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公开(公告)号：US09314845B2
公开(公告)日：2016-04-19
申请号：US14328106
申请日：2014-07-10
发明人： Takanobu Miyashita , Yasuyuki Goto , Takamichi Yamamoto , Ryousuke Kushibiki , Masahiro Aono , Masahiro Nishiura
IPC分类号： C23C14/24 , B22F3/12 , B22F9/08 , C23C14/34 , C22C1/05 , C22C5/04 , C22C32/00 , G11B5/851 , B22F9/04 , C22C1/04 , C22C1/10 , H01J37/34 , C23C14/06 , C22C38/00 , C22C38/16
CPC分类号： B22F3/12 , B22F9/04 , B22F9/08 , B22F9/082 , B22F2201/03 , B22F2999/00 , C22C1/0466 , C22C1/05 , C22C1/10 , C22C5/04 , C22C32/00 , C22C38/002 , C22C38/16 , C23C14/0635 , C23C14/34 , C23C14/3414 , G11B5/851 , H01J37/3429 , H01J37/3491 , H01J2237/3322 , H01J2237/3323
摘要： A process for producing an FePt-based sputtering target includes adding C powder containing unavoidable impurities and metal oxide powder containing unavoidable impurities to FePt-based alloy powder containing Pt in an amount of 40 at % or more and 60 at % or less with the balance being Fe and unavoidable impurities so that the C powder and the metal oxide powder are contained to satisfy: 0
摘要翻译： 制造FePt系溅射靶的方法包括将含有不可避免的杂质的C粉末和含有不可避免的杂质的金属氧化物粉末添加至含有40质量％以上且60原子％以下的Pt的FePt系合金粉末，余量 是Fe和不可避免的杂质，因此含有C粉末和金属氧化物粉末以满足：0 <α＆nlE; 20; 10＆nlE;＆bgr; <40; 和20＆nlE;α+＆bgr;＆nlE; 40，其中α和＆bgr; 基于FePt系合金粉末，C粉末和金属氧化物粉末的总量，分别以体积％表示C粉末和金属氧化物粉末的含量，然后将FePt系合金粉末， C粉末和金属氧化物粉末以产生粉末混合物。
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公开(公告)号：US20150211109A1
公开(公告)日：2015-07-30
申请号：US14677013
申请日：2015-04-02
CPC分类号： C23C14/3414 , B22F3/14 , B22F3/15 , B22F5/00 , C22C1/0433 , C22C1/05 , C22C5/04 , C22C19/07 , C22C32/001 , C23C14/35 , G11B5/851 , H01J37/3429
摘要： A target for magnetron sputtering, comprising metal Co, metal Cr, and an oxide with an atomic ratio of the metal Cr to the total of the metal Co and the metal Cr being less than 25 at %, wherein the target comprises: a non-magnetic metal phase containing metal Co and metal Cr with an atomic ratio of the metal Cr to the total of the metal Co and the metal Cr being 25 at % or more and with an atomic ratio of the metal Co to the total of the metal Co and the other metals being more than 0 at % and 45 at % or less; and a magnetic metal phase containing metal Co, wherein a volume ratio of the oxide to the non-magnetic metal phase is more than 0 and 1.2 or less, and wherein the non-magnetic metal phase and the oxide are mutually dispersed.
摘要翻译： 包含金属Co，金属Cr和金属Cr的原子比与金属Co和金属Cr的总和小于25at％的氧化物的磁控溅射靶，其中靶包括： 含有金属Co的金属相和金属Cr的原子比与金属Co的总量和金属Cr的总和为25原子％以上，金属Co与金属Co的总量的原子比 其他金属的含量大于0原子％和45原子％以下; 以及含有金属Co的磁性金属相，其中所述氧化物与所述非磁性金属相的体积比大于0且为1.2以下，并且所述非磁性金属相和所述氧化物相互分散。
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公开(公告)号：US20140311901A1
公开(公告)日：2014-10-23
申请号：US14357852
申请日：2012-10-12
发明人： Takanobu Miyashita , Yasuyuki Goto
IPC分类号： H01J37/34
CPC分类号： H01J37/3429 , B22F3/00 , B22F3/14 , C22C1/04 , C22C1/0433 , C22C1/05 , C22C5/04 , C22C19/07 , C22C27/06 , C22C30/00 , C23C14/3414 , G11B5/851 , H01F41/183 , H01J37/3426
摘要： Provided is a magnetron sputtering target having a ferromagnetic metal element. This magnetron sputtering target includes: a magnetic phase containing the ferromagnetic metal element; a plurality of non-magnetic phases that each contain the ferromagnetic metal element and that are different in constituent elements or a content ratio of constituent elements; and an oxide phase. At least one of the plurality of non-magnetic phases is more finely interdispersed with the oxide phase than the magnetic phase.
