Power estimation method for an integrated circuit using probability
calculations
    1.
    发明授权
    Power estimation method for an integrated circuit using probability calculations 失效
    使用概率计算的集成电路的功率估计方法

    公开(公告)号:US5847966A

    公开(公告)日:1998-12-08

    申请号:US616994

    申请日:1996-03-14

    摘要: A method of estimating power for an integrated circuit based on high speed probability calculation having a high precision with considering correlation between signals may be provided. The method may be performed by calculating probability quantity accompanying to output nodes of respective logical gates, the probability quantity being represented by probability that logical values of the output nodes of respective logical gates are 1 (referred to as "signal probability" hereinafter) and probability that logical values of the output nodes of respective logical gates are changed (referred to as "switching probability" hereinafter), expanding into series a difference P.sub.e -P.sub.a between a strict value P.sub.e of the probability quantity and a value P.sub.a calculated based on supposition that all inputs of respective logical gates are independent, with respect to the probability quantity corresponding to entire input signals of the integrated circuit, and estimating power required for the integrated circuit by first calculating infinite number of terms in the series as a correction term and then employing a value obtained by adding the correction term to the value P.sub.a as an approximate value of the probability quantity.

    摘要翻译: 可以提供考虑到信号之间的相关性的基于具有高精度的高速概率计算的集成电路的功率的方法。 该方法可以通过计算伴随各个逻辑门的输出节点的概率来执行,概率量由各个逻辑门的输出节点的逻辑值为1(以下称为“信号概率”)和概率表示的概率 各个逻辑门的输出节点的逻辑值被改变(以下称为“切换概率”),将概率量的严格值Pe与基于假设计算出的值Pa之间的差Pe-Pa串联扩大, 各个逻辑门的所有输入对于与集成电路的整个输入信号相对应的概率量是独立的,并且通过首先计算该系列中的无限数量的项作为校正项,然后采用 通过将校正项加到值Pa上获得的值作为近似值 概率数值。

    Mobile network system and guidance message providing method
    2.
    发明授权
    Mobile network system and guidance message providing method 有权
    移动网络系统和指导消息提供方法

    公开(公告)号:US08606243B2

    公开(公告)日:2013-12-10

    申请号:US12638130

    申请日:2009-12-15

    CPC分类号: H04L65/1016 H04L65/1046

    摘要: A mobile network system includes a guidance message control server, a call control server and a plurality of access gateways. The call control server includes a gateway management section that determines an access gateway as a subject of call restriction, a first instructing section that transmits a message transmission instruction to the guidance message control server and a second instructing section that transmits a call restriction instruction to the access gateway. The guidance message control server includes a receiving section that receives the message transmission instruction, an acquisition section that acquires a guidance message data and a transmission section that transmits the guidance message data to a specified multicast group. Each of the access gateways includes a processing section that performs multicast group participation processing for participating in the specified multicast group and a guidance transmission section that transmits the guidance message data to a mobile terminal.

    摘要翻译: 移动网络系统包括引导消息控制服务器,呼叫控制服务器和多个接入网关。 呼叫控制服务器包括:网关管理部,其将接入网关判定为呼叫限制的对象;向所述引导消息控制服务器发送消息发送指示的第一指示部;以及向所述引导消息控制服务器发送呼叫限制指令的第二指示部, 接入网关 引导消息控制服务器包括接收消息传输指令的接收部分,获取引导消息数据的获取部分和将指导消息数据发送到指定的多播组的发送部分。 每个访问网关包括执行用于参与所指定的多播组的多播组参与处理的处理部分和将指导消息数据发送到移动终端的引导传输部分。

    Stencil, stencil design system and method for cell projection particle beam lithography
    4.
    发明授权
    Stencil, stencil design system and method for cell projection particle beam lithography 有权
    模板,模板设计系统和用于单元投影粒子束光刻的方法

    公开(公告)号:US07914954B2

    公开(公告)日:2011-03-29

    申请号:US12207342

    申请日:2008-09-09

    IPC分类号: G03F9/00 G03C5/00

    摘要: Stencil masks, particle beam lithography characters and methods for designing the same for use in particle beam lithography are disclosed. The masks, characters and methods for designing them allows for more accurately writing images by reducing various chemical and physical effects, particularly Coulomb and proximity effects. Particle current reaching a surface is reduced by introducing shield areas, which preserve the shape and fidelity of the written image. The shape of the written image is further corrected by systematically adjusting the shape of the character or mask.

