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1.发明授权Objectives as a microlithography projection objective with at least one liquid lens 有权目标作为具有至少一个液体透镜的微光刻投影物镜公开(公告)号：US07428105B2
公开(公告)日：2008-09-23
申请号：US11758363
申请日：2007-06-05
CPC分类号： G02B3/12 , G02B17/0812 , G02B17/0856 , G03F7/70225 , G03F7/70241 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： The invention relates to an objective designed as a microlithography projection objective for an operating wavelength. The objective has a greatest adjustable image-side numerical aperture NA, at least one first lens made from a solid transparent body, in particular glass or crystal, with a refractive index nL and at least one liquid lens (F) made from a transparent liquid, with a refractive index nF. At the operating wavelength the first lens has the greatest refractive index nL of all solid lenses of the objective, the refractive index nF of the at least one liquid lens (F) is bigger than the refractive index nL of the first lens and the value of the numerical aperture NA is bigger than 1.
摘要翻译： 本发明涉及被设计为用于工作波长的微光刻投射物镜的物镜。 目标具有最大的可调节图像侧数值孔径NA，由实心透明体，特别是玻璃或晶体制成的至少一个第一透镜，具有折射率n L L和至少一个液体透镜 （F）由透明液体制成，具有折射率n F F。 在工作波长下，第一透镜具有物镜的所有实心透镜的最大折射率n L L，所述至少一个液体透镜的折射率n F ）大于第一透镜的折射率nLL ，并且数值孔径NA的值大于1。
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2.发明申请OBJECTIVES AS A MICROLITHOGRAPHY PROJECTION OBJECTIVE WITH AT LEAST ONE LIQUID LENS 有权目标作为目标与一个液晶镜头的微观图像投影公开(公告)号：US20080030869A1
公开(公告)日：2008-02-07
申请号：US11758363
申请日：2007-06-05
IPC分类号： G02B3/12
CPC分类号： G02B3/12 , G02B17/0812 , G02B17/0856 , G03F7/70225 , G03F7/70241 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： The invention relates to an objective designed as a microlithography projection objective for an operating wavelength. The objective has a greatest adjustable image-side numerical aperture NA, at least one first lens made from a solid transparent body, in particular glass or crystal, with a refractive index nL and at least one liquid lens (F) made from a transparent liquid, with a refractive index nF. At the operating wavelength the first lens has the greatest refractive index nL of all solid lenses of the objective, the refractive index nF of the at least one liquid lens (F) is bigger than the refractive index nL of the first lens and the value of the numerical aperture NA is bigger than 1.
摘要翻译： 本发明涉及被设计为用于工作波长的微光刻投射物镜的物镜。 目标具有最大的可调节图像侧数值孔径NA，由实心透明体，特别是玻璃或晶体制成的至少一个第一透镜，具有折射率n L L和至少一个液体透镜 （F）由透明液体制成，具有折射率n F F。 在工作波长下，第一透镜具有物镜的所有实心透镜的最大折射率n L L，所述至少一个液体透镜的折射率n F ）大于第一透镜的折射率nLL ，并且数值孔径NA的值大于1。
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3.发明授权Arrangement of optical elements in a microlithographic projection exposure apparatus 失效微光刻投影曝光装置中的光学元件的布置公开(公告)号：US07474469B2
公开(公告)日：2009-01-06
申请号：US11232606
申请日：2005-09-22
申请人： Michael Totzeck , Gerhart Fuerter , Olaf Dittmann , Karl-Heinz Schuster , David Shafer , Susanne Beder , Wolfgang Singer
发明人： Michael Totzeck , Gerhart Fuerter , Olaf Dittmann , Karl-Heinz Schuster , David Shafer , Susanne Beder , Wolfgang Singer
CPC分类号： G02B3/12 , G02B17/0812 , G02B17/0856 , G03F7/70225 , G03F7/70241 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： The invention relates to an arrangement of optical elements in a microlithographic projection exposure apparatus, particularly in a projection objective of a microlithographic projection exposure apparatus. The arrangement comprises a rigid first optical element, a rigid second optical element with a first optical surface and a second optical surface on opposite sides and a first liquid. The first optical element has a concave optical surface. The first side of the second optical element is facing the concave optical surface of the first optical element. The first liquid is at least partially filling the space between the first optical element and the second optical element.