摘要翻译： 提供了具有铁磁性金属元素的磁控溅射靶。 该磁控溅射靶包括：含有铁磁性金属元素的磁性相; 多个非磁性相，其各自含有强磁性金属元素，并且构成元素不同或构成元素的含量比; 和氧化物相。 所述多个非磁性相中的至少一个与所述磁性相相比，所述氧化物相更细微地分散。
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公开(公告)号：US09928996B2
公开(公告)日：2018-03-27
申请号：US14313787
申请日：2014-06-24
发明人： Takanobu Miyashita , Yasuyuki Goto
IPC分类号： B22F3/12 , H01J37/34 , C22C19/05 , C22C38/30 , C22C19/07 , C22C32/00 , C23C14/34 , G11B5/851 , H01F41/18 , C22C1/04 , B22F1/02
CPC分类号： H01J37/3426 , B22F1/02 , B22F3/12 , C22C1/0433 , C22C19/05 , C22C19/07 , C22C32/0026 , C22C38/30 , C22C2202/02 , C23C14/3407 , C23C14/3414 , G11B5/851 , H01F41/183
摘要： A process for producing a magnetron sputtering target includes: mixing and dispersing an oxide powder and a magnetic metal powder, the magnetic metal powder containing a ferromagnetic metal element, to obtain a magnetic powder mixture; mixing and dispersing an oxide powder and each of a plurality of non-magnetic metal powders, the plurality of non-magnetic metal powders containing the ferromagnetic metal element, the plurality of non-magnetic metal powders containing a different constituent element from each other or containing constituent elements at different ratios from each other, to obtain a plurality of non-magnetic powder mixtures; and mixing and dispersing the magnetic powder mixture and the plurality of non-magnetic powder mixtures to obtain a powder mixture for pressure sintering.
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公开(公告)号：US09314846B2
公开(公告)日：2016-04-19
申请号：US14330786
申请日：2014-07-14
发明人： Takanobu Miyashita , Yasuyuki Goto , Takamichi Yamamoto , Ryousuke Kushibiki , Masahiro Aono , Masahiro Nishiura
IPC分类号： B22F3/12 , B22F9/08 , C23C14/34 , C22C1/05 , C22C5/04 , C22C32/00 , G11B5/851 , B22F9/04 , C22C1/04 , C22C1/10 , H01J37/34 , C23C14/06 , C22C38/00 , C22C38/16
CPC分类号： B22F3/12 , B22F9/04 , B22F9/08 , B22F9/082 , B22F2201/03 , B22F2999/00 , C22C1/0466 , C22C1/05 , C22C1/10 , C22C5/04 , C22C32/00 , C22C38/002 , C22C38/16 , C23C14/0635 , C23C14/34 , C23C14/3414 , G11B5/851 , H01J37/3429 , H01J37/3491 , H01J2237/3322 , H01J2237/3323
摘要： A process for producing an FePt-based sputtering target includes adding metal oxide powder containing unavoidable impurities to FePt-based alloy powder containing Pt in an amount of 40 at % or more and less than 60 at % and one or more kinds of metal elements other than Fe and Pt in an amount of more than 0 at % and 20 at % or less with the balance being Fe and unavoidable impurities and with a total amount of Pt and the one or more kinds of metal elements being 60 at % or less so that the metal oxide powder accounts for 20 vol % or more and 40 vol % or less of a total amount of the FePt-based alloy powder and the metal oxide powder, followed by mixing the FePt-based alloy powder and the metal oxide powder to produce a powder mixture.
摘要翻译： 一种FePt系溅射靶的制造方法，其特征在于，在含有40质量％以上且小于等于60原子％的Pt的FePt系合金粉末中添加含有不可避免的杂质的金属氧化物粉末和其他金属元素 比Fe和Pt大于0at％和20at％或更少，余量为Fe和不可避免的杂质，并且Pt的总量和一种或多种金属元素的含量为60原子％以下，Fe 金属氧化物粉末占FePt系合金粉末和金属氧化物粉末总量的20体积％以上且40体积％以下，然后将FePt系合金粉末和金属氧化物粉末混合到 产生粉末混合物。
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公开(公告)号：US20150214017A1
公开(公告)日：2015-07-30
申请号：US14677049
申请日：2015-04-02
CPC分类号： C23C14/3414 , B22F3/14 , B22F3/15 , B22F5/00 , C22C1/0433 , C22C1/05 , C22C5/04 , C22C19/07 , C22C32/001 , C23C14/35 , G11B5/851 , H01J37/3429
摘要： A manufacturing method for a target for magnetron sputtering, the method comprising the steps of: mixing and dispersing non-magnetic metal powder and oxide powder to obtain a non-magnetic powder mixture, the non-magnetic metal powder containing metal Co and metal Cr with an atomic ratio of the metal Cr to the total of the metal Co and the metal Cr being 25 at % or more and with an atomic ratio of the metal Co to the total of the metal Co and the other metals being 45 at % or less, the oxide powder being mixed at a volume ratio of more than 0 and 1.2 or less with respect to the non-magnetic metal powder; mixing and dispersing the obtained non-magnetic powder mixture and magnetic metal powder containing metal Co to obtain a powder mixture for pressure sintering; and pressure sintering the obtained powder mixture for pressure sintering.
