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公开(公告)号：US06221519B1
公开(公告)日：2001-04-24
申请号：US09272622
申请日：1999-03-19
申请人： Takanori Doi , Kousaku Tamari , Yasuo Kakihara , Kenichi Nakata , Mitsuru Matsuura , Setsuo Yamamoto
发明人： Takanori Doi , Kousaku Tamari , Yasuo Kakihara , Kenichi Nakata , Mitsuru Matsuura , Setsuo Yamamoto
IPC分类号： G11B566
CPC分类号： G11B5/7325 , G11B5/656 , G11B5/84 , G11B5/8404 , Y10S428/90
摘要： A magnetic recording medium comprising: a plastic substrate; a nickel oxide underlayer formed on said substrate; and a cobalt-containing maghemite thin film formed on said nickel oxide underlayer, containing cobalt at a molar ratio of cobalt to iron of 0.01:1 to 0.1:1, and having either a spacing of a plane (311) of not more than 2.510 Å, a spacing of a plane (222) of not more than 2.415 Å or a spacing of a plane (220) of not more than 2.950 Å, a ratio value of an X-ray diffraction pattern peak intensity of either of the planes (311), (222) and (220) of said cobalt-containing maghemite thin film to an X-ray diffraction pattern peak intensity of the plane (400) thereof being more than 0.5. Such magnetic recording medium suitably applicable to existent magnetic recording systems using a ring-type magnetic head and capable of using a plastic substrate for providing a magnetic recording medium for high-density recording.
摘要翻译： 一种磁记录介质，包括：塑料基板;形成在所述基板上的氧化镍底层; 和在所述氧化镍底层上形成的含钴的磁赤铁矿薄膜，其含有钴与铁的摩尔比为0.01:1至0.1:1的钴，并且具有不大于2.510的平面（311）的间隔 ，平面（222）的间距不大于2.415或平面（220）的间距不大于2.950，任一平面（311）的X射线衍射图峰值强度的比值 ），所述含钴磁赤铁矿薄膜的（222）和（220）相对于所述平面（400）的X射线衍射图峰值强度大于0.5。 这种磁记录介质适用于使用环形磁头的现有磁记录系统，并能够使用塑料基板提供用于高密度记录的磁记录介质。
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公开(公告)号：US06268024B1
公开(公告)日：2001-07-31
申请号：US09276520
申请日：1999-03-25
申请人： Takanori Doi , Kousaku Tamari , Yasuo Kakihara , Kenichi Nakata , Mitsuru Matsuura , Setsuo Yamamoto
发明人： Takanori Doi , Kousaku Tamari , Yasuo Kakihara , Kenichi Nakata , Mitsuru Matsuura , Setsuo Yamamoto
IPC分类号： H05H100
CPC分类号： G11B5/7325 , G11B5/656 , G11B5/84 , G11B5/8404
摘要： A magnetic recording medium is prepared by forming on a plastic substrate, a nickel oxide underlayer having a plane (200) which is predominantly oriented in parallel with the surface of the plastic substrate, then forming on the nickel oxide underlayer at a substrate temperature of less 240° C., a cobalt-containing magnetite thin film having a plane (400) which is predominantly oriented in parallel with the surface of the plastic substrate, and finally oxidizing the cobalt-containing magnetite thin film in a plasma-activated oxygen atmosphere containing a rare gas at a substrate temperature of less than 240° C. while incorporating the rare gas into oxygen. This results in a cobalt-containing maghemite thin film as a perpendicular magnetic film having a spacing of a plane (400) of not more than 2.082 Å. The magnetic recording medium so produced is useful for high-density recording using a plastic substrate.
