公开(公告)号：US20100296769A1

公开(公告)日：2010-11-25

申请号：US12811565

申请日：2008-12-26

申请人： Tadao Ishibashi ,  Kazuhiro Maruyama ,  Kenji Kobayashi ,  Tomoyuki Akeyoshi ,  Nobuhiro Kikuchi ,  Ken Tsuzuki ,  Mitsuteru Ishikawa

发明人： Tadao Ishibashi ,  Kazuhiro Maruyama ,  Kenji Kobayashi ,  Tomoyuki Akeyoshi ,  Nobuhiro Kikuchi ,  Ken Tsuzuki ,  Mitsuteru Ishikawa

IPC分类号： G02F1/035

CPC分类号： G02F1/025 ,  G02F2201/07

摘要： A semiconductor optical modulator that includes a first semiconductor optical waveguide having a laminated structure including a core layer, a first clad layer, a second clad layer, and a barrier layer, the first clad layer and the second clad layer being disposed below and above the core layer, the barrier layer being inserted between the second clad layer and the core layer; a second semiconductor optical waveguide having a laminated structure in which the second clad layer has a p-type semiconductor penetrating locally through a n-type semiconductor in a laminated direction in the laminated structure of the first semiconductor optical waveguide; a first electrode connected to the first clad layer of the first semiconductor optical waveguide; and a second electrode electrically connecting the second clad layer of the first semiconductor optical waveguide and the p-type semiconductor of the second clad layer of the second semiconductor optical waveguide.

摘要翻译： 一种半导体光调制器，包括具有芯层，第一覆层，第二覆层和阻挡层的叠层结构的第一半导体光波导，第一覆层和第二覆层设置在第一半导体光波导的下方和上方 所述阻挡层插入在所述第二覆盖层和所述芯层之间; 具有层叠结构的第二半导体光波导，其中所述第二包层具有在所述第一半导体光波导的层叠结构中在层叠方向上局部穿透n型半导体的p型半导体; 连接到第一半导体光波导的第一包层的第一电极; 以及第二电极，电连接第一半导体光波导的第二包层和第二半导体光波导的第二包层的p型半导体。

公开(公告)号：US08401344B2

公开(公告)日：2013-03-19

申请号：US12811565

申请日：2008-12-26

申请人： Tadao Ishibashi ,  Kazuhiro Maruyama ,  Kenji Kobayashi ,  Tomoyuki Akeyoshi ,  Nobuhiro Kikuchi ,  Ken Tsuzuki ,  Mitsuteru Ishikawa

发明人： Tadao Ishibashi ,  Kazuhiro Maruyama ,  Kenji Kobayashi ,  Tomoyuki Akeyoshi ,  Nobuhiro Kikuchi ,  Ken Tsuzuki ,  Mitsuteru Ishikawa

IPC分类号： G02F1/035

CPC分类号： G02F1/025 ,  G02F2201/07

摘要： A semiconductor optical modulator that includes a first semiconductor optical waveguide having a laminated structure including a core layer, a first clad layer, a second clad layer, and a barrier layer, the first clad layer and the second clad layer being disposed below and above the core layer, the barrier layer being inserted between the second clad layer and the core layer; a second semiconductor optical waveguide having a laminated structure in which the second clad layer has a p-type semiconductor penetrating locally through a n-type semiconductor in a laminated direction in the laminated structure of the first semiconductor optical waveguide; a first electrode connected to the first clad layer of the first semiconductor optical waveguide; and a second electrode electrically connecting the second clad layer of the first semiconductor optical waveguide and the p-type semiconductor of the second clad layer of the second semiconductor optical waveguide.

