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公开(公告)号：US08628908B2
公开(公告)日：2014-01-14
申请号：US13406684
申请日：2012-02-28
申请人： Takeru Watanabe , Tomohiro Kobayashi , Masayoshi Sagehashi , Takeshi Nagata , Youichi Ohsawa , Ryosuke Taniguchi
发明人： Takeru Watanabe , Tomohiro Kobayashi , Masayoshi Sagehashi , Takeshi Nagata , Youichi Ohsawa , Ryosuke Taniguchi
CPC分类号： G03F7/2041 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/11
摘要： A chemically amplified resist composition is provided comprising (A) a specific tertiary amine compound, (B) a specific acid generator, (C) a base resin having an acidic functional group protected with an acid labile group, which is substantially insoluble in alkaline developer and turns soluble in alkaline developer upon deprotection of the acid labile group, and (D) an organic solvent. The resist composition has a high resolution, improved defect control in the immersion lithography, and good shelf stability.
摘要翻译： 提供一种化学放大抗蚀剂组合物，其包含（A）特定的叔胺化合物，（B）特定的酸发生剂，（C）具有由酸不稳定基团保护的酸性官能团的基础树脂，其基本上不溶于碱性显影剂 并且在酸不稳定基团脱保护时变为可溶于碱性显影剂，和（D）有机溶剂。 抗蚀剂组合物具有高分辨率，改善浸渍光刻中的缺陷控制，以及良好的储存稳定性。
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公开(公告)号：US20120225386A1
公开(公告)日：2012-09-06
申请号：US13406684
申请日：2012-02-28
申请人： Takeru Watanabe , Tomohiro Kobayashi , Masayoshi Sagehashi , Takeshi Nagata , Youichi Ohsawa , Ryosuke Taniguchi
发明人： Takeru Watanabe , Tomohiro Kobayashi , Masayoshi Sagehashi , Takeshi Nagata , Youichi Ohsawa , Ryosuke Taniguchi
CPC分类号： G03F7/2041 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/11
摘要： A chemically amplified resist composition is provided comprising (A) a specific tertiary amine compound, (B) a specific acid generator, (C) a base resin having an acidic functional group protected with an acid labile group, which is substantially insoluble in alkaline developer and turns soluble in alkaline developer upon deprotection of the acid labile group, and (D) an organic solvent. The resist composition has a high resolution, improved defect control in the immersion lithography, and good shelf stability.
摘要翻译： 提供一种化学放大抗蚀剂组合物，其包含（A）特定的叔胺化合物，（B）特定的酸发生剂，（C）具有由酸不稳定基团保护的酸性官能团的基础树脂，其基本上不溶于碱性显影剂 并且在酸不稳定基团脱保护时变为可溶于碱性显影剂，和（D）有机溶剂。 抗蚀剂组合物具有高分辨率，改善浸渍光刻中的缺陷控制，以及良好的储存稳定性。
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3.发明授权Preparation of 2,2-bis (fluoroalkyl) oxirane and preparation of photoacid generator therefrom 有权2,2-双（氟烷基）环氧乙烷的制备及其制备光致酸产生剂公开(公告)号：US08686166B2
公开(公告)日：2014-04-01
申请号：US13526569
申请日：2012-06-19
IPC分类号： C07D301/27 , C07D301/02 , C07C69/74 , C07C309/00
CPC分类号： C07D301/24 , C07C303/32 , C07C381/12 , C07C2603/74 , C07D303/08 , C07C309/08 , C07C309/12
摘要： A 2,2-bis(fluoroalkyl)oxirane (A) is prepared by reacting a fluorinated alcohol (1) with a chlorinating, brominating or sulfonylating agent under basic conditions to form an oxirane precursor (2) and subjecting the oxirane precursor to ring closure under basic conditions. R1 and R2 are fluoroalkyl groups, R3 and R4 are hydrogen or monovalent hydrocarbon groups, X is chlorine, bromine or —OSO2R5 group, and R5 is alkyl or aryl.
摘要翻译： 通过在碱性条件下使氟化醇（1）与氯化，溴化或磺酰化剂反应以形成环氧乙烷前体（2）并使环氧乙烷前体环闭合来制备2,2-双（氟烷基）环氧乙烷（A） 在基本条件下 R1和R2是氟烷基，R3和R4是氢或一价烃基，X是氯，溴或-OSO2R5基，R5是烷基或芳基。
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4.发明申请NITROGEN-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS 有权含氮单体，聚合物，电阻组合物和方法公开(公告)号：US20120183904A1
公开(公告)日：2012-07-19
申请号：US13349754
申请日：2012-01-13
IPC分类号： G03F7/20 , G03F7/039 , C07D211/44 , C08F226/06
CPC分类号： G03F7/0397 , C07D211/44 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/2037 , G03F7/2039 , G03F7/2041 , G03F7/30
摘要： A chemically amplified positive resist composition of better performance can be formulated using a polymer having a quencher incorporated therein, specifically a polymer comprising recurring units having a carbamate structure which is decomposed with an acid to generate an amino group and optionally recurring units having an acid labile group capable of generating a carboxyl and/or hydroxyl group under the action of an acid. The polymer is highly effective for suppressing diffusion of acid and diffuses little itself, and the composition forms a pattern of rectangular profile at a high resolution.
