公开(公告)号：US20080286979A1

公开(公告)日：2008-11-20

申请号：US12220503

申请日：2008-07-24

申请人： Taeho Shin ,  Jingbao Liu ,  Ajey M. Joshi ,  Jong Mun Kim ,  Wei-Te Wu

发明人： Taeho Shin ,  Jingbao Liu ,  Ajey M. Joshi ,  Jong Mun Kim ,  Wei-Te Wu

IPC分类号： H01L21/3065

CPC分类号： H01L21/76802 ,  H01L21/31122 ,  H01L21/31144

摘要： A method of removing a silicon-containing hard polymeric material from an opening leading to a recessed feature during the plasma etching of said recessed feature into a carbon-containing layer in a semiconductor substrate. The method comprises the intermittent use of a cleaning step within a continuous etching process, where at least one fluorine-containing cleaning agent species is added to already present etchant species of said continuous etching process for a limited time period, wherein the length of time of each cleaning step ranges from about 5% to about 100% of the time length of an etch step which either precedes or follows said cleaning step.

摘要翻译： 在将所述凹入特征等离子体蚀刻到半导体衬底中的含碳层中时，从导通凹陷特征的开口去除含硅的硬质聚合物材料的方法。 该方法包括在连续蚀刻过程中间歇地使用清洁步骤，其中在有限时间段内将至少一种含氟清洁剂种类添加到已存在的所述连续蚀刻工艺的蚀刻剂物质中，其中时间长度 每个清洁步骤的范围是在所述清洁步骤之前或之后的蚀刻步骤的时间长度的约5％至约100％。

公开(公告)号：US20080102553A1

公开(公告)日：2008-05-01

申请号：US11555160

申请日：2006-10-31

申请人： TAEHO SHIN ,  Ajey M. Joshi ,  Zhuang Li ,  Wei-Te Wu ,  Jin Chul Son ,  Jong Hun Choi

发明人： TAEHO SHIN ,  Ajey M. Joshi ,  Zhuang Li ,  Wei-Te Wu ,  Jin Chul Son ,  Jong Hun Choi

IPC分类号： H01L21/00

CPC分类号： H01L21/67069 ,  H01L21/0332 ,  H01L21/31122 ,  H01L21/31144

摘要： A process for passivating a carbon-based hard mask, for example, of hydrogenated amorphous carbon, overlying an oxide dielectric which is to be later etched according to the pattern of the hard mask. After the hard mask is photo lithographically etched, it is exposed to a plasma of a hydrogen-containing reducing gas, preferably hydrogen gas, and a fluorocarbon gas, preferably trifluoromethane. The substrate can then be exposed to air without the moisture condensing in the etched apertures of the hard mask.

摘要翻译： 钝化覆盖氧化物电介质的碳氢化硬掩模（例如氢化无定形碳）的方法，该氧化物电介质将根据硬掩模的图案而被蚀刻。 在硬掩模被光刻蚀刻之后，将其暴露于含氢还原气体，优选氢气和碳氟化合物气体，优选三氟甲烷的等离子体。 然后可以将衬底暴露于空气，而不会在硬掩模的蚀刻孔中凝结水分。

公开(公告)号：US20070243714A1

公开(公告)日：2007-10-18

申请号：US11406000

申请日：2006-04-18

申请人： Taeho Shin ,  Jingbao Liu ,  Ajey Joshi ,  Jong Kim ,  Wei-Te Wu

发明人： Taeho Shin ,  Jingbao Liu ,  Ajey Joshi ,  Jong Kim ,  Wei-Te Wu

IPC分类号： H01L21/461 ,  C03C15/00

CPC分类号： H01L21/76802 ,  H01L21/31122 ,  H01L21/31144

摘要： A method of removing a silicon-containing hard polymeric material from an opening leading to a recessed feature during the plasma etching of said recessed feature into a carbon-containing layer in a semiconductor substrate. The method comprises the intermittent use of a cleaning step within a continuous etching process, where at least one fluorine-containing cleaning agent species is added to already present etchant species of said continuous etching process for a limited time period, wherein the length of time of each cleaning step ranges from about 5% to about 100% of the time length of an etch step which either precedes or follows said cleaning step.

