利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

115 条记录 (耗时 0.032 秒)

    Process for preparing fluorine-containing polymer and photoresist composition
    1.
    发明申请
    Process for preparing fluorine-containing polymer and photoresist composition 审中-公开
    制备含氟聚合物和光致抗蚀剂组合物的方法

    公开(公告)号：US20050191578A1

    公开(公告)日：2005-09-01

    申请号：US11104554

    申请日：2005-04-13

    申请人： Takayuki Araki ,  Takuji Ishikawa ,  Meiten Koh ,  Minoru Toriumi

    发明人： Takayuki Araki ,  Takuji Ishikawa ,  Meiten Koh ,  Minoru Toriumi

    IPC分类号： C08F4/34 ,  C08F8/00 ,  C08F214/18 ,  G03C1/492 ,  G03F7/004 ,  G03F7/039

    CPC分类号： C08F214/18 ,  C08F8/00 ,  C08F2800/20 ,  G03C1/492 ,  G03F7/0046 ,  G03F7/0392 ,  C08F214/26

    摘要： There is provided a process for preparing a fluorine-containing polymer for resist which is excellent in transparency in a vacuum ultraviolet region, comprises a structural unit derived from a fluorine-containing ethylenic monomer and/or a structural unit derived from a monomer which can provide an aliphatic ring structure in the polymer trunk chain and may have a fluorine atom, and has an acid-reactive group Y1 reacting with an acid or a group Y2 which can be converted to the acid-reactive group Y1, in which the fluorine-containing ethylenic monomer and/or the monomer which can provide an aliphatic ring structure in the polymer trunk chain are subjected to radical polymerization by using an organic peroxide represented by the formula (1): wherein R50 and R51 are the same or different and each is a hydrocarbon group having 1 to 30 carbon atoms which may have ether bond (an atom at an end of bond is not oxygen atom); p1 and p2 are the same or different and each is 0 or 1; p3 is 1 or 2, and also there is provided a photoresist composition comprising the obtained polymer. The fluorine-containing polymer is excellent in transparency in a vacuum ultraviolet region, and can form an ultra fine pattern as a polymer for a photoresist, particularly for a F2 resist.

    摘要翻译： 提供了一种制备真空紫外线区域的透明度优异的抗蚀剂用含氟聚合物的方法，包括衍生自含氟乙烯性单体的结构单元和/或衍生自单体的结构单元，其可以提供 聚合物主链中的脂族环结构，并且可以具有氟原子，并且具有与酸或Y 2的基团反应的酸反应性基团Y 1，其可以是 转化为酸反应性基团Y 1，其中可以在聚合物主链中提供脂族环结构的含氟乙烯性单体和/或单体通过使用 由式（1）表示的有机过氧化物：其中R 50和R 51相同或不同，并且各自为具有1至30个碳原子的烃基，其可以 具有醚键（键的末端的原子不是氧原子）; p1和p2相同或不同，分别为0或1; p3为1或2，并且还提供包含所得聚合物的光致抗蚀剂组合物。 含氟聚合物在真空紫外区域的透明度优异，并且可以形成作为光致抗蚀剂的聚合物的超细图案，特别是用于F2抗蚀剂。

    Novel fluorine-containing polymer having acid-reactive group and chemically amplifying type photoresist composition prepared from same
    4.
    发明申请
    Novel fluorine-containing polymer having acid-reactive group and chemically amplifying type photoresist composition prepared from same 审中-公开
    具有酸反应性基团的新型含氟聚合物和由其制备的化学放大型光致抗蚀剂组合物

    公开(公告)号：US20050287471A1

    公开(公告)日：2005-12-29

    申请号：US11033954

    申请日：2005-01-13

    申请人： Takayuki Araki ,  Meiten Koh ,  Yoshito Tanaka ,  Takuji Ishikawa ,  Hirokazu Aoyama ,  Tetsuo Shimizu

    发明人： Takayuki Araki ,  Meiten Koh ,  Yoshito Tanaka ,  Takuji Ishikawa ,  Hirokazu Aoyama ,  Tetsuo Shimizu