摘要翻译： 通过在塑料基板上形成氧化镍底层制备磁记录介质，所述氧化镍底层具有主要与塑料基板的表面平行取向的平面（200），然后在较低的基板温度下在氧化镍底层上形成 240℃的含钴磁铁矿薄膜，其具有主要与塑料基板的表面平行取向的平面（400），最后在等离子体激活的氧气氛中氧化含钴磁铁矿薄膜，其中含有 在低于240℃的衬底温度下的稀有气体，同时将稀有气体并入氧气中。 这导致含有钴的磁赤铁矿薄膜作为垂直磁性膜，其平面（400）的间隔不大于2.082。 所制造的磁记录介质对于使用塑料基板的高密度记录是有用的。
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公开(公告)号：US06187462B1
公开(公告)日：2001-02-13
申请号：US09272618
申请日：1999-03-19
申请人： Takanori Doi , Kousaku Tamari , Yasuo Kakihara , Kenichi Nakata , Mitsuru Matsuura , Setsuo Yamamoto
发明人： Takanori Doi , Kousaku Tamari , Yasuo Kakihara , Kenichi Nakata , Mitsuru Matsuura , Setsuo Yamamoto
IPC分类号： G11B566
CPC分类号： G11B5/656 , G11B5/84 , G11B5/851 , Y10S428/90
摘要： A magnetic recording medium of the present invention comprises: a plastic substrate; and a cobalt-containing maghemite thin film formed on said substrate, containing cobalt at a molar ratio of cobalt to iron of not more than 0.06:1, and having either a spacing of a plane (311) of not more than 2.510 Å, a spacing of a plane (222) of not more than 2.415 Å or a spacing of a plane (220) of not more than 2.950 Å; and has a coercive force of not less than 2,000 Oe. Such magnetic recording medium suitably applicable to existent magnetic recording systems using a ring-type magnetic head and capable of using a plastic substrate for providing a magnetic recording medium for high-density recording.
摘要翻译： 本发明的磁记录介质包括：塑料基板; 以及在所述基板上形成的含有钴与铁的摩尔比为0.06：1以下且具有不大于2.51的平面（311）间隔的钴的磁赤铁矿薄膜， 平面（222）的间距不大于2.415埃或平面（220）的间距不大于2.950埃; 并具有不低于2000 Oe的矫顽力。 这种磁记录介质适用于使用环形磁头的现有磁记录系统，并能够使用塑料基板提供用于高密度记录的磁记录介质。
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公开(公告)号：US06746786B2
公开(公告)日：2004-06-08
申请号：US09976296
申请日：2001-10-15
IPC分类号： G11B566
CPC分类号： G11B5/7325 , G11B5/656 , G11B5/851 , Y10S428/90
摘要： A magnetic recording medium, comprises a substrate; and a Co-containing spinel-type iron oxide thin film formed on the substrate, having a Co content of 1 to 20 mol % based on Fe, a coercive force value of not less than 159 kA/m (2,000 Oe), a thickness of 5 to 200 nm, a center line average height Ra of 0.1 to 0.8 nm and a maximum height (Rmax) of not more than 10 nm. The magnetic recording medium is capable of exhibiting a relatively high coercive force, especially a coercive force of not less than 159 kA/m (2,000 Oe) despite as small a film thickness as not more than 200 nm, and an excellent surface smoothness.
摘要翻译： 磁记录介质，包括基板; 和在该基板上形成的含Co尖晶石型氧化铁薄膜，Co含量为Fe为1〜20摩尔％，矫顽力值为159kA / m 2（2,000Oe）以上，厚度 为5〜200nm，中心线平均高度Ra为0.1〜0.8nm，最大高度（Rmax）为10nm以下。 尽管薄膜厚度不大于200nm，磁记录介质也能表现出相当高的矫顽力，特别是不低于159kA / m（2000Oe）的矫顽力，并具有优异的表面平滑度。
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公开(公告)号：US06841265B2
公开(公告)日：2005-01-11
申请号：US10312701
申请日：2002-03-18
CPC分类号： C23C8/16 , C22C14/00 , Y10S428/923 , Y10T428/12993
摘要： The objective of the present invention is to provide a titanium alloy vacuum container and vacuum parts that can easily achieve an ultra-high vacuum in a short time through vacuum evacuation.The titanium alloy of the titanium alloy vacuum container and vacuum parts has a compact structure composed of fine grains, each having a size of approximately not more than 10 μm, with a surface that is exposed to at least vacuum being set to have a surface roughness of not more than 50 nm; and in this structure, preferably, the surface roughness thereof may be set to not more than 10 nm, the titanium alloy may have a hardness in a range of not less than 230 Hv to not more than 310 Hv, and the titanium alloy may have a passivity surface film made by a thin titanium oxide layer or nitride layer that is formed on the surface thereof. The titanium alloy, which is desirably used in such titanium alloy vacuum container and vacuum parts, contains 0.3 wt. % to 0.5 wt. % of iron and 0.3 wt. % to 0.5 wt. % of oxygen, and the remainder thereof is made from Ti obligatory impurities.
