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    Method of manufacturing an optical element
    2.
    发明授权
    Method of manufacturing an optical element 有权
    制造光学元件的方法

    公开(公告)号：US07728987B2

    公开(公告)日：2010-06-01

    申请号：US11596187

    申请日：2004-05-14

    申请人： Ralf Arnold ,  Bernd Dörband ,  Frank Schillke ,  Susanne Beder

    发明人： Ralf Arnold ,  Bernd Dörband ,  Frank Schillke ,  Susanne Beder

    IPC分类号： G01B11/02

    CPC分类号： G01B11/2441

    摘要： A method of manufacturing an optical element includes testing the optical element by using an interferometer optics generating a beam of measuring light illuminating only a sub-aperture of the tested optical element. The interferometer optics comprises a hologram. Results of the sub-aperture measurement are stitched together to obtain a measuring result with respect to the full surface of the optical element. Further, a method of calibrating the interferometer optics includes performing an interferometric measurement using a calibrating optics having a hologram covering only a sub-aperture of the full cross section of the beam of measuring light generated by the interferometer optics and stitching together the sub-aperture measurements to obtain a result indicative for the full cross section of the interferometer optics.

    摘要翻译： 制造光学元件的方法包括通过使用产生仅照射被测光学元件的子孔径的测量光束的干涉仪光学元件来测试光学元件。 干涉仪光学器件包括全息图。 子孔径测量的结果被缝合在一起以获得关于光学元件的整个表面的测量结果。 此外，校准干涉仪光学器件的方法包括使用校准光学器件执行干涉测量，所述校准光学器件具有仅覆盖由干涉仪光学器件产生的测量光束的全部横截面的子孔径并将子孔缝合在一起的全息图 测量以获得指示干涉仪光学器件的完整横截面的结果。

    Projection objective of a microlithographic projection exposure apparatus
    3.
    发明授权
    Projection objective of a microlithographic projection exposure apparatus 失效
    微光刻投影曝光装置的投影目标

    公开(公告)号：US07710640B2

    公开(公告)日：2010-05-04

    申请号：US12138851

    申请日：2008-06-13

    申请人： Susanne Beder ,  Daniel Kraehmer ,  Heiko Feldmann

    发明人： Susanne Beder ,  Daniel Kraehmer ,  Heiko Feldmann

    IPC分类号： G02B13/14

    CPC分类号： G02B13/14 ,  G02B13/143 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70275 ,  G03F7/70341 ,  G03F7/70566 ,  G03F7/70966

    摘要： A projection objective for a microlithographic projection exposure apparatus. The projection objective can project an image of a mask that can be set in position in an object plane onto a light-sensitive coating layer that can be set in position in an image plane. The projection objective can be designed to operate in an immersion mode, and it can produce at least one intermediate image. The projection objective can include an optical subsystem on the image-plane side which projects the intermediate image into the image plane with an image-plane-side projection ratio having an absolute value of at least 0.3.

    摘要翻译： 一种用于微光刻投影曝光装置的投影物镜。 投影物镜可以将可以在物平面中的位置设置的掩模的图像投影到能够被设置在图像平面中的位置的感光涂层上。 投影物镜可以被设计为以浸没模式操作，并且可以产生至少一个中间图像。 投影物镜可以包括图像平面侧的光学子系统，其中间图像以绝对值至少为0.3的像平面侧投影比率投射到像平面中。

    PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
    6.
    发明申请
    PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
    微波投影曝光装置投影目标

    公开(公告)号：US20080304033A1

    公开(公告)日：2008-12-11

    申请号：US12194229

    申请日：2008-08-19

    申请人： Bernhard Kneer ,  Norbert Wabra ,  Toralf Gruner ,  Alexander Epple ,  Susanne Beder ,  Wolfgang Singer

    发明人： Bernhard Kneer ,  Norbert Wabra ,  Toralf Gruner ,  Alexander Epple ,  Susanne Beder ,  Wolfgang Singer

    IPC分类号： G03B27/42 ,  G03B27/54

    CPC分类号： G03F7/70225 ,  G03F7/70241 ,  G03F7/70341 ,  G03F7/70958 ,  G03F7/70966

    摘要： Another approach to decrease the resolution is to introduce an immersion liquid having high refractive index into the gap that remains between a final lens element on the image side of the projection objective and the photoresist or another photosensitive layer to be exposed. Projection objectives that are designed for immersion operation and are therefore also referred to as immersion objective may reach numerical apertures of more than 1, for example 1.3 or 1.4. The term “immersion liquid” shall, in the context of this application, relate also to what is commonly referred to as “solid immersion”. In the case of solid immersion, the immersion liquid is in fact a solid medium that, however, does not get in direct contact with the photoresist but is spaced apart from it by a distance that is only a fraction of the wavelength used. This ensures that the laws of geometrical optics do not apply such that no total reflection occurs.

    摘要翻译： 降低分辨率的另一种方法是将具有高折射率的浸没液体引入保留在投影物镜的像侧上的最终透镜元件与待曝光的光致抗蚀剂或另一光敏层之间的间隙中。 为浸入式操作设计的投影物镜，因此也称为浸没物镜，可达到大于1，例如1.3或1.4的数值孔径。 在本申请的上下文中，术语“浸没液体”还涉及通常称为“固体浸没”的内容。 在固体浸渍的情况下，浸没液实际上是固体介质，然而，其不会与光致抗蚀剂直接接触，而是与其隔开距离，其仅是所使用波长的一部分。 这确保几何光学的定律不适用于不发生全反射。

    Objectives as a microlithography projection objective with at least one liquid lens
    10.
    发明授权
    Objectives as a microlithography projection objective with at least one liquid lens 有权
    目标作为具有至少一个液体透镜的微光刻投影物镜

    公开(公告)号：US07428105B2

    公开(公告)日：2008-09-23

    申请号：US11758363

    申请日：2007-06-05

    申请人： David R. Shafer ,  Susanne Beder ,  Karl-Heinz Schuster ,  Wolfgang Singer

    发明人： David R. Shafer ,  Susanne Beder ,  Karl-Heinz Schuster ,  Wolfgang Singer

    IPC分类号： G02B9/00 ,  G02B1/06

    CPC分类号： G02B3/12 ,  G02B17/0812 ,  G02B17/0856 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70341 ,  G03F7/70958 ,  G03F7/70966

    摘要： The invention relates to an objective designed as a microlithography projection objective for an operating wavelength. The objective has a greatest adjustable image-side numerical aperture NA, at least one first lens made from a solid transparent body, in particular glass or crystal, with a refractive index nL and at least one liquid lens (F) made from a transparent liquid, with a refractive index nF. At the operating wavelength the first lens has the greatest refractive index nL of all solid lenses of the objective, the refractive index nF of the at least one liquid lens (F) is bigger than the refractive index nL of the first lens and the value of the numerical aperture NA is bigger than 1.

    摘要翻译： 本发明涉及被设计为用于工作波长的微光刻投射物镜的物镜。 目标具有最大的可调节图像侧数值孔径NA，由实心透明体，特别是玻璃或晶体制成的至少一个第一透镜，具有折射率n L L和至少一个液体透镜 （F）由透明液体制成，具有折射率n F F。 在工作波长下，第一透镜具有物镜的所有实心透镜的最大折射率n L L，所述至少一个液体透镜的折射率n F ）大于第一透镜的折射率nLL ，并且数值孔径NA的值大于1。