    IPC分类号： G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/075 ,  G03C1/76

    CPC分类号： G03F7/039 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/0758 ,  Y10S430/106 ,  Y10S430/108

    摘要： There is provided a novel fluorine-containing polymer having an acid-reactive group which has a high transparency against energy rays (radioactive rays) in a vacuum ultraviolet region (157 nm), and further there are provided a material for fluorine-containing base polymer prepared from the polymer and suitable for a photoresist and a chemically amplifying type resist composition obtained therefrom. The polymer has a number average molecular weight of from 1,000 to 1,000,000 and represented by the formula: -(M1)-(M2)-(A)-, wherein M1 is a structural unit having an acid-labile or acid-degradable functional group, M2 is a structural unit of fluorine-containing acryl ester, A is a structural unit derived from other copolymerizable monomer, the percent by mole ratio M1/M2 is 1 to 99/99 to 1 and the polymer comprises from 1 to 99% by mole of the structural unit M1, from 1 to 99% by mole of the structural unit M2 and from 0 to 98% by mole of the structural unit A1. The material for fluorine-containing base polymer comprises a fluorine-containing polymer having an acid-reactive group such as the above-mentioned polymer and is suitable for a photoresist, and the chemically amplifying type resist composition is obtained from those polymer and material.

    摘要翻译： 提供了一种具有酸反应性基团的新型含氟聚合物，其具有对真空紫外区域（157nm）中的能量射线（放射线）的高透明性，并且还提供了含氟基础聚合物 由聚合物制备并适用于由其获得的光致抗蚀剂和化学放大型抗蚀剂组合物。 聚合物的数均分子量为1,000〜1,000,000，由下式表示： - （M1） - （M2） - （A） - ，其中M1是具有酸不稳定性或酸可降解官能团的结构单元 M2是含氟丙烯酸酯的结构单元，A是来自其它可共聚单体的结构单元，M1 / M2的摩尔比为1〜99/99〜1，聚合物的含量为1〜99％ 结构单元M1的摩尔数，结构单元M2的1〜99摩尔％和结构单元A1的0〜98摩尔％。 含氟基础聚合物的材料包括具有酸反应性基团的含氟聚合物如上述聚合物，并且适用于光致抗蚀剂，化学放大型抗蚀剂组合物由那些聚合物和材料获得。

    Fluorine-containing polymer having acid-reactive group and chemically amplifying type photoresist composition prepared from same
    7.
    发明授权
    Fluorine-containing polymer having acid-reactive group and chemically amplifying type photoresist composition prepared from same 有权
    具有酸反应性基团的含氟聚合物和由其制备的化学放大型光致抗蚀剂组合物

    公开(公告)号：US06908724B2

    公开(公告)日：2005-06-21

    申请号：US10262893

    申请日：2002-10-03

    申请人： Takayuki Araki ,  Meiten Koh ,  Yoshito Tanaka ,  Takuji Ishikawa ,  Hirokazu Aoyama ,  Tetsuo Shimizu

    发明人： Takayuki Araki ,  Meiten Koh ,  Yoshito Tanaka ,  Takuji Ishikawa ,  Hirokazu Aoyama ,  Tetsuo Shimizu

    IPC分类号： G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/075

    CPC分类号： G03F7/039 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/0758 ,  Y10S430/106 ,  Y10S430/108

    摘要： There is provided a novel fluorine-containing polymer having an acid-reactive group which has a high transparency against energy rays (radioactive rays) in a vacuum ultraviolet region (157 nm), and further there are provided a material for fluorine-containing base polymer prepared from the polymer and suitable for a photoresist and a chemically amplifying type resist composition obtained therefrom.The polymer has a number average molecular weight of from 1,000 to 1,000,000 and represented by the formula: —(M1)—(M2)—(A)—, wherein M1 is a structural unit having an acid-labile or acid-degradable functional group, M2 is a structural unit of fluorine-containing acryl ester, A is a structural unit derived from other copolymerizable monomer, the percent by mole ratio M1/M2 is 1 to 99/99 to 1 and the polymer comprises from 1 to 99% by mole of the structural unit M1, from 1 to 99% by mole of the structural unit M2 and from 0 to 98% by mole of the structural unit A1. The material for fluorine-containing base polymer comprises a fluorine-containing polymer having an acid-reactive group such as the above-mentioned polymer and is suitable for a photoresist, and the chemically amplifying type resist composition is obtained from those polymer and material.

