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公开(公告)号：US4245301A
公开(公告)日：1981-01-13
申请号：US930406
申请日：1978-08-02
IPC分类号： G06F13/36 , G06F13/362 , G06F13/40 , G06F15/16 , G06F9/46
CPC分类号： G06F13/362 , G06F13/4027 , G06F13/4031 , G06F15/161
摘要： An information processing system having a main memory unit, an arithmetic control unit, and a plurality of input/output units, is comprised of a first bus, which is bidirectional, commonly connecting the main memory unit, the arithmetic control unit, and at least one input/output unit, a bus controller for controlling data transfer between two units connecting to the first bus, a second bus, which is also bidirectional, commonly connecting to the arithmetic control unit with at least another input/output unit, and a bus control means which is provided in the arithmetic control unit and controls data transfer between two units connecting to the second bus. The information processing system uses various units connecting to the first and second buses in time sharing and multiplexing mode.
摘要翻译： 具有主存储单元，运算控制单元和多个输入/输出单元的信息处理系统由第一总线构成，第一总线是双向的，通常连接主存储单元，算术控制单元，并且至少 一个输入/输出单元，用于控制连接到第一总线的两个单元之间的数据传输的总线控制器，也是双向的第二总线，通常使用至少另一个输入/输出单元连接到算术控制单元 控制装置，设置在算术控制单元中，并控制连接到第二总线的两个单元之间的数据传送。 信息处理系统使用在时分和复用模式下连接到第一和第二总线的各种单元。
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公开(公告)号：US20080302449A1
公开(公告)日：2008-12-11
申请号：US12185494
申请日：2008-08-04
申请人： Tomohisa ARAI , Takashi Rokutanda , Tadaharu Kido
发明人： Tomohisa ARAI , Takashi Rokutanda , Tadaharu Kido
CPC分类号： B26B9/00 , B26B3/00 , B26D1/0006 , B26D2001/002 , C22C19/053 , C22C19/055 , C22C19/058
摘要： A cutter is composed of a Ni—Cr alloy containing from 32 to 44 mass percent of Cr, from 2.3 to 6.0 mass percent of Al, the balance being Ni, impurities, and additional trace elements and having a Rockwell C hardness of 52 or more. This Ni—Cr alloy provides a cutter produced with a superior workability and by a significantly simplified process, having a low deterioration in the hardness even when heated in use, having excellent corrosion resistance and low-temperature embrittlement resistance, and satisfactorily maintaining the cutting performance for a long time.
摘要翻译： 切割机由含有32〜44质量％的Cr，2.3〜6.0质量％的Al，余量为Ni，杂质和其他微量元素并且具有52以上的Rockwell C硬度的Ni-Cr合金构成 。 该Ni-Cr合金提供了具有优异的可加工性的工具，并且通过显着简化的工艺，即使在使用中加热时也具有低的硬度劣化，具有优异的耐腐蚀性和耐低温脆性，并且令人满意地保持切割性能 需很长时间。
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3.发明申请Thermoelectric element and electronic component module and portable electronic apparatus using it 审中-公开热电元件和电子元件模块及其使用的便携式电子设备公开(公告)号：US20050172991A1
公开(公告)日：2005-08-11
申请号：US10518399
申请日：2003-06-18
申请人： Tomohisa Arai , Takashi Rokutanda , Masami Okamura
发明人： Tomohisa Arai , Takashi Rokutanda , Masami Okamura
CPC分类号： H01L35/30 , F25B21/02 , F25B2321/025
摘要： A thermoelectric element (1) comprises N type thermoelectric semiconductors (4) and P type thermoelectric semiconductors (5) arranged between support members (2, 3). The N type and P type thermoelectric semiconductors (4, 5) are connected together in series by heat absorbing electrodes (6) and heat radiating electrodes (7) joined to the ends of these semiconductors. First heat transmitting members (8) are integrally provided to the heat radiating electrodes (7), and second heat transmitting members (9) are integrally provided to the heat absorbing electrodes (6) and are allowed to protrude in the same direction as (in a direction opposite to) the direction of the first heat transmitting members (8). The second heat transmitting members (9) function as heat radiating media when the thermoelectric element (1) is not in operation to dissipate the heat of a component (16) to be cooled into a radiation space via the second heat transmitting members (9).
