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    Positive resist composition for electron beam, X-ray or EUV and pattern forming method using the same
    2.
    发明授权
    Positive resist composition for electron beam, X-ray or EUV and pattern forming method using the same 有权
    用于电子束，X射线或EUV的正性抗蚀剂组合物和使用其的图案形成方法

    公开(公告)号：US08092978B2

    公开(公告)日：2012-01-10

    申请号：US12410881

    申请日：2009-03-25

    申请人： Katsuhiro Yamashita

    发明人： Katsuhiro Yamashita

    IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/029

    CPC分类号： G03F7/0392 ,  G03F7/0045 ,  G03F7/0397 ,  Y10S430/114 ,  Y10S430/115 ,  Y10S430/146

    摘要： Provided is a positive resist composition for an electron beam, an X-ray or EUV, including: (A) a resin capable of decomposing by the action of an acid to increase the dissolution rate in an aqueous alkali solution; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, represented by the following formula (ZI) or (ZII); (C) a basic compound; and (D) an organic solvent, wherein a concentration of all solid contents in said composition is from 1.0 to 4.5 mass %, and a total amount of the compound represented by formula (ZI) or (ZII) is 12 mass % or more based on all solid contents in said composition: wherein symbols in the formulae are defined in the specification.

    摘要翻译： 本发明提供一种用于电子束，X射线或EUV的正型抗蚀剂组合物，其包括：（A）能够通过酸的作用分解以提高碱性水溶液中的溶解速率的树脂; （B）由下式（ZI）或（ZII）表示的能够用光化射线或辐射照射后能够产生酸的化合物。 （C）碱性化合物; 和（D）有机溶剂，其中所述组合物中所有固体含量的浓度为1.0〜4.5质量％，由式（ZI）或（ZII）表示的化合物的总量为12质量％以上 所述组合物中所有固体含量：其中式中的符号在说明书中定义。

    Positive resist composition for electron beam, X-ray or EUV and pattern forming method using the same
    4.
    发明授权
    Positive resist composition for electron beam, X-ray or EUV and pattern forming method using the same 有权
    用于电子束，X射线或EUV的正性抗蚀剂组合物和使用其的图案形成方法

    公开(公告)号：US07858289B2

    公开(公告)日：2010-12-28

    申请号：US12259056

    申请日：2008-10-27

    申请人： Katsuhiro Yamashita

    发明人： Katsuhiro Yamashita

    IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/029 ,  C07C381/00

    CPC分类号： G03F7/0045 ,  G03F7/0392 ,  G03F7/0397 ,  Y10S430/114

    摘要： A positive resist composition for electron beam, X-ray or EUV includes a compound having a proton acceptor functional group and capable of producing an acid radical upon irradiation with an actinic ray or radiation to reduce or lose the acceptor property or to change the proton acceptor functional group to be acidic, wherein the positive resist composition has a solid content concentration of from 2.5 to 4.5 mass %.

    摘要翻译： 用于电子束，X射线或EUV的正性抗蚀剂组合物包括具有质子受体官能团的化合物，并且能够在用光化射线或辐射照射时产生酸基以降低或失去受体性质或改变质子受体 官能团为酸性，其中正性抗蚀剂组合物的固体成分浓度为2.5〜4.5质量％。

    POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
    5.
    发明申请
    POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME 有权
    正极性组合物和使用其的图案形成方法

    公开(公告)号：US20090111053A1

    公开(公告)日：2009-04-30

    申请号：US12257646

    申请日：2008-10-24

    申请人： Katsuhiro YAMASHITA

    发明人： Katsuhiro YAMASHITA

    IPC分类号： G03F7/004 ,  G03F7/20

    CPC分类号： G03F7/0392 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

    摘要： A positive resist composition for electron beam, X-ray or EUV exposure, including (A) a resin capable of decomposing by the action of an acid to increase the solubility in an alkali developer; and (B) a compound capable of generating a sulfonic acid upon irradiation with an actinic ray or radiation, wherein the resin (A) is a resin having a phenolic hydroxyl group and having a weight average molecular weight of 1,500 to 3,500, the positive resist composition has a property of decomposing by the action of an acid and causing the dissolution rate in an aqueous 2.38 wt % tetramethylammonium hydroxide solution at 23° C. under normal pressure to increase in a range of 200 to 5,000 times, and the positive resist composition has a solid content concentration of from 2.5 to 4.5 mass %.

