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    Radiation-sensitive positive resist composition
    2.
    发明授权
    Radiation-sensitive positive resist composition 失效
    辐射敏感正光刻胶组合物

    公开(公告)号：US5792585A

    公开(公告)日：1998-08-11

    申请号：US217892

    申请日：1994-03-25

    申请人： Ayako Ida ,  Haruyoshi Osaki ,  Takeshi Hioki ,  Yasunori Doi ,  Yasunori Uetani ,  Ryotaro Hanawa

    发明人： Ayako Ida ,  Haruyoshi Osaki ,  Takeshi Hioki ,  Yasunori Doi ,  Yasunori Uetani ,  Ryotaro Hanawa

    IPC分类号： C07C39/15 ,  G03F7/004 ,  G03F7/022 ,  G03F7/023 ,  H01L21/027 ,  H01L21/30

    CPC分类号： G03F7/022 ,  C07C39/15 ,  G03F7/0226 ,  G03F7/0236

    摘要： A positive resist composition comprising 1,2-quinonediazide compound and, as an alkali-soluble resin, an alkali-soluble resin (A) which comprises a resin (I) obtainable through a condensation reaction of a mixture of m-cresol, 2,3,5-trimethylphenol and optionally p-cresol with an aldehyde and a low molecular weight novolak (II) having a weight average molecular weight of 200 to 2000 as converted to polystyrene, an alkali-soluble resin (B) which comprises a resin (I) and a compound of the general formula (III): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are respectively a C.sub.1 -C.sub.5 alkyl group or a C.sub.1 -C.sub.5 alkoxy group, 1, m and n are respectively a number of 0 to 3, R' is a hydrogen atom or a C.sub.1 -C.sub.3 alkyl group, or an alkali-soluble resin (C) which comprises a resin (IV) obtainable through a condensation reaction of a mixture of m-methoxyphenol and 2,3,5-trimethylphenol in a molar ratio of 80:20 to 30:70 with an aldehyde, which has good sensitivity, improved resolution and heat resistance.

    摘要翻译： 包含1,2-醌二叠氮化合物的正性抗蚀剂组合物和作为碱溶性树脂的碱溶性树脂（A），其包含可通过间甲酚，2,5-二氯苯的混合物的缩合反应获得的树脂（I） 3,5-二甲基苯酚和任选的具有醛和低分子量酚醛清漆（II）的对甲酚，其重均分子量为200至2000，转化为聚苯乙烯，碱溶性树脂（B）包含树脂（ I）和通式（III）的化合物：其中R 1，R 2和R 3分别是C 1 -C 5烷基或C 1 -C 5烷氧基，m和n分别为0〜 3，R'是氢原子或C1-C3烷基，或碱溶性树脂（C），其包含可通过间 - 甲氧基苯酚和2,3,5-三羟基苯酚的混合物的缩合反应获得的树脂（IV） - 三甲基苯酚与摩尔比为80:20至30:70的醛，其具有良好的灵敏度，改进的分辨率和耐热性。

    Radiation-sensitive positive resist composition comprising an alkali soluble resin made from m-cresol, 2,3,5-trimethyl phenol and optionally p-cresol and a polyphenol compound having alkyl or alkoxy side groups
    3.
    发明授权
    Radiation-sensitive positive resist composition comprising an alkali soluble resin made from m-cresol, 2,3,5-trimethyl phenol and optionally p-cresol and a polyphenol compound having alkyl or alkoxy side groups 失效
    包含由间甲酚，2,3,5-三甲基苯酚和任选的对甲酚制成的碱溶性树脂和具有烷基或烷氧基侧基的多酚化合物的辐射敏感性正性抗蚀剂组合物

    公开(公告)号：US5736292A

    公开(公告)日：1998-04-07

    申请号：US490511

    申请日：1995-06-14

    申请人： Ayako Ida ,  Haruyoshi Osaki ,  Takeshi Hioki ,  Yasunori Doi ,  Yasunori Uetani ,  Ryotaro Hanawa

    发明人： Ayako Ida ,  Haruyoshi Osaki ,  Takeshi Hioki ,  Yasunori Doi ,  Yasunori Uetani ,  Ryotaro Hanawa