摘要翻译： 在将所述凹入特征等离子体蚀刻到半导体衬底中的含碳层中时，从导通凹陷特征的开口去除含硅的硬质聚合物材料的方法。 该方法包括在连续蚀刻过程中间歇地使用清洁步骤，其中在有限时间段内将至少一种含氟清洁剂种类添加到已存在的所述连续蚀刻工艺的蚀刻剂物质中，其中时间长度 每个清洁步骤的范围是在所述清洁步骤之前或之后的蚀刻步骤的时间长度的约5％至约100％。

公开(公告)号：US20090293907A1

公开(公告)日：2009-12-03

申请号：US12246137

申请日：2008-10-06

申请人： Nancy Fung ,  Siyi Li ,  Ying Rui ,  Walter R. Merry ,  Anchel Sheyner ,  Kathryn Keswick ,  Shing-Li Sung ,  Mang-Mang Ling ,  Chia-Ling Kao ,  Wei-Te Wu ,  Kang-Lie Chiang

发明人： Nancy Fung ,  Siyi Li ,  Ying Rui ,  Walter R. Merry ,  Anchel Sheyner ,  Kathryn Keswick ,  Shing-Li Sung ,  Mang-Mang Ling ,  Chia-Ling Kao ,  Wei-Te Wu ,  Kang-Lie Chiang

IPC分类号： B08B6/00

CPC分类号： H01L21/67069 ,  G03F7/427 ,  H01L21/02087 ,  H01L21/0209

摘要： Methods for cleaning a substrate are provided. In one embodiment, the method includes depositing a polymer on a substrate. A cleaning gas is provided to clean a frontside, a bevel edge, and a backside of the substrate. The cleaning gas may include various reactive chemicals such as H2 and N2 in one embodiment. In another embodiment, the cleaning gas may include H2 and H2O. Plasma is initiated from the cleaning gas and used to remove polymer that formed on a bevel edge, backside, or frontside of the substrate during semiconductor processing.

摘要翻译： 提供了清洗基板的方法。 在一个实施方案中，该方法包括在基底上沉积聚合物。 提供清洁气体以清洁基板的前侧，斜边和背面。 在一个实施方案中，清洁气体可以包括各种反应性化学品，例如H 2和N 2。 在另一个实施方案中，清洁气体可以包括H 2和H 2 O. 等离子体从清洁气体引发，并用于去除在半导体处理期间在衬底的斜边缘，背面或前面形成的聚合物。

公开(公告)号：US20110069316A1

公开(公告)日：2011-03-24

申请号：US12798056

申请日：2010-03-29

申请人： Lai-Kwan Chau ,  Wei-Te Wu ,  Tzu-Chien Tsao ,  Chien-Hsing Chen ,  Wan-Yun Li

发明人： Lai-Kwan Chau ,  Wei-Te Wu ,  Tzu-Chien Tsao ,  Chien-Hsing Chen ,  Wan-Yun Li

IPC分类号： G01N21/55 ,  G02B6/02

CPC分类号： G01N21/554 ,  B82Y20/00 ,  G02B6/02052 ,  G02B6/1226

摘要： The present invention discloses a localized plasmon resonance sensing device and a fiber optic structure. The device comprises an optical fiber and a noble metal nanoparticle layer. The optical fiber has a plurality of notches, and such notches are located on the side surface of the optical fiber. The noble metal nanoparticle layer is located at the notch. As a result, when a light is launched into the optical fiber, a detecting unit can be used to detect a localized plasmon resonance signal which is generated by the interaction between the noble metal nanoparticle layer and the light.

摘要翻译： 本发明公开了一种局部等离子体共振感测装置和光纤结构。 该装置包括光纤和贵金属纳米颗粒层。 光纤具有多个凹口，并且这种凹口位于光纤的侧表面上。 贵金属纳米颗粒层位于凹口处。 结果，当光发射到光纤中时，可以使用检测单元来检测由贵金属纳米颗粒层和光之间的相互作用产生的局部等离子体共振信号。

公开(公告)号：US08355134B2

公开(公告)日：2013-01-15

申请号：US12798056

申请日：2010-03-29

申请人： La-Kwan Chau ,  Wei-Te Wu ,  Tzu-Chien Tsao ,  Chien-Hsing Chen ,  Wan-Yun Li

发明人： La-Kwan Chau ,  Wei-Te Wu ,  Tzu-Chien Tsao ,  Chien-Hsing Chen ,  Wan-Yun Li

IPC分类号： G01N21/55 ,  G02B6/02

CPC分类号： G01N21/554 ,  B82Y20/00 ,  G02B6/02052 ,  G02B6/1226

摘要： The present invention discloses a localized plasmon resonance sensing device and a fiber optic structure. The device comprises an optical fiber and a noble metal nanoparticle layer. The optical fiber has a plurality of notches, and such notches are located on the side surface of the optical fiber. The noble metal nanoparticle layer is located at the notch. As a result, when a light is launched into the optical fiber, a detecting unit can be used to detect a localized plasmon resonance signal which is generated by the interaction between the noble metal nanoparticle layer and the light.

