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1.
公开(公告)号:US07830736B2
公开(公告)日:2010-11-09
申请号:US12165720
申请日:2008-07-01
申请人: Takehiko Hojo , Tomohiro Kobayashi , Tetsuya Amano
发明人: Takehiko Hojo , Tomohiro Kobayashi , Tetsuya Amano
IPC分类号: G11C29/00
CPC分类号: G11C17/18 , G11C17/16 , G11C17/165 , G11C29/027 , G11C29/785 , G11C29/802
摘要: A semiconductor integrated circuit device includes a first fuse circuit, a second fuse circuit, and a control signal generating circuit which sends a first control signal and executes program such that the resistance value of the first fuse circuit becomes greater than the resistance value of the second fuse circuit, and sends a second control signal and executes reprogram such that the resistance value of the second fuse circuit becomes greater than the resistance value of the first fuse circuit.
摘要翻译: 半导体集成电路器件包括第一熔丝电路,第二熔丝电路和控制信号发生电路,其发送第一控制信号并执行程序,使得第一熔丝电路的电阻值变得大于第二熔丝电路的电阻值 熔丝电路,并发送第二控制信号并执行重新编程,使得第二熔丝电路的电阻值变得大于第一熔丝电路的电阻值。
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2.
公开(公告)号:US20090010085A1
公开(公告)日:2009-01-08
申请号:US12165720
申请日:2008-07-01
申请人: Takehiko Hojo , Tomohiro Kobayashi , Tetsuya Amano
发明人: Takehiko Hojo , Tomohiro Kobayashi , Tetsuya Amano
CPC分类号: G11C17/18 , G11C17/16 , G11C17/165 , G11C29/027 , G11C29/785 , G11C29/802
摘要: A semiconductor integrated circuit device includes a first fuse circuit, a second fuse circuit, and a control signal generating circuit which sends a first control signal and executes program such that the resistance value of the first fuse circuit becomes greater than the resistance value of the second fuse circuit, and sends a second control signal and executes reprogram such that the resistance value of the second fuse circuit becomes greater than the resistance value of the first fuse circuit.
摘要翻译: 半导体集成电路器件包括第一熔丝电路,第二熔丝电路和控制信号发生电路,其发送第一控制信号并执行程序,使得第一熔丝电路的电阻值变得大于第二熔丝电路的电阻值 熔丝电路,并发送第二控制信号并执行重新编程,使得第二熔丝电路的电阻值变得大于第一熔丝电路的电阻值。
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公开(公告)号:US08795942B2
公开(公告)日:2014-08-05
申请号:US12000284
申请日:2007-12-11
CPC分类号: G03F7/0397 , G03F7/0045
摘要: There is disclosed a resist composition that remarkably improves the resolution of photolithography using a high energy beam such as ArF excimer laser light as a light source, and exhibits excellent resistance to surface roughness and side lobe under use of a halftone phase shift mask; and a patterning process using the resist composition. The positive resist composition at least comprises (A) a resin component comprising a repeating unit represented by the following general formula (1); (B) a photoacid generator generating sulfonic acid represented by the following general formula (2) upon exposure to a high energy beam; and (C) an onium salt where a cation is sulfonium represented by the following general formula (3), or ammonium represented by the following general formula (4); and an anion is represented by any one of the following general formulae (5) to (7).
摘要翻译: 公开了一种抗蚀剂组合物,其使用诸如ArF准分子激光器的高能束作为光源显着地提高了光刻的分辨率,并且在使用半色调相移掩模的情况下表现出优异的抗表面粗糙度和侧凸的性能; 以及使用抗蚀剂组合物的图案化工艺。 正型抗蚀剂组合物至少包含(A)包含由以下通式(1)表示的重复单元的树脂组分; (B)在暴露于高能量束时产生由以下通式(2)表示的磺酸的光酸产生剂; 和(C)鎓盐,其中阳离子是由以下通式(3)表示的锍或由以下通式(4)表示的铵; 并且阴离子由以下通式(5)至(7)中的任一个表示。
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公开(公告)号:US08628908B2
公开(公告)日:2014-01-14
申请号:US13406684
申请日:2012-02-28
申请人: Takeru Watanabe , Tomohiro Kobayashi , Masayoshi Sagehashi , Takeshi Nagata , Youichi Ohsawa , Ryosuke Taniguchi
发明人: Takeru Watanabe , Tomohiro Kobayashi , Masayoshi Sagehashi , Takeshi Nagata , Youichi Ohsawa , Ryosuke Taniguchi
CPC分类号: G03F7/2041 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/11
摘要: A chemically amplified resist composition is provided comprising (A) a specific tertiary amine compound, (B) a specific acid generator, (C) a base resin having an acidic functional group protected with an acid labile group, which is substantially insoluble in alkaline developer and turns soluble in alkaline developer upon deprotection of the acid labile group, and (D) an organic solvent. The resist composition has a high resolution, improved defect control in the immersion lithography, and good shelf stability.
