HEAT-RESISTANT POLYMER FILM LAMINATE AND METHOD FOR PRODUCING HEAT-RESISTANT POLYMER FILM LAMINATE

    公开(公告)号:US20220143964A1

    公开(公告)日:2022-05-12

    申请号:US17434405

    申请日:2020-03-30

    申请人: TOYOBO CO., LTD.

    摘要: The present invention enables the achievement of a laminate of heat-resistant polymer films, which does not use a bonding material having inferior heat resistance. According to the present invention, a polyvalent amine compound serving as a reactive compound is applied to heat-resistant polymer films such as PET, PEN or PI films, and the resulting polymer films are superposed upon each other and subsequently subjected to a heat treatment under predetermined conditions, thereby obtaining a laminate of heat-resistant polymer films. Since the thus-obtained laminate does not use a bonding material, the heat resistance is not decreased and the film properties before lamination are not deteriorated. Since the process for obtaining this laminate has excellent productivity, this laminate is useful as a low-cost thick heat-resistant polymer film or sheet of high performance.

    LAMINATE, METHOD FOR MANUFACTURING LAMINATE, AND METHOD FOR MANUFACTURING FLEXIBLE ELECTRONIC DEVICE

    公开(公告)号:US20230271367A1

    公开(公告)日:2023-08-31

    申请号:US18005934

    申请日:2021-07-30

    申请人: TOYOBO CO., LTD.

    IPC分类号: B29C48/21 B29C48/00

    摘要: Provided is a laminate that is useful as a temporary support for producing a large-area, high-definition, flexible electronic device, the laminate having stably low adhesive strength between a heat-resistant polymer film and an inorganic substrate even in the case of a large surface area, and having few blister defects. This laminate has an inorganic substrate, a silane coupling agent layer that includes amino groups, and a heat-resistant polymer film in the stated order, the laminate being characterized in that the elemental nitrogen component ratio in an inorganic-substrate-side peel surface after the heat-resistant polymer film has been peeled from the inorganic substrate at 90° is greater than 3.5 at % and no greater than 11 at %.