利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

19 条记录 (耗时 0.021 秒)

    Rewriteable Aberration-Corrected Gradient-Index Intraocular Lenses
    2.
    发明申请
    Rewriteable Aberration-Corrected Gradient-Index Intraocular Lenses 审中-公开
    可重写的畸变校正梯度指数眼内镜

    公开(公告)号：US20140316521A1

    公开(公告)日：2014-10-23

    申请号：US14257908

    申请日：2014-04-21

    申请人： The Regents of the University of Colorado, a body corporate

    发明人： Robert R. McLeod ,  Michael Cole

    IPC分类号： A61F2/16 ,  G02C7/02

    CPC分类号： A61F2/1613 ,  A61F2/1624 ,  A61F2/1637 ,  A61F2250/0085 ,  G02C7/022 ,  G02C7/027 ,  G02C7/04 ,  G02C2202/14

    摘要： Systems and methods for rewritable aberration-corrected gradient-index intraocular lenses are provided. Various embodiments relate to rewritable aberration-corrected gradient-index intraocular lenses. Some embodiments provide for polymer materials and processing to create full or partial rewritable phakic or pseudophakic intraocular lenses which allow for adjustable visual performance by doctors. Various methods to fabricate and adjust the lenses with optical and/or mechanical properties customized to the individual patient are also disclosed.

    摘要翻译： 提供了可重写像差校正梯度折射率眼内透镜的系统和方法。 各种实施例涉及可重写像差校正的梯度折射率眼内透镜。 一些实施例提供聚合物材料和加工以产生完全或部分可重写的晶状体或假晶状体眼内透镜，其允许医生进行可调节的视觉表现。 还公开了针对针对个体患者定制的光学和/或机械特性来制造和调节透镜的各种方法。

    Liquid Deposition Photolithography
    3.
    发明申请
    Liquid Deposition Photolithography 有权

    公开(公告)号：US20130252178A1

    公开(公告)日：2013-09-26

    申请号：US13849256

    申请日：2013-03-22

    申请人： The Regents of the University of Colorado, a body corporate

    发明人： Robert R. McLeod ,  Adam Urness ,  Michael Cole ,  Eric Moore

    IPC分类号： G03F7/20

    CPC分类号： G03F7/2041 ,  G03F7/0035 ,  G03F7/2022 ,  G03F7/70 ,  G03F7/70341

    摘要： Systems and methods for liquid deposition photolithography are described. In particular, some embodiments relate to systems and methods for using photolithography to control the 2D structure of a thin layer of material (e.g., photopolymer) using various masks, projection optics and materials. In one or more embodiments, this thin layer can be manipulated by micro-fluidic techniques such that it can be formed, patterned and post-processed in a liquid environment, vastly simplifying the creation of multi-layer structures. Multiple layers are rapidly built up to create thick structures of possibly multiple materials that are currently challenging to fabricate by existing methods.

    Liquid deposition photolithography
    6.
    发明授权
    Liquid deposition photolithography 有权

    公开(公告)号：US10162264B2

    公开(公告)日：2018-12-25

    申请号：US14713748

    申请日：2015-05-15

    申请人： The Regents of the University of Colorado, a body corporate

    发明人： Robert R. McLeod ,  Adam Urness ,  Michael Cole ,  Eric Moore

    IPC分类号： G03F7/20 ,  G03F7/00

    摘要： Systems and methods for liquid deposition photolithography are described. In particular, some embodiments relate to systems and methods for using photolithography to control the 2D structure of a thin layer of material (e.g., photopolymer) using various masks, projection optics and materials. In one or more embodiments, this thin layer can be manipulated by micro-fluidic techniques such that it can be formed, patterned and post-processed in a liquid environment, vastly simplifying the creation of multi-layer structures. Multiple layers are rapidly built up to create thick structures of possibly multiple materials that are currently challenging to fabricate by existing methods.

    Systems and methods for creating aberration-corrected gradient index lenses
    7.
    发明授权
    Systems and methods for creating aberration-corrected gradient index lenses 有权
    用于产生像差校正梯度折射率透镜的系统和方法

    公开(公告)号：US08944594B2

    公开(公告)日：2015-02-03

    申请号：US13715606

    申请日：2012-12-14

    申请人： The Regents of the University of Colorado

    发明人： Robert R. McLeod ,  Michael Cole

    IPC分类号： B29D11/00 ,  G02C7/02

    CPC分类号： G02C7/024 ,  B29D11/00461 ,  G02C2202/22

    摘要： Embodiments include methods, systems, and/or devices that may be used to create aberration-corrected gradient index lenses. In some embodiments, data related to aberration measurements is received. This data is processed and an inverse map is generated to compensate for the aberration measurements. An intensity pattern corresponding to the inverse map is then projected onto a blank lens (e.g., to locally polymerize a mobile monomer) to create an exposed lens with a gradient index to correct for the aberration measurement. For example, in some embodiments, the lens may be an intraocular lens and the data can be generated by using a wavefront sensor to measure aberrations (e.g., an optical phase profile to correct defocus or astigmatism) in a patient's eye.

    摘要翻译： 实施例包括可用于产生像差校正的梯度折射率透镜的方法，系统和/或设备。 在一些实施例中，接收与像差测量有关的数据。 处理该数据，并生成反向映射以补偿像差测量。 然后将与逆映射相对应的强度图案投影到空白透镜（例如，以局部聚合移动单体）上，以产生具有梯度指数的曝光透镜，以校正像差测量。 例如，在一些实施例中，透镜可以是眼内透镜，并且可以通过使用波前传感器来测量患者眼睛中的像差（例如，光学相位曲线以校正散焦或散光）来生成数据。

    Elastomeric reflection suppressor
    8.
    发明授权
    Elastomeric reflection suppressor 有权

    公开(公告)号：US11719859B2

    公开(公告)日：2023-08-08

    申请号：US16571491

    申请日：2019-09-16

    申请人： The Regents of the University of Colorado

    发明人： David Miller ,  Robert R. McLeod

    IPC分类号： G02B1/115 ,  C08L83/04 ,  C08K3/04 ,  G02B5/02 ,  G02B26/08 ,  G02B5/22 ,  B82Y20/00

    CPC分类号： G02B1/115 ,  C08K3/04 ,  C08L83/04 ,  G02B5/0226 ,  G02B5/0294 ,  G02B5/223 ,  G02B26/0875 ,  B82Y20/00

    摘要： Various embodiments of the present technology generally relate to reflection suppressors. More specifically, some embodiments use elastomeric materials doped with optical absorbers for temporary suppression of Fresnel reflections for multiple substrates spanning wide spectral and angular bandwidth. The refractive index of the elastomer can be tuned to match a substrate and thereby minimize reflection. Some embodiments can use the addition of different absorptive dopants to allow for either broadband or wavelength-selective reflection suppression. As performance is limited only by index mismatch, both spectral and angular performance significantly exceed that of anti-reflection coatings. After use, these light traps may be removed and reused without damaging the substrate. These films have uses in spectroscopic ellipsometry, holography, and lithography.