公开(公告)号：US5261935A

公开(公告)日：1993-11-16

申请号：US23394

申请日：1993-02-26

申请人： Katsumi Ishii ,  Takanobu Asano ,  Masaharu Abe ,  Kenichi Yamaga ,  Kazunari Sakata ,  Takashi Tanahashi ,  Syuji Moriya

发明人： Katsumi Ishii ,  Takanobu Asano ,  Masaharu Abe ,  Kenichi Yamaga ,  Kazunari Sakata ,  Takashi Tanahashi ,  Syuji Moriya

IPC分类号： C30B33/00 ,  H01L21/00 ,  H01L21/677 ,  B01D46/04

CPC分类号： H01L21/67757 ,  C30B33/00 ,  H01L21/67017 ,  H01L21/67769 ,  H01L21/67772 ,  Y10S414/137 ,  Y10S414/139 ,  Y10S414/14

摘要： A clean air apparatus includes a housing having an opening through which a carrier housing semiconductor wafers is supplied into the housing and an I/O port for supporting the carrier and a furnace for treating the wafer, provided in the upper portion of the housing. The carriers are at the same time supported by a first carrier stage provided in the upper portion of the housing and supported by a second carrier stage provided in the lower portion of the housing. The carrier or carriers are selectively moved between the I/O port and the first stage, between the I/O port and the second stage, and between the first stage and the second stage. A clean air is applied to the wafers in the carriers supported by the I/O port, the first stage and the second stage.

摘要翻译： 清洁空气装置包括壳体，壳体具有开口，载体壳体半导体晶片被供给到壳体中，以及用于支撑载体的I / O端口和设置在壳体的上部中的晶片处理炉。 载体同时由设置在壳体的上部中的第一载体台支撑并由设置在壳体的下部中的第二载体台支撑。 载体或载体选择性地在I / O端口和第一级之间，I / O端口和第二级之间以及在第一级和第二级之间移动。 将清洁空气施加到由I / O端口，第一级和第二级支撑的载体中的晶片。

公开(公告)号：US5236181A

公开(公告)日：1993-08-17

申请号：US765890

申请日：1991-09-26

申请人： Katsumi Ishii ,  Takanobu Asano ,  Masaharu Abe

发明人： Katsumi Ishii ,  Takanobu Asano ,  Masaharu Abe

IPC分类号： C30B33/00

CPC分类号： C30B33/00

摘要： A vertical heating apparatus comprises a casing having an opening through which a plurality of transport members receiving articles to be processed are loaded in and unloaded from the casing, a heat treating furnace provided in an upper portion of the casing, a transport member storing portion provided in the casing at a side space of the heat treating furnace, for receiving the transport members, a processing member for transporting the articles to be processed in the heat treating furnace, a transferring mechanism for transferring the articles to be processed and received by the transport members to the processing member, and a vertically moving mechanism provided below the heat treating furnace in the casing, for loading and unloading the articles to be processed and received by the processing member in and from the heat treating furnace.

摘要翻译： 立式加热装置包括具有开口的多个运送构件的容纳体，所述多个运送构件容纳待加工物品从所述壳体上装卸的壳体，设置在所述壳体的上部的热处理炉， 在热处理炉的侧空间的壳体中，为了接收输送构件，在处理炉中输送待处理物品的搬运机构，用于转运待处理物品的运送机构， 构件到加工构件，以及设置在壳体内的热处理炉下方的垂直移动机构，用于将处理构件加工和被处理物品加载和卸载在热处理炉内。

公开(公告)号：US5183378A

公开(公告)日：1993-02-02

申请号：US672852

申请日：1991-03-20

申请人： Takanobu Asano ,  Katsumi Ishii

发明人： Takanobu Asano ,  Katsumi Ishii

IPC分类号： H01L21/00 ,  H01L21/68

CPC分类号： H01L21/67242 ,  H01L21/68 ,  Y10S414/136

摘要： A wafer counter device comprising a system for aligning the orientation flats of plural wafers in a cassette with one another and a system provided with optical sensors for detecting whether or not the wafers are present in the cassette and serving to count the number of the wafers in the cassette on the basis of the result detected by the optical sensors. The wafers aligning system includes aligning rollers contacted with the rims of the wafers to rotate the wafers, a system for lifting the aligning rollers in such a way that the rollers can be contacted with the rims of the wafers, and a motor for rotating the aligning rollers.