摘要翻译： 一种半导体光调制器，包括具有芯层，第一覆层，第二覆层和阻挡层的叠层结构的第一半导体光波导，第一覆层和第二覆层设置在第一半导体光波导的下方和上方 所述阻挡层插入在所述第二覆盖层和所述芯层之间; 具有层叠结构的第二半导体光波导，其中所述第二包层具有在所述第一半导体光波导的层叠结构中在层叠方向上局部穿透n型半导体的p型半导体; 连接到第一半导体光波导的第一包层的第一电极; 以及第二电极，电连接第一半导体光波导的第二包层和第二半导体光波导的第二包层的p型半导体。

公开(公告)号：US08031984B2

公开(公告)日：2011-10-04

申请号：US12445616

申请日：2007-10-24

申请人： Tadao Ishibashi ,  Nobuhiro Kikuchi ,  Ken Tsuzuki

发明人： Tadao Ishibashi ,  Nobuhiro Kikuchi ,  Ken Tsuzuki

IPC分类号： G02F1/025

CPC分类号： G02F1/017 ,  B82Y20/00 ,  G02F1/025 ,  G02F2202/101

摘要： The present invention can provide an npin-type optical modulator that has a high withstand voltage and is easily fabricated. A semiconductor optical amplifier (10) according to an embodiment of the present invention is an npin-type semiconductor optical modulator in which layers are sequentially stacked, with a cathode layer (12-1) arranged on the substrate side, including at least a first n-type cladding layer (13-1), a p-type cladding layer (14), a core layer (17) and a second n-type cladding layer (13-2). In this semiconductor optical modulator, the p-type cladding layer (14) is electrically connected to an electrode (18-1) of the cathode layer. Accordingly, the accumulation of holes in the p-type cladding layer associated with light absorption in the npin-type optical modulator can be absorbed in the electrode on the negative side. This npin-type semiconductor optical modulator can be comparatively easily fabricated using conventional semiconductor manufacturing techniques by adopting a mesa type waveguide structure.

摘要翻译： 本发明可以提供一种耐压高且易于制造的npin型光调制器。 根据本发明的实施例的半导体光放大器（10）是其中依次堆叠层的衬底型半导体光调制器，其中布置在衬底侧上的阴极层（12-1）包括至少第一 n型包覆层（13-1），p型包覆层（14），芯层（17）和第二n型包覆层（13-2）。 在该半导体光调制器中，p型覆层（14）与阴极层的电极（18-1）电连接。 因此，能够在负极侧的电极中吸收与npin型光调制器中的光吸收有关的p型覆层的空穴积聚。 通过采用台面型波导结构，可以使用常规的半导体制造技术相对容易地制造该npin型半导体光调制器。

公开(公告)号：US20100296766A1

公开(公告)日：2010-11-25

申请号：US12445616

申请日：2007-10-24

申请人： Tadao Ishibashi ,  Nobuhiro Kikuchi ,  Ken Tsuzuki

发明人： Tadao Ishibashi ,  Nobuhiro Kikuchi ,  Ken Tsuzuki

IPC分类号： G02F1/025

CPC分类号： G02F1/017 ,  B82Y20/00 ,  G02F1/025 ,  G02F2202/101

摘要： The present invention can provide an npin-type optical modulator that has a high withstand voltage and is easily fabricated. A semiconductor optical amplifier (10) according to an embodiment of the present invention is an npin-type semiconductor optical modulator in which layers are sequentially stacked, with a cathode layer (12-1) arranged on the substrate side, including at least a first n-type cladding layer (13-1), a p-type cladding layer (14), a core layer (17) and a second n-type cladding layer (13-2). In this semiconductor optical modulator, the p-type cladding layer (14) is electrically connected to an electrode (18-1) of the cathode layer. Accordingly, the accumulation of holes in the p-type cladding layer associated with light absorption in the npin-type optical modulator can be absorbed in the electrode on the negative side. This npin-type semiconductor optical modulator can be comparatively easily fabricated using conventional semiconductor manufacturing techniques by adopting a mesa type waveguide structure.

