公开(公告)号：US06183345B2

公开(公告)日：2001-02-06

申请号：US09045651

申请日：1998-03-20

申请人： Takashi Kamono ,  Matsuomi Nishimura ,  Kazuo Takahashi ,  Osamu Ikeda ,  Satoshi Ohta

发明人： Takashi Kamono ,  Matsuomi Nishimura ,  Kazuo Takahashi ,  Osamu Ikeda ,  Satoshi Ohta

IPC分类号： B24B2900

CPC分类号： B24B37/013 ,  B24B27/0023 ,  B24B27/0076 ,  B24B37/042

摘要： In order to efficiently polish a large-area member to be polished to a desired shape, a polishing apparatus includes a first polishing station including a first holding unit for holding a member to be polished in a state in which a surface to be polished thereof is upwardly placed, and a first polishing head for holding and rotating a polishing pad whose polishing surface is larger than the surface to be polished in a state of contacting the surface to be polished, a detection station for detecting a polished state of the surface to be polished in a state in which the surface to be polished is upwardly placed, and a second polishing station including a second holding unit for holding the member to be polished in a state in which the surface to be polished thereof is upwardly placed, and a second polishing head for holding and rotating a polishing pad whose polishing surface is smaller than the surface to be polished in a state of contacting the surface to be polished.

摘要翻译： 为了将要抛光的大面积构件有效地研磨成所需的形状，抛光装置包括：第一抛光站，包括：第一保持单元，用于在要抛光的表面被抛光的状态下保持要抛光的构件 向上放置的第一抛光头，以及用于保持和旋转抛光表面的抛光表面大于待抛光表面的抛光表面的第一抛光头，用于检测表面抛光状态的检测站 在抛光表面被向上放置的状态下被抛光;以及第二抛光台，其包括第二保持单元，用于在待抛光表面向上放置的状态下保持待抛光元件， 抛光头，用于在与要抛光的表面接触的状态下保持和旋转其研磨表面小于待抛光表面的抛光垫。

公开(公告)号：US06629882B2

公开(公告)日：2003-10-07

申请号：US09970302

申请日：2001-10-04

申请人： Kazuo Takahashi ,  Mikichi Ban ,  Matsuomi Nishimura ,  Shinzo Uchiyama ,  Takashi Kamono

发明人： Kazuo Takahashi ,  Mikichi Ban ,  Matsuomi Nishimura ,  Shinzo Uchiyama ,  Takashi Kamono

IPC分类号： B24B2900

CPC分类号： B24B37/105 ,  B24B47/10 ,  B24B49/12 ,  H01L21/00 ,  H01L21/68764

摘要： The present invention provides a precise polishing apparatus and method in which a polished body is polished by rotating a polishing pad having a diameter greater than that of the polished body while urging the polishing pad against the polished body in conditions that a center of the polished body is deviated from a rotation axis of the polishing pad and that the polishing pad is contacted with the entire polished surface of the polished body. The polished body may be a semi-conductor wafer.

公开(公告)号：US06390903B1

公开(公告)日：2002-05-21

申请号：US09044147

申请日：1998-03-19

申请人： Kazuo Takahashi ,  Mikichi Ban ,  Matsuomi Nishimura ,  Shinzo Uchiyama ,  Takashi Kamono

发明人： Kazuo Takahashi ,  Mikichi Ban ,  Matsuomi Nishimura ,  Shinzo Uchiyama ,  Takashi Kamono

IPC分类号： B24B2900

CPC分类号： B24B37/105 ,  B24B47/10 ,  B24B49/12 ,  H01L21/00 ,  H01L21/68764

摘要： The present invention provides a precise polishing apparatus and method in which a polished body is polished by rotating a polishing pad having a diameter greater than that of the polished body while urging the polishing pad against the polished body in conditions that a center of the polished body is deviated from a rotation axis of the polishing pad and that the polishing pad is contacted with the entire polished surface of the polished body. The polished body may be a semi-conductor wafer.

公开(公告)号：US20070121092A1

公开(公告)日：2007-05-31

申请号：US11611386

申请日：2006-12-15

申请人： Shinya Mochizuki ,  Takashi Kamono

发明人： Shinya Mochizuki ,  Takashi Kamono

IPC分类号： G03B27/62

CPC分类号： H01L21/67225 ,  G03F7/70741 ,  G03F7/70983 ,  H01L21/67772 ,  H01L21/67775

摘要： An exposure apparatus includes a vacuum chamber, a load-lock chamber disposed between the vacuum chamber and outside the exposure apparatus, a reticle cassette configured to hold a reticle, a conveying unit configured to convey the reticle cassette between the vacuum chamber and the load-lock chamber, and an opening and closing unit configured to open and close the reticle cassette. The opening and closing unit is disposed within the vacuum chamber.