摘要翻译： 一种晶片计数器装置，包括用于将盒中的多个晶片的取向平面彼此对准的系统，以及设置有光学传感器的系统，用于检测晶片是否存在于盒中并用于对晶片的数量进行计数 基于由光学传感器检测到的结果的盒。 晶片对准系统包括与晶片的边缘接触的对准辊以旋转晶片，用于提升对准辊的系统，使得辊可以与晶片的边缘接触，以及用于使对准 滚筒。

公开(公告)号：US5110248A

公开(公告)日：1992-05-05

申请号：US550981

申请日：1990-07-11

申请人： Takanobu Asano ,  Hirofumi Kitayama ,  Hiroyuki Iwai ,  Yuuji Ono

发明人： Takanobu Asano ,  Hirofumi Kitayama ,  Hiroyuki Iwai ,  Yuuji Ono

IPC分类号： H01L21/00 ,  H01L21/677

CPC分类号： H01L21/67115 ,  H01L21/67781

摘要： A vertical heat-treatment apparatus is provided with a mechanism for automatically transferring semiconductor wafers from carriers to a boat for a vertical type furnace. The automatic transferring mechanism comprises a port for receiving a plurality of carriers arranged in series in an upright state, a posture change mechanism for changing the posture of wafers in the carriers from the upright state to the horizontal state, a parallel transfer mechanism for transferring the carriers on the boat to the posture change mechanism, a carrier loading/unloading mechanism for loading the carriers on a station, a wafer loading/unloading mechanism for taking out the wafers from the carriers on the station in turn and transferring the taken-out wafers to the boat in turn, and a mounting mechanism for mounting the boat in the furnace. The carrier loading/unloading mechanism and the wafer loading/unloading mechanism are mounted on a common frame and are rotated and lifted at the same time.

摘要翻译： 立式热处理装置设置有用于将半导体晶片从载体自动转移到垂直型炉的船的机构。 自动转印机构包括用于接收以直立状态串联布置的多个载体的端口，用于将载体中的晶片的姿势从直立状态改变为水平状态的姿势改变机构，用于传送 船上的载体到姿势改变机构，用于将载体载载在车站上的载体装载/卸载机构，用于依次从车站上的载体取出晶片的晶片装载/卸载机构，并传送取出的晶片 依次转到船上，以及用于将船安装在炉中的安装机构。 载体装载/卸载机构和晶片装载/卸载机构安装在公共框架上并同时旋转和提升。

公开(公告)号：US20100064969A1

公开(公告)日：2010-03-18

申请号：US12278407

申请日：2007-02-07

申请人： Jiro Hiraiwa ,  Osamu Yoshimoto ,  Hiroshi Hayakawa ,  Tetsuro Tojo ,  Tsuneyuki Okabe ,  Takanobu Asano ,  Shinichi Wada ,  Ken Nakao ,  Hitoshi Kato

发明人： Jiro Hiraiwa ,  Osamu Yoshimoto ,  Hiroshi Hayakawa ,  Tetsuro Tojo ,  Tsuneyuki Okabe ,  Takanobu Asano ,  Shinichi Wada ,  Ken Nakao ,  Hitoshi Kato

IPC分类号： H01L21/46

CPC分类号： F17D1/04 ,  C01B7/19 ,  F17C2250/032 ,  F17C2270/0518 ,  H01L21/67017 ,  H01L21/67276

摘要： Fluorine gas generators are connected with semiconductor manufacturing apparatuses through a gas supplying system including a storage tank that can store a predetermined quantity of fluorine gas generated in the on-site fluorine gas generators. When one or more of the on-site fluorine gas generators are stopped, fluorine gas is supplied to the semiconductor manufacturing apparatuses from the storage tank storing a predetermined quantity of fluorine gas, so as to keep the operations of the semiconductor manufacturing apparatuses. Thereby obtained is a semiconductor manufacturing plant in which fluorine gas generated in the fluorine gas generators can be safely and stably supplied to the semiconductor manufacturing apparatuses, and with superior cost performance.