摘要翻译： 本发明公开了一种局部等离子体共振感测装置和光纤结构。 该装置包括光纤和贵金属纳米颗粒层。 光纤具有多个凹口，并且这种凹口位于光纤的侧表面上。 贵金属纳米颗粒层位于凹口处。 结果，当光发射到光纤中时，可以使用检测单元来检测由贵金属纳米颗粒层和光之间的相互作用产生的局部等离子体共振信号。

公开(公告)号：US20100182607A1

公开(公告)日：2010-07-22

申请号：US12505975

申请日：2009-07-20

申请人： Lai-Kwan Chau ,  Chung-Shi Yang ,  Wei-Zhe Chang ,  Wei-Te Wu

发明人： Lai-Kwan Chau ,  Chung-Shi Yang ,  Wei-Zhe Chang ,  Wei-Te Wu

IPC分类号： G01N21/55 ,  G02B6/00 ,  G01J3/44

CPC分类号： G01N21/7703 ,  G01N21/554 ,  G01N21/648 ,  G01N21/658 ,  G01N2021/7716 ,  G01N2021/773 ,  G02B6/0229

摘要： The present invention discloses a fiber-optic localized plasmon resonance (FO-LPR) sensing device and a sensing system thereof, the FO-LPR sensing system includes a light source, a FO-LPR sensing device and a detector, and the light source provides a light beam entered into the FO-LPR sensing device, and the detector generates a detected signal according to an emergent light from the FO-LPR sensing device. The FO-LPR sensing device includes an optical fiber, a noble metal nanoparticle layer and a filter film layer. The filter film layer is having a porous material, and the porous material comes with a pore diameter or a property selected according to a feature of a sample, while an interfering substance in the sample is isolated.

摘要翻译： 本发明公开了一种光纤局域等离子体共振（FO-LPR）感测装置及其感测系统，该FO-LPR感测系统包括光源，FO-LPR感测装置和检测器，光源提供 进入FO-LPR感测装置的光束，并且检测器根据来自FO-LPR感测装置的紧急光产生检测信号。 FO-LPR感测装置包括光纤，贵金属纳米颗粒层和过滤膜层。 过滤膜层具有多孔材料，并且多孔材料具有根据样品的特征选择的孔径或特性，同时隔离样品中的干扰物质。

公开(公告)号：US06767821B1

公开(公告)日：2004-07-27

申请号：US10426354

申请日：2003-04-07

申请人： Chan-syun David Yang ,  Ajay Kumar ,  Wei-Te Wu ,  Changhun Lee ,  Yeajer Arthur Chen ,  Katsuhisa Kugimiya

发明人： Chan-syun David Yang ,  Ajay Kumar ,  Wei-Te Wu ,  Changhun Lee ,  Yeajer Arthur Chen ,  Katsuhisa Kugimiya

IPC分类号： H01L214763

CPC分类号： H01L21/32137 ,  H01L21/32139 ,  H01L21/76838 ,  Y10S438/945

摘要： A method of fabricating an interconnect line comprises forming a wall, depositing an etch mask having a thickness that decreases towards a bottom of the wall, and isotropically etching the wall at the bottom to form the interconnect line having a pre-determined gap between the substrate and a bottom of the line.

摘要翻译： 制造互连线的方法包括形成壁，沉积具有朝向壁底部减小的厚度的蚀刻掩模，以及在底部各向同性蚀刻壁，以形成在衬底之间具有预定间隙的互连线 和底线。

公开(公告)号：US08072606B2

公开(公告)日：2011-12-06

申请号：US12505975

申请日：2009-07-20

申请人： Lai-Kwan Chau ,  Chung-Shi Yang ,  Wei-Zhe Chang ,  Wei-Te Wu

发明人： Lai-Kwan Chau ,  Chung-Shi Yang ,  Wei-Zhe Chang ,  Wei-Te Wu

IPC分类号： G01N21/55

CPC分类号： G01N21/7703 ,  G01N21/554 ,  G01N21/648 ,  G01N21/658 ,  G01N2021/7716 ,  G01N2021/773 ,  G02B6/0229

摘要： The present invention discloses a fiber-optic localized plasmon resonance (FO-LPR) sensing device and a sensing system thereof, the FO-LPR sensing system includes a light source, a FO-LPR sensing device and a detector, and the light source provides a light beam entered into the FO-LPR sensing device, and the detector generates a detected signal according to an emergent light from the FO-LPR sensing device. The FO-LPR sensing device includes an optical fiber, a noble metal nanoparticle layer and a filter film layer. The filter film layer is having a porous material, and the porous material comes with a pore diameter or a property selected according to a feature of a sample, while an interfering substance in the sample is isolated.

摘要翻译： 本发明公开了一种光纤局域等离子体共振（FO-LPR）感测装置及其感测系统，该FO-LPR感测系统包括光源，FO-LPR感测装置和检测器，光源提供 进入FO-LPR感测装置的光束，并且检测器根据来自FO-LPR感测装置的紧急光产生检测信号。 FO-LPR感测装置包括光纤，贵金属纳米颗粒层和过滤膜层。 过滤膜层具有多孔材料，并且多孔材料具有根据样品的特征选择的孔径或特性，同时隔离样品中的干扰物质。