摘要翻译： 本发明涉及微光刻投影曝光装置中的光学元件的布置，特别是在微光刻投影曝光装置的投影物镜中。 该装置包括刚性第一光学元件，具有第一光学表面的刚性第二光学元件和在相对侧上的第二光学表面和第一液体。 第一光学元件具有凹面光学表面。 第二光学元件的第一面面对第一光学元件的凹面光学表面。 第一液体至少部分地填充第一光学元件和第二光学元件之间的空间。
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公开(公告)号：US07466489B2
公开(公告)日：2008-12-16
申请号：US11151465
申请日：2005-06-14
CPC分类号： G02B17/0892 , B82Y10/00 , G02B17/0804 , G02B17/0812 , G03F7/70225 , G03F7/70325 , G03F7/70341 , G03F7/70958
摘要： A projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective suitable for microlithography projection exposure machines has a plurality of optical elements transparent for radiation at an operating wavelength of the projection objective. At least one optical element is a high-index optical element made from a high-index material with a refractive index n≧1.6 at the operating wavelength.
摘要翻译： 用于将设置在投影物镜的物平面中的图案成像到投影物镜的适合于微光刻投影曝光机的投影物镜的平面上的投影物镜具有在投影物镜的工作波长处对于辐射而透明的多个光学元件。 至少一个光学元件是在工作波长处由折射率n> = 1.6的高折射率材料制成的高折射率光学元件。
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公开(公告)号：US20060012885A1
公开(公告)日：2006-01-19
申请号：US11151465
申请日：2005-06-14
IPC分类号： G02B3/00
CPC分类号： G02B17/0892 , B82Y10/00 , G02B17/0804 , G02B17/0812 , G03F7/70225 , G03F7/70325 , G03F7/70341 , G03F7/70958
摘要： A projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective suitable for microlithography projection exposure machines has a plurality of optical elements transparent for radiation at an operating wavelength of the projection objective. At least one optical element is a high-index optical element made from a high-index material with a refractive index n≧1.6 at the operating wavelength.
摘要翻译： 用于将设置在投影物镜的物平面中的图案成像到投影物镜的适合于微光刻投影曝光机的投影物镜的平面上的投影物镜具有在投影物镜的工作波长处对于辐射而透明的多个光学元件。 至少一个光学元件是在工作波长处由折射率n> = 1.6的高折射率材料制成的高折射率光学元件。
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公开(公告)号：US07782538B2
公开(公告)日：2010-08-24
申请号：US12269686
申请日：2008-11-12
CPC分类号： G02B17/0892 , B82Y10/00 , G02B17/0804 , G02B17/0812 , G03F7/70225 , G03F7/70325 , G03F7/70341 , G03F7/70958
摘要： A projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective suitable for microlithography projection exposure machines has a plurality of optical elements transparent for radiation at an operating wavelength of the projection objective. At least one optical element is a high-index optical element made from a high-index material with a refractive index n≧1.6 at the operating wavelength.
摘要翻译： 用于将设置在投影物镜的物平面中的图案成像到投影物镜的适合于微光刻投影曝光机的投影物镜的平面上的投影物镜具有在投影物镜的工作波长处对于辐射而透明的多个光学元件。 至少一个光学元件是在工作波长处由折射率n≥1.6的高折射率材料制成的高折射率光学元件。
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公开(公告)号：US20090059385A1
公开(公告)日：2009-03-05
申请号：US12269686
申请日：2008-11-12
IPC分类号： G02B9/00
CPC分类号： G02B17/0892 , B82Y10/00 , G02B17/0804 , G02B17/0812 , G03F7/70225 , G03F7/70325 , G03F7/70341 , G03F7/70958
摘要： A projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective suitable for microlithography projection exposure machines has a plurality of optical elements transparent for radiation at an operating wavelength of the projection objective. At least one optical element is a high-index optical element made from a high-index material with a refractive index n≧1.6 at the operating wavelength.