摘要翻译： 热电元件（1）包括N型热电半导体（4）和布置在支撑构件（2,3）之间的P型热电半导体（5）。 N型和P型热电半导体（4,5）通过与这些半导体的端部连接的吸热电极（6）和散热电极（7）串联连接在一起。 第一传热构件（8）一体地设置在散热电极（7）上，第二传热构件（9）一体地设置在吸热电极（6）上，并允许沿与 与第一传热部件（8）的方向相反的方向。 当热电元件（1）不工作时，第二传热构件（9）用作散热介质，以通过第二传热构件（9）将待冷却的部件（16）的热量散发到辐射空间中， 。
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公开(公告)号：US6070032A
公开(公告)日：2000-05-30
申请号：US323842
申请日：1999-06-02
申请人： Takashi Rokutanda , Takao Umeda , Yukio Otome
发明人： Takashi Rokutanda , Takao Umeda , Yukio Otome
CPC分类号： G03G21/08 , Y10S430/102
摘要： In an electrostatic printing apparatus, the residual image phenomenon conspicuously observed at low density printing can be eliminated while photo-deterioration of the photosensitive body is being suppressed to a minimum in a high speed printing process. A charging unit, a writing light source, a developing unit, a transfer unit, a first erase lamp, an AC discharging unit and a second erase lamp are arranged around a photosensitive drum. Therein, the light intensity of the erase lamp is strengthened when the density of a printed image is light and is weakened when the density of the printed image is dark. That is, by changing the light intensity of the erase lamps corresponding to a developing bias, the residual image phenomenon can be eliminated while suppressing deterioration of the photosensitive drum to a minimum.
摘要翻译： 在静电印刷装置中，可以消除在低密度印刷时明显观察到的残留图像现象，同时在高速印刷工艺中将感光体的光劣化抑制到最小。 在感光鼓周围布置充电单元，书写光源，显影单元，转印单元，第一擦除灯，AC放电单元和第二擦除灯。 其中，当打印图像的浓度较浅时，擦除灯的光强度增强，并且当打印图像的浓度变暗时，擦除灯的光强度变弱。 也就是说，通过改变对应于显影偏压的擦除灯的光强度，可以消除残留图像现象，同时将感光鼓的劣化抑制到最小。
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公开(公告)号：US07682474B2
公开(公告)日：2010-03-23
申请号：US12185494
申请日：2008-08-04
申请人： Tomohisa Arai , Takashi Rokutanda , Tadaharu Kido
发明人： Tomohisa Arai , Takashi Rokutanda , Tadaharu Kido
IPC分类号： C22F1/10
CPC分类号： B26B9/00 , B26B3/00 , B26D1/0006 , B26D2001/002 , C22C19/053 , C22C19/055 , C22C19/058
摘要： A cutter is composed of a Ni—Cr—Al alloy containing from 32 to 44 mass percent of Cr, from 2.3 to 6.0 mass percent of Al, the balance being Ni, impurities, and additional trace elements and having a Rockwell C hardness of 52 or more. This Ni—Cr—Al alloy provides a cutter produced with a superior workability and by a significantly simplified process, having a low deterioration in the hardness even when heated in use, having excellent corrosion resistance and low-temperature embrittlement resistance, and satisfactorily maintaining the cutting performance for a long time.