摘要翻译: 提供一种化学放大抗蚀剂组合物,其包含(A)特定的叔胺化合物,(B)特定的酸发生剂,(C)具有由酸不稳定基团保护的酸性官能团的基础树脂,其基本上不溶于碱性显影剂 并且在酸不稳定基团脱保护时变为可溶于碱性显影剂,和(D)有机溶剂。 抗蚀剂组合物具有高分辨率,改善浸渍光刻中的缺陷控制,以及良好的储存稳定性。
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公开(公告)号:US20130322141A1
公开(公告)日:2013-12-05
申请号:US13984216
申请日:2011-02-10
IPC分类号: H02M7/537
CPC分类号: H02M7/537 , H02G5/005 , H02G5/10 , H02M7/003 , H02M7/5387 , H05K7/209 , H05K7/20918
摘要: A filter capacitor accumulating direct-current power and a semiconductor device module performing a switching operation that converts the direct-current power accumulated in the filter capacitor to alternating-current power are electrically connected with each other through a laminated bus bar. The laminated bus bar has a first bus bar and a second bus bar in which a plurality of connection conductors are laminated through an insulator. The second bus bar is provided with heat radiating portions that are formed by exposing a part of the conductor in each flat plate surface.
摘要翻译: 将积蓄直流电力的滤波电容器和执行将滤波电容器中累积的直流电力转换为交流电力的开关动作的半导体器件模块通过层叠母线彼此电连接。 叠层母线具有第一母线和第二母线,其中多个连接导体通过绝缘体层叠。 第二母线设置有通过在每个平板表面中暴露导体的一部分而形成的散热部分。
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公开(公告)号:US08584153B2
公开(公告)日:2013-11-12
申请号:US13466210
申请日:2012-05-08
申请人: Daisuke Takasaka , Tetsuya Tamura , Masaki Nakatani , Katsuo Ichinohe , Rikiya Ueshima , Tomohiro Kobayashi , Yoshiyuki Nakagawa , Yasuhide Mizuta
发明人: Daisuke Takasaka , Tetsuya Tamura , Masaki Nakatani , Katsuo Ichinohe , Rikiya Ueshima , Tomohiro Kobayashi , Yoshiyuki Nakagawa , Yasuhide Mizuta
IPC分类号: G11B17/028
CPC分类号: G11B17/0284
摘要: An optical disc device comprises a disc clamper. The disc clamper is provided with: a first member provided with a first circular disc, and with a plurality of upstanding pieces formed with predetermined spaces therebetween along a circle concentric to the first circular disc, the upstanding pieces having an engaging claw at the distal end thereof; and a second member provided with a second circular disc in which are formed a plurality of through-holes into which the plurality of upstanding pieces are inserted, and with a plurality of peripheral walls formed with predetermined spaces therebetween along a circle concentric to the second circular disc. Rotation in a state where the upstanding pieces have been inserted into the through-holes through the spaces between the peripheral walls causes the engaging claws to engage the peripheral walls.
摘要翻译: 光盘装置包括盘夹持器。 盘夹持器设置有:第一构件,设置有第一圆盘,并且多个直立片沿着与第一圆盘同心的圆形在其间形成有预定的间隔,直立件在远端具有接合爪 的; 以及设置有第二圆盘的第二构件,其中形成有多个直孔插入其中的多个通孔,并且沿着与第二圆周同心的圆形在其间形成有预定间隔的多个周壁 光盘。 直立片已经通过周壁之间的空间插入通孔的状态下的旋转导致接合爪与周壁接合。
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公开(公告)号:US20130227593A1
公开(公告)日:2013-08-29
申请号:US13882805
申请日:2011-10-31
申请人: Daisuke Takasaka , Tetsuya Tamura , Masaki Nakatani , Katsuo Ichinohe , Rikiya Ueshima , Tomohiro Kobayashi , Yoshiyuki Nakagawa , Yasuhide Mizuta
发明人: Daisuke Takasaka , Tetsuya Tamura , Masaki Nakatani , Katsuo Ichinohe , Rikiya Ueshima , Tomohiro Kobayashi , Yoshiyuki Nakagawa , Yasuhide Mizuta
IPC分类号: G11B17/051
CPC分类号: G11B17/051 , G11B17/0404
摘要: In a disk device, a disk is held between a flap and a conveyance roller conveying the disk into a loader chassis. The loader chassis includes a lid panel including a spring seat to which a holddown spring that presses the flap toward the conveyance roller is attached. The spring seat includes an L-shaped frame including a support panel (formed at an edge of an opening,) and a support shaft panel perpendicularly bent from an end of the support panel, the L-shaped frame being pulled to rise toward the flap by bending the support panel. A sloped guide edge is formed by cutting an end side of a lid-panel-side edge of the support shaft panel including a stopper portion and a support shaft main body. A coil portion of the holddown spring is moved along the sloped guide edge to be fitted onto the support shaft main body.
