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公开(公告)号：US20210234248A1
公开(公告)日：2021-07-29
申请号：US17155618
申请日：2021-01-22
摘要： A directional coupler includes: a hollow coaxial line including a central conductor forming a main line and an outer conductor surrounding the central conductor and having an opening formed therein; a dielectric substrate covering the opening and provided with film-shaped ground conductors, wherein a film-shaped ground conductor covers a rear surface of the dielectric substrate facing the central conductor via the opening and a film-shaped ground conductor covers a front surface of the dielectric substrate, respectively, and are grounded; and a coupling line provided on the rear surface of the dielectric substrate in a region surrounded by the ground conductor formed on the rear surface and serving as an auxiliary line, wherein the ground conductor formed on the front surface is provided with a conductor-removed portion in which a portion of a conductor film in a region facing the coupling line via the dielectric substrate is removed.
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2.发明申请IMPEDANCE MATCHING SLUG, IMPEDANCE MATCHING DEVICE, ELECTROMAGNETIC WAVE TRANSMISSION DEVICE, ELECTROMAGNETIC WAVE RADIATION DEVICE, AND PLASMA PROCESSING APPARATUS 审中-公开阻抗匹配滑块，阻抗匹配装置，电磁波传输装置，电磁波辐射装置和等离子体处理装置公开(公告)号：US20150348758A1
公开(公告)日：2015-12-03
申请号：US14716175
申请日：2015-05-19
发明人： Hiroyuki MIYASHITA , Taro IKEDA , Yuki OSADA , Tomohito KOMATSU
CPC分类号： H01J37/32229 , H01J37/32311 , H01J37/3244 , H01P5/04
摘要： An impedance matching slug that performs an impedance matching process in a waveguide is axially movably interposed between an outer conductor and an inner conductor of the waveguide. The impedance matching slug includes: a cylindrical first part and a cylindrical second part which are coupled to each other, wherein each of the first part and the second part has an inner circumferential surface facing the inner conductor and an outer circumferential surface facing the outer conductor, wherein the second part is disposed in the outside of the first part in such a manner that the inner circumferential surface of the second part is in contact with the outer circumferential surface of the first part, wherein one of the first part and the second part is constituted by a conductor, and wherein the other of the first part and the second part is constituted by a dielectric.
摘要翻译： 在波导中的外导体和内导体之间轴向可动地插入执行波导中的阻抗匹配处理的阻抗匹配块。 阻抗匹配块包括：彼此耦合的圆柱形第一部分和圆柱形第二部分，其中第一部分和第二部分中的每一个具有面向内部导体的内周面和面向外部导体的外周面 其中，所述第二部分以所述第二部分的内周面与所述第一部分的外周面接触的方式设置在所述第一部分的外侧，其中，所述第一部分和所述第二部分中的一个 由导体构成，并且其中第一部分和第二部分中的另一个由电介质构成。
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公开(公告)号：US20240212985A1
公开(公告)日：2024-06-27
申请号：US18392205
申请日：2023-12-21
发明人： Taro IKEDA , Takeshi ISHIDA , Tomoki HONDA , Hiroyuki MIYASHITA
CPC分类号： H01J37/32174 , H01B9/003 , H01B9/006 , H01J37/3211
摘要： A filter circuit includes a housing made of a conductor and comprising an input port and an output port, each of which comprises an outer conductor and an inner conductor, wherein the housing is configured to have a ground potential together with the outer conductors of the input port and the output port, a first protrusion made of a conductor and connected to the housing, wherein the first protrusion is configured to protrude into the housing, and a power supply line provided within the housing and insulated from the housing. The power supply line includes an input-side conductor which is the inner conductor of the input port, an output-side conductor which is the inner conductor of the output port, and an antenna connected to the input-side conductor and the output-side conductor and formed to surround the first protrusion.
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公开(公告)号：US20210225623A1
公开(公告)日：2021-07-22
申请号：US17149150
申请日：2021-01-14
发明人： Ryoji YAMAZAKI , Hiroyuki MIYASHITA , Mikio SATO
摘要： A plasma observation system includes a plasma processing apparatus which includes a processing container in which a substrate is processed with plasma, and a plurality of observation windows each capable of observing an emission state of the plasma in the processing container; and a measuring device including a light receiver configured to receive a plurality of light beams intersecting in the processing container through a plurality of observation windows, and a controller configured to specify an observation point of the plasma and determine a state of the plasma at the observation point based on the plurality of light beams received by the light receiver.
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公开(公告)号：US20210020477A1
公开(公告)日：2021-01-21
申请号：US16919464
申请日：2020-07-02
IPC分类号： H01L21/67 , F27B17/00 , H01L21/324 , H01L21/66
摘要： An apparatus for heat-treating a substrate includes: a stage where the substrate is disposed; a heating part configured to change an output; a first temperature measurement part configured to measure a temperature at which the substrate is heated; a second temperature measurement part configured to measure the temperature, and having a level of measurement accuracy which is lower than that of the first temperature measurement part in a first temperature region and is higher than that of the first temperature measurement part in a second temperature region; a temperature calculator configured to calculate a weighted average temperature of the temperatures measured by the first and second temperature measurement parts if a reference temperature is in a temperature range between the first and second temperatures, and configured to change a weight of the weighted average temperature; and a controller configured to control the output based on the weighted average temperature.