摘要翻译： 氟气发生器通过包括存储在现场氟气发生器中产生的预定量的氟气的储罐的气体供给系统与半导体制造装置连接。 当一个或多个现场氟气发生器停止时，从储存预定量的氟气的储罐向半导体制造装置供应氟气，以保持半导体制造装置的操作。 由此，能够将在氟气发生器中产生的氟气安全稳定地供给到半导体制造装置，并具有优异的成本性能的半导体制造工厂。

公开(公告)号：US5562383A

公开(公告)日：1996-10-08

申请号：US583669

申请日：1996-01-05

申请人： Hiroyuki Iwai ,  Tamotsu Tanifuji ,  Takanobu Asano ,  Ryoichi Okura

发明人： Hiroyuki Iwai ,  Tamotsu Tanifuji ,  Takanobu Asano ,  Ryoichi Okura

IPC分类号： H01L21/304 ,  H01L21/677 ,  H01L21/00

CPC分类号： H01L21/67769 ,  H01L21/67772 ,  Y10S414/137 ,  Y10S414/139 ,  Y10S414/14

摘要： A treatment apparatus comprises a treatment chamber for performing a treatment for a workpiece W, a loading chamber connected to the treatment chamber, for loading and unloading a holding member which contains the workpiece into and from the treatment chamber, and an input/output chamber for inputting and outputting the workpiece to and from the loading chamber. The input/output chamber includes a cassette accommodating vessel port which holds a cassette accommodating vessel. The vessel is filled with clean air or an inert gas, and is airtightly closed. A cassette receiving mechanism is disposed below the port and lowers only the cassette of the vessel so as to receive the cassette. Thus, when the cassette is input and output to and from the outside of the treatment apparatus, the workpiece contained within the cassette is not exposed to the atmosphere in a working region. Consequently, it is not necessary to improve the cleanliness level of the atmosphere in the working region. As a result, the construction cost of the clean room and the operation cost thereof can be reduced. A clean air blowing device is disposed below the port. The clean air blowing device blows a side flow of clean air. Thus, the atmosphere at a position below the port where air tends to stay is circulated. Thus, since the surface of the workpiece loaded in the treatment chamber is exposed to the side flow, particles and the like that adhere thereto are purged.

摘要翻译： 处理装置包括：处理室，用于对工件W进行处理，连接到处理室的装载室，用于将包含工件的保持构件装载到处理室和从处理室中卸载;以及输入/输出室， 将工件输入和输出到装载室。 输入/输出室包括容纳容纳容器的盒式磁带容纳容器端口。 容器内装有清洁空气或惰性气体，并且气密地关闭。 盒接收机构设置在端口下方，并且仅降低容器的盒以便接收盒。 因此，当盒子从处理设备的外部输入和输出时，包含在盒内的工件不会暴露在工作区域中的大气中。 因此，不需要提高工作区域的气氛的清洁度。 因此，能够降低洁净室的建筑成本及其运转成本。 清洁吹风装置设置在端口下方。 清洁吹风装置吹扫清洁空气的侧流。 因此，空气倾向于停留的港口下方的气氛被循环。 因此，由于装载在处理室中的工件的表面暴露于侧流，所以清除附着在其上的颗粒等。