摘要翻译: 在盘装置中,盘被保持在翼片和将盘传送到装载机底盘中的传送辊之间。 装载机底盘包括盖板,该盖板包括弹簧座,将弹簧朝向传送辊按压的按压弹簧安装在该弹簧座上。 弹簧座包括:L形框架,其包括支撑板(形成在开口的边缘处)和从支撑板的端部垂直弯曲的支撑轴板,L形框架被拉动以朝向翼片 通过弯曲支撑面板。 通过切割包括止动部分和支撑轴主体的支撑轴板的盖板侧边缘的端侧来形成倾斜的引导边缘。 按压弹簧的线圈部分沿着倾斜的引导边缘移动以装配到支撑轴主体上。
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公开(公告)号:US20120328987A1
公开(公告)日:2012-12-27
申请号:US13530896
申请日:2012-06-22
CPC分类号: G03F7/038 , G03F1/32 , G03F7/0046 , G03F7/0395 , G03F7/0397 , G03F7/11 , G03F7/203 , G03F7/2041 , G03F7/325 , G03F7/70466
摘要: A negative pattern is formed by applying a resist composition onto a substrate, prebaking, exposing to high-energy radiation, baking (PEB), and developing the exposed resist film in an organic solvent developer to dissolve the unexposed region of resist film. The resist composition comprising a polymer comprising recurring units of cycloolefin having a hydroxyl group substituted with an acid labile group, an acid generator, and an organic solvent displays a high dissolution contrast and high etch resistance.
摘要翻译: 通过将抗蚀剂组合物施加到基材上,预烘烤,暴露于高能辐射,烘烤(PEB)和在有机溶剂显影剂中显影曝光的抗蚀剂膜以溶解抗蚀剂膜的未曝光区域来形成负图案。 包含含有被酸不稳定基团,酸发生剂和有机溶剂取代的羟基的环烯烃的重复单元的聚合物的抗蚀剂组合物显示出高的溶解对比度和高耐蚀刻性。
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公开(公告)号:US08268528B2
公开(公告)日:2012-09-18
申请号:US12628794
申请日:2009-12-01
CPC分类号: G03F7/0046 , G03F7/0045 , G03F7/0392 , G03F7/0395 , G03F7/0397 , G03F7/2041
摘要: A resist composition is provided comprising (A) an additive polymer of acyl-protected hexafluoroalcohol structure, (B) a base polymer having a structure derived from lactone ring, hydroxyl group and/or maleic anhydride, the base polymer becoming soluble in alkaline developer under the action of acid, (C) a photoacid generator, and (D) an organic solvent. The additive polymer is transparent to radiation of wavelength up to 200 nm, and its properties can be tailored by a choice of the polymer structure.
摘要翻译: 提供了抗蚀剂组合物,其包含(A)酰基保护的六氟醇结构的添加剂聚合物,(B)具有衍生自内酯环,羟基和/或马来酸酐的结构的基础聚合物,所述基础聚合物在碱性显影剂中变得可溶 酸的作用,(C)光致酸发生剂,和(D)有机溶剂。 添加剂聚合物对波长高达200nm的辐射是透明的,并且其性质可以通过选择聚合物结构来定制。
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公开(公告)号:US08252504B2
公开(公告)日:2012-08-28
申请号:US12371455
申请日:2009-02-13
CPC分类号: G03F7/0046 , C08F220/18 , C08F220/24 , C08F220/28 , G03F7/0392 , G03F7/0397
摘要: A polymer obtained through copolymerization of a monomer having a hexafluoroalcohol pendant whose hydroxyl moiety has been protected and a monomer having an acid labile group is useful as an additive to a photoresist composition for immersion lithography. When processed by immersion lithography, the resist composition exhibits good water repellency and water slip and produces few development defects.
摘要翻译: 通过使具有羟基部分被保护的六氟醇侧基的单体和具有酸不稳定基团的单体的共聚合得到的聚合物可用作浸渍光刻用光致抗蚀剂组合物的添加剂。 当通过浸渍光刻处理时,抗蚀剂组合物表现出良好的拒水性和水滑动,并且产生很少的显影缺陷。
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