摘要:
A diagnosis processing device is provided in which diagnosis is realizable by a simple arrangement. A diagnosis processing device (1) of the present invention includes: a learning pattern creating section (10a) for creating a learning pattern by sampling data from a learning image in which abnormality information indicating a substantive feature of abnormality of a target is pre-known; a learning processing section (12) for causing a neural network (17) to learn, by using learning patterns; a diagnostic pattern creating section (10b) for creating a diagnostic pattern by sampling data from a diagnostic image in which abnormality information is unknown; a determination processing section (18) for determining a substantive feature of the abnormality of the target indicated in the abnormality information in the diagnostic image, based on an output value outputted, in response to an input of the diagnostic pattern, from a learned neural network (17) which is a neural network subjected to learning.
摘要:
A diagnosis processing device is provided in which diagnosis is realizable by a simple arrangement. A diagnosis processing device (1) of the present invention includes: a learning pattern creating section (10a) for creating a learning pattern by sampling data from a learning image in which abnormality information indicating a substantive feature of abnormality of a target is pre-known; a learning processing section (12) for causing a neural network (17) to learn, by using learning patterns; a diagnostic pattern creating section (10b) for creating a diagnostic pattern by sampling data from a diagnostic image in which abnormality information is unknown; a determination processing section (18) for determining a substantive feature of the abnormality of the target indicated in the abnormality information in the diagnostic image, based on an output value outputted, in response to an input of the diagnostic pattern, from a learned neural network (17) which is a neural network subjected to learning.
摘要:
A titanium oxide film, a nickel oxide film and a top electrode are formed on a bottom electrode, and a resistance element is constituted by the bottom electrode, the titanium oxide film, the nickel oxide film and the top electrode. A thickness of the titanium oxide film is 5 nm, and a thickness of the nickel oxide film is 60 nm. A rate of oxygen in nickel oxide composing the nickel oxide film is lower than a rate of oxygen in a stoichiometric composition.
摘要:
A titanium oxide film, a nickel oxide film and a top electrode are formed on a bottom electrode, and a resistance element is constituted by the bottom electrode, the titanium oxide film, the nickel oxide film and the top electrode. A thickness of the titanium oxide film is 5 nm, and a thickness of the nickel oxide film is 60 nm. A rate of oxygen in nickel oxide composing the nickel oxide film is lower than a rate of oxygen in a stoichiometric composition.
摘要:
In a resistance change memory (ReRAM) storing data by utilizing change in resistance of a resistance change element, a transistor T, interlayer insulating films, W plugs and the like are formed on a semiconductor substrate. Thereafter, a Pt film serving as a lower electrode of the resist change element is formed and a transition metal film (Ni film) is formed on the Pt film. After that, the surface of the transition metal film is oxidized to form a transition metal oxide film and a Pt film serving as an upper electrode is formed on the transition metal oxide film.
摘要:
An NMOS transistor 14 having one end connected to one end of a resistance memory element 10 is provided, and when a voltage is applied to the resistance memory element 10 via the NMOS transistor 14 to switch the resistance memory element 10 from the low resistance state to the high resistance state, the gate voltage of the NMOS transistor 14 is set at a value which is equal to or greater than the total of the reset voltage of the resistance memory element 10 and the threshold voltage of the NMOS transistor 14 and is smaller than the total of the set voltage of the resistance memory element 10 and the threshold voltage of the NMOS transistor 14, whereby the voltage applied to the resistance memory element 10 is set at a value which is equal to or greater than the reset voltage and is smaller than the set voltage.
摘要:
In a resistance change memory (ReRAM) storing data by utilizing change in resistance of a resistance change element, a transistor T, interlayer insulating films, W plugs and the like are formed on a semiconductor substrate. Thereafter, a Pt film serving as a lower electrode of the resist change element is formed and a transition metal film (Ni film) is formed on the Pt film. After that, the surface of the transition metal film is oxidized to form a transition metal oxide film and a Pt film serving as an upper electrode is formed on the transition metal oxide film.
摘要:
A resistance memory element, which memorizes a high resistance state and a low resistance state and switches between the high resistance state and the low resistance state by an application of a voltage, includes a pair of electrodes and a resistance memory layer sandwiched between the pair of electrodes and including a first layer of a first resistance memory material and a second layer of a second resistance memory material. The current value of the resistance memory element in the writing operation can be drastically decreased, and a nonvolatile semiconductor memory device of high integration and low electric power consumption can be formed.
摘要:
A nonvolatile semiconductor memory device includes a memory cell including a resistance memory element which memorizes a high resistance state or a low resistance state, switches the high resistance state and the low resistance state by voltage application, one end of the resistance memory element being coupled to a bit line, the other end of the resistance memory element being coupled to a source line via the first transistor; and a resistor whose resistance value is higher than a resistance value of the resistance memory element in the low resistance state and lower than a resistance value of the resistance memory element in the high resistance state, one end of the resistor being coupled to said one end of the resistance memory element and the bit line, the other end of the resistor being coupled to the source line via the second transistor.
摘要:
A resistance memory element memorizing a high resistance state or a low resistance state in a memory region and switched between the high resistance state and the low resistance state by an application of a voltage includes a resistance memory layer 42 of a resistance memory material, an electrode 38 and an electrode 40 arranged, sandwiching the resistance memory layer 42. The electrode 38 and the electrode 40 are formed on the same surface, whereby the manufacturing process of the resistance memory element can be simplified.