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公开(公告)号：US06629882B2
公开(公告)日：2003-10-07
申请号：US09970302
申请日：2001-10-04
IPC分类号： B24B2900
CPC分类号： B24B37/105 , B24B47/10 , B24B49/12 , H01L21/00 , H01L21/68764
摘要： The present invention provides a precise polishing apparatus and method in which a polished body is polished by rotating a polishing pad having a diameter greater than that of the polished body while urging the polishing pad against the polished body in conditions that a center of the polished body is deviated from a rotation axis of the polishing pad and that the polishing pad is contacted with the entire polished surface of the polished body. The polished body may be a semi-conductor wafer.
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公开(公告)号：US06390903B1
公开(公告)日：2002-05-21
申请号：US09044147
申请日：1998-03-19
IPC分类号： B24B2900
CPC分类号： B24B37/105 , B24B47/10 , B24B49/12 , H01L21/00 , H01L21/68764
摘要： The present invention provides a precise polishing apparatus and method in which a polished body is polished by rotating a polishing pad having a diameter greater than that of the polished body while urging the polishing pad against the polished body in conditions that a center of the polished body is deviated from a rotation axis of the polishing pad and that the polishing pad is contacted with the entire polished surface of the polished body. The polished body may be a semi-conductor wafer.
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3.发明授权Polishing/cleaning method as well as method of making a wiring section using a polishing apparatus 失效抛光/清洁方法以及使用抛光装置制造布线部分的方法公开(公告)号：US06776691B2
公开(公告)日：2004-08-17
申请号：US09971692
申请日：2001-10-09
申请人： Matsuomi Nishimura , Mikichi Ban , Kazuo Takahashi , Osamu Ikeda
发明人： Matsuomi Nishimura , Mikichi Ban , Kazuo Takahashi , Osamu Ikeda
IPC分类号： B24B100
CPC分类号： H01L21/67028 , B08B3/00 , B08B3/04 , B08B2203/005 , B24B37/04 , B24B57/02 , Y10T29/49165
摘要： A polishing apparatus that can effectively and efficiently remove potassium and other alkaline metals comprises integrally a polishing unit for polishing an object by means of a polishing agent and a cleaning unit for cleaning the polished object. The polishing unit and the cleaning unit have means for isolating the internal atmosphere from the external atmosphere and the cleaning unit has a means for cleaning the polished object by bringing hot pure water or steam of pure water into contact with the polished object. With a cleaning method hot pure water is brought into contact with the polished object without drying it after having been polished by such a polishing apparatus.
摘要翻译： 能够有效且高效地除去钾等碱金属的研磨装置，通过研磨剂和用于清洗抛光物的清洗单元，一体地研磨用于研磨物体的研磨单元。 抛光单元和清洁单元具有用于将内部空气与外部空气隔离的装置，并且清洁单元具有通过使热纯水或纯水蒸汽与抛光对象接触来清洁抛光对象的装置。 通过清洗方法，在通过这种抛光装置抛光之后，使热纯水与抛光物体接触而不干燥。
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4.发明授权Polishing apparatus with transfer arm for moving polished object without drying it 有权抛光装置带有转移臂，用于移动抛光对象而不干燥公开(公告)号：US06332835B1
公开(公告)日：2001-12-25
申请号：US09193858
申请日：1998-11-18
申请人： Matsuomi Nishimura , Mikichi Ban , Kazuo Takahashi , Osamu Ikeda
发明人： Matsuomi Nishimura , Mikichi Ban , Kazuo Takahashi , Osamu Ikeda
IPC分类号： B24B700
CPC分类号： H01L21/67028 , B08B3/00 , B08B3/04 , B08B2203/005 , B24B37/04 , B24B57/02 , Y10T29/49165
摘要： A polishing apparatus that can effectively and efficiently remove potassium and other alkaline metals comprises integrally a polishing unit for polishing an object by means of a polishing agent and a cleaning unit for cleaning the polished object. The polishing unit and the cleaning unit have means for isolating the internal atmosphere from the external atmosphere and the cleaning unit has a means for cleaning the polished object by bringing hot pure water or steam of pure water into contact with the polished object. With a cleaning method hot pure water is brought into contact with the polished object without drying it after having been polished by such a polishing apparatus.