摘要翻译： 本发明可以提供一种耐压高且易于制造的npin型光调制器。 根据本发明的实施例的半导体光放大器（10）是其中依次堆叠层的衬底型半导体光调制器，其中布置在衬底侧上的阴极层（12-1）包括至少第一 n型包覆层（13-1），p型包覆层（14），芯层（17）和第二n型包覆层（13-2）。 在该半导体光调制器中，p型覆层（14）与阴极层的电极（18-1）电连接。 因此，能够在负极侧的电极中吸收与npin型光调制器中的光吸收有关的p型覆层的空穴积聚。 通过采用台面型波导结构，可以使用常规的半导体制造技术相对容易地制造该npin型半导体光调制器。

公开(公告)号：US07787736B2

公开(公告)日：2010-08-31

申请号：US12219061

申请日：2008-07-15

申请人： Tadao Ishibashi ,  Seigo Ando ,  Ken Tsuzuki

发明人： Tadao Ishibashi ,  Seigo Ando ,  Ken Tsuzuki

IPC分类号： G02B6/10

CPC分类号： G02F1/01708 ,  B82Y20/00

摘要： The present invention relates to a semiconductor optoelectronic waveguide having a nin-type hetero structure which is able to stably operate an optical modulator. On the upper and lower surfaces of the core layer determined for the structure so that electro-optical effects are effectively exerted at an operating light wavelength and are provided with intermediate clad layers having a band gap which is greater than that of the core layer 11. Respectively on the upper and the lower surface of the intermediate clad layer are provided the clad layers having the band gap which is greater than those of the intermediate clad layers. On the upper surface of the clad layer are sequentially laminated a p-type layer and an n-type layer. In the applied voltage range used under an operating state, a whole region of the p-type layer and a part or a whole region of the n-type layer are depleted.

摘要翻译： 本发明涉及能够稳定地操作光调制器的具有n型异质结构的半导体光电波导。 在对于结构确定的芯层的上表面和下表面上，使得电光效应在工作光波长下有效地施加，并且设置有具有比芯层11的带隙大的带隙的中间包层。 在中间包层的上表面和下表面上分别设置具有大于中间包层的带隙的包覆层。 在包覆层的上表面依次层叠p型层和n型层。 在工作状态下使用的施加电压范围内，p型层的整个区域和n型层的一部分或全部区域耗尽。

公开(公告)号：US20080304786A1

公开(公告)日：2008-12-11

申请号：US12219061

申请日：2008-07-15

申请人： Tadao Ishibashi ,  Seigo Ando ,  Ken Tsuzuki

发明人： Tadao Ishibashi ,  Seigo Ando ,  Ken Tsuzuki

IPC分类号： G02F1/035

CPC分类号： G02F1/01708 ,  B82Y20/00

摘要： The present invention relates to a semiconductor optoelectronic waveguide having a nin-type hetero structure which is able to stably operate an optical modulator. On the upper and lower surfaces of the core layer determined for the structure so that electro-optical effects are effectively exerted at an operating light wavelength and are provided with intermediate clad layers having a band gap which is greater than that of the core layer 11. Respectively on the upper and the lower surface of the intermediate clad layer are provided the clad layers having the band gap which is greater than those of the intermediate clad layers. On the upper surface of the clad layer are sequentially laminated a p-type layer and an n-type layer. In the applied voltage range used under an operating state, a whole region of the p-type layer and a part or a whole region of the n-type layer are depleted.

摘要翻译： 本发明涉及能够稳定地操作光调制器的具有n型异质结构的半导体光电波导。 在对于结构确定的芯层的上表面和下表面上，使得电光效应在工作光波长下有效地施加，并且设置有具有比芯层11的带隙大的带隙的中间包层。 在中间包层的上表面和下表面上分别设置具有大于中间包层的带隙的包覆层。 在包覆层的上表面依次层叠p型层和n型层。 在工作状态下使用的施加电压范围内，p型层的整个区域和n型层的一部分或全部区域耗尽。