摘要翻译： 具有更好性能的化学放大型正性抗蚀剂组合物可以使用其中掺入猝灭剂的聚合物，特别是包含具有氨基甲酸酯结构的重复单元的聚合物来配制，该聚合单元用酸分解以产生氨基，以及任选的具有酸不稳定性的重复单元 能够在酸的作用下产生羧基和/或羟基的基团。 该聚合物对于抑制酸的扩散非常有效，并且自身扩散，并且组合物以高分辨率形成矩形轮廓的图案。
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5.发明授权Nitrogen-containing organic compound, chemically amplified positive resist composition, and patterning process 有权含氮有机化合物，化学放大阳性抗蚀剂组合物和图案化工艺公开(公告)号：US08808964B2
公开(公告)日：2014-08-19
申请号：US13217319
申请日：2011-08-25
IPC分类号： G03F7/004
CPC分类号： C07D235/08 , C07D233/60 , G03F7/0045 , G03F7/0397
摘要： An aralkylcarbamate of imidazole base is effective as the quencher. In a chemically amplified positive resist composition comprising the carbamate, deprotection reaction of carbamate takes place by reacting with the acid generated upon exposure to high-energy radiation, whereby the composition changes its basicity before and after exposure, resulting in a pattern profile with advantages including high resolution, rectangular shape, and minimized dark-bright difference.
摘要翻译： 咪唑碱的芳烷基氨基甲酸酯作为猝灭剂是有效的。 在包含氨基甲酸酯的化学放大型正性抗蚀剂组合物中，氨基甲酸酯的脱保护反应通过与暴露于高能量辐射时产生的酸反应而发生，由此组合物在暴露之前和之后改变其碱度，得到具有以下优点的图案图案，包括 高分辨率，矩形形状和最小暗亮差异。
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公开(公告)号：US08778591B2
公开(公告)日：2014-07-15
申请号：US13217319
申请日：2011-08-25
IPC分类号： G03F7/004
摘要： An aralkylcarbamate of imidazole base is effective as the quencher. In a chemically amplified positive resist composition comprising the carbamate, deprotection reaction of carbamate takes place by reacting with the acid generated upon exposure to high-energy radiation, whereby the composition changes its basicity before and after exposure, resulting in a pattern profile with advantages including high resolution, rectangular shape, and minimized dark-bright difference.
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7.发明申请公开(公告)号：US20120052441A1
公开(公告)日：2012-03-01
申请号：US13217319
申请日：2011-08-25
IPC分类号： G03F7/039 , C07D233/60 , C07D235/08 , G03F7/26 , G03F7/38
CPC分类号： C07D235/08 , C07D233/60 , G03F7/0045 , G03F7/0397
摘要： An aralkylcarbamate of imidazole base is effective as the quencher. In a chemically amplified positive resist composition comprising the carbamate, deprotection reaction of carbamate takes place by reacting with the acid generated upon exposure to high-energy radiation, whereby the composition changes its basicity before and after exposure, resulting in a pattern profile with advantages including high resolution, rectangular shape, and minimized dark-bright difference.
摘要翻译： 咪唑碱的芳烷基氨基甲酸酯作为猝灭剂是有效的。 在包含氨基甲酸酯的化学放大型正性抗蚀剂组合物中，氨基甲酸酯的脱保护反应通过与暴露于高能量辐射时产生的酸反应而发生，由此组合物在暴露之前和之后改变其碱度，得到具有以下优点的图案图案，包括 高分辨率，矩形形状和最小暗亮差异。
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8.发明授权Nitrogen-containing monomer, polymer, resist composition, and patterning process 有权含氮单体，聚合物，抗蚀剂组合物和图案化工艺公开(公告)号：US09207534B2
公开(公告)日：2015-12-08
申请号：US13349754
申请日：2012-01-13
IPC分类号： G03F7/039 , G03F7/004 , G03F7/30 , G03F7/20 , C07D211/44
CPC分类号： G03F7/0397 , C07D211/44 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/2037 , G03F7/2039 , G03F7/2041 , G03F7/30
摘要： A chemically amplified positive resist composition of better performance can be formulated using a polymer having a quencher incorporated therein, specifically a polymer comprising recurring units having a carbamate structure which is decomposed with an acid to generate an amino group and optionally recurring units having an acid labile group capable of generating a carboxyl and/or hydroxyl group under the action of an acid. The polymer is highly effective for suppressing diffusion of acid and diffuses little itself, and the composition forms a pattern of rectangular profile at a high resolution.