摘要翻译： 能够有效且高效地除去钾等碱金属的研磨装置，通过研磨剂和用于清洗抛光物的清洗单元，一体地研磨用于研磨物体的研磨单元。 抛光单元和清洁单元具有用于将内部空气与外部空气隔离的装置，并且清洁单元具有通过使热纯水或纯水蒸汽与抛光对象接触来清洁抛光对象的装置。 通过清洗方法，在通过这种抛光装置抛光之后，使热纯水与抛光物体接触而不干燥。
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公开(公告)号：US06149500A
公开(公告)日：2000-11-21
申请号：US304629
申请日：1999-05-04
申请人： Kazuo Takahashi , Mikichi Ban , Matsuomi Nishimura
发明人： Kazuo Takahashi , Mikichi Ban , Matsuomi Nishimura
CPC分类号： B24B37/345 , B24B55/00
摘要： A precision polishing apparatus has a first hermetically sealed chamber provided with polishing means, a third hermetically sealed chamber capable of communicating with the first hermetically sealed chamber through a second hermetically sealed chamber, first and second opening-closing means for alternately placing the first and the third hermetically sealed chamber in communication with the second hermetically sealed chamber, and atmosphere pressure control means for controlling the atmosphere pressure of the first and the second hermetically sealed chamber so that the atmosphere pressure of the first hermetically sealed chamber may become lower than the atmosphere pressure of the second hermetically sealed chamber when at least the first opening-closing means is opened.
摘要翻译： 精密抛光装置具有设置有抛光装置的第一密封室，能够通过第二密封室与第一密封室连通的第三密封室，第一和第二打开 - 关闭装置，用于交替地放置第一和第二密封室 与第二密封室连通的第三密封室，以及用于控制第一和第二密封室的气氛压力的大气压力控制装置，使得第一密封室的气氛压力可能变得低于大气压力 的至少第一开闭装置被打开。
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6.发明授权Method of manufacturing semiconductor device using precision polishing apparatus with detecting means 失效使用具有检测装置的精密抛光装置制造半导体器件的方法
公开(公告)号：US6165050A
公开(公告)日：2000-12-26
申请号：US303647
申请日：1999-05-03
申请人： Mikichi Ban , Matsuomi Nishimura , Kazuo Takahashi
发明人： Mikichi Ban , Matsuomi Nishimura , Kazuo Takahashi
IPC分类号： B24B37/04 , B24B49/00 , H01L21/302
CPC分类号： H01L21/67219 , B24B37/04 , B24B49/00 , H01L21/67271 , H01L21/67745
摘要： In order to reclaim defective articles, wafers carried in from a loading unit are transported to a wafer stocker unit, a polishing unit, a pre-rinsing unit, a rinsing unit, a spin dehydrating unit and a drying unit in the named order, and in a defect inspecting device, defective articles are sorted and the remainder are taken out of an unloading unit as products. The defective articles are classified in a discriminating device in conformity with the kinds of defects and are returned to the polishing unit, the rinsing unit or the drying unit through a return duct.
摘要翻译： 为了回收有缺陷的物品，从装载单元运送的晶片以指定的顺序被输送到晶片储存单元，抛光单元，预漂洗单元，漂洗单元，脱水脱水单元和干燥单元，以及 在缺陷检查装置中，有缺陷的物品被分类，其余的作为产品从卸载单元中取出。 有缺陷的物品根据缺陷的种类分类在鉴别装置中，并通过返回管道返回到抛光单元，漂洗单元或干燥单元。
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公开(公告)号：US5904611A
公开(公告)日：1999-05-18
申请号：US840627
申请日：1997-04-25
申请人： Kazuo Takahashi , Mikichi Ban , Matsuomi Nishimura
发明人： Kazuo Takahashi , Mikichi Ban , Matsuomi Nishimura
CPC分类号： B24B37/345 , B24B55/00
摘要： A precision polishing apparatus has a first hermetically sealed chamber provided with polishing means, a third hermetically sealed chamber capable of communicating with the first hermetically sealed chamber through a second hermetically sealed chamber, first and second opening-closing means for alternately placing the first and the third hermetically sealed chamber in communication with with the second hermetically sealed chamber, and atmosphere pressure control means for controlling the atmosphere pressure of the first and the second hermetically sealed chamber so that the atmosphere pressure of the first hermetically sealed chamber may become lower than the atmosphere pressure of the second hermetically sealed chamber when at least the first opening-closing means is opened.