    摘要翻译： 提供了一种具有酸反应性基团的新型含氟聚合物，其具有对真空紫外区域（157nm）中的能量射线（放射线）的高透明性，并且还提供了含氟基础聚合物 由聚合物制备并适用于由其获得的光致抗蚀剂和化学放大型抗蚀剂组合物。 聚合物的数均分子量为1,000〜1,000,000，由下式表示： - （M1） - （M2） - （A） - ，其中M1是具有酸不稳定性或酸可降解官能团的结构单元 M2是含氟丙烯酸酯的结构单元，A是来自其它可共聚单体的结构单元，M1 / M2的摩尔比为1〜99/99〜1，聚合物的含量为1〜99％ 结构单元M1的摩尔数，结构单元M2的1〜99摩尔％和结构单元A1的0〜98摩尔％。 含氟基础聚合物的材料包括具有酸反应性基团的含氟聚合物如上述聚合物，并且适用于光致抗蚀剂，化学放大型抗蚀剂组合物由那些聚合物和材料获得。

    Solid electrolyte comprising fluorine-containing polymer having fluorine-containing ether chains
    8.
    发明授权
    Solid electrolyte comprising fluorine-containing polymer having fluorine-containing ether chains 有权
    含有含氟醚链的含氟聚合物的固体电解质

    公开(公告)号：US07682753B2

    公开(公告)日：2010-03-23

    申请号：US11096056

    申请日：2005-04-01

    申请人： Meiten Koh ,  Takayuki Araki

    发明人： Meiten Koh ,  Takayuki Araki

    IPC分类号： H01M10/40

    CPC分类号： G02F1/1508 ,  H01B1/122 ,  H01G9/025 ,  H01G9/028 ,  H01G9/038 ,  H01G11/56 ,  H01M8/0289 ,  H01M8/1025 ,  H01M8/1039 ,  H01M8/1044 ,  H01M8/1048 ,  H01M8/1072 ,  Y02E60/13 ,  Y02P70/56

    摘要： There is provided a fluorine-containing polymer solid electrolyte which has an excellent ion-conducting property, is high in oxidation resistance, is stable electrochemically and thermally, has sufficient strength and is applicable to various electrochemical devices. The electrolyte comprises (A) a non-crystalline fluorine-containing polymer having, in a trunk chain and/or side chain of the polymer molecule, a structural unit D having five or more chained units derived from a fluorine-containing ether, (B) an electrolytic compound and (C) a solvent, and has an ionic conductivity of from 10−10 to 101 S/cm measured at 25° C. by an alternating current complex impedance method. The electrolyte is useful for various electrochemical devices.

    摘要翻译： 提供了具有优异的离子传导性，耐氧化性高，电化学和热稳定性好的含氟聚合物固体电解质，具有足够的强度并适用于各种电化学装置。 电解质包含（A）在聚合物分子的主链和/或侧链中具有5个以上来自含氟醚的链状单元的结构单元D（B）的非结晶性含氟聚合物 ）电解化合物和（C）溶剂，并且通过交流复阻抗法在25℃下测得的离子电导率为10-10至101S / cm。 电解质可用于各种电化学装置。

    Functional material comprising fluorine-containing compound
    9.
    发明申请
    Functional material comprising fluorine-containing compound 审中-公开

    公开(公告)号：US20070179263A1

    公开(公告)日：2007-08-02

    申请号：US10591860

    申请日：2005-03-03

    申请人： Meiten Koh ,  Mamoru Miyata ,  Takayuki Araki

    发明人： Meiten Koh ,  Mamoru Miyata ,  Takayuki Araki

    IPC分类号： C08F214/18 ,  C07C215/28

    CPC分类号： H01M14/005 ,  C07C235/16 ,  C07D239/42 ,  C07D249/14 ,  C07D251/18 ,  C07D251/22 ,  C07D251/24 ,  C08F214/18 ,  C08F216/1408 ,  C10N2220/04