公开(公告)号：US07599595B2

公开(公告)日：2009-10-06

申请号：US10574513

申请日：2004-10-04

申请人： Tadao Ishibashi ,  Seigo Ando ,  Ken Tsuzuki

发明人： Tadao Ishibashi ,  Seigo Ando ,  Ken Tsuzuki

IPC分类号： G02B6/10

CPC分类号： G02F1/01708 ,  B82Y20/00

摘要： The present invention relates to a semiconductor optoelectronic waveguide having a nin-type hetero structure which is able to stably operate an optical modulator. On the upper and lower surfaces of the core layer determined for the structure so that electro-optical effects are effectively exerted at an operating light wavelength and are provided with intermediate clad layers having a band gap which is greater than that of the core layer 11. Respectively on the upper and the lower surface of the intermediate clad layer are provided the clad layers having the band gap which is greater than those of the intermediate clad layers. On the upper surface of the clad layer are sequentially laminated a p-type layer and an n-type layer. In the applied voltage range used under an operating state, a whole region of the p-type layer and a part or a whole region of the n-type layer are depleted.

摘要翻译： 本发明涉及能够稳定地操作光调制器的具有n型异质结构的半导体光电波导。 在对于结构确定的芯层的上表面和下表面上，使得电光效应在工作光波长下有效地施加，并且设置有具有比芯层11的带隙大的带隙的中间包层。 在中间包层的上表面和下表面上分别设置具有大于中间包层的带隙的包覆层。 在包覆层的上表面依次层叠p型层和n型层。 在工作状态下使用的施加电压范围内，p型层的整个区域和n型层的一部分或全部区域耗尽。

公开(公告)号：US09006854B2

公开(公告)日：2015-04-14

申请号：US13819559

申请日：2011-09-01

申请人： Tadao Ishibashi ,  Seigo Ando ,  Masahiro Nada ,  Yoshifumi Muramoto ,  Haruki Yokoyama

发明人： Tadao Ishibashi ,  Seigo Ando ,  Masahiro Nada ,  Yoshifumi Muramoto ,  Haruki Yokoyama

IPC分类号： H01L31/107 ,  H01L31/02 ,  H01L31/0224

CPC分类号： H01L31/02002 ,  H01L31/022416 ,  H01L31/03046 ,  H01L31/035281 ,  H01L31/1075 ,  Y02E10/544

摘要： An APD is provided with the semi-insulating substrate, a first mesa having a first laminate constitution in which a p-type electrode layer, a p-type light absorbing layer, a light absorbing layer with a low impurity concentration, a band gap inclined layer, a p-type electric field control layer, an avalanche multiplier layer, an n-type electric field control layer, and an electron transit layer with a low impurity concentration are stacked in this order on a surface of the semi-insulating substrate, a second mesa having an outer circumference provided inside an outer circumference of the first mesa as viewed from the laminating direction and having a second laminate constitution in which an n-type electrode buffer layer and an n-type electrode layer are stacked in this order on a surface on the electron transit layer side, and a depletion control region that is provided in layers on the second mesa side relative to the p-type electric field control layer, formed in an encircling portion provided inside an outer circumference of the first mesa and encircling an outer circumference of the second mesa, and prevents the encircling portion of the p-type electric field control layer from being depleted when bias is applied.

摘要翻译： APD设置有半绝缘基板，第一台面具有第一层叠结构，其中p型电极层，p型光吸收层，具有低杂质浓度的光吸收层，带隙倾斜 层叠，p型电场控制层，雪崩乘法器层，n型电场控制层和具有低杂质浓度的电子传输层依次层叠在半绝缘基板的表面上， 第二台面，其具有从层叠方向观察时设置在第一台面的外周的外周，并且具有第二层叠结构，其中n型电极缓冲层和n型电极层依次层叠在 电子转移层侧的表面和相对于p型电场控制层设置在第二台面侧的层的耗尽控制区域，形成在环状端口 n设置在第一台面的外周内并且围绕第二台面的外周，并且在施加偏压时防止p型电场控制层的环绕部分耗尽。

公开(公告)号：US20130313608A1

公开(公告)日：2013-11-28

申请号：US13981050

申请日：2012-01-20

申请人： Tadao Ishibashi ,  Seigo Ando ,  Yoshifumi Muramoto ,  Toshihide Yoshimatsu ,  Haruki Yokoyama

