at a substantially lower pressure of about 2 Torr to 10 Torr, and forming a conformal amorphous carbon layer on the substrate.

Abstract translation: 在基板处理室中的基板上形成无定形碳层的方法包括将烃源引入到处理室中，将氩单独或与氦，氢，氮及其组合单独或组合地引入到处理室中， 其中氩气具有约10:1至约20:1的烃源体积流量比的体积流速，在处理室中以约2托至10托的基本较低的压力产生等离子体，并形成保形 无定形碳层。

公开(公告)号：US07922440B2

公开(公告)日：2011-04-12

申请号：US12171594

申请日：2008-07-11

Applicant: Dale R. Du Bois ,  Ganesh Balasubramanian ,  Mark A. Fodor ,  Chiu Chan ,  Karthik Janakiraman

Inventor： Dale R. Du Bois ,  Ganesh Balasubramanian ,  Mark A. Fodor ,  Chiu Chan ,  Karthik Janakiraman

IPC: B21B39/22 ,  B65G47/22

CPC classification number: H01L21/68 ,  Y10S414/136

Abstract: The present invention comprises an apparatus and method for centering a substrate in a process chamber. In one embodiment, the apparatus comprises a substrate support having a support surface adapted to receive the placement of a substrate and a reference axis substantially perpendicular to the support surface, and a plurality of centering members extending above the support surface. Each centering member is biased into a first position and is movable to a second position by interacting with an opposing member. A movement between the first position and the second position thereby causes each centering member to releasably engage with a peripheral edge of the substrate to push the substrate in a direction toward the reference axis.

Abstract translation: 本发明包括用于使处理室中的衬底居中的装置和方法。 在一个实施例中，该装置包括具有适于接收基板的放置和基本上垂直于支撑表面的参考轴的支撑表面的基板支撑件，以及在支撑表面上方延伸的多个定心构件。 每个定心构件被偏压到第一位置，并且通过与相对构件相互作用而可移动到第二位置。 第一位置和第二位置之间的运动使得每个定心构件可释放地与基板的周缘接合，以沿着基准轴线的方向推动基板。

公开(公告)号：US07562666B2

公开(公告)日：2009-07-21

申请号：US11493543

申请日：2006-07-27

Applicant: Ping Chiu Chan

Inventor： Ping Chiu Chan

IPC: E45B25/04 ,  E45B17/00

CPC classification number: A45B25/143

Abstract: Radially disposed ribs for supporting the canopy of an umbrella are pivotally connected by a crown mounted on the outer end of a rod. A sleeve is in external sliding relationship with the rod. Struts are pivotally connected to the sleeve, each strut being associated with one of the ribs for splaying the ribs and collapsing them inwardly. A support tube is connected by a coaxial shaft to the rod, and the sleeve is telescopically received in the support tube. The shaft is threaded and rotated by motor, opposing ends of the threaded shaft being supported for rotation in first and second journals fixed within the support tube and the rod, respectively. A threaded nut fixedly connected to the sleeve is engaged with the threaded shaft for moving the sleeve along the rod between extended and retracted positions.

Abstract translation: 用于支撑伞的顶盖的径向布置的肋通过安装在杆的外端上的冠部枢转地连接。 套筒与杆体处于外部滑动关系。 支柱枢转地连接到套筒，每个支柱与一个肋条相关联，用于展开肋条并将它们向内折叠。 支撑管通过同轴轴连接到杆上，并且套筒可伸缩地容纳在支撑管中。 轴被螺纹旋转并由电动机旋转，螺纹轴的相对端被分别支撑在第一和第二轴颈中，以固定在支撑管和杆内。 固定地连接到套筒的螺纹螺母与螺纹轴接合，用于沿延伸和缩回位置之间的杆移动套筒。

公开(公告)号：US07505506B1

公开(公告)日：2009-03-17

申请号：US11067148

申请日：2005-02-25

Applicant: Goran Djuknic ,  Chi Chiu Chan ,  Robert W. Smid

Inventor： Goran Djuknic ,  Chi Chiu Chan ,  Robert W. Smid

IPC: H04B1/00

CPC classification number: H04L5/0021

Abstract: A method of generating a composite signal includes the steps of: (a) generating a plurality of sub-carriers, each sub-carrier having a different frequency position in a frequency spectrum; (b) generating a plurality of codes; and (c) forming a plurality of code combinations from the plurality of codes generated in step (b). The method also includes the steps of (d) first modulating each sub-carrier using a respective one of the code combinations formed in step (c) to form a plurality of modulated sub-carriers; and (e) second modulating in-phase and quadrature components of a base carrier using the plurality of modulated sub-carriers to form the composite signal having multiple carriers. The composite signal is a constant envelope signal, and a single sideband signal.

Abstract translation: 一种生成复合信号的方法包括以下步骤：（a）产生多个子载波，每个副载波在频谱中具有不同的频率位置; （b）生成多个代码; 和（c）从步骤（b）中生成的多个代码形成多个代码组合。 该方法还包括以下步骤：（d）使用步骤（c）中形成的代码组合中的相应一个来对每个子载波进行首先调制以形成多个调制子载波; 以及（e）使用所述多个调制子载波的第二调制基带载波的同相和正交分量，以形成具有多载波的复合信号。 复合信号是恒定包络信号和单边带信号。

公开(公告)号：US20090044753A1

公开(公告)日：2009-02-19

申请号：US12255638

申请日：2008-10-21

Applicant: Deenesh Padhi ,  Chiu Chan ,  Sudha Rathi ,  Ganesh Balasubramanian ,  Jianhua Zhou ,  Karthik Janakiraman ,  Martin J. Seamons ,  Visweswaren Sivaramakrishnan ,  Derek R. Witty ,  Hichem M'Saad

Inventor： Deenesh Padhi ,  Chiu Chan ,  Sudha Rathi ,  Ganesh Balasubramanian ,  Jianhua Zhou ,  Karthik Janakiraman ,  Martin J. Seamons ,  Visweswaren Sivaramakrishnan ,  Derek R. Witty ,  Hichem M'Saad

IPC: H01L21/30

CPC classification number: C23C16/45565 ,  C23C16/0254 ,  C23C16/26 ,  C23C16/4404

Abstract: An article having a protective coating for use in semiconductor applications and methods for making the same are provided. In certain embodiments, a method of coating an aluminum surface of an article utilized in a semiconductor processing chamber is provided. The method comprises providing a processing chamber; placing the article into the processing chamber; flowing a first gas comprising a carbon source into the processing chamber; flowing a second gas comprising a nitrogen source into the processing chamber; forming a plasma in the chamber; and depositing a coating material on the aluminum surface. In certain embodiments, the coating material comprises an amorphous carbon nitrogen containing layer. In certain embodiments, the article comprises a showerhead configured to deliver a gas to the processing chamber.

Abstract translation: 提供了具有用于半导体应用的保护涂层的制品及其制造方法。 在某些实施例中，提供了在半导体处理室中使用的制品的铝表面的涂覆方法。 该方法包括提供处理室; 将物品放入处理室; 将包含碳源的第一气体流入所述处理室; 将包含氮源的第二气体流入所述处理室; 在室内形成等离子体; 以及在铝表面上沉积涂层材料。 在某些实施方案中，涂层材料包含无定形含碳氮层。 在某些实施例中，制品包括构造成将气体输送到处理室的喷头。