摘要:
There is provided a bolt support structure which can absorb displacement of a bus bar and prevent the bus bar from bending during fastening of bolt, having a bolt including a head portion and a shaft portion and a mount portion to which the head portion is mounted movable in an axial direction of the shaft portion. The mount portion includes a bottom and upper plates between which a large-diameter portion of the head portion is positioned. The shaft portion and a small-diameter portion of the head portion are passed through a notch of the upper plate. A gap between the bottom and upper plates is larger than the thickness of the large-diameter portion. After the head portion is mounted to the mount portion, the nut is attached to the shaft portion so that the bus bar and the terminal clamp are sandwiched between the head portion and the nut.
摘要:
There is provided a bolt support structure which can absorb displacement of a bus bar and prevent the bus bar from bending during fastening of bolt, having a bolt including a head portion and a shaft portion and a mount portion to which the head portion is mounted movable in an axial direction of the shaft portion. The mount portion includes a bottom and upper plates between which a large-diameter portion of the head portion is positioned. The shaft portion and a small-diameter portion of the head portion are passed through a notch of the upper plate. A gap between the bottom and upper plates is larger than the thickness of the large-diameter portion. After the head portion is mounted to the mount portion, the nut is attached to the shaft portion so that the bus bar and the terminal clamp are sandwiched between the head portion and the nut.
摘要:
A composition comprising an acrylamide compound (A1) having an ester structure and a molecular weight of from 150 to 200 and an acylphosphine oxide polymerization initiator (B1) is provided.
摘要:
A composition comprising an acrylamide compound (A1) having an ester structure and a molecular weight of from 150 to 200 and an acylphosphine oxide polymerization initiator (B1) is provided.
摘要:
An object of the present invention is to provide a waterproof box capable of improving waterproof performance, and workability and space-saving. The washing water hits the lower face of the first waterproof part in the upper cover, and the upper cover is uplifted, at this time the tapered outer face and the inner face in the first waterproof part and are abutted and engaged to each other, causing the inlet of the small passage to close. Even if water infiltrates, the water infiltrates into the dead end to let the momentum thereof reduce. Further, the water infiltrates into the dead end let the momentum thereof reduce. The water its momentum have been reduced falls. Consequently, it is effective for enhancing waterproof performance to include the dead end.
摘要:
There is provided an information processing system that includes an information processing terminal equipped with an IC chip capable of non-contact communication with a reader/writer, a data provider device that stores a first data record for creating service data, and a control information processing device that creates the service data and transmits the service data to the information processing terminal. The information processing terminal includes a terminal communication portion that acquires the first data record from the data provider device and transmits the first data record to the control information processing device. The control information processing device includes a control communication portion that receives the first data record, a control storage portion that stores a second data record for creating the service data, and a data creation portion that creates the service data based on the first data record and the second data record.
摘要:
A shrinkage suppression layer used in the production of a ceramic substrate according to a non-shrinkage process provides favorable removal performance while sufficiently ensuring the restraining performance of the shrinkage suppression layer. Resin beads, which disappear at a temperature lower than the sintering temperature of a low-temperature sintering ceramic material of a base material layer to form open bores in a shrinkage suppression layer, are added to the shrinkage suppression layer and dispersed uniformly at least in a principal surface direction. The shrinkage suppression layer provides sufficient restraining performance to the base material layer in the step of firing, and after the firing, forms open bores, thereby improving the removal performance of the shrinkage suppression layer.
摘要:
A method has been disclosed which cleans a semiconductor substrate using a cleaning liquid produced by mixing bubbles of a gas into an acid solution in which the gas has been dissolved to the saturated concentration and which brings the zeta potentials of the semiconductor substrate and adsorbed particles into the negative region by the introduction of an interfacial active agent. Alternatively, a semiconductor substrate is cleaned using a cleaning liquid produced by mixing bubbles of a gas into an alkaline solution in which the gas has been dissolved to the saturated concentration and whose pH is 9 or more.
摘要:
An information processing apparatus according to the present application includes a first application allowed to access the IC chip, including an IC chip in which predetermined data is recorded, an IC chip reading unit that reads the data recorded in the IC chip, and a signature data generation unit that generates signature data by performing encryption processing on the recorded data read by the IC chip reading unit and a second application not allowed to access the IC chip, including a server access unit that requests acquisition of content from an information providing server by receiving the signature data and the recorded data from the first application and transmitting the signature data and the recorded data to the information providing server that provides predetermined content.
摘要:
A method of manufacturing a semiconductor device includes removing a part of a semiconductor substrate to form a protruding portion and a recess portion in a surface area of the semiconductor substrate, forming a first epitaxial semiconductor layer in the recess portion, forming a second epitaxial semiconductor layer on the protruding portion and the first epitaxial semiconductor layer, removing a first part of the second epitaxial semiconductor layer with a second part of the second epitaxial semiconductor layer left to expose a part of the first epitaxial semiconductor layer, and etching the first epitaxial semiconductor layer from the exposed part of the first epitaxial semiconductor layer to form a cavity under the second part of the second epitaxial semiconductor layer.