    摘要： There is provided an ionic liquid type functional material which is useful for a lubricant, acid-removing agent, various ionic liquid materials, electrolyte for solar cell and actuator material. The ionic liquid type functional material contains an aromatic compound which has a fluorine-containing ether chain and is represented by the formula (1): [Ra-DmRy  (1)wherein -D- is a fluoroether unit represented by the formula (1-1): O—Rn or R—On  (1-1) in which R is at least one selected from divalent fluorine-containing alkylene groups having 1 to 5 carbon atoms in which at least one of hydrogen atoms is replaced by fluorine atom; n is an integer of from 1 to 20; when m is not less than 2, two or more of D may be the same or different; Ra is a monovalent organic group which has 1 to 20 carbon atoms and does not contain D; when m is not less than 2, two or more of Ra may be the same or different; m is an integer of from 1 to 4; Ry is a mono-, di-, tri- or tetra-valent organic group having 2 to 30 carbon atoms which has at least one selected from a basic functional group Y1 and/or a salt Y2 of the basic functional group and contains an aromatic ring structure, provided that a unit of —O—O— is not contained in the formulae (1) and (1-1).

    Fluorine-containing ethylenic monomer having hydroxyl group or fluoroalkyl carbonyl group and fluorine-containing polymer prepared by polymerization of same
    10.
    发明授权
    Fluorine-containing ethylenic monomer having hydroxyl group or fluoroalkyl carbonyl group and fluorine-containing polymer prepared by polymerization of same 有权
    具有羟基或氟代烷基羰基的含氟乙烯性单体和通过聚合制备的含氟聚合物

    公开(公告)号：US07214470B2

    公开(公告)日：2007-05-08

    申请号：US10644953

    申请日：2003-08-21

    申请人： Takayuki Araki ,  Yuzo Komatsu ,  Meiten Koh

    发明人： Takayuki Araki ,  Yuzo Komatsu ,  Meiten Koh

    IPC分类号： G03F7/038

    CPC分类号： G03F7/091 ,  C07C33/423 ,  C07C43/178 ,  C07C45/45 ,  C07C49/227 ,  C07C49/255 ,  C08F16/04 ,  C08F16/34 ,  C08F216/04 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0392

    摘要： There are provided a fluorine-containing ethylenic monomer having hydroxyl group or fluoroalkyl carbonyl group and represented by the formula (1): and the formula (14): respectively, wherein X1 and X2 are the same or different and each is H or F; X3 is H, F, Cl or CF3; Rf1 and Rf2 are the same or different and each is a perfluoroalkyl group having 1 to 20 carbon atoms; Rf3 is a fluorine-containing alkylene group having 1 to 40 carbon atoms or a fluorine-containing alkylene group having ether bond which has 1 to 100 carbon atoms and the sum of carbon atom and oxygen atom of two or more; a is 0 or 1, a fluorine-containing polymer having a structural unit of the above-mentioned monomer and a composition for a photoresist. The monomer has good polymerizability, particularly radical polymerizability, and the polymer obtained by polymerizing the monomer has excellent optical characteristics and is useful as a base polymer for an antireflection film and for a composition for a resist.

    摘要翻译： 提供具有羟基或氟代烷基羰基并由式（1）表示的含氟乙烯性单体：和式（14）：其中X 1和X 2 相同或不同，分别为H或F; X 3是H，F，Cl或CF 3; Rf 1和Rf 2相同或不同，各自为具有1至20个碳原子的全氟烷基; Rf 3是具有1〜40个碳原子的含氟亚烷基或具有1〜100个碳原子的醚键的含氟亚烷基，碳原子和氧原子之和为2 或者更多; a为0或1，具有上述单体的结构单元的含氟聚合物和光致抗蚀剂的组合物。 单体具有良好的聚合性，特别是自由基聚合性，通过聚合单体获得的聚合物具有优异的光学特性，可用作抗反射膜和抗蚀剂组合物的基础聚合物。