摘要翻译： 切割机由含有32〜44质量％的Cr，2.3〜6.0质量％的Al，余量为Ni，杂质和其他微量元素并且具有52的Rockwell C硬度的Ni-Cr-Al合金 或者更多。 该Ni-Cr-Al合金提供了具有优异的可加工性的工具，并且通过显着简化的工艺，即使在使用中加热时也具有低的硬度劣化，具有优异的耐腐蚀性和耐低温脆性，并且令人满意地保持 切割性能很长时间。
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公开(公告)号：US20080121319A1
公开(公告)日：2008-05-29
申请号：US11664275
申请日：2005-09-22
CPC分类号： C22F1/10 , C22C19/05 , C22C19/052 , C22C19/053 , C22C19/055 , C22C19/058
摘要： There are provided a high hardness, high corrosion resistance and high wear resistance alloy, wherein the alloy is an aging heat treated Cr(chromium)-Al(aluminum)-Ni(nickel)-base alloy, the proportion of a mixed phase of (α phase+γ′ phase+γ phase) precipitated at grain boundaries of γ phase grains in a metal structure in the cross section of the alloy is not less than 95% in terms of area ratio, and the intensity ratio as measured by X-ray diffractometry of the alloy is not less than 50% and not more than 200% in terms of Iα(110)/[Iγ(200)+Iγ′(004)]×100, and a component comprising this alloy, a material for an alloy which can form this alloy, and a process for producing this alloy.The present invention can provide a Cr—Al—Ni-base alloy possessing excellent corrosion resistance, hardness, wear resistance, releasability, fatigue strength, and planishing property in a molding face, a component comprising this alloy, a material for an alloy which can form this alloy, and a process for producing this alloy.
摘要翻译： 提供高硬度，高耐腐蚀性和高耐磨合金，其中该合金是老化热处理的Cr（铬）-Al（铝）-Ni（镍） - 基合金，混合相的比例（ 在合金的横截面中的金属结构的γ相晶粒的晶界处析出的α相+γ'相+γ相）以面积比计不小于95％，并且通过X- 按照Ialpha（110）/ [Igamma（200）+ Igamma'（004）]×100，合金的射线衍射不小于50％且不大于200％，并且包含该合金的组分，用于 可以形成该合金的合金，以及该合金的制造方法。 本发明可以提供一种在成型面上具有优异的耐腐蚀性，硬度，耐磨性，脱模性，疲劳强度和平整性的Cr-Al-Ni基合金，包含该合金的组分， 形成该合金，以及该合金的制造方法。
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公开(公告)号：US20050167010A1
公开(公告)日：2005-08-04
申请号：US10514196
申请日：2003-05-14
申请人： Tomohisa Arai , Takashi Rokutanda , Tadaharu Kido
发明人： Tomohisa Arai , Takashi Rokutanda , Tadaharu Kido
CPC分类号： B26B9/00 , B26B3/00 , B26D1/0006 , B26D2001/002 , C22C19/053 , C22C19/055 , C22C19/058
摘要： A cutter is composed of a Ni—Cr alloy containing from 32 to 44 mass percent of Cr, from 2.3 to 6.0 mass percent of Al, the balance being Ni, impurities, and additional trace elements and having a Rockwell C hardness of 52 or more. This Ni—Cr alloy provides a cutter produced with a superior workability and by a significantly simplified process, having a low deterioration in the hardness even when heated in use, having excellent corrosion resistance and low-temperature embrittlement resistance, and satisfactorily maintaining the cutting performance for a long time.
摘要翻译： 切割机由含有32〜44质量％的Cr，2.3〜6.0质量％的Al，余量为Ni，杂质和其他微量元素并且具有52以上的Rockwell C硬度的Ni-Cr合金构成 。 该Ni-Cr合金提供了具有优异的可加工性的工具，并且通过显着简化的工艺，即使在使用中加热时也具有低的硬度劣化，具有优异的耐腐蚀性和耐低温脆性，并且令人满意地保持切割性能 需很长时间。
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公开(公告)号：US6101347A
公开(公告)日：2000-08-08
申请号：US324724
申请日：1999-06-03
申请人： Takashi Rokutanda , Takao Umeda , Yukio Otome , Nobuyuki Mori
发明人： Takashi Rokutanda , Takao Umeda , Yukio Otome , Nobuyuki Mori
CPC分类号： G03G15/231 , G03G2215/00413 , G03G2215/00455 , G03G2215/00708
摘要： There are provided a paper separating mechanism for bringing paper into a state of non-contact with a paper carrying roll; a motor for independently driving the paper carrying roll; and a switch for changing-over the paper carrying roll driving mode between a following mode and an independent driving mode so that the driving mode is changed over to the following mode and independent driving mode at the time of printing and at the time of non-printing, respectively.