摘要翻译： 具有更好性能的化学放大型正性抗蚀剂组合物可以使用其中掺入猝灭剂的聚合物，特别是包含具有氨基甲酸酯结构的重复单元的聚合物来配制，该聚合单元用酸分解以产生氨基，以及任选的具有酸不稳定性的重复单元 能够在酸的作用下产生羧基和/或羟基的基团。 该聚合物对于抑制酸的扩散非常有效，并且自身扩散，并且组合物以高分辨率形成矩形轮廓的图案。
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9.发明授权Acid-labile ester monomer having spirocyclic structure, polymer, resist composition, and patterning process 有权具有螺环结构的酸不稳定酯单体，聚合物，抗蚀剂组合物和图案化工艺公开(公告)号：US08791288B2
公开(公告)日：2014-07-29
申请号：US12787004
申请日：2010-05-25
申请人： Takeshi Kinsho , Tomohiro Kobayashi , Masayoshi Sagehashi , Takeru Watanabe , Koji Hasegawa , Seiichiro Tachibana
发明人： Takeshi Kinsho , Tomohiro Kobayashi , Masayoshi Sagehashi , Takeru Watanabe , Koji Hasegawa , Seiichiro Tachibana
CPC分类号： C07C69/54 , C07C69/753 , C07C2602/42 , C07C2602/50 , C07C2603/94 , C08F232/08 , G03F7/0045 , G03F7/0397
摘要： An acid-labile ester monomer of spirocyclic structure has formula (1) wherein Z is a monovalent group having a polymerizable double bond, X is a divalent group which forms a cyclopentane, cyclohexane or norbornane ring, R2 is H or monovalent hydrocarbon, R3 and R4 are H or monovalent hydrocarbon, or R3 and R4, taken together, stand for a divalent group which forms a cyclopentane or cyclohexane ring, and n is 1 or 2. A polymer obtained from the acid-labile ester monomer has so high reactivity in acid-catalyzed elimination reaction that the polymer may be used to formulate a resist composition having high resolution.
摘要翻译： 螺环结构的酸不稳定酯单体具有式（1）其中Z是具有可聚合双键的一价基团，X是形成环戊烷，环己烷或降冰片烷环的二价基团，R 2是H或一价烃，R 3和 R 4为H或一价烃，或者R 3和R 4一起代表形成环戊烷或环己烷环的二价基团，n为1或2.由酸不稳定酯单体获得的聚合物具有如此高的反应性 酸催化的消除反应，聚合物可用于配制具有高分辨率的抗蚀剂组合物。
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10.发明申请ACID-LABILE ESTER MONOMER HAVING SPIROCYCLIC STRUCTURE, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS 有权具有螺旋结构的酸可可酯单体，聚合物，树脂组合物和方法公开(公告)号：US20100304295A1
公开(公告)日：2010-12-02
申请号：US12787004
申请日：2010-05-25
申请人： Takeshi Kinsho , Tomohiro Kobayashi , Masayoshi Sagehashi , Takeru Watanabe , Koji Hasegawa , Seiichiro Tachibana
发明人： Takeshi Kinsho , Tomohiro Kobayashi , Masayoshi Sagehashi , Takeru Watanabe , Koji Hasegawa , Seiichiro Tachibana
IPC分类号： G03F7/20 , C07C69/533 , C08F220/00 , C08F232/08 , G03F7/004
CPC分类号： C07C69/54 , C07C69/753 , C07C2602/42 , C07C2602/50 , C07C2603/94 , C08F232/08 , G03F7/0045 , G03F7/0397
摘要： An acid-labile ester monomer of spirocyclic structure has formula (1) wherein Z is a monovalent group having a polymerizable double bond, X is a divalent group which forms a cyclopentane, cyclohexane or norbornane ring, R2 is H or monovalent hydrocarbon, R3 and R4 are H or monovalent hydrocarbon, or R3 and R4, taken together, stand for a divalent group which forms a cyclopentane or cyclohexane ring, and n is 1 or 2. A polymer obtained from the acid-labile ester monomer has so high reactivity in acid-catalyzed elimination reaction that the polymer may be used to formulate a resist composition having high resolution.
摘要翻译： 螺环结构的酸不稳定酯单体具有式（1）其中Z是具有可聚合双键的一价基团，X是形成环戊烷，环己烷或降冰片烷环的二价基团，R 2是H或一价烃，R 3和 R 4为H或一价烃，或者R 3和R 4一起代表形成环戊烷或环己烷环的二价基团，n为1或2.由酸不稳定酯单体获得的聚合物具有如此高的反应性 酸催化的消除反应，聚合物可用于配制具有高分辨率的抗蚀剂组合物。
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