    摘要翻译: 公开了用于粒子束光刻的模版掩模,粒子束光刻特征及其设计方法。 用于设计它们的掩模,字符和方法允许通过减少各种化学和物理效应,特别是库仑和邻近效应来更准确地写入图像。 通过引入屏蔽区域来减小到达表面的粒子电流,这保护了书写图像的形状和保真度。 通过系统地调整字符或掩模的形状来进一步校正书写图像的形状。

    COMMUNICATION DEVICE
    6.
    发明申请
    COMMUNICATION DEVICE 审中-公开
    通信设备

    公开(公告)号:US20100115107A1

    公开(公告)日:2010-05-06

    申请号:US12688069

    申请日:2010-01-15

    IPC分类号: G06F15/16

    摘要: When a communication route is established between SIP servers #1 and #3, an SIP server #2 performing a relay between the servers #1 and #3 receives an INVITE signal from the SIP server #1, not describing track information about the SIP server #2 in a Via header and a Record-Route header of the INVITE signal, but transferring the signal to the SIP server #3. Thus, after the transferred INVITE signal, the signal transmitted and received by the SIP servers #1 and #3, does not include the track information about the SIP server #2, thereby transmitting the signal without passing through the SIP server #2.

    摘要翻译: 当在SIP服务器#1和#3之间建立通信路由时,执行服务器#1和#3之间的中继的SIP服务器#2从SIP服务器#1接收到INVITE信号,而不是描述关于SIP服务器的跟踪信息 #2在INVITE信号的Via头和Record-Route头,但将信号传送到SIP服务器#3。 因此,在转移的INVITE信号之后,由SIP服务器#1和#3发送和接收的信号不包括关于SIP服务器#2的轨道信息,从而在不通过SIP服务器#2的情况下发送信号。

    Method and system for logic design for cell projection particle beam lithography
    8.
    发明申请
    Method and system for logic design for cell projection particle beam lithography 失效
    用于单元投影粒子束光刻的逻辑设计方法和系统

    公开(公告)号:US20080128637A1

    公开(公告)日:2008-06-05

    申请号:US11607305

    申请日:2006-12-01

    IPC分类号: G21K5/04

    摘要: A method for particle beam lithography, such as electron beam (EB) lithography, includes predefining a stencil design having a plurality of cell patterns with information from a cell library, fabricating the stencil design, synthesizing a functional description into a logic circuit design after predefining the stencil design so that one or more characteristics of the stencil design are considered during synthesizing of the functional description into the logic circuit design, optimizing the logic circuit design, generating a layout design from the optimized logic circuit design, and forming the logic circuit on a substrate according to the stencil design and the layout design.

    摘要翻译: 用于粒子束光刻的方法,例如电子束(EB)光刻,包括预定义具有多个单元图案的模板设计,其具有来自单元库的信息,制造模板设计,在预定义之后将功能描述合成为逻辑电路设计 模板设计使得在将逻辑电路设计中的功能描述合成期间考虑模板设计的一个或多个特性,优化逻辑电路设计,从优化的逻辑电路设计生成布局设计,并且形成逻辑电路 根据模板设计和布局设计的基材。

    Method and System for Lithography Simulation and Measurement of Critical Dimensions with Improved CD Marker Generation and Placement
    9.
    发明申请
    Method and System for Lithography Simulation and Measurement of Critical Dimensions with Improved CD Marker Generation and Placement 有权
    使用改进的CD标记生成和放置的​​光刻模拟和关键尺寸测量的方法和系统

    公开(公告)号:US20080118852A1

    公开(公告)日:2008-05-22

    申请号:US11678530

    申请日:2007-02-23

    IPC分类号: G03C5/00

    CPC分类号: G03F7/2061 G03F1/36 G03F1/68

    摘要: A method and system for lithography simulation and measurement of critical dimensions with improved CD marker generation and placement is disclosed. The method and system specify a position for measuring a difference between a lithography image and a target pattern, generate one or more CD marker candidates, and select at least one CD marker from the one or more CD marker candidates.

    摘要翻译: 公开了一种用于光刻模拟和关键尺寸测量的方法和系统,其具有改进的CD标记生成和放置。 该方法和系统指定用于测量光刻图像和目标图案之间的差异的位置,生成一个或多个CD标记候选,并从该一个或多个CD标记候选中选择至少一个CD标记。