    IPC分类号： C07C39/15 ,  G03F7/004 ,  G03F7/022 ,  G03F7/023 ,  H01L21/027 ,  H01L21/30

    CPC分类号： G03F7/022 ,  C07C39/15 ,  G03F7/0226 ,  G03F7/0236

    摘要： A positive resist composition comprising 1,2-quinonediazide compound and, as an alkali-soluble resin, an alkali-soluble resin (A) which comprises a resin (I) obtainable through a condensation reaction of a mixture of m-cresol, 2,3,5-trimethylphenol and optionally p-cresol with an aldehyde and a low molecular weight novolak (II) having a weight average molecular weight of 200 to 2000 as converted to polystyrene, an alkali-soluble resin (B) which comprises a resin (I) and a compound of the general formula (III): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are respectively a C.sub.1 -C.sub.5 alkyl group or a C.sub.1 -C.sub.5 alkoxy group, l, m and n are respectively a number of 0 to 3, R' is a hydrogen atom or a C.sub.1 -C.sub.3 alkyl group, or an alkali-soluble resin (C) which comprises a resin (IV) obtainable through a condensation reaction of a mixture of m-methoxyphenol and 2,3,5-trimethylphenol in a molar ratio of 80:20 to 30:70 with an aldehyde, which has good sensitivity, improved resolution and heat resistance.

    摘要翻译： 包含1,2-醌二叠氮化合物的正性抗蚀剂组合物和作为碱溶性树脂的碱溶性树脂（A），其包含可通过间甲酚，2,5-二氯苯的混合物的缩合反应获得的树脂（I） 3,5-二甲基苯酚和任选的具有醛和低分子量酚醛清漆（II）的对甲酚，其重均分子量为200至2000，转化为聚苯乙烯，碱溶性树脂（B）包含树脂（ I）和通式（III）的化合物：其中R1，R2和R3分别为C1-C5烷基或C1-C5烷氧基，l，m和n分别为0〜 3，R'是氢原子或C1-C3烷基，或碱溶性树脂（C），其包含可通过间 - 甲氧基苯酚和2,3,5-三羟基苯酚的混合物的缩合反应获得的树脂（IV） - 三甲基苯酚与摩尔比为80:20至30:70的醛，其具有良好的灵敏度，改进的分辨率和耐热性。

    Quinone diazide photoresist composition containing alkali-soluble resin and an ultraviolet ray absorbing dye
    4.
    发明授权
    Quinone diazide photoresist composition containing alkali-soluble resin and an ultraviolet ray absorbing dye 失效
    醌基二氮化物光刻胶组合物，含有碱溶性树脂和紫外线吸收染料

    公开(公告)号：US5362598A

    公开(公告)日：1994-11-08

    申请号：US132230

    申请日：1993-10-06

    申请人： Naoki Takeyama ,  Yasunori Uetani ,  Hirotoshi Nakanishi ,  Ryotaro Hanawa

    发明人： Naoki Takeyama ,  Yasunori Uetani ,  Hirotoshi Nakanishi ,  Ryotaro Hanawa

    IPC分类号： G03F7/09 ,  G03F7/023 ,  G03C1/61

    CPC分类号： G03F7/091

    摘要： A photoresist composition which comprises a compound of the general formula: ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are the same or different and represent a hydrogen atom, a hydroxyl group, --OCOR.sub.4, --O--R.sub.5, --OSi(R.sub.6).sub.3, a halogen atom, an optionally substituted alkyl group, an optionally substituted alkenyl group, an optionally substituted phenyl group or an optionally substituted aralkyl group; R.sub.4, R.sub.5 and R.sub.6 represent an optionally substituted lower alkyl group or an optionally substituted phenyl group; X and Y are the same or different and represent --CN, --COOR.sub.7, --CONR.sub.8 R.sub.9, ##STR2## R.sub.7 represents an alkyl group; R.sub.8 and R.sub.9 are the same or different and represent a hydrogen atom, an optionally substituted alkyl or phenyl group; R.sub.10 represents a hydrogen atom, an optionally substituted alkyl group or a hydroxyl group; and a is a number of 1 to 2, which is suitable for forming fine patterns having high resolution on a substrate having high reflectance.