公开(公告)号：US5533243A

公开(公告)日：1996-07-09

申请号：US365429

申请日：1994-12-28

申请人： Takanobu Asano

发明人： Takanobu Asano

IPC分类号： H01L21/68 ,  B23B5/22 ,  B65G47/24

CPC分类号： H01L21/68 ,  Y10S269/903 ,  Y10S414/136 ,  Y10S414/138 ,  Y10T29/41

摘要： According to this invention, there is provided a notch position aligning mechanism and a process for using the mechanism including a base which can be vertically movably inserted into a cassette through a lower opening of the cassette for storing a plurality of targets to be aligned having notches formed in edge portions of the targets wherein can be fitted, a rotating/supporting mechanism, including a first rotary member which is arranged on the base, and has a plurality of fitting grooves in which the notches of the targets can be fitted, a second rotary member which can be rotated and is arranged on the base, and a drive unit for rotating at least one of the first and second rotary members, the rotating/supporting mechanism supporting and rotating the targets using the first and second rotary members while the targets are spaced apart from the cassette, and a support member, arranged on the base, for supporting the targets having the notches fitted in the fitting grooves of the first rotary member to stop rotations of the targets.

摘要翻译： 根据本发明，提供了一种切口位置对准机构和使用该机构的方法，该机构包括基座，该基座可以通过盒的下部开口垂直移动地插入到盒中，用于存储多个待对准的目标，具有凹口 形成在能够嵌合的靶的边缘部分的旋转/支撑机构，包括布置在基座上的第一旋转构件，并且具有多个配合槽，靶可以嵌合在其中，第二 旋转构件，其可以旋转并布置在基座上;驱动单元，用于旋转第一和第二旋转构件中的至少一个，旋转/支撑机构使用第一和第二旋转构件支撑并旋转靶，同时靶 与盒子间隔开，并且支撑构件布置在基座上，用于支撑具有装配在冷杉的装配槽中的凹口的靶 t旋转构件以停止目标的旋转。

公开(公告)号：US20050246918A1

公开(公告)日：2005-11-10

申请号：US10528230

申请日：2003-09-19

申请人： Takashi Tanahashi ,  Takanobu Asano ,  Ken Nakao ,  Katsuhiro Yamashita

发明人： Takashi Tanahashi ,  Takanobu Asano ,  Ken Nakao ,  Katsuhiro Yamashita

IPC分类号： B01D53/06 ,  B01D53/26 ,  F24F3/14 ,  F26B21/06 ,  F26B3/00

CPC分类号： F24F3/1423 ,  B01D53/06 ,  B01D53/261 ,  B01D2253/108 ,  B01D2253/25 ,  B01D2253/3425 ,  B01D2257/70 ,  B01D2257/80 ,  B01D2259/40007 ,  B01D2259/40052 ,  B01D2259/4009 ,  F24F2203/1032 ,  F24F2203/1056 ,  F24F2203/1072 ,  F24F2203/1084 ,  F24F2203/1088 ,  F24F2203/1096

摘要： Two rotors 18a, 18b each housing a honeycomb structure 25 carrying an absorbent is driven for rotation by a common motor 19. Partitioning members 17 define an absorbing zone S and a recovery zone U in the rotor depending on the angular positional relationship between the partitioning members 17 and the rotor corresponding thereto. In the absorbing zone S, the absorbent removes moisture and organic matters from air passing therethrough. In the recovery zone U, recovery of the absorbent deteriorated by absorbing the moisture and the organic matters is preformed by using heated dry air. Air sucked from a transfer space 10 of the processing system sequentially passes through the absorbing zones of both the rotors via a circulation passage 20, thereafter returned to the transfer space. A part of clean dry air having passed through the absorbing zones of both the rotors is supplied into an exhaust passage 21, and is heated by a heater, and passes through the recovery zones of both the rotors.

摘要翻译： 每个容纳携带吸收剂的蜂窝结构25的两个转子18a，18b被驱动以便由公共电动机19旋转。 分隔构件17根据分隔构件17和与其对应的转子之间的角度位置关系来限定转子中的吸收区域S和恢复区域U. 在吸收区S中，吸收剂从通过其的空气中除去水分和有机物质。 在回收区U中，通过吸收水分和有机物而劣化的吸收剂的回收通过使用加热的干燥空气来预处理。 从处理系统的传送空间10吸入的空气经由循环通道20依次通过两个转子的吸收区，然后返回到传送空间。 已经通过两个转子的吸收区的清洁干燥空气的一部分被供给到排气通道21中，并被加热器加热，并且通过两个转子的回收区。