摘要翻译： 精密抛光装置具有设置有抛光装置的第一密封室，能够通过第二密封室与第一密封室连通的第三密封室，第一和第二打开 - 关闭装置，用于交替地放置第一和第二密封室 与第二密封室连通的第三密封室，以及用于控制第一和第二密封室的气氛压力的大气压力控制装置，使得第一密封室的气氛压力可能变得低于大气 至少第一打开 - 关闭装置打开时，第二密封室的压力。
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公开(公告)号：US6012966A
公开(公告)日：2000-01-11
申请号：US851538
申请日：1997-05-05
申请人： Mikichi Ban , Matsuomi Nishimura , Kazuo Takahashi
发明人： Mikichi Ban , Matsuomi Nishimura , Kazuo Takahashi
IPC分类号： B24B37/04 , B24B49/00 , H01L21/302
CPC分类号： H01L21/67219 , B24B37/04 , B24B49/00 , H01L21/67271 , H01L21/67745
摘要： In order to reclaim defective articles, wafers carried in from a loading unit are transported to a wafer stocker unit, a polishing unit, a pre-rinsing unit, a rinsing unit, a spin dehydrating unit and a drying unit in the named order, and in a defect inspecting device, defective articles are sorted and the remainder are taken out as products out of an unloading unit. The defective articles are classified in a discriminating device in conformity with the kinds of the defects thereof, and are returned to the polishing unit, the rinsing unit or the drying unit through a return duct.
摘要翻译： 为了回收有缺陷的物品，从装载单元运送的晶片以指定的顺序被输送到晶片储存单元，抛光单元，预漂洗单元，漂洗单元，脱水脱水单元和干燥单元，以及 在缺陷检查装置中，对不合格物品进行分类，其余部分作为产品从卸载单元中取出。 有缺陷的物品根据其缺陷的种类被分类在鉴别装置中，并通过返回管道返回到抛光单元，漂洗单元或干燥单元。
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公开(公告)号：US06183345B2
公开(公告)日：2001-02-06
申请号：US09045651
申请日：1998-03-20
IPC分类号： B24B2900
CPC分类号： B24B37/013 , B24B27/0023 , B24B27/0076 , B24B37/042
摘要： In order to efficiently polish a large-area member to be polished to a desired shape, a polishing apparatus includes a first polishing station including a first holding unit for holding a member to be polished in a state in which a surface to be polished thereof is upwardly placed, and a first polishing head for holding and rotating a polishing pad whose polishing surface is larger than the surface to be polished in a state of contacting the surface to be polished, a detection station for detecting a polished state of the surface to be polished in a state in which the surface to be polished is upwardly placed, and a second polishing station including a second holding unit for holding the member to be polished in a state in which the surface to be polished thereof is upwardly placed, and a second polishing head for holding and rotating a polishing pad whose polishing surface is smaller than the surface to be polished in a state of contacting the surface to be polished.
摘要翻译： 为了将要抛光的大面积构件有效地研磨成所需的形状，抛光装置包括：第一抛光站，包括：第一保持单元，用于在要抛光的表面被抛光的状态下保持要抛光的构件 向上放置的第一抛光头，以及用于保持和旋转抛光表面的抛光表面大于待抛光表面的抛光表面的第一抛光头，用于检测表面抛光状态的检测站 在抛光表面被向上放置的状态下被抛光;以及第二抛光台，其包括第二保持单元，用于在待抛光表面向上放置的状态下保持待抛光元件， 抛光头，用于在与要抛光的表面接触的状态下保持和旋转其研磨表面小于待抛光表面的抛光垫。
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公开(公告)号：US06312316B1
公开(公告)日：2001-11-06
申请号：US09306822
申请日：1999-05-07
IPC分类号： B24B722
CPC分类号： B24B37/26 , B24B27/0076 , B24B37/20 , B24B41/047
摘要： A chemical mechanical polishing apparatus and method can polish a surface of an object very precisely at a high speed irrespective of the presence of a local defect on the surface to be polished. By using a multiplex ring-shaped polishing pad, an effective surface to be polished is increased, and very precise and uniform polishing can be performed at a high speed. By using a plurality of polishing pads, having different diameters smaller than the diameter of the surface to be polished, provided with an interval on the same revolution radius on a revolution table, or by using a plurality of polishing pads, having the same diameter smaller than the diameter of the surface to be polished, provided at positions having different revolution radii on a revolution table, very precise and uniform polishing can be performed.
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