摘要翻译： 曝光装置包括真空室，设置在真空室和曝光装置外部的装载锁定室，被配置为保持掩模版的掩模盒，构造成将掩模版盒传送到真空室和负载锁定室之间的输送单元， 锁定室，以及构造成打开和关闭标线盒的打开和关闭单元。 打开和关闭单元设置在真空室内。

公开(公告)号：US5161994A

公开(公告)日：1992-11-10

申请号：US689031

申请日：1991-05-24

申请人： Yoshio Sato ,  Takashi Kamono ,  Ryoji Nishimura

发明人： Yoshio Sato ,  Takashi Kamono ,  Ryoji Nishimura

IPC分类号： H01R13/62 ,  H01R12/70 ,  H01R12/83 ,  H01R13/627

CPC分类号： H01R12/7005 ,  H01R12/83 ,  H01R13/627

摘要： An edge connector (1) having metal latching devices (5) to latch and unlatch a circuit board (4) is disclosed. More particularly the latching devices (5) include a latching section (53) for latching the board (4) and an unlatching section (54) for releasing the board (4).

摘要翻译： PCT No.PCT / US90 / 04787 Sec。 371日期1991年5月24日 102（e）日期1991年5月24日PCT提交1990年8月15日PCT公布。 公开号WO91 / 04592 公开了具有用于闩锁和解锁电路板（4）的金属锁定装置（5）的边缘连接器（1）。 更具体地，锁定装置（5）包括用于闩锁板（4）的闩锁部分（53）和用于释放板（4）的解锁部分（54）。

公开(公告)号：US4806109A

公开(公告)日：1989-02-21

申请号：US148465

申请日：1988-01-26

申请人： Sakae Manabe ,  Takashi Kamono ,  Tetsuro Tokaichi ,  Shoji Umesato

发明人： Sakae Manabe ,  Takashi Kamono ,  Tetsuro Tokaichi ,  Shoji Umesato

IPC分类号： H01R13/658 ,  H01R4/70 ,  H01R4/66

CPC分类号： H01R23/688 ,  H01R12/724

摘要： A shielded electrical connector comprises a housing having contact sections of electrical contact members disposed in passages of the housing and exposed terminal sections extending outwardly and downwardly from a rear surface of the housing for electrical connection with signal paths of a printed circuit board. A shield plate extends along a row of terminal sections and has ground terminals electrically connected to ground tabs of contact members and ground terminals for electrical connection with ground paths of the printed circuit board.

摘要翻译： 屏蔽电连接器包括壳体，其具有设置在壳体的通道中的电接触构件的接触部分，以及从壳体的后表面向外和向下延伸的暴露端子部分，用于与印刷电路板的信号路径电连接。 屏蔽板沿着一排端子部分延伸，并且具有电连接到接触部件和接地端子的接地片的接地端子，用于与印刷电路板的接地路径电连接。

公开(公告)号：US07342640B2

公开(公告)日：2008-03-11

申请号：US11548021

申请日：2006-10-10

申请人： Takashi Kamono

发明人： Takashi Kamono

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70341

摘要： An exposure apparatus to expose a substrate to light with a space between a projection optical system and the substrate filled with liquid. The apparatus has a stage to hold the substrate and to move, a supply unit to supply the liquid to the space, a recovery unit to recover the liquid from the space, a detector to detect a droplet of the liquid on at least one of the substrate and the stage, a removing unit configured to remove the droplet on the substrate detected by the detector, the removing unit including a slit-shaped nozzle arranged so as to vertically sandwich the substrate and blowing a gas on the substrate from the nozzle, a calculation unit to calculate at least one of a position and size of the droplet detected by the detector, and a controller to control a relative velocity between the nozzle and the substrate based on the calculation result of the calculation unit.