发明人： Tadao Ishibashi ,  Seigo Ando ,  Yoshifumi Muramoto ,  Toshihide Yoshimatsu ,  Haruki Yokoyama

IPC分类号： H01L29/06

CPC分类号： H01L29/0615 ,  G02F1/025 ,  G02F2001/0157 ,  H01L29/0692 ,  H01L29/0821 ,  H01L29/205 ,  H01L29/41708 ,  H01L29/42304 ,  H01L29/7371 ,  H01L31/03046 ,  H01L31/035281 ,  H01L31/105 ,  Y02E10/544

摘要： A layer in which the potential level difference normally unrequired for device operation is generated is positively inserted in a device structure. The potential level difference has such a function that even if a semiconductor having a small bandgap is exposed on a mesa side surface, a potential drop amount of the portion is suppressed, and a leakage current inconvenient for device operation can be reduced. This effect can be commonly obtained for a heterostructure bipolar transistor, a photodiode, an electroabsorption modulator, and so on. In the photodiode, since the leakage current is alleviated, the device size can be reduced, so that in addition to improvement of operating speed with a reduction in series resistance, it is advantageous that the device can be densely disposed in an array.

摘要翻译： 产生通常不需要用于器件操作的电位电平差的层被积极地插入到器件结构中。 电位差具有这样的功能：即使具有小的带隙的半导体暴露在台面侧表面上，也能够抑制该部分的电位下降量，并且能够减少不利于器件操作的漏电流。 对于异质结双极晶体管，光电二极管，电吸收调制器等，通常可以获得这种效果。 在光电二极管中，由于泄漏电流被减轻，所以能够减小器件尺寸，除了随着串联电阻的降低而提高工作速度之外，还可以将器件密集地排列成阵列。

公开(公告)号：US20130154045A1

公开(公告)日：2013-06-20

申请号：US13819279

申请日：2011-09-01

申请人： Tadao Ishibashi ,  Seigo Ando ,  Masahiro Nada ,  Yoshifumi Muramoto ,  Haruki Yokoyama

发明人： Tadao Ishibashi ,  Seigo Ando ,  Masahiro Nada ,  Yoshifumi Muramoto ,  Haruki Yokoyama

IPC分类号： H01L31/0352

CPC分类号： H01L31/035281 ,  H01L31/03046 ,  H01L31/1075 ,  Y02E10/544

摘要： An APD is provided with a semi-insulating substrate, a first mesa having a first laminate constitution in which a p-type electrode layer, a p-type light absorbing layer, a light absorbing layer with a low impurity concentration, a band gap inclined layer, a p-type electric field control layer, an avalanche multiplier layer, an n-type electric field control layer, and an electron transit layer with a low impurity concentration are stacked in this order on a surface of the semi-insulating substrate, a second mesa having an outer circumference provided inside an outer circumference of the first mesa as viewed from the laminating direction and having a second laminate constitution in which an n-type electrode buffer layer and an n-type electrode layer are stacked in this order on a surface on the electron transit layer side of the first mesa, and in the APD, a total donor concentration of the n-type electric field control layer is lower than a total acceptor concentration of the p-type electric field control layer in a range of 2×1011 to 1×1012/cm2.

摘要翻译： APD设置有半绝缘基板，第一台面具有第一层叠结构，其中p型电极层，p型光吸收层，具有低杂质浓度的光吸收层，带隙倾斜 层叠，p型电场控制层，雪崩乘法器层，n型电场控制层和具有低杂质浓度的电子传输层依次层叠在半绝缘基板的表面上， 第二台面，其具有从层叠方向观察时设置在第一台面的外周的外周，并且具有第二层叠结构，其中n型电极缓冲层和n型电极层依次层叠在 在第一台面的电子转移层侧的表面，并且在APD中，n型电场控制层的总施主浓度低于p型电子的总受主浓度 在2×1011到1×1012 / cm2的范围内的场域控制层。