摘要翻译： 本发明的目的是提供一种钛合金真空容器和真空部件，其可以通过真空排气在短时间内容易地实现超高真空。钛合金真空容器和真空部件的钛合金具有紧凑的结构 由细颗粒组成，每个细颗粒具有大约不超过10μm的尺寸，其中至少暴露于真空的表面被设定为具有不大于50nm的表面粗糙度; 在该结构中，优选其表面粗糙度可以设定为不大于10nm，钛合金的硬度可以在230Hv以上且不高于310Hv的范围内，并且钛合金可以具有 由形成在其表面上的薄氧化钛层或氮化物层制成的无源表面膜。 希望用于这种钛合金真空容器和真空部件中的钛合金含有0.3wt。 ％至0.5wt。 铁含量为0.3％ ％至0.5wt。 的氧气，其余部分由Ti强制性杂质制成。
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公开(公告)号：US07736215B2
公开(公告)日：2010-06-15
申请号：US11987382
申请日：2007-11-29
申请人： Sinnosuke Sekiya , Setsuo Yamamoto , Yutaka Koma , Masashi Aoki
发明人： Sinnosuke Sekiya , Setsuo Yamamoto , Yutaka Koma , Masashi Aoki
IPC分类号： B24B1/00
CPC分类号： B24D11/00 , B24B7/228 , B24D13/147
摘要： A polishing tool comprising a support member, and polishing means fixed to the support member. The polishing means is composed of felt having a density of 0.20 g/cm3 or more and a hardness of 30 or more, and abrasive grains dispersed in the felt. A polishing method and apparatus involving pressing the polishing means against a surface of a workpiece to be polished, while rotating the workpiece and also rotating the polishing tool.
摘要翻译： 一种抛光工具，包括支撑构件和固定到支撑构件上的抛光装置。 抛光装置由密度为0.20g / cm 3以上且硬度为30以上的毡和分散在毡中的磨粒组成。 一种抛光方法和装置，包括在旋转工件的同时将抛光装置压靠待抛光工件的表面并且还旋转抛光工具。
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公开(公告)号：US07677955B2
公开(公告)日：2010-03-16
申请号：US12243483
申请日：2008-10-01
申请人： Keiichi Kajiyama , Takatoshi Masuda , Shinya Watanabe , Shigehiko Aoki , Hirotoshi Hoshikawa , Yoshikazu Kobayashi , Seiji Harada , Setsuo Yamamoto
发明人： Keiichi Kajiyama , Takatoshi Masuda , Shinya Watanabe , Shigehiko Aoki , Hirotoshi Hoshikawa , Yoshikazu Kobayashi , Seiji Harada , Setsuo Yamamoto
IPC分类号： B24B49/00
摘要： A grinding method for a wafer having a plurality of devices on the front side, wherein the back side of the wafer is ground by a grinding wheel to suppress the motion of heavy metal in the wafer by a gettering effect and also to maintain the die strength of each device at about 1,000 MPa or more. The grinding wheel is composed of a frame and an abrasive member fixed to the free end of the frame. The abrasive member is produced by fixing diamond abrasive grains having a grain size of less than or equal to 1 μm with a vitrified bond. A protective member is attached to the front side of the wafer and the wafer is held on a chuck table in the condition where the protective member is in contact with the chuck table. The grinding wheel is rotated as rotating the chuck table to thereby grind the back side of the wafer by means of the abrasive member so that the average surface roughness of the back side of the wafer becomes less than or equal to 0.003 μm and the thickness of a strain layer remaining on the back side of the wafer becomes 0.05 μm.
摘要翻译： 一种用于在前侧具有多个器件的晶片的研磨方法，其中晶片的背面通过砂轮研磨，以通过吸气效应抑制晶片中重金属的运动，并且还保持模具强度 的每个装置在约1000MPa或更大。 砂轮由固定在框架自由端的框架和研磨件构成。 研磨构件通过用玻璃化粘合剂固定具有小于或等于1μm的晶粒尺寸的金刚石磨粒来制造。 在保护构件与卡盘台接触的状态下，将保护构件安装在晶片的前侧，并将晶片保持在卡盘台上。 砂轮沿着卡盘台转动而旋转，从而通过研磨部件磨削晶片的背面，使得晶片背面的平均表面粗糙度小于或等于0.003μm，厚度为 残留在晶片背面的应变层为0.05μm。
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公开(公告)号：US20090098808A1
公开(公告)日：2009-04-16
申请号：US12243483
申请日：2008-10-01
申请人： Keiichi Kajiyama , Takatoshi Masuda , Shinya Watanabe , Shigehiko Aoki , Hirotoshi Hoshikawa , Yoshikazu Kobayashi , Seiji Harada , Setsuo Yamamoto
发明人： Keiichi Kajiyama , Takatoshi Masuda , Shinya Watanabe , Shigehiko Aoki , Hirotoshi Hoshikawa , Yoshikazu Kobayashi , Seiji Harada , Setsuo Yamamoto
摘要： A grinding method for a wafer having a plurality of devices on the front side, wherein the back side of the wafer is ground by a grinding wheel to suppress the motion of heavy metal in the wafer by a gettering effect and also to maintain the die strength of each device at about 1,000 MPa or more. The grinding wheel is composed of a frame and an abrasive member fixed to the free end of the frame. The abrasive member is produced by fixing diamond abrasive grains having a grain size of less than or equal to 1 μm with a vitrified bond. A protective member is attached to the front side of the wafer and the wafer is held on a chuck table in the condition where the protective member is in contact with the chuck table. The grinding wheel is rotated as rotating the chuck table to thereby grind the back side of the wafer by means of the abrasive member so that the average surface roughness of the back side of the wafer becomes less than or equal to 0.003 μm and the thickness of a strain layer remaining on the back side of the wafer becomes 0.05 μm.
