Thin film single crystal substrate
    3.
    发明授权
    Thin film single crystal substrate 失效
    薄膜单晶基板

    公开(公告)号:US5373171A

    公开(公告)日:1994-12-13

    申请号:US165734

    申请日:1988-03-09

    IPC分类号: H01L21/20 H01L21/36 H01L27/10

    摘要: A thin film single crystal substrate useful in the production of a semiconductor, comprising a base substrate made of single crystal diamond and at least one thin film of a single crystal of a material selected from the group consisting of silicon carbide, silicon, boron nitride, gallium nitride, indium nitride, aluminum nitride, boron phosphide, cadmium selenide, germanium, gallium arsenide, gallium phosphide, indium phosphide, gallium antimonide, indium arsenide, indium antimonide, aluminum phosphide, aluminum arsenide, aluminum antimonide, cadmium telluride, mercury sulfide, zinc oxide, zinc sulfide, zinc selenide and zinc telluride, and optionally an intermediate layer between the base substrate and the thin film of single crystal, which optionally comprises an intermediate layer between the base substrate and the thin film of single crystal.

    摘要翻译: 一种可用于制造半导体的薄膜单晶衬底,包括由单晶金刚石制成的基底衬底和至少一种选自碳化硅,硅,氮化硼等的材料的单晶薄膜, 氮化镓,氮化铟,氮化铝,磷化硼,硒化镉,锗,砷化镓,磷化镓,磷化铟,锑化锑,砷化铟,锑化锑,磷化铝,砷化铝,锑化锑,碲化镉, 氧化锌,硫化锌,硒化锌和碲化锌,以及任选地在基底衬底和单晶薄膜之间的中间层,其任选地包括在基底衬底和单晶薄膜之间的中间层。

    Surface acoustic wave device
    6.
    发明授权
    Surface acoustic wave device 失效
    表面声波装置

    公开(公告)号:US4952832A

    公开(公告)日:1990-08-28

    申请号:US425956

    申请日:1989-10-24

    IPC分类号: H03H9/02

    CPC分类号: H03H9/02582

    摘要: A surface acoustic wave device which comprises a piezoelectric layer, a carbonaceous layer which is selected from the group consisting of a diamond layer and a diamond-like carbon layer and formed on at least one surface of the piezoelectric layer, and at least a pair of interdigital transducer electrodes, can be used in an extremely high frequency region.

    摘要翻译: 一种声表面波器件,包括压电层,选自金刚石层和类金刚石碳层并形成在压电层的至少一个表面上的碳质层,以及至少一对 叉指式换能器电极,可用于极高频率区域。

    Method for manufacturing a surface acoustic wave device
    7.
    发明授权
    Method for manufacturing a surface acoustic wave device 失效
    声表面波装置的制造方法

    公开(公告)号:US5401544A

    公开(公告)日:1995-03-28

    申请号:US109394

    申请日:1993-08-19

    CPC分类号: H03H3/08 H03H9/14538

    摘要: A surface acoustic wave device which can operate at a higher frequency range is produced by irradiation with a focused ion beam to produce a narrower electrode width and narrower spacing width between neighboring electrodes in contact with a piezoelectric body, without degrading the reliability of the device. The surface acoustic wave device includes a piezoelectric body 3 and interdigital electrodes 2a and 2b in close contact with the piezoelectric body 3 and formed by using the focused ion beam. In order to increase the frequency of the device, the piezoelectric body 3 may be formed on a substrate 1, for example of diamond.

    摘要翻译: 可以通过用聚焦离子束照射来产生能够在较高频率范围内工作的表面声波装置,以产生与压电体接触的相邻电极之间的较窄的电极宽度和较窄的间隔宽度,而不会降低装置的可靠性。 表面声波装置包括与压电体3紧密接触并通过使用聚焦离子束形成的压电体3和叉指电极2a和2b。 为了增加器件的频率,压电体3可以形成在例如金刚石的衬底1上。

    Method of manufacturing a surface acoustic wave device
    8.
    发明授权
    Method of manufacturing a surface acoustic wave device 失效
    声表面波装置的制造方法

    公开(公告)号:US5320865A

    公开(公告)日:1994-06-14

    申请号:US947283

    申请日:1992-09-16

    摘要: A method of manufacturing a surface acoustic wave device which has a smaller insertion loss and which operates at higher frequency than a conventional surface acoustic wave device is provided. The surface acoustic wave device includes a substrate, a diamond layer formed on the substrate, a piezoelectric layer formed on the diamond layer, and electrodes formed on any of the substrate, the diamond layer and the piezoelectric layer. The piezoelectric layer is formed by the laser ablation method. The insertion loss of this acoustic wave device is small even in a high frequency range of several hundreds MHz to GHz. Therefore, the device can be used as a frequency filter, a resonator, a delay line, a convolver, a correlator and the like.

    摘要翻译: 提供一种制造具有较小的插入损耗并且以比常规的声表面波器件更高的频率工作的声表面波器件的方法。 表面声波装置包括基板,形成在基板上的金刚石层,形成在金刚石层上的压电层,以及形成在基板,金刚石层和压电层之一上的电极。 压电层通过激光烧蚀法形成。 即使在几百MHz至GHz的高频范围内,该声波器件的插入损耗也很小。 因此,该装置可以用作频率滤波器,谐振器,延迟线,卷积器,相关器等。

    Surface acoustic wave device
    10.
    发明授权
    Surface acoustic wave device 失效
    表面声波装置

    公开(公告)号:US5294858A

    公开(公告)日:1994-03-15

    申请号:US19136

    申请日:1993-02-18

    CPC分类号: H03H9/02582

    摘要: Disclosed herein is a surface acoustic wave device employing diamond, which has an operation frequency in a range of several hundred MHz to several GHz, a high propagation velocity and a large electromechanical coefficient. This surface acoustic wave comprises a substrate, a diamond layer which is formed on the substrate, a ZnO layer which is formed on the diamond layer, and interdigital electrodes which are formed on the ZnO layer, and utilizes a second order mode of a surface acoustic wave which is excited in a structure satisfying (2.pi..H/.lambda.)=0.9 to 2.3 where H represents the thickness of the ZnO layer and .lambda. represents the wavelength of the surface acoustic wave. This surface acoustic wave device can be used in an extremely high frequency range, whereby the same is applicable to a resonator, a delay line, a signal processing device, a convolver, a correlator or the like in addition to a filter.

    摘要翻译: 本发明公开了一种采用金刚石的弹性表面波器件,其工作频率范围为数百MHz至数GHz,传播速度高,机电系数大。 该表面声波包括衬底,形成在衬底上的金刚石层,形成在金刚石层上的ZnO层和形成在ZnO层上的叉指电极,并且利用表面声学的二阶模式 在满足(2(pi)·H /(λ))= 0.9〜2.3的结构中激发的波,其中H表示ZnO层的厚度,(λ)表示声表面波的波长。 该声表面波装置可以在极高的频率范围内使用,除了滤波器之外,其也适用于谐振器,延迟线,信号处理装置,卷积器,相关器等。