摘要翻译： 一种用于将投影光学系统和填充有液体的基板之间的空间将基板曝光的曝光装置。 该装置具有保持基板并移动的阶段，用于将液体供应到空间的供应单元，用于从空间回收液体的回收单元，检测器，用于在至少一个 基板和载物台，移除单元，被配置为去除由检测器检测到的基板上的液滴，所述移除单元包括狭缝状喷嘴，其被布置成垂直夹持基板并从喷嘴吹送基板上的气体; 计算单元，用于计算由检测器检测的液滴的位置和尺寸中的至少一个;以及控制器，用于基于计算单元的计算结果来控制喷嘴和基板之间的相对速度。

公开(公告)号：US20070236673A1

公开(公告)日：2007-10-11

申请号：US11695831

申请日：2007-04-03

申请人： Hisashi Namba ,  Tatsuya Hayashi ,  Takashi Kamono

发明人： Hisashi Namba ,  Tatsuya Hayashi ,  Takashi Kamono

IPC分类号： G03B27/52

CPC分类号： G03F7/70933 ,  G03F7/70891

摘要： An exposure apparatus includes an illumination optical system configured to illuminate a reticle using extreme ultraviolet light, a projection optical system configured to project a pattern of the reticle onto a substrate, a diaphragm that defines a first space that accommodates the projection optical system, a first gas supplier configured to supply a first gas to the first space, and a first cooling unit configured to cool the first gas before the first gas supplier supplies the first gas to the first space.

摘要翻译： 曝光装置包括被配置为使用极紫外光照射掩模版的照明光学系统，配置为将掩模版的图案投影到基板上的投影光学系统，限定容纳投影光学系统的第一空间的光阑，第一 气体供给器，被配置为向第一空间供应第一气体;第一冷却单元，被配置为在第一气体供应器将第一气体供应到第一空间之前冷却第一气体。

公开(公告)号：US06833903B2

公开(公告)日：2004-12-21

申请号：US10356571

申请日：2003-02-03

申请人： Takashi Kamono

发明人： Takashi Kamono

IPC分类号： G03B2752

CPC分类号： G03F1/66 ,  G03F7/70741 ,  G03F7/70933

摘要： The object of this invention is to provide a technique of effectively purging a space almost closed with a master and pellicle film with inert gas in an exposure apparatus which uses ultraviolet rays as exposure light, purges the interior of the apparatus with inert gas, and projects the pattern of a master onto a photosensitive substrate via a projection optical system. To achieve this object, a plurality of vent holes are formed in a structure obtained by surrounding by a surrounding member a gas purge space to be purged with inert gas. A vessel which forms a space around the structure is filled with inert gas to cause inert gas to enter the gas purge space, purging the gas purge space with inert gas.

摘要翻译： 本发明的目的是提供一种在使用紫外线作为曝光灯的曝光装置中用惰性气体有效地吹扫主密封膜和防护薄膜的空间的技术，用惰性气体清洗设备的内部，并进行项目 通过投影光学系统将母版图案转印到感光基片上。 为了达到这个目的，多个通气孔形成在一个结构中，该结构是通过围绕一个气体吹扫空间围绕的，用惰性气体吹扫而形成的。 在结构周围形成空间的容器填充有惰性气体，以使惰性气体进入气体吹扫空间，用惰性气体吹扫气体吹扫空间。

公开(公告)号：US06762821B2

公开(公告)日：2004-07-13

申请号：US10166640

申请日：2002-06-12

申请人： Takashi Kamono

发明人： Takashi Kamono

IPC分类号： G03B2752

CPC分类号： G03F1/64 ,  G03F7/70866 ,  G03F7/70933 ,  G03F7/70983

摘要： An exposure apparatus includes a pellicle support frame which has a freely openable/closable lid and forms a pellicle space by using a pellicle film, and a pattern of a master facing the pellicle space is transferred onto a photosensitive substrate via a projection optical system. The apparatus includes a mechanism which opens/closes the lid, a nozzle arranged by selecting at least either one of a gas supply nozzle and a discharge nozzle, wherein at least either one of a gas supply and discharge is performed for the pellicle space via the selected nozzle, a device for measuring flexure of the pellicle film, a pressure detection device for detecting either one of a gas supply pressure and a discharge pressure, and a pressure control device for controlling the pressure detected by the pressure detection device. The pressure control device controls either one of the gas supply pressure and the discharge pressure so as to adjust a flexure value detected by the device for measuring flexure of the pellicle film to not more than a predetermined value.

摘要翻译： 曝光装置包括防护薄膜组件支架，其具有可自由打开/关闭的盖子，并通过使用防护薄膜形成防护薄膜组件，并且通过投影光学系统将面向防护薄膜空间的主机图案转印到感光基板上。 该装置包括打开/关闭盖的机构，通过选择气体供给喷嘴和排出喷嘴中的至少一个而布置的喷嘴，其中，通过经由 选择喷嘴，用于测量防护薄膜的挠曲的装置，用于检测气体供应压力和排出压力中的任一个的压力检测装置，以及用于控制由压力​​检测装置检测的压力的压力控制装置。 压力控制装置控制气体供给压力和排出压力中的任一个，以便将由用于测量防护薄膜的挠曲的装置检测到的挠曲值调整到不超过预定值。