摘要翻译： 用于将设置在投影物镜的物平面中的图案成像到投影物镜的适合于微光刻投影曝光机的投影物镜的平面上的投影物镜具有在投影物镜的工作波长处对于辐射而透明的多个光学元件。 至少一个光学元件是在工作波长处由折射率n> = 1.6的高折射率材料制成的高折射率光学元件。
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8.发明授权Objectives as a microlithography projection objective with at least one liquid lens 有权目标作为具有至少一个液体透镜的微光刻投影物镜公开(公告)号：US07385764B2
公开(公告)日：2008-06-10
申请号：US10562257
申请日：2004-12-14
CPC分类号： G02B3/12 , G02B17/0812 , G02B17/0856 , G03F7/70225 , G03F7/70241 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： The invention relates to an objective designed as a microlithography projection objective for an operating wavelength. The objective has a greatest adjustable image-side numerical aperture NA, at least one first lens made from a solid transparent body, in particular glass or crystal, with a refractive index nL and at least one liquid lens (F) made from a transparent liquid, with a refractive index NF. At the operating wavelength the first lens has the greatest refractive index nL of all solid lenses of the objective, the refractive index nF of the at least one liquid lens (F) is bigger than the refractive index nL of the first lens and the value of the numerical aperture NA is bigger than 1.
摘要翻译： 本发明涉及被设计为用于工作波长的微光刻投射物镜的物镜。 目标具有最大的可调节图像侧数值孔径NA，由实心透明体，特别是玻璃或晶体制成的至少一个第一透镜，具有折射率n L L和至少一个液体透镜 （F）由折射率为NF的透明液体制成。 在工作波长处，第一透镜具有物镜的所有实心透镜的最大折射率n L L，所述至少一个液体透镜的折射率n F ）大于第一透镜的折射率nLL ，并且数值孔径NA的值大于1。
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公开(公告)号：US07592598B2
公开(公告)日：2009-09-22
申请号：US12257910
申请日：2008-10-24
申请人： Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
发明人： Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
CPC分类号： G21K1/06 , B82Y10/00 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/702 , G03F7/70233 , G03F7/70358
摘要： There is provided a projection objective for a projection exposure apparatus that has a primary light source for emitting electromagnetic radiation having a chief ray with a wavelength ≦193 nm. The projection objective includes an object plane, a first mirror, a second mirror, a third mirror, a fourth mirror; and an image plane. The object plane, the first mirror, the second mirror, the third mirror, the fourth mirror and the image plane are arranged in a centered arrangement around a common optical axis. The first mirror, the second mirror, the third mirror, and the fourth mirror are situated between the object plane and the image plane. The chief ray, when incident on an object situated in the object plane, in a direction from the primary light source, is inclined away from the common optical axis.
摘要翻译： 提供一种用于投影曝光装置的投影物镜，其具有用于发射具有波长<= 193nm的主射线的电磁辐射的主光源。 投影物镜包括物平面，第一镜，第二镜，第三镜，第四镜; 和一个图像平面。 物体平面，第一反射镜，第二反射镜，第三反射镜，第四反射镜和像平面以围绕公共光轴的中心布置布置。 第一镜，第二镜，第三镜和第四镜位于物平面和像平面之间。 当从主光源方向入射到物平面中的物体上时，主光线远离公共光轴倾斜。
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公开(公告)号：US20090015812A1
公开(公告)日：2009-01-15
申请号：US12212926
申请日：2008-09-18
申请人： Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Wolfgang Singer , Martin Antoni , Joachim Wietzorrek , Joachim Hainz
发明人： Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Wolfgang Singer , Martin Antoni , Joachim Wietzorrek , Joachim Hainz
IPC分类号： G03B27/54
CPC分类号： G21K1/06 , B82Y10/00 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/702 , G03F7/70233 , G03F7/70358
摘要： There is provided an illumination system for scannertype microlithography along a scanning direction with a light source emitting a wavelength ≦193 nm. The illumination system includes a plurality of raster elements. The plurality of raster elements is imaged into an image plane of the illumination system to produce a plurality of images being partially superimposed on a field in the image plane. The field defines a non-rectangular intensity profile in the scanning direction.
摘要翻译： 提供了一种用于沿着扫描方向进行扫描器微光刻的照明系统，其中发射波长<= 193nm的光源。 照明系统包括多个光栅元件。 将多个光栅元件成像为照明系统的图像平面，以产生部分地叠加在图像平面中的场上的多个图像。 该场在扫描方向上定义非矩形强度分布。
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