公开(公告)号：US20180203347A1

公开(公告)日：2018-07-19

申请号：US15917939

申请日：2018-03-12

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Hsun-Chuan SHIH ,  Sheng-Chi CHIN ,  Yuan-Chih CHU ,  Yueh-Hsun LI

IPC: G03F1/72 ,  G03F1/26 ,  G03F1/22 ,  H01L21/02 ,  G03F1/74 ,  H01L21/285 ,  C23C16/455 ,  C23C16/04 ,  G03F1/82 ,  H01L21/321

CPC classification number: G03F1/72 ,  C23C16/047 ,  C23C16/45523 ,  G03F1/22 ,  G03F1/26 ,  G03F1/74 ,  G03F1/82 ,  H01L21/02277 ,  H01L21/02334 ,  H01L21/02337 ,  H01L21/0262 ,  H01L21/02664 ,  H01L21/28556 ,  H01L21/321

Abstract: A method includes loading a mask having a defect into a chamber. The defect of the mask is repaired by forming a repair feature in a repair region of the mask. The forming the repair feature includes irradiating the repair region of the mask with a radiation beam. The forming the repair feature further includes while irradiating the repair region, injecting a precursor gas into the chamber to form a first film of the repair feature on the repair region, and while irradiating the repair region, injecting a cleaning gas into the chamber. The cleaning gas reacts with an impurity material in the first film to transform the first film into a first cleaned film.

公开(公告)号：US20170352144A1

公开(公告)日：2017-12-07

申请号：US15254607

申请日：2016-09-01

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Shinn-Sheng YU ,  Anthony YEN ,  Wen-Chuan WANG ,  Sheng-Chi CHIN

IPC: G06T7/00 ,  G03F1/72 ,  G03F1/24 ,  G03F1/26 ,  H01L21/027

CPC classification number: G06T7/0004 ,  G03F1/24 ,  G03F1/26 ,  G03F1/72 ,  G03F1/84 ,  G06T7/001 ,  G06T7/0081 ,  G06T7/11 ,  G06T2207/10004 ,  G06T2207/10056 ,  G06T2207/30148 ,  H01L21/0273

Abstract: A method includes inspecting a mask to locate a defect region for a defect of the mask. A phase distribution of an aerial image of the defect region is acquired. A point spread function of an imaging system is determined. One or more repair regions of the mask are identified based on the phase distribution of the aerial image of the defect region and the point spread function. A repair process is performed to the one or more repair regions of the mask to form one or more repair features.