公开(公告)号：US5829939A

公开(公告)日：1998-11-03

申请号：US667584

申请日：1996-06-24

申请人： Hiroyuki Iwai ,  Tamotsu Tanifuji ,  Takanobu Asano ,  Ryoichi Okura

发明人： Hiroyuki Iwai ,  Tamotsu Tanifuji ,  Takanobu Asano ,  Ryoichi Okura

IPC分类号： H01L21/304 ,  H01L21/677 ,  H01L21/00

CPC分类号： H01L21/67769 ,  H01L21/67772 ,  Y10S414/137 ,  Y10S414/139 ,  Y10S414/14

摘要： A treatment apparatus comprises a treatment chamber for performing a treatment for a workpiece W, a loading chamber connected to the treatment chamber, for loading and unloading a holding member which contains the workpiece into and from the treatment chamber, and an input/output chamber for inputting and outputting the workpiece to and from the loading chamber. The input/output chamber includes a cassette accommodating vessel port which holds a cassette accommodating vessel. The vessel is filled with clean air or an inert gas, and is airtightly closed. A cassette receiving mechanism is disposed below the port and lowers only the cassette of the vessel so as to receive the cassette. Thus, when the cassette is input and output to and from the outside of the treatment apparatus, the workpiece contained within the cassette is not exposed to the atmosphere in a working region. Consequently, it is not necessary to improve the cleanliness level of the atmosphere in the working region. As a result, the construction cost of the clean room and the operation cost thereof can be reduced. A clean air blowing device is disposed below the port. The clean air blowing device blows a side flow of clean air. Thus, the atmosphere at a position below the port where air tends to stay is circulated. Thus, since the surface of the workpiece loaded in the treatment chamber is exposed to the side flow, particles and the like that adhere thereto are purged.

公开(公告)号：US5030057A

公开(公告)日：1991-07-09

申请号：US266651

申请日：1988-11-03

申请人： Hironobu Nishi ,  Kenichi Yamaga ,  Takanobu Asano ,  Kazutoshi Sawado ,  Masashi Fumoto ,  Shozo Ito ,  Yoshinori Mochizuki

发明人： Hironobu Nishi ,  Kenichi Yamaga ,  Takanobu Asano ,  Kazutoshi Sawado ,  Masashi Fumoto ,  Shozo Ito ,  Yoshinori Mochizuki

IPC分类号： H01L21/00 ,  H01L21/205 ,  H01L21/22 ,  H01L21/673 ,  H01L21/677

CPC分类号： H01L21/67313 ,  H01L21/67294 ,  H01L21/67326 ,  H01L21/67781 ,  Y10S414/136 ,  Y10S414/138 ,  Y10S414/14

摘要： A wafer transferring method for transferring wafers between a cassette and a boat having grooves to hold the wafers, comprises the steps of providing an identification mechanism for positional alignment on the boat in advance, detecting the identification mechanism, and aligning the boat to a predetermined position based on a detection result and transferring the wafers from the cassette to the boat. A wafer transferring apparatus comprises a loading device for extracting wafers from a cassette and transferring the wafers onto a boat, a detection device for detecting an identification section provided on the boat in order to identify a wafer transferring position on the boat, and a control device for acquiring the wafer transferring position on the boat based on a detection result attained from the detection device and controlling a mutual position between the boat and the cassette to come to a predetermined position.

摘要翻译： 一种晶片转印方法，用于在具有用于保持晶片的槽的盒和舟皿之间转移晶片，包括以下步骤：提供用于在船上进行位置对准的识别机构，检测识别机构，以及将船对准到预定位置 基于检测结果并将晶片从盒转移到船。 晶片转印装置包括用于从盒中提取晶片并将晶片转移到船上的装载装置，用于检测设置在船上的识别部分以识别船上的晶片转移位置的检测装置，以及控制装置 用于基于从检测装置获得的检测结果获取船上的晶片转移位置，并控制船和盒之间的相互位置到达预定位置。