    摘要翻译： 一种用于电子束，X射线或EUV曝光的正型抗蚀剂组合物，包括（A）能够通过酸的作用分解以提高在碱性显影剂中的溶解度的树脂; 和（B）能够在用光化射线或辐射照射时能够产生磺酸的化合物，其中树脂（A）是具有酚羟基并且重均分子量为1,500至3,500的树脂，正性抗蚀剂 组合物具有通过酸的作用分解的性质，并且在常压下在23℃下使2.38重量％四甲基氢氧化铵水溶液中的溶解速率增加到200-5000倍的范围，并且正性抗蚀剂组合物 固体成分浓度为2.5〜4.5质量％。

    Air filter
    8.
    发明授权
    Air filter 有权
    空气过滤器

    公开(公告)号：US06767391B2

    公开(公告)日：2004-07-27

    申请号：US10190534

    申请日：2002-07-09

    申请人： Minoru Tanaka ,  Jun Shimada ,  Katsuhiro Yamashita ,  Haruko Sasaki

    发明人： Minoru Tanaka ,  Jun Shimada ,  Katsuhiro Yamashita ,  Haruko Sasaki

    IPC分类号： B01D5306

    CPC分类号： F24F3/1423 ,  B01D53/0454 ,  B01D53/06 ,  B01D53/261 ,  B01D53/40 ,  B01D53/42 ,  B01D53/44 ,  B01D2253/102 ,  B01D2253/25 ,  B01D2253/3425 ,  B01D2257/70 ,  B01D2257/80 ,  B01D2258/0216 ,  B01D2259/40081 ,  B01D2259/4009 ,  F24F2203/1004 ,  F24F2203/1032 ,  F24F2203/1056 ,  F24F2203/1068 ,  F24F2203/1084

    摘要： An air filter includes a honeycomb rotor which carries a porous adsorbent and can be rotated in a circumferential direction, a drive means for rotating the honeycomb rotor, a first partition member provided with a first gas introduction section and a second gas exhaust section and a second partition member provided with a first gas exhaust section and a second gas introduction section, the first and second partition members being disposed on both sides of the honeycomb rotor respectively to allow two gases to flow in counter current to each other and to pass through different conduits respectively, a heater disposed at the inlet port of the first gas introduction section, a drive controller for controlling the drive means such that the honeycomb rotor can rotate intermittently by every part of a regenerative/purge-zone facing the first gas introduction section among the surface of the filter of the honeycomb rotor.

    摘要翻译： 空气过滤器包括：携带多孔吸附剂的蜂窝状转子，能够沿圆周方向旋转;旋转蜂窝转子的驱动机构;设置有第一气体导入部和第二排气部的第一分隔部件， 分隔构件设置有第一排气部和第二气体导入部，第一隔壁构件和第二分隔构件分别设置在蜂窝状转子的两侧，以允许两个气体彼此逆流地流动并穿过不同的导管 分别设置在第一气体导入部的入口处的加热器，用于控制驱动装置的驱动控制器，使得蜂窝转子可以在面向第一气体导入部的再生/吹扫区域的每一部分间歇地旋转 蜂窝转子过滤器的表面。

    Silver halide photographic emulsion and silver halide photographic material
    10.
    发明授权
    Silver halide photographic emulsion and silver halide photographic material 有权
    卤化银照相乳剂和卤化银照相材料

    公开(公告)号：US06521401B1

    公开(公告)日：2003-02-18

    申请号：US09631994

    申请日：2000-08-03

    申请人： Katsuhiro Yamashita ,  Katsumi Kobayashi

    发明人： Katsuhiro Yamashita ,  Katsumi Kobayashi

    IPC分类号： G03C1005

    CPC分类号： G03C1/14 ,  G03C7/3041

    摘要： A silver halide photographic emulsion which contains silver halide grains having a spectral absorption maximum wavelength of less than 500 nm and a light absorption strength of 60 or more, or a spectral absorption maximum wavelength of 500 nm or more and a light absorption strength of 100 or more, wherein at least one of the sensitizing dyes which are used for spectrally sensitizing the emulsion does not have an electric charge in the molecule at all, or forms an inner salt and the molecule does not have an electric charge as a whole and has at least one aromatic ring in the molecule.

    摘要翻译： 一种卤化银照相乳剂，其含有光谱吸收最大波长小于500nm，光吸收强度为60以上，或光谱吸收最大波长为500nm以上，光吸收强度为100的卤化银粒子 其中，用于光谱敏化乳液的增感染料中的至少一种完全不具有分子中的电荷，或形成内盐，并且分子整体上不具有电荷，并且具有 分子中至少有一个芳香环。