Abstract:
It is an object of the present invention to allow a cell to produce a protein at a high level using a medium containing an enzymatic degradation product of fish meat or a fish meat extract. A method of culturing a cell comprising starting culturing in an initial medium and feeding at least once a feed medium to the initial medium during culturing, wherein at least one of the initial medium or the feed medium contains an enzymatic degradation product of fish meat or a fish meat extract added thereto. A method of producing a protein of interest using the above culture method.
Abstract:
A Petunia variety named ‘Hoobenihime’ particularly distinguished by having red-purple flowers with a dark purple edge and small flower size is disclosed.
Abstract:
An image source apparatus includes: a driver, operable to send the image data to the printer and to cause the printer to execute the printing based on the image data, in accordance with a prescribed standard; an application processor; and a storage. When the driver receives an initialization request from the application processor, the driver, after notifying the application processor of an acknowledgement of the initialization request, carries out an initialization process in accordance with the received initialization request, and the driver, after finishing the initialization process, acquires information on a plurality of items related to a specification of the printer from the printer in accordance with the prescribed standard and stores the information in the storage. When the driver receives an acquisition command for acquiring any of the plurality of items from the application processor, the driver returns information on the item related to the acquisition command to the application processor with reference to the storage.
Abstract:
A charged-particle beam lithography apparatus includes a projection system that projects a charged-particle beam, and images a pattern on a substrate with the projected charged-particle beam. The projection system has a symmetrical magnetic doublet lens configured to generate a magnetic field, and an electro-static lens configured to generate an electrical field superimposed on the magnetic field. The electro-static lens includes an electrode configured to apply, on at least the pupil plane of the symmetrical magnetic doublet lens, a potential to accelerate a charged-particle beam that has entered the symmetrical magnetic double lens.
Abstract:
This invention discloses a charged-particle beam lithography apparatus which comprises a projection system which projects a charged-particle beam, and images a pattern on a substrate with the projected charged-particle beam. The projection system comprises a symmetrical magnetic doublet lens configured to generate a magnetic field, and an electro-static lens configured to generate an electric field superimposed on the magnetic field. The electro-static lens includes an electrode configured to apply, on at least the pupil plane of the symmetrical magnetic doublet lens, a potential to accelerate the charged-particle beam which has entered the symmetrical magnetic doublet lens.
Abstract:
This invention provides an electron beam projection exposure apparatus which can obtain a large irradiation width while maintaining an electron beam intensity required for exposure. An electron beam emitted by an electron gun (1) is transmitted through a condenser lens (2) and field lens (3), and illuminates a mask (4). The electron beam transmitted through the mask (4) is imaged and irradiated onto a wafer (7) via reduction projection lenses (5, 6), thus forming a pattern on the mask (4) on the wafer (7) by exposure. The electron gun (1) has an electron source, an electron emission surface of which has a circularly recessed central portion, and a ring-shaped electron beam emitted by the peripheral portion of the electron emission surface is used in exposure.
Abstract:
An alignment system for aligning a mask and a wafer each having an alignment mark, includes an irradiation system for irradiating the alignment marks of the mask and the wafer with an electron beam, a detecting system for detecting the amount of electron beam absorbed by the alignment marks, and an adjusting system for adjusting a relative position of the mask and the wafer, in accordance with the detection, so as to bring the mask and the wafer into a predetermined positional relation.
Abstract:
A polyamide composition comprised of a mixture of 65-95% by weight of polyamide and 35-5% by weight of a copolymer of ethylene series containing unsaturated carboxylic acid components, the mixture having incorporated thereto 0.1-5% by weight of a carbonate compound such as ethylene carbonate or an epoxy compound such as butyl glycidyl ether. This composition is excellent in impact-strength and is thus suitable for use in interior or exterior parts of automobiles and housing materials.
Abstract:
It is an object of the present invention to allow a cell to produce a protein at a high level using a medium containing an enzymatic degradation product of fish meat or a fish meat extract. A method of culturing a cell comprising starting culturing in an initial medium and feeding at least once a feed medium to the initial medium during culturing, wherein at least one of the initial medium or the feed medium contains an enzymatic degradation product of fish meat or a fish meat extract added thereto. A method of producing a protein of interest using the above culture method.