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公开(公告)号：US20230054452A1
公开(公告)日：2023-02-23
申请号：US17891300
申请日：2022-08-19
发明人： Taro IKEDA , Satoru KAWAKAMI , Hiroyuki MIYASHITA
IPC分类号： H01J37/32 , H01L21/02 , C23C16/34 , C23C16/455
摘要： A semiconductor manufacturing apparatus includes: a processing container that accommodates a substrate holder that holds a plurality of substrates in a shelf shape; a gas supply that supplies a processing gas into the processing container; and a microwave introducer that generates a plasma from the processing gas. The microwave introducer includes: a rectangular waveguide provided along a length direction of the processing container and including a plurality of slots that radiates microwaves; and a phase controller that is provided at an end of the rectangular waveguide and controls a phase of the microwaves propagating in the rectangular waveguide.
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公开(公告)号：US20160358750A1
公开(公告)日：2016-12-08
申请号：US15166561
申请日：2016-05-27
发明人： Taro IKEDA , Hiroyuki MIYASHITA
CPC分类号： H01J37/3222 , H01J37/32266 , H01P1/18 , H01P5/12 , H03H7/40
摘要： A power combiner includes a main body composed of outer and inner conductors, a plurality of power introduction ports configured to introduce electromagnetic wave powers supplied through power supply lines into the main body, a power combining antenna configured to radiate electromagnetic waves to a space between the outer and inner conductors such that the powers are combined, and an output port through which the combined electromagnetic wave is outputted from the main body. The power combining antenna includes a plurality of antenna members, each of which has a first pole and a second pole that is in contact with the inner conductor, and a reflection part configured to reflect the electromagnetic waves.
摘要翻译： 功率组合器包括由外导体和内导体组成的主体，多个功率引入端口，被配置为将通过电源线提供的电磁波引入主体;功率合成天线，被配置为将电磁波辐射到 外部和内部导体，使得功率被组合，以及输出端口，组合的电磁波通过该输出端口从主体输出。 功率合成天线包括多个天线构件，每个天线构件具有与内部导体接触的第一极和第二极以及被配置为反射电磁波的反射部。
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8.发明申请MICROWAVE RADIATION ANTENNA, MICROWAVE PLASMA SOURCE AND PLASMA PROCESSING APPARATUS 有权微波辐射天线，微波等离子体源和等离子体处理装置公开(公告)号：US20140158302A1
公开(公告)日：2014-06-12
申请号：US14095563
申请日：2013-12-03
发明人： Taro IKEDA , Tomohito KOMATSU , Shigeru KASAI , Hiroyuki MIYASHITA , Yuki OSADA , Akira TANIHARA , Yutaka FUJINO
IPC分类号： H01J37/32
CPC分类号： H01J37/3222 , H01J37/32201
摘要： A microwave radiation antenna includes an antenna body having a microwave radiation surface; a processing gas inlet configured to introduce a processing gas into the antenna body; a gas diffusion space configured to diffuse the processing gas in the antenna body; a plurality of gas outlets provided in the antenna body and configured to discharge the processing gas into the chamber; a plurality of slots provided in the antenna body under a state where the slots are separated from the gas diffusion space and the gas outlets; and an annular dielectric member provided in the microwave radiation surface side of the antenna body to cover a slot formation region where the slots are formed. A metal surface wave is formed in the microwave radiation surface by the microwave radiated through the slots and the annular dielectric member and a surface wave plasma is generated by the metal surface wave.
摘要翻译： 微波辐射天线包括具有微波辐射表面的天线体; 处理气体入口，被配置为将处理气体引入到天线体中; 气体扩散空间，其构造成将所述处理气体扩散到所述天线体中; 多个气体出口，其设置在所述天线体中并且被配置为将所述处理气体排出到所述室中; 在槽与气体扩散空间和气体出口分离的状态下设置在天线体中的多个槽; 以及设置在天线体的微波辐射面侧的环状电介质部件，以覆盖形成槽的槽形成区域。 通过微波辐射通过狭缝和环形电介质构成的微波辐射表面形成金属表面波，并通过金属表面波产生表面波等离子体。
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公开(公告)号：US20240297020A1
公开(公告)日：2024-09-05
申请号：US18583943
申请日：2024-02-22
发明人： Taro IKEDA , Yuki OSADA , Hiroyuki MIYASHITA
IPC分类号： H01J37/32
CPC分类号： H01J37/32256 , H01J37/3222 , H01J37/32238 , H01J37/32293
摘要： A plasma processing apparatus includes: a processing container; a resonator configured to resonate electromagnetic waves to be supplied; a slot antenna connected to the resonator; and a transmission window configured to transmit the electromagnetic waves radiated from the slot antenna and supply the electromagnetic waves into the processing container, wherein the resonator includes: an input port including an inner shaft and an outer cylinder; an output port including an inner shaft and an outer cylinder; a power supply fin connecting the inner shaft of the input port and the inner shaft of the output port and provided in the resonator; and a ground fin connected to the outer cylinder of the input port and the outer cylinder of the output port at a same potential and provided to protrude within the resonator so as to be inserted between fins of the power supply fin.
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公开(公告)号：US20240297018A1
公开(公告)日：2024-09-05
申请号：US18589744
申请日：2024-02-28
发明人： Taro IKEDA , Yuki OSADA , Hiroyuki MIYASHITA
IPC分类号： H01J37/32
CPC分类号： H01J37/32183 , H01J37/3211 , H01J2237/327
摘要： A distributor for distributing electromagnetic waves to a plurality of output terminals, the distributor includes: a power supply terminal configured to be electrically connected to a radio-frequency power source configured to be capable of varying frequency; and a plurality of filters provided respectively at the plurality of output terminals to which the electromagnetic waves input to the power supply terminal are distributed. The plurality of filters is configured to have different frequency characteristics.
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