摘要翻译： 一种磁控溅射靶的制造方法，其特征在于，包括以下步骤：将非磁性金属粉末和氧化物粉末混合分散，得到非磁性粉末混合物，将含有金属Co和金属Cr的非磁性金属粉末与 金属Cr与金属Co和金属Cr的总量的原子比为25原子％以上，金属Co与金属Co的总量的原子比为45原子％以下。 所述氧化物粉末相对于所述非磁性金属粉末以大于0且小于等于1.2的体积比混合; 将得到的非磁性粉末混合物和含有金属Co的磁性金属粉末进行混合分散，得到用于加压烧结的粉末混合物; 并将所得粉末混合物加压烧结以进行加压烧结。
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公开(公告)号：US09358612B2
公开(公告)日：2016-06-07
申请号：US14330775
申请日：2014-07-14
发明人： Takanobu Miyashita , Yasuyuki Goto , Takamichi Yamamoto , Ryousuke Kushibiki , Masahiro Aono , Masahiro Nishiura
IPC分类号： C23C14/24 , B22F3/12 , B22F9/08 , C23C14/34 , C22C1/05 , C22C5/04 , C22C32/00 , G11B5/851 , B22F9/04 , C22C1/04 , C22C1/10 , H01J37/34 , C23C14/06 , C22C38/00 , C22C38/16
CPC分类号： B22F3/12 , B22F9/04 , B22F9/08 , B22F9/082 , B22F2201/03 , B22F2999/00 , C22C1/0466 , C22C1/05 , C22C1/10 , C22C5/04 , C22C32/00 , C22C38/002 , C22C38/16 , C23C14/0635 , C23C14/34 , C23C14/3414 , G11B5/851 , H01J37/3429 , H01J37/3491 , H01J2237/3322 , H01J2237/3323
摘要： An FePt-based sputtering target contains Fe, Pt, and a metal oxide, and further contains one or more kinds of metal elements other than Fe and Pt, wherein the FePt-based sputtering target has a structure in which an FePt-based alloy phase and a metal oxide phase containing unavoidable impurities are mutually dispersed, the FePt-based alloy phase containing Pt in an amount of 40 at % or more and less than 60 at % and the one or more kinds of metal elements in an amount of more than 0 at % and 20 at % or less with the balance being Fe and unavoidable impurities and with the total amount of Pt and the one or more kinds of metal elements being 60 at % or less, and wherein the metal oxide is contained in an amount of 20 vol % or more and 40 vol % or less based on the total amount of the target.
摘要翻译： FePt系溅射靶包含Fe，Pt和金属氧化物，并且还含有除Fe和Pt以外的一种以上的金属元素，其中，FePt系溅射靶具有FePt系合金相 含有不可避免的杂质的金属氧化物相相互分散，含有40at％以上且小于60at％的Pt的FePt系合金相和超过一个以上的金属元素 0原子％和20原子％以下，余量为Fe和不可避免的杂质，Pt的总量和一种或多种金属元素的含量为60原子％以下，其中金属氧化物的含量 为20体积％以上且40体积％以下。
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公开(公告)号：US09502224B2
公开(公告)日：2016-11-22
申请号：US14357852
申请日：2012-10-12
发明人： Takanobu Miyashita , Yasuyuki Goto
IPC分类号： C23C14/34 , H01J37/34 , B22F3/00 , C22C1/04 , C22C1/05 , C22C5/04 , C22C19/07 , C22C27/06 , G11B5/851 , B22F3/14 , H01F41/18
CPC分类号： H01J37/3429 , B22F3/00 , B22F3/14 , C22C1/04 , C22C1/0433 , C22C1/05 , C22C5/04 , C22C19/07 , C22C27/06 , C22C30/00 , C23C14/3414 , G11B5/851 , H01F41/183 , H01J37/3426
摘要： Provided is a magnetron sputtering target having a ferromagnetic metal element. This magnetron sputtering target includes: a magnetic phase containing the ferromagnetic metal element; a plurality of non-magnetic phases that each contain the ferromagnetic metal element and that are different in constituent elements or a content ratio of constituent elements; and an oxide phase. At least one of the plurality of non-magnetic phases is more finely interdispersed with the oxide phase than the magnetic phase.