摘要翻译： 一种用于在前侧具有多个器件的晶片的研磨方法，其中晶片的背面通过砂轮研磨，以通过吸气效应抑制晶片中重金属的运动，并且还保持模具强度 的每个装置在约1000MPa或更大。 砂轮由固定在框架自由端的框架和研磨件构成。 研磨部件通过将具有小于或等于1μm的粒度的金刚石磨粒与玻璃化粘合固定而制成。 在保护构件与卡盘台接触的状态下，将保护构件安装在晶片的前侧，并将晶片保持在卡盘台上。 砂轮以旋转卡盘台的方式旋转，从而通过研磨部件磨削晶片的背面，使得晶片背面的平均表面粗糙度小于或等于0.003μm，厚度为 残留在晶片背面的应变层为0.05μm。
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公开(公告)号：US08025556B2
公开(公告)日：2011-09-27
申请号：US12349770
申请日：2009-01-07
IPC分类号： B24B1/00
CPC分类号： B24B37/042 , B24B27/0076
摘要： A method of grinding a wafer, including: a wafer holding step for holding a wafer on a conical holding surface of a chuck table having the holding surface; a rough grinding step for performing rough grinding of the wafer held on the holding surface of the chuck table by positioning a grinding surface of a rough grinding wheel at a predetermined inclination angle relative to the holding surface of said chuck table, and rotating the rough grinding wheel; and a finish grinding step for performing finish grinding of the wafer by positioning a grinding surface of a finish grinding wheel in parallel to the holding surface of the chuck table, and rotating the finish grinding wheel in a grinding region of the grinding wheel in a direction toward the vertex of the contact angle between the grinding surface of the finish grinding wheel and the surface to be ground of the wafer.
摘要翻译： 一种研磨晶片的方法，包括：晶片保持步骤，用于将晶片保持在具有保持表面的卡盘台的锥形保持表面上; 通过将粗磨轮的研磨面相对于所述夹盘的保持面定位成预定的倾斜角度，对保持在卡盘台的保持面上的晶片进行粗磨，粗磨加工， 轮; 以及精磨步骤，通过将精磨轮的研磨面与夹盘的保持面平行地定位，使精磨砂轮在砂轮的研磨区域中沿着方向 朝向精磨轮的磨削表面与待研磨的表面之间的接触角的顶点。
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公开(公告)号：US5119317A
公开(公告)日：1992-06-02
申请号：US323832
申请日：1989-03-15
IPC分类号： G06F17/50
CPC分类号： G06F17/509 , G06F2217/08 , G06F2217/34
摘要： A routing system for finding a route which satisfies predetermined limiting conditions in a space of an object space with an aid of a computer, includes a first processor for dividing at least the object area into a plurality of areas and extracting a divided area or divided areas which satisfy the predetermined limiting conditions from the plurality of divided areas, and a second processor for further dividing the divided area or divided areas extracted by the first processor into a plurality of subdivided areas and extracting a subdivided area or subdivided areas which satisfy the predetermined limiting conditions from the plurality of subdivided areas.
摘要翻译： 一种借助计算机找到满足对象空间空间中的预定限制条件的路由的路由系统，包括：第一处理器，用于至少将对象区域划分成多个区域，并提取分割区域或划分区域 其满足来自多个分割区域的预定限制条件，以及第二处理器，用于将由第一处理器提取的划分区域或划分区域进一步划分为多个细分区域，并提取满足预定限制的细分区域或细分区域 条件从多个细分区域。
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