摘要翻译： 提供了一种纸分离机构，用于使纸张与携带卷纸不接触的状态; 用于独立地驱动纸张传送辊的电机; 以及用于在随动模式和独立驱动模式之间切换送纸辊驱动模式的开关，使得驱动模式在打印时切换到随后的模式和独立的驱动模式， 印刷。
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9.发明授权公开(公告)号：US09355855B2
公开(公告)日：2016-05-31
申请号：US13989092
申请日：2011-11-29
申请人： Michio Sato , Takashi Hino , Takashi Rokutanda , Masashi Nakatani
发明人： Michio Sato , Takashi Hino , Takashi Rokutanda , Masashi Nakatani
CPC分类号： H01L21/3065 , C23C4/04 , C23C24/04 , H01J37/32477 , H01J2237/334 , Y10T428/24413 , Y10T428/25 , Y10T428/26 , Y10T428/265
摘要： The present invention provides a plasma etching apparatus component 1 includes a base material 10 and an yttrium oxide coating 20 formed by an impact sintering process and configured to cover a surface of the base material. The yttrium oxide coating 20 contains at least one of particulate portions and non-particulate portions. The yttrium oxide coating 20 has a film thickness of 10 μm or above and a film density of 90% or above. The particulate portions have an area coverage ratio of 0 to 80% and the non-particulate portions have an area coverage ratio of 20 to 100%.
摘要翻译： 本发明提供了一种等离子体蚀刻装置部件1，其包括基材10和通过冲击烧结工艺形成的氧化钇涂层20，并被构造成覆盖基材的表面。 氧化钇涂层20包含颗粒部分和非颗粒部分中的至少一个。 氧化钇涂层20的膜厚为10μm以上，膜密度为90％以上。 颗粒部分的面积覆盖率为0〜80％，非颗粒部分的面积覆盖率为20〜100％。
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10.发明申请公开(公告)号：US20130251949A1
公开(公告)日：2013-09-26
申请号：US13989092
申请日：2011-11-29
申请人： Michio Sato , Takashi Hino , Takashi Rokutanda , Masashi Nakatani
发明人： Michio Sato , Takashi Hino , Takashi Rokutanda , Masashi Nakatani
IPC分类号： H01L21/3065 , C23C4/12
CPC分类号： H01L21/3065 , C23C4/04 , C23C24/04 , H01J37/32477 , H01J2237/334 , Y10T428/24413 , Y10T428/25 , Y10T428/26 , Y10T428/265
摘要： The present invention provides a plasma etching apparatus component 1 includes a base material 10 and an yttrium oxide coating 20 formed by an impact sintering process and configured to cover a surface of the base material. The yttrium oxide coating 20 contains at least one of particulate portions and non-particulate portions. The yttrium oxide coating 20 has a film thickness of 10 μm or above and a film density of 90% or above. The particulate portions have an area coverage ratio of 0 to 80% and the non-particulate portions have an area coverage ratio of 20 to 100%.
摘要翻译： 本发明提供一种等离子体蚀刻装置部件1，其包括基材10和通过冲击烧结工艺形成的氧化钇涂层20，并且被构造成覆盖基材的表面。 氧化钇涂层20包含颗粒部分和非颗粒部分中的至少一个。 氧化钇涂层20的膜厚为10μm以上，膜密度为90％以上。 颗粒部分的面积覆盖率为0〜80％，非颗粒部分的面积覆盖率为20〜100％。
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