摘要翻译： 提供了具有铁磁性金属元素的磁控溅射靶。 该磁控溅射靶包括：含有铁磁性金属元素的磁性相; 多个非磁性相，其各自含有强磁性金属元素，并且在构成元素中不同或构成元素的含量比; 和氧化物相。 所述多个非磁性相中的至少一个与所述磁性相相比，所述氧化物相更细微地分散。
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公开(公告)号：US09435024B2
公开(公告)日：2016-09-06
申请号：US14677013
申请日：2015-04-02
IPC分类号： C23C14/35 , H01J37/34 , C23C14/34 , B22F3/15 , C22C1/05 , C22C5/04 , C22C19/07 , G11B5/851 , C22C1/04 , C22C32/00 , B22F3/14 , B22F5/00
CPC分类号： C23C14/3414 , B22F3/14 , B22F3/15 , B22F5/00 , C22C1/0433 , C22C1/05 , C22C5/04 , C22C19/07 , C22C32/001 , C23C14/35 , G11B5/851 , H01J37/3429
摘要： A target for magnetron sputtering, comprising metal Co, metal Cr, and an oxide with an atomic ratio of the metal Cr to the total of the metal Co and the metal Cr being less than 25 at %, wherein the target comprises: a non-magnetic metal phase containing metal Co and metal Cr with an atomic ratio of the metal Cr to the total of the metal Co and the metal Cr being 25 at % or more and with an atomic ratio of the metal Co to the total of the metal Co and the other metals being more than 0 at % and 45 at % or less; and a magnetic metal phase containing metal Co, wherein a volume ratio of the oxide to the non-magnetic metal phase is more than 0 and 1.2 or less, and wherein the non-magnetic metal phase and the oxide are mutually dispersed.
摘要翻译： 包含金属Co，金属Cr和金属Cr的原子比与金属Co和金属Cr的总和小于25at％的氧化物的磁控溅射靶，其中靶包括： 含有金属Co的金属相和金属Cr的原子比与金属Co的总量和金属Cr的总和为25原子％以上，金属Co与金属Co的总量的原子比 其他金属的含量大于0原子％和45原子％以下; 以及含有金属Co的磁性金属相，其中所述氧化物与所述非磁性金属相的体积比大于0且为1.2以下，并且所述非磁性金属相和所述氧化物相互分散。
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公开(公告)号：US09095901B2
公开(公告)日：2015-08-04
申请号：US14328016
申请日：2014-07-10
发明人： Takanobu Miyashita , Yasuyuki Goto , Takamichi Yamamoto , Ryousuke Kushibiki , Masahiro Aono , Masahiro Nishiura
IPC分类号： C23C14/34 , B22F3/12 , B22F9/08 , C22C1/05 , C22C5/04 , C22C32/00 , G11B5/851 , B22F9/04 , C22C1/04 , C22C1/10 , H01J37/34 , C23C14/06 , C22C38/00 , C22C38/16
CPC分类号： B22F3/12 , B22F9/04 , B22F9/08 , B22F9/082 , B22F2201/03 , B22F2999/00 , C22C1/0466 , C22C1/05 , C22C1/10 , C22C5/04 , C22C32/00 , C22C38/002 , C22C38/16 , C23C14/0635 , C23C14/34 , C23C14/3414 , G11B5/851 , H01J37/3429 , H01J37/3491 , H01J2237/3322 , H01J2237/3323
摘要： An FePt-based sputtering target has a structure in which an FePt-based alloy phase, a C phase containing unavoidable impurities, and a metal oxide phase containing unavoidable impurities are mutually dispersed, the FePt-based alloy phase containing Pt in an amount of 40 at % or more and 60 at % or less with the balance being Fe and unavoidable impurities, wherein C is contained in an amount of more than 0 vol % and 20 vol % or less based on the total amount of the target, the metal oxide is contained in an amount of 10 vol % or more and less than 40 vol % based on the total amount of the target, and the total content of C and the metal oxide is 20 vol % or more and 40 vol % or less based on the total amount of the target.
摘要翻译： 基于FePt的溅射靶具有FePt基合金相，含有不可避免的杂质的C相和含有不可避免的杂质的金属氧化物相相互分散的结构，含有Pt量的FePt系合金相40 ％以上且60原子％以下，余量为Fe和不可避免的杂质，其中C的含量相对于靶的总量大于0体积％和20体积％以下，金属氧化物 的含量相对于靶的总量为10体积％以上且小于40体积％，C和金属氧化物的总含量为20体积％以上且40体积％以下，基于 目标的总量。
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