    摘要翻译： 一种光致抗蚀剂组合物，其包含以下通式的化合物：其中R 1，R 2和R 3相同或不同，表示氢原子，羟基，-OCOR 4，-O-R 5，-OSi（ R6）3，卤素原子，任选取代的烷基，任选取代的烯基，任选取代的苯基或任选取代的芳烷基; R4，R5和R6表示任选取代的低级烷基或任意取代的苯基; X和Y相同或不同，表示-CN，-COOR 7，-CONR 8 R 9，R 7表示烷基; R8和R9相同或不同，表示氢原子，任意取代的烷基或苯基; R 10表示氢原子，任选取代的烷基或羟基; a为1〜2，适合于在高反射率的基板上形成分辨率高的精细图案。

    Positive resist composition
    7.
    发明授权
    Positive resist composition 失效
    正抗蚀剂组成

    公开(公告)号：US5436107A

    公开(公告)日：1995-07-25

    申请号：US853547

    申请日：1992-03-18

    申请人： Jun Tomioka ,  Yasunori Uetani ,  Hirotoshi Nakanishi ,  Ryotaro Hanawa ,  Ayako Ida

    发明人： Jun Tomioka ,  Yasunori Uetani ,  Hirotoshi Nakanishi ,  Ryotaro Hanawa ,  Ayako Ida

    IPC分类号： C07D311/64 ,  G03F7/022 ,  H01L21/027 ,  G03F7/023 ,  G03F7/30

    CPC分类号： C07D311/64 ,  G03F7/0226

    摘要： A positive resist composition which comprises, in admixture, an alkali-soluble resin; at least one quinone diazide sulfonate of a polyhydric phenol compound of the formula: ##STR1## wherein R.sub.1 to R.sub.5 are independently a hydrogen atom, an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group, provided that at least one of R.sub.1 and R.sub.2 is an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group; anda quinone diazide sulfonate of a phenol compound of the formula ##STR2## wherein R.sub.6 to R.sub.10 are independently a hydrogen atom, an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group, provided that at least one of R.sub.6 and R.sub.7 is an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group.

    摘要翻译： 一种正性抗蚀剂组合物，其包含碱溶性树脂; 至少一种下式的多元酚化合物的醌二叠氮化物磺酸盐：其中R 1至R 5独立地为氢原子，烷基，烯基，环烷基或芳基，条件是在 R1和R2中的至少一个是烷基，烯基，环烷基或芳基; 和式（II）的酚化合物的醌二叠氮基磺酸盐，其中R 6至R 10独立地为氢原子，烷基，烯基，环烷基或芳基，条件是至少一个 R6和R7是烷基，烯基，环烷基或芳基。

    Positive resist composition
    9.
    发明授权
    Positive resist composition 失效
    正抗蚀剂组成

    公开(公告)号：US06383708B1

    公开(公告)日：2002-05-07

    申请号：US08160290

    申请日：1993-12-02

    申请人： Yasunori Uetani ,  Yasunori Doi ,  Kazuhiko Hashimoto ,  Haruyoshi Osaki ,  Ryotaro Hanawa

    发明人： Yasunori Uetani ,  Yasunori Doi ,  Kazuhiko Hashimoto ,  Haruyoshi Osaki ,  Ryotaro Hanawa

    IPC分类号： G03C152

    CPC分类号： G03F7/0048 ,  G03F7/0226

    摘要： A positive resist composition comprising, in admixture, an alkali-soluble resin, a quinone diazide compound and a mixed solvent of (B) at least one organic solvent selected from the group consisting of &ggr;-butyrolactone, 3-methoxybutanol and cyclohexanone and (A) an organic solvent other than the solvents (B) which does not have simultaneously an alkylcarbonyl group and an alkoxy group in a molecule and has a boiling point of from 140 to 180° C. under atmospheric pressure (B), which composition has a large &ggr;-value and provides an improved profile and a large depth of focus.

    摘要翻译： 一种正性抗蚀剂组合物，其包含碱溶性树脂，醌二叠氮化合物和（B）至少一种选自γ-丁内酯，3-甲氧基丁醇和环己酮的至少一种有机溶剂和（A ）除了在大气压（B）下在分子中不具有烷基羰基和烷氧基并且沸点为140〜180℃的溶剂（B）的有机溶剂，该组合物具有 大的伽马值，并提供